公开(公告)号：US20080071022A1

公开(公告)日：2008-03-20

申请号：US11882754

申请日：2007-08-03

Applicant: Dean Webster ,  Peter Edwards

Inventor： Dean Webster ,  Peter Edwards

IPC: C08G18/09

CPC classification number: C08G18/2845 ,  C08G18/706 ,  C08G59/5026 ,  C09D163/00

Abstract: The invention relates to novel aqueous coating compositions containing epoxy urethane (glycidyl carbamate) functional resin. An aqueous coating composition comprises a polyfunctional oligomer having at least two epoxy urethane functional groups and a polyalkylene oxide chain, a surfactant and water. The aqueous coating compositions of the invention can be dispersed in water with added surfactants to form a dispersion containing no volatile organic solvent. The invention provides a method for making aqueous coating compositions containing epoxy urethane functional resin as well. Water-dispersible epoxy urethane compounds of the aqueous coating compositions are also provided.

Abstract translation: 本发明涉及含有环氧氨基甲酸酯（缩水甘油氨基甲酸酯）官能树脂的新型含水涂料组合物。 水性涂​​料组合物包含具有至少两个环氧氨基甲酸酯官能团和聚环氧烷链，表面活性剂和水的多官能低聚物。 本发明的水性涂料组合物可以用添加的表面活性剂分散在水中以形成不含挥发性有机溶剂的分散体。 本发明提供一种制备含有环氧氨基甲酸酯官能树脂的水性涂料组合物的方法。 还提供了水性涂料组合物的水分散性环氧聚氨酯化合物。

公开(公告)号：US20110042578A1

公开(公告)日：2011-02-24

申请号：US12926158

申请日：2010-10-28

Applicant: Adrian Murrell ,  Bernard F. Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

Inventor： Adrian Murrell ,  Bernard F. Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

IPC: H01J3/26

CPC classification number: H01J37/3171 ,  H01J37/304 ,  H01J2237/30455 ,  H01J2237/31703

Abstract: This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.

Abstract translation: 本发明涉及用于离子注入机的离子束监测装置，其中期望监测用于植入的离子束的通量和/或横截面轮廓。 通常期望在离子注入机中测量离子束的通量和/或横截面轮廓，以便改进对半导体晶片或类似物的离子注入的控制。 本发明描述了适配晶片保持器以允许执行这种光束轮廓。 衬底保持器可以逐渐地用于从下游通量监视器闭塞离子束，或者通量监视器可以位于设置有狭缝入口孔的晶片保持器上。

公开(公告)号：US20060197016A1

公开(公告)日：2006-09-07

申请号：US11417027

申请日：2006-05-04

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01J49/00

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：USD293289S

公开(公告)日：1987-12-22

申请号：US862599

申请日：1986-05-12

Applicant: Peter Edwards ,  Budd Steinhilber ,  Ken Gilliam

Designer： Peter Edwards ,  Budd Steinhilber ,  Ken Gilliam

公开(公告)号：US20070003033A1

公开(公告)日：2007-01-04

申请号：US11165836

申请日：2005-06-24

Applicant: Peter Edwards ,  Richard Smolucha

Inventor： Peter Edwards ,  Richard Smolucha

IPC: H04M15/00

CPC classification number: H04M15/68 ,  G06Q30/04 ,  H04M15/00 ,  H04M15/43 ,  H04M15/51 ,  H04M15/52 ,  H04M15/80 ,  H04M15/8083 ,  H04M2215/0152 ,  H04M2215/0184 ,  H04M2215/0196 ,  H04M2215/54

Abstract: A method of deriving a primary and secondary billing scheme for a plurality of services each having a respective service consumption cost comprises, at a billing entity, receiving service consumption data. The billing entity applies each of a primary and secondary service consumption pricing plan to the service consumption data to derive respective primary and secondary billing schemes.

Abstract translation: 为每个具有相应服务消耗成本的多个服务导出主要和次要计费方案的方法包括在计费实体处接收服务消费数据。 计费实体将主要和次要服务消费定价计划中的每一个应用于服务消费数据以导出相应的主要和次要计费方案。

公开(公告)号：US20060106259A1

公开(公告)日：2006-05-18

申请号：US10524023

申请日：2003-08-06

Applicant: Graham Eastham ,  Paul Cameron ,  Robert Tooze ,  Kingsley Cavell ,  Peter Edwards ,  Dennis Coleman

Inventor： Graham Eastham ,  Paul Cameron ,  Robert Tooze ,  Kingsley Cavell ,  Peter Edwards ,  Dennis Coleman

IPC: B01J31/00 ,  C07C45/50

CPC classification number: B01J31/1895 ,  B01J31/2457 ,  B01J35/0013 ,  B01J2231/321 ,  B01J2531/0258 ,  B01J2531/60 ,  B01J2531/80 ,  B01J2531/824 ,  C07C67/38 ,  C07C2603/74 ,  C07F9/5018 ,  C07F9/5027 ,  C07F9/5045 ,  C07F9/52 ,  C07C69/24 ,  C07C69/67

Abstract: A catalyst system capable of catalysing the carbonylation of an olefinally unsaturated compound is described. The 5 catalyst system is obtainable by combining: (a) a metal of Group VIB or Group VIII B or a compound thereof; and (b) a bidentate phosphine of general formula (I) Ad)s(CR4R5R6)TQ2-A-(K,D)Ar(E,Z)-B-Q1(Ad)u(CR1R2R3)v. Ad represents an optionally substituted adamantyl radical bonded to the phosphorous atom via any one of its tertiary carbon atoms. A method of production of the catalyst is also illustrated.

