Formation of group III-V nitride films on sapphire substrates with
reduced dislocation densities
    10.
    发明授权
    Formation of group III-V nitride films on sapphire substrates with reduced dislocation densities 失效
    在蓝宝石衬底上形成具有降低的位错密度的III-V族氮化物膜

    公开(公告)号:US6064078A

    公开(公告)日:2000-05-16

    申请号:US83137

    申请日:1998-05-22

    Abstract: A single layer of atoms of a selected valence is deposited between a substrate and a group III-V nitride film to improve the quality of the nitride film and of subsequently deposited nitride films on the substrate. The interlayer provides local charge neutrality at the interface, thereby promoting two-dimensional growth of the nitride film and reduced dislocation densities. When the substrate is sapphire, the interlayer should include atoms of group II elements and possibly group III elements. The structure can include a group III-V nitride buffer layer on the interlayer to further enhance the quality of the group III-V nitride films. The structures can be used in blue light emitting optoelectronic devices.

    Abstract translation: 选择的价态的单层原子沉积在衬底和III-V族氮化物膜之间以提高氮化物膜的质量和随后在衬底上沉积的氮化物膜的质量。 中间层在界面处提供局部电荷中性,从而促进氮化膜的二维生长和降低的位错密度。 当衬底是蓝宝石时,中间层应包括II族元素的原子和可能的III族元素。 该结构可以包括中间层上的III-V族氮化物缓冲层,以进一步提高III-V族氮化物膜的质量。 该结构可用于蓝光发光光电器件。

Patent Agency Ranking