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公开(公告)号：US10151987B2
公开(公告)日：2018-12-11
申请号：US13306668
申请日：2011-11-29
摘要： A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.
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2.发明授权公开(公告)号：US09046385B2
公开(公告)日：2015-06-02
申请号：US13206592
申请日：2011-08-10
CPC分类号： G03F7/70141 , G01B9/02 , G01B11/272 , G01D5/344 , G03F9/7046 , G03F9/7088
摘要： An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.
摘要翻译： 对准测量系统测量物体上的对准目标。 测量照亮目标并被反射。 反射的测量光束被分离，其部分被不同的极化。 检测器接收反射的测量光束。 处理单元基于由检测器接收的测量波束来确定对准。 一种替代方案是使用光学色散光纤将从物体反射的多波长测量光束引导到检测器。
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3.发明授权Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatus 失效具有窗的基板，测量基板的位置的方法和光刻设备公开(公告)号：US07463337B2
公开(公告)日：2008-12-09
申请号：US11321467
申请日：2005-12-30
IPC分类号： G03B27/58
CPC分类号： G03F7/70716 , G03F9/7084 , G03F9/7088
摘要： A substrate table is provided with an optical system that includes a first window and a second window arranged to allow radiation to pass into an optical arm. At least two mirrors are provided within the optical arm and are arranged to reflect radiation that is passed through the windows. At least two lenses are positioned to receive radiation reflected from the mirrors, wherein the first window is provided with a first alignment mark and the at least two mirrors and at least two lenses are arranged to form an image of the first alignment mark at the second window. A second alignment mark is provided in the second window, or in the substrate table at a location adjacent to the second window.
摘要翻译： 衬底台设置有光学系统，该光学系统包括第一窗口和布置成允许辐射进入光学臂的第二窗口。 至少两个反射镜设置在光学臂内，并被布置成反射穿过窗户的辐射。 至少两个透镜被定位成接收从反射镜反射的辐射，其中第一窗口设置有第一对准标记，并且至少两个反射镜和至少两个透镜被布置成在第二个第二对准标记处形成第一对准标记的图像 窗口。 第二对准标记设置在第二窗口中，或者在与第二窗口相邻的位置处的衬底台中。
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公开(公告)号：US07562686B2
公开(公告)日：2009-07-21
申请号：US11317241
申请日：2005-12-27
申请人： Keith Frank Best , Geoffrey Norman Phillipps , Franciscus Godefridus Casper Bijnen , Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Peter Ten Berge
发明人： Keith Frank Best , Geoffrey Norman Phillipps , Franciscus Godefridus Casper Bijnen , Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Peter Ten Berge
CPC分类号： H01L25/50 , B81C3/001 , G03F9/7084 , H01L24/26 , H01L24/83 , H01L2224/8385 , H01L2924/01005 , H01L2924/01006 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01041 , H01L2924/01061 , H01L2924/01074 , H01L2924/01076 , H01L2924/01082 , H01L2924/01087 , H01L2924/07802 , H01L2924/12042 , H01L2924/14 , H01L2924/19041 , H01L2924/30105 , H01L2924/00
摘要： A substrate bonding system has a first and a second substrate table for holding a first substrate and a second substrate, respectively, and a controller. The first substrate includes a first device having first contact pads and the second substrate a second device having second contact pads. The wafer bonding system is arranged to bond the first and second device in such a way that a circuit may be formed by the first and second device. The first and second substrate tables each include a position sensor arranged to measure an optical signal generated on an alignment marker of the first and second substrate, respectively. The first and second substrate tables include a first and second actuator respectively that is arranged to alter a position and orientation of the respective substrate table.
摘要翻译： 基板接合系统具有用于分别保持第一基板和第二基板的第一和第二基板台，以及控制器。 第一衬底包括具有第一接触焊盘的第一器件，而第二衬底具有第二接触焊盘的第二器件。 晶片接合系统布置成以第一和第二器件形成电路的方式结合第一和第二器件。 第一和第二衬底台各自包括位置传感器，其布置成分别测量在第一和第二衬底的对准标记上产生的光信号。 第一和第二衬底台包括分别设置成改变相应衬底台的位置和取向的第一和第二致动器。
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公开(公告)号：US08208139B2
公开(公告)日：2012-06-26
申请号：US12346063
申请日：2008-12-30
IPC分类号： G01B11/00
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
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公开(公告)号：US20090153825A1
公开(公告)日：2009-06-18
申请号：US12273816
申请日：2008-11-19
申请人： Remi Daniel Marie EDART , Franciscus Godefridus Casper Bijnen , Rudy Jan Maria Pellens , Pascale Anne Maury
发明人： Remi Daniel Marie EDART , Franciscus Godefridus Casper Bijnen , Rudy Jan Maria Pellens , Pascale Anne Maury
CPC分类号： G03F9/7049 , G03F7/70633 , G03F9/7065 , G03F9/7088
摘要： A lithographic alignment apparatus includes a radiation source arranged to generate radiation at a wavelength of 1000 nanometers or longer, and a plurality of non-imaging detectors arranged to detect the radiation after the radiation has been reflected by an alignment mark.
