Compound semiconductor device
    1.
    发明授权

    公开(公告)号:US11916140B2

    公开(公告)日:2024-02-27

    申请号:US17508933

    申请日:2021-10-22

    CPC classification number: H01L29/7786 H01L29/7827 H01L29/785

    Abstract: Provided is a compound semiconductor device. The compound semiconductor device according to embodiments of the inventive concept includes a first semiconductor layer having a fin extending in a first direction on a substrate, an upper gate electrode extending in a second direction perpendicular to the first direction on the first semiconductor layer, a second semiconductor layer disposed between a sidewall of the fin and the upper gate electrode, a dielectric layer disposed between a top surface of the fin and the upper gate electrode, and a lower gate structure connected to a bottom surface of the first semiconductor layer by passing through the substrate.

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