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公开(公告)号：US20170209908A1
公开(公告)日：2017-07-27
申请号：US15416253
申请日：2017-01-26
摘要： In various embodiments, metallic wires are fabricated by combining one or more powders of substantially spherical metal particles with one or more powders of non-spherical particles within one or more optional metallic tubes. The metal elements within the powders (and the one or more tubes, if present) collectively define a high entropy alloy of five or more metallic elements or a multi-principal element alloy of four or more metallic elements.
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公开(公告)号：US20170209963A1
公开(公告)日：2017-07-27
申请号：US15416254
申请日：2017-01-26
IPC分类号： B23K26/342 , B23K26/00 , B23K35/02 , B23K35/32 , B23K35/40 , B33Y70/00 , B22F7/06 , B22F3/02 , C22C30/00 , B23K15/00 , B33Y10/00
CPC分类号： B23K26/342 , B21C1/003 , B21C1/02 , B21C23/002 , B22F1/0048 , B22F1/0055 , B22F3/02 , B22F3/1055 , B22F5/12 , B22F7/06 , B22F2301/20 , B22F2998/10 , B23K9/04 , B23K15/0086 , B23K15/0093 , B23K26/0006 , B23K35/0272 , B23K35/32 , B23K35/406 , B33Y10/00 , B33Y70/00 , C22C27/02 , C22C30/00 , C23F1/00 , Y02P10/295
摘要： In various embodiments, additive manufacturing is utilized to fabricate three-dimensional metallic parts using metallic alloy wire as a feedstock material.
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公开(公告)号：US20160076138A1
公开(公告)日：2016-03-17
申请号：US14950249
申请日：2015-11-24
申请人： Christopher MICHALUK , William LOEWENTHAL , Gary ROZAK , Marc ABOUAF , Patrick HOGAN , Steven A. MILLER
发明人： Christopher MICHALUK , William LOEWENTHAL , Gary ROZAK , Marc ABOUAF , Patrick HOGAN , Steven A. MILLER
CPC分类号： C23C14/3414 , C23C14/3407 , C23C24/04
摘要： In various embodiments, used sputtering targets are refurbished at least in part by maintaining a large obliquity angle between the spray-deposition gun and the depressed surface contour of the target during spray deposition of the target material.
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公开(公告)号：US20220308705A1
公开(公告)日：2022-09-29
申请号：US17838476
申请日：2022-06-13
申请人： Shuwei SUN , Francois-Charles DARY , Marc ABOUAF , Patrick HOGAN , Qi ZHANG
发明人： Shuwei SUN , Francois-Charles DARY , Marc ABOUAF , Patrick HOGAN , Qi ZHANG
IPC分类号： G06F3/044 , H01B1/02 , B81C1/00 , C22F1/04 , C22F1/00 , C22F1/08 , C22F1/14 , C21D1/00 , C21D9/00 , H01L29/49 , G06F3/041 , C23C30/00 , B32B17/06 , B32B15/04 , B32B15/01 , B32B15/20 , C23C28/02 , C23C28/00 , B32B15/02 , B32B15/18 , C03C17/40 , C03C17/36 , H01L29/66 , H01L23/532 , H01L27/12 , H01L29/786
摘要： In various embodiments, electronic devices such as touch-panel displays incorporate interconnects featuring a conductor layer and, disposed above the conductor layer, a capping layer comprising an alloy of Cu and one or more refractory metal elements selected from the group consisting of Ta, Nb, Mo, W, Zr, Hf, Re, Os, Ru, Rh, Ti, V, Cr, and Ni.
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公开(公告)号：US20190148420A1
公开(公告)日：2019-05-16
申请号：US16217563
申请日：2018-12-12
申请人： Patrick HOGAN , John MOORE , Alex BREWER , Jared PETTIT
发明人： Patrick HOGAN , John MOORE , Alex BREWER , Jared PETTIT
IPC分类号： H01L27/12 , H01L21/3213 , C23F1/18 , C23F1/02 , C23F1/16 , H01L29/786 , H01L29/423 , H01L29/49 , H01L21/283 , H01L29/66 , H01L29/417 , C23F1/26 , C23F1/30
摘要： In various embodiments, etchants featuring (i) mixtures of hydrochloric acid, methanesulfonic acid, and nitric acid, or (ii) mixtures of phosphoric acid, methanesulfonic acid, and nitric acid, are utilized to etch metallic bilayers while minimizing resulting etch discontinuities between the layers of the bilayer.
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公开(公告)号：US20160372500A1
公开(公告)日：2016-12-22
申请号：US15249603
申请日：2016-08-29
申请人： Patrick HOGAN , John MOORE , Alex BREWER , Jared PETTIT
发明人： Patrick HOGAN , John MOORE , Alex BREWER , Jared PETTIT
IPC分类号： H01L27/12 , H01L29/786 , H01L29/423 , C23F1/26 , H01L21/3213 , C23F1/02 , C23F1/18 , C23F1/30 , H01L29/66 , H01L29/417
CPC分类号： H01L27/1288 , C23F1/02 , C23F1/16 , C23F1/18 , C23F1/26 , C23F1/30 , G02F1/13439 , G02F1/1368 , G02F2202/103 , H01L21/283 , H01L21/32134 , H01L21/32139 , H01L27/1218 , H01L27/1222 , H01L27/1296 , H01L29/41733 , H01L29/42384 , H01L29/4908 , H01L29/4958 , H01L29/66742 , H01L29/66765 , H01L29/78603 , H01L29/78669
摘要： In various embodiments, etchants featuring (i) mixtures of hydrochloric acid, methanesulfonic acid, and nitric acid, or (ii) mixtures of phosphoric acid, methanesulfonic acid, and nitric acid, are utilized to etch metallic bilayers while minimizing resulting etch discontinuities between the layers of the bilayer.
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公开(公告)号：US20160129417A1
公开(公告)日：2016-05-12
申请号：US14936916
申请日：2015-11-10
申请人： Paul R. AIMONE , Marc ABOUAF , Patrick HOGAN
发明人： Paul R. AIMONE , Marc ABOUAF , Patrick HOGAN
CPC分类号： B01J19/0093 , B01J19/02 , B01J19/2415 , B01J2219/00092 , B01J2219/00822 , B01J2219/00837 , B01J2219/00873 , B01J2219/0236 , B01J2219/0277 , B22F3/008 , B22F3/1055 , B22F3/12 , B22F5/10 , B33Y10/00 , B33Y80/00 , Y02P10/295
摘要： In various embodiments, a microreactor features a corrosion-resistant microchannel network encased within a thermally conductive matrix material that may define therewithin one or more hollow heat-exchange conduits.
摘要翻译： 在各种实施例中，微反应器具有包封在导热基体材料内的耐腐蚀微通道网络，其可以在其中限定一个或多个中空热交换管道。
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