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公开(公告)号：US06916147B2
公开(公告)日：2005-07-12
申请号：US10280451
申请日：2002-10-25
IPC分类号： H01L21/673 , H01L21/677 , B65B21/02 , B65B69/00 , B65G65/04 , B65G65/34
CPC分类号： H01L21/6732 , H01L21/67772 , Y10S414/136
摘要： A substrate storage cassette and a method of orienting a substrate disposed therein are provided. In one embodiment, the substrate storage cassette includes a plurality of flanges pairs disposed between a first lateral sidewall coupled in a spaced-apart relation to a second lateral sidewall. Each of the flange pairs adapted to support a substrate thereon. At least a first alignment feature disposed between the flange pair and adapted to mate with an orientation feature of the substrate when the substrate is in a predefined orientation.
摘要翻译： 提供了基板存储盒和设置在其中的基板的定向方法。 在一个实施例中，衬底存储盒包括多个凸缘对，其设置在以与第二侧壁侧壁间隔开的关系连接的第一侧壁之间。 每个凸缘对适于在其上支撑基底。 至少第一对准特征设置在所述凸缘对之间并且当所述基板处于预定义取向时适于与所述基板的取向特征配合。
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公开(公告)号：US07735710B2
公开(公告)日：2010-06-15
申请号：US10990094
申请日：2004-11-16
IPC分类号： H01L21/68
CPC分类号： H01L21/68 , H01L21/68728 , H01L21/68778 , H01L21/68792 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.
摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。
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公开(公告)号：US20100107672A1
公开(公告)日：2010-05-06
申请号：US12691612
申请日：2010-01-21
IPC分类号： H01L21/677 , H01L23/34 , F25D23/12
CPC分类号： H01L21/68742 , B65G49/068 , B65G2249/02 , B65G2249/04 , C23C14/566 , C23C14/568 , C23C16/54 , H01L21/67103 , H01L21/67109 , H01L21/67167 , H01L21/67201 , H01L21/67739 , H01L21/67745 , H01L21/67748
摘要： One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.
摘要翻译： 一个实施例涉及一种其中具有第一支撑结构的负载锁，用于支撑一个未处理的基板和其中的第二支撑结构以支撑一个处理的基板。 第一支撑结构位于第二支撑结构的上方。 负载锁包括用于控制支撑结构的垂直位置的电梯。 负载锁还包括第一孔，以允许将未处理的衬底插入到装载锁中并从加载锁中移除经处理的衬底，以及第二孔，以允许将未处理的衬底从负载锁上移除并将经处理的衬底插入 负载锁。 一个冷却板也位于负载锁中。 冷却板包括适于在其上支撑经处理的基板的表面。 加热装置可以位于第一支撑结构上方的装载锁中。
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公开(公告)号：US07641247B2
公开(公告)日：2010-01-05
申请号：US10321826
申请日：2002-12-17
CPC分类号： H01L21/68707 , Y10S294/902 , Y10S414/141
摘要： Generally, an end effector assembly for a substrate transfer robot is provided. In one embodiment, an end effector assembly for supporting a quadrilateral substrate during substrate transfer includes an end effector having an inner edge support disposed on a first end and a first outer edge support disposed on a distal end. The first end of the end effector is adapted for coupling to a robot linkage. The first inner edge support has a face that is oriented parallel to and facing the face of the first outer edge support. This configuration of edge supports captures the substrate to the end effector thereby minimizing substrate slippage during transfer. In another embodiment, lateral guides may be utilized to further enhance capturing the substrate along the edges of the substrate open between the inner and outer edge supports.
摘要翻译： 通常，提供了一种用于衬底传送机器人的端部执行器组件。 在一个实施例中，用于在衬底传送期间支撑四边形衬底的端部执行器组件包括端部执行器，其具有设置在第一端上的内边缘支撑件和设置在远端上的第一外边缘支撑件。 端部执行器的第一端适于联接到机器人联动装置。 第一内边缘支撑件具有平行于并面向第一外边缘支撑件的面的面。 边缘支撑件的这种构造将基板捕获到端部执行器，从而最小化转移期间的基板滑移。 在另一个实施例中，可以使用横向引导件来进一步增强沿着在内边缘支撑件和外边缘支撑件之间打开的基板的边缘捕获基板。
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公开(公告)号：US07438175B2
公开(公告)日：2008-10-21
申请号：US11176085
申请日：2005-07-07
申请人： John M. White , Wendell T. Blonigan
发明人： John M. White , Wendell T. Blonigan
IPC分类号： B65G43/08
CPC分类号： H01L21/67739 , C23C14/56 , C23C14/568 , C23C16/54
摘要： Embodiments of a vacuum conveyor system are provided herein. In one embodiment a vacuum conveyor system includes a first vacuum sleeve having a plurality of rollers that support and move substrates through the first vacuum sleeve. A port is provided for sealably coupling the first vacuum sleeve to a process chamber. A first substrate handler is disposed proximate the port. Multiple ports may be provided for sealably coupling the first vacuum sleeve to a plurality of process chambers. A dedicated substrate handler is provided for each process chamber. A second vacuum sleeve may be sealably coupled to an opposing side of the process chambers. The vacuum conveyor system may be modular with independent modules linked via load lock chambers. The plurality of rollers may compensate for any sag of the leading edge of a substrate being transported thereupon.
