公开(公告)号：US07297965B2

公开(公告)日：2007-11-20

申请号：US11119207

申请日：2005-04-28

Applicant: Eitan Kidron ,  Dror Shemesh

Inventor： Eitan Kidron ,  Dror Shemesh

IPC: G21K5/10

CPC classification number: G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

Abstract translation: 公开了用于形成物体样品的方法和装置，从物体中提取样品，并对该样品进行微量分析，包括真空室中的表面分析和电子透过性分析。 在一些实施例中，提供了用于对提取的样品的物体横截面进行成像的方法。 任选地，将样品迭代地稀释并在真空室内成像。 在一些实施例中，样品位于包括任选孔的样品支架上。 可选地，样品位于样品载体的表面上，使得物体横截面基本上平行于样品载体的表面。 一旦安装在样品支架上，样品就可以在真空室中进行微量分析，或者加载到装载站上。 在一些实施例中，用基本上正常地入射到物体横截面表面的电子束成像样品。

公开(公告)号：US20060011868A1

公开(公告)日：2006-01-19

申请号：US11119207

申请日：2005-04-28

Applicant: Eitan Kidron ,  Dror Shemesh

Inventor： Eitan Kidron ,  Dror Shemesh

IPC: G21K5/10

CPC classification number: G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

Abstract translation: 公开了用于形成物体样品的方法和装置，从物体中提取样品，并对该样品进行微量分析，包括真空室中的表面分析和电子透过性分析。 在一些实施例中，提供了用于对提取的样品的物体横截面进行成像的方法。 任选地，将样品迭代地稀释并在真空室内成像。 在一些实施例中，样品位于包括任选孔的样品支架上。 可选地，样品位于样品载体的表面上，使得物体横截面基本上平行于样品载体的表面。 一旦安装在样品支架上，样品就可以在真空室中进行微量分析，或者加载到装载站上。 在一些实施例中，用基本上正常地入射到物体横截面表面的电子束成像样品。

公开(公告)号：US20060011867A1

公开(公告)日：2006-01-19

申请号：US11119230

申请日：2005-08-18

Applicant: Eitan Kidron ,  Dror Shemesh

Inventor： Eitan Kidron ,  Dror Shemesh

IPC: H01J37/08

CPC classification number: G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

公开(公告)号：US08723144B2

公开(公告)日：2014-05-13

申请号：US11119230

申请日：2005-04-28

Applicant: Eitan Kidron ,  Dror Shemesh

Inventor： Eitan Kidron ,  Dror Shemesh

IPC: H01J37/08

CPC classification number: G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An apparatus is disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a means is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

Abstract translation: 公开了一种用于形成物体样品的装置，从物体中提取样品，并对该样品进行微量分析，包括真空室中的表面分析和电子透过度分析。 在一些实施例中，提供了用于对提取的样品的物体横截面进行成像的装置。 任选地，将样品迭代地稀释并在真空室内成像。 在一些实施例中，样品位于包括任选孔的样品支架上。 可选地，样品位于样品载体的表面上，使得物体横截面基本上平行于样品载体的表面。 一旦安装在样品支架上，样品就可以在真空室中进行微量分析，或者加载到装载站上。 在一些实施例中，用基本上正常地入射到物体横截面表面的电子束成像样品。

公开(公告)号：US07912657B2

公开(公告)日：2011-03-22

申请号：US11877125

申请日：2007-10-23

Applicant: Dror Shemesh ,  Yuri Shirman

Inventor： Dror Shemesh ,  Yuri Shirman

IPC: G01B5/28 ,  G01K1/08

CPC classification number: G01N23/2276

Abstract: A system for providing a compensated Auger spectrum, the system includes: a processor, adapted to generate a compensated Auger spectrum in response to a non-compensated Auger spectrum and in response to an electric potential related parameter, and an interface to an electron detector that is adapted to detect electrons emitted from the first area, wherein the interface is connected to the processor, and wherein the electric potential related parameter reflects a state of a first area of an object that was illuminated by a charged particle beam during the generation of the non-compensated Auger spectrum.

Abstract translation: 一种用于提供经补偿的俄歇频谱的系统，该系统包括：处理器，适于响应于未补偿的俄歇频谱和响应于电位相关参数产生经补偿的俄歇频谱，以及与电子检测器的接口， 适于检测从所述第一区域发射的电子，其中所述界面连接到所述处理器，并且其中所述电位相关参数反映在所述第一区域生成期间被带电粒子束照射的物体的第一区域的状态 非补偿俄歇谱。

公开(公告)号：US07161158B2

公开(公告)日：2007-01-09

申请号：US10492393

申请日：2002-10-09

Applicant: Dror Shemesh ,  Dubi Shachal

Inventor： Dror Shemesh ,  Dubi Shachal

IPC: H01J3/14 ,  H01J37/21 ,  H01J3/28 ,  H01J37/256

CPC classification number: H01J37/21 ,  H01J37/153 ,  H01J37/22 ,  H01J37/241 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501

Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.

Abstract translation: 一种用于快速改变带电粒子束的焦距的装置和方法，该方法包括响应于控制信号电压值与带电粒子束的焦距之间的关系改变控制信号的步骤。

公开(公告)号：US20060216839A1

公开(公告)日：2006-09-28

申请号：US11350516

申请日：2006-02-09

Applicant: Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

Inventor： Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

IPC: H01L21/66 ,  G01R31/26

CPC classification number: H01L22/12

Abstract: A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.

公开(公告)号：US20060049349A1

公开(公告)日：2006-03-09

申请号：US10530159

申请日：2003-10-08

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: G21K7/00 ,  G01N23/00

CPC classification number: G01N23/2252

Abstract: Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.

Abstract translation: 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法。 概念如本文所述。

公开(公告)号：US20120241605A1

公开(公告)日：2012-09-27

申请号：US13460470

申请日：2012-04-30

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J2237/057 ,  H01J2237/2814

Abstract: A method for improving the resolution of a scanning electron microscope, the method including: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive at a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer; controlled by the controller so as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.

Abstract translation: 一种用于提高扫描电子显微镜的分辨率的方法，所述方法包括：响应于对象中二次电子的预期穿透深度来定义能带; 用一次电子束照射物体; 以及从能量到达具有能带内的光谱仪的电子产生图像。 一种扫描电子显微镜，包括：用于支撑物体的台; 控制器，适于响应于物体中二次电子的预期穿透深度而接收或限定能带的能带; 适于用一次电子束照射物体的照明光学器件; 光谱仪 由控制器控制，以响应于限定的能带选择性地拒绝电子; 以及适于根据由该光谱仪提供的检测信号产生图像的处理器。

公开(公告)号：US07312446B2

公开(公告)日：2007-12-25

申请号：US10530159

申请日：2003-10-08

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: G01N23/00

CPC classification number: G01N23/2252

Abstract: Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.

Abstract translation: 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法。 概念如本文所述。