Abstract translation: 描述了能够催化烯属不饱和化合物羰基化的催化剂体系。 5催化剂体系可通过以下方法获得：（a）VIB族或VIIIB族金属或其化合物; 和（b）通式（I）的二齿膦Ad）（CR 4）5 R 5 D 6 （K，D）Ar（E，Z）-BQ 1（Ad）u u u u u u u u u u u u u u u u u u u u u u （CR 1）第2个和第3个或更多个。 Ad表示任意取代的金刚烷基，其通过其叔碳原子中的任一个与磷原子键合。 还示出了催化剂的生产方法。

公开(公告)号：US20050191409A1

公开(公告)日：2005-09-01

申请号：US11029004

申请日：2005-01-05

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

IPC: H01L21/265 ,  B05D1/00 ,  C23C14/00 ,  C23C16/00 ,  H01J27/00 ,  H01J37/244 ,  H01J37/304 ,  H01J37/317 ,  H01L21/425 ,  H01L21/66

CPC classification number: H01J37/3171 ,  H01J37/304 ,  H01J2237/30455 ,  H01J2237/31703

Abstract: This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.

Abstract translation: 本发明涉及用于离子注入机的离子束监测装置，其中期望监测用于植入的离子束的通量和/或横截面轮廓。 通常期望在离子注入机中测量离子束的通量和/或横截面轮廓，以便改进对半导体晶片或类似物的离子注入的控制。 本发明描述了适配晶片保持器以允许执行这种光束轮廓。 衬底保持器可以逐渐地用于从下游通量监视器闭塞离子束，或者通量监视器可以位于设置有狭缝入口孔的晶片保持器上。

公开(公告)号：US5149244A

公开(公告)日：1992-09-22

申请号：US715882

申请日：1991-06-17

Applicant: Herbert Webber ,  Peter Edwards

Inventor： Herbert Webber ,  Peter Edwards

IPC: H01L21/68

CPC classification number: H01L21/68 ,  Y10S206/832 ,  Y10S414/138

Abstract: An improvement which allows precise positioning of wafers within cassettes in preparation for removal of the wafers by automated equipment. The improvement includes mounting two sawtooth jigs upon the surface upon which the cassette tray is to be placed which extend up into the cassette. Wafers within the cassette rest within the precisely aligned grooves of the sawtooth jigs.

Abstract translation: 这种改进允许晶片在盒中的精确定位，以准备通过自动化设备移除晶片。 该改进包括将两个锯齿形夹具安装在其上延伸到盒中的盒托盘放置在其上的表面上。 盒内的晶片搁置在锯齿形夹具的精确排列的凹槽内。

公开(公告)号：US08269164B2

公开(公告)日：2012-09-18

申请号：US12380002

申请日：2009-02-20

Applicant: Alan Finlay ,  Bharathram Ganapathisubramani ,  Richard William Moseley ,  Peter Edwards ,  Ariel Lipson

Inventor： Alan Finlay ,  Bharathram Ganapathisubramani ,  Richard William Moseley ,  Peter Edwards ,  Ariel Lipson

IPC: H01J49/26

CPC classification number: H01J49/26 ,  B33Y80/00 ,  H01J49/0404 ,  Y10T29/49

Abstract: This invention describes a vacuum interface for a mass spectrometer system formed from a diverging nozzle. The vacuum interface may be used to transfer a beam of ions from an atmospheric pressure ionization source into a vacuum chamber for analysis by a mass analyser.

Abstract translation: 本发明描述了由发散喷嘴形成的质谱系统的真空界面。 真空界面可用于将离子束从大气压离子源传输到真空室中，以便通过质量分析仪进行分析。

公开(公告)号：US06956223B2

公开(公告)日：2005-10-18

申请号：US10119290

申请日：2002-04-10

Applicant: Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

Inventor： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

IPC: H01J37/04 ,  H01J37/18 ,  H01J37/317 ,  H01L21/265 ,  H01L21/68 ,  B05C5/00

CPC classification number: H01J37/20 ,  H01J37/18 ,  H01J37/3171 ,  H01J2237/20 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20228 ,  H01J2237/20278 ,  H01L21/682 ,  H01L21/6835

Abstract: Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

Abstract translation: 公开了半导体处理装置，其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向（所谓的X-Y扫描）上的移动。 沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。 臂60由一个或多个线性电动机90A，90B往复运动。臂60相对于滑块100被支撑，使用支撑的空气轴承，以便相对于滑块100为臂提供悬臂支撑。 进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件，但本身不需要提供轴承支撑件。 法拉第450附接到靠近基板保持器180的臂60，以允许在植入之前和期间执行光束轮廓。 法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处，以允许在植入之前执行光束轮廓，其中衬底支撑件反向或水平并且离开光束线。