摘要翻译： 本文提供了真空输送系统的实施例。 在一个实施例中，真空输送系统包括具有支撑并移动基板通过第一真空套筒的多个辊的第一真空套筒。 提供端口用于将第一真空套筒密封地联接到处理室。 第一衬底处理器设置在端口附近。 可以提供多个端口用于将第一真空套管密封地联接到多个处理室。 为每个处理室提供专用的基板处理器。 第二真空套筒可以密封地联接到处理室的相对侧。 真空输送系统可以是模块化的，具有通过负载锁定室连接的独立模块。 多个辊可以补偿在其上运送的基板的前缘的任何下垂。
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公开(公告)号：US07031600B2
公开(公告)日：2006-04-18
申请号：US10409466
申请日：2003-04-07
IPC分类号： C23C14/00
CPC分类号： C23C16/402 , C23C16/4485
摘要： A method and apparatus for depositing a dielectric material at a rate of at least 3000 Angstroms per minute on a large area substrate that has a surface area of at least about 0.35 square meters is provided. In one embodiment, the dielectric material is silicon oxide. Also provided is a large area substrate having a layer of dielectric material deposited by a process yielding a deposition rate in excess of about 3000 Angstroms per minute and a processing chamber for fabricating the same.
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公开(公告)号：US06949143B1
公开(公告)日：2005-09-27
申请号：US09464362
申请日：1999-12-15
IPC分类号： G02F1/13 , B65G49/06 , C23C14/56 , C23C16/44 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/677 , H01L21/687 , C23C16/00
CPC分类号： H01L21/68742 , B65G49/068 , B65G2249/02 , B65G2249/04 , C23C14/566 , C23C14/568 , C23C16/54 , H01L21/67103 , H01L21/67109 , H01L21/67167 , H01L21/67201 , H01L21/67739 , H01L21/67745 , H01L21/67748
摘要： One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as wall as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.
摘要翻译： 一个实施例涉及一种其中具有第一支撑结构的负载锁，用于支撑一个未处理的基板和其中的第二支撑结构以支撑一个处理的基板。 第一支撑结构位于第二支撑结构的上方。 负载锁包括用于控制支撑结构的垂直位置的电梯。 负载锁还包括第一孔，以允许将未处理的衬底插入到装载锁中，并且将加工的衬底从负载锁上移除，作为壁作为第二孔，以允许将未加工的衬底从负载锁中移除并将处理的衬底插入 负载锁。 一个冷却板也位于负载锁中。 冷却板包括适于在其上支撑经处理的基板的表面。 加热装置可以位于第一支撑结构上方的装载锁中。
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公开(公告)号：US06823589B2
公开(公告)日：2004-11-30
申请号：US10293544
申请日：2002-11-12
申请人： John M. White , Ernst Keller , Wendell T. Blonigan
发明人： John M. White , Ernst Keller , Wendell T. Blonigan
IPC分类号： B23P1500
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , Y10T29/49428 , Y10T29/49826
摘要： A method of flexibly mounting a gas distribution plate to the back wall of a gas inlet manifold for a plasma chamber. A perforated gas distribution plate is suspended from the back wall by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate.
摘要翻译： 一种将气体分配板柔性地安装到用于等离子体室的气体入口歧管的后壁的方法。 穿孔式气体分配板通过柔性侧壁从后壁悬挂。 柔性悬架使气体分配板的热膨胀的机械应力最小化。
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公开(公告)号：US06477980B1
公开(公告)日：2002-11-12
申请号：US09488612
申请日：2000-01-20
申请人： John M. White , Ernst Keller , Wendell T. Blonigan
发明人： John M. White , Ernst Keller , Wendell T. Blonigan
IPC分类号： C23C1600
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , Y10T29/49428 , Y10T29/49826
摘要： A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provides thermal isolation between the gas distribution plate and other components of the chamber.
摘要翻译： 一种用于等离子体室的气体入口歧管，其具有由柔性侧壁悬挂的穿孔气体分配板。 柔性悬架使气体分配板的热膨胀的机械应力最小化。 在另一方面，悬架提供气体分配板和腔室的其它部件之间的热隔离。
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公开(公告)号：US06359250B1
公开(公告)日：2002-03-19
申请号：US09664983
申请日：2000-09-18
IPC分类号： B23K1000
CPC分类号： H01J37/32174 , H01J37/32082
摘要： An apparatus for distributing RF power outputs to a first electrode in a parallel plate electrode system for generating plasma in depositing films on a substrate. A RF power output is applied to a distributed RF matching network to excite a plasma from a process gas stream to deposit a uniform film onto the substrate. The distributed matching network includes a load capacitor for receiving a radio frequency power input and an inductor having first and second ends with the first end coupled to the load capacitor. The matching network also includes multiple drive capacitors each of which couples the second end of the inductor to a different one of multiple points distributed on the first electrode. The capacitance of each drive capacitor is user-selectable, and the points on the backing plate to which the drive capacitors are coupled are user-selectable.
摘要翻译： 一种用于在平行板电极系统中的第一电极上分配RF功率输出的装置，用于在衬底上沉积膜中产生等离子体。 将RF功率输出施加到分布式RF匹配网络，以从工艺气流中激发等离子体以将均匀的膜沉积到衬底上。 分布式匹配网络包括用于接收射频功率输入的负载电容器和具有第一端和第二端的电感器，其第一端耦合到负载电容器。 匹配网络还包括多个驱动电容器，每个驱动电容器将电感器的第二端耦合到分布在第一电极上的多个点中的不同的一个。 每个驱动电容器的电容可由用户选择，驱动电容耦合到背板上的点可由用户选择。
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