摘要翻译： 光刻对准装置包括布置成产生1000纳米或更长波长的辐射的辐射源，以及布置成在放射线被对准标记反射之后检测辐射的多个非成像检测器。
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公开(公告)号：US07433038B2
公开(公告)日：2008-10-07
申请号：US11412112
申请日：2006-04-27
CPC分类号： H01L21/681 , H01L21/67092 , Y10T29/49131
摘要： An alignment apparatus for a substrate bonding system is provided with a first optical arm arranged to direct onto a detector radiation from a first alignment mark on a first substrate, and a second optical arm arranged to direct onto the detector radiation from a second alignment mark on a second substrate. The first alignment mark has a known location relative to a functional pattern provided on an opposite side of the first substrate, and the second alignment mark has a known location relative to a functional pattern provided on an opposite side of the second substrate. The substrate bonding system can be further provided with first and second substrate tables arranged to hold the first and second substrates such that they face one another, at least one of the substrate tables being movable in response to a signal output from the detector, thereby allowing the first and second substrates to be aligned with respect to each other for bonding.
摘要翻译： 用于基板接合系统的对准装置设置有第一光学臂，布置成将第一对准标记上的检测器辐射引导到第一基板上，第二光臂布置成将检测器辐射从第二对准标记 第二基板。 第一对准标记具有相对于设置在第一基板的相对侧上的功能图案的已知位置，并且第二对准标记相对于设置在第二基板的相对侧上的功能图案具有已知位置。 衬底接合系统还可以设置有第一和第二衬底台，布置成保持第一和第二衬底使得它们彼此面对，至少一个衬底台可响应于从检测器输出的信号而可移动，从而允许 第一和第二基板相对于彼此对准以进行接合。
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8.发明授权Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures 有权使用标记结构确定改善的曝光场绝对位置的光刻设备和器件制造方法公开(公告)号：US08908152B2
公开(公告)日：2014-12-09
申请号：US12621143
申请日：2009-11-18
申请人： Franciscus Godefridus Casper Bijnen , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
发明人： Franciscus Godefridus Casper Bijnen , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
CPC分类号： G03F9/7049 , G03F9/7003 , G03F9/7076 , G03F9/7084
摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.
摘要翻译： 一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。
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公开(公告)号：US08208140B2
公开(公告)日：2012-06-26
申请号：US12718485
申请日：2010-03-05
IPC分类号： G01B11/00
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
摘要翻译： 根据本发明的一个实施例的光刻设备包括用于对准衬底或掩模版的对准系统。 对准系统包括被配置为照亮衬底或掩模版上的对准标记的辐射源，对准标记包括最大长度序列或多周期性粗略对准标记。 由对准标记产生的对准信号由检测系统检测。 处理器基于对准信号确定基板或掩模版的对准位置。
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10.发明授权Alignment mark and a method of aligning a substrate comprising such an alignment mark 有权对准标记和对准包括这种对准标记的基板的方法公开(公告)号：US08208121B2
公开(公告)日：2012-06-26
申请号：US12363320
申请日：2009-01-30
申请人： Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
发明人： Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
CPC分类号： G03B27/32 , G03F9/7076
摘要： An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle α with respect to the scribe lane direction: 0°
摘要翻译： 描述包括由标记线形成的周期性结构的对准标记。 在一个实施例中，对准标记形成在基板的划线中，刻划线在划线方向延伸。 对准标记包括：第一区域，包括由第一方向延伸的第一标记线形成的第一周期性结构，第一方向相对于划线方向为第一角度α：0°<α<90°， 第二区域包括由沿第二方向延伸的第二标记线形成的第二周期性结构，第二方向为第二角度＆amp; bgr; 相对于划线方向：-90°＆nlE;＆bgr; <0°。
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