公开(公告)号：US20150234271A1

公开(公告)日：2015-08-20

申请号：US14706564

申请日：2015-05-07

Applicant: FUJIFILM Corporation

Inventor： Tsukasa TOKUNAGA ,  Shin TAJIRI ,  Makoto SUTOU ,  Toshinari FUJII ,  Shinichi NAKAHIRA ,  Kensuke KATAGIRI ,  Nozomu TONOIKE

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/40 ,  G03F7/20

CPC classification number: G03F7/0043 ,  G03C1/047 ,  G03C1/053 ,  G03C1/85 ,  G03C1/915 ,  G03C5/04 ,  G03C2001/0475 ,  G03C2001/0478 ,  G03F7/168 ,  G03F7/20 ,  G03F7/40 ,  G06F3/041 ,  G06F3/0416 ,  G06F3/044 ,  G06F2203/04103 ,  H05K1/092 ,  H05K3/105 ,  H05K3/106 ,  H05K3/28 ,  H05K3/381 ,  H05K3/386 ,  H05K2201/0215 ,  H05K2201/0769 ,  H05K2203/0796 ,  H05K2203/162

Abstract: A manufacturing method of a conductive sheet includes: a step A of forming a silver halide-containing photosensitive layer, which contains silver halide, gelatin, and a polymer different from the gelatin and in which a mass ratio (Y/X) of a mass Y of the polymer to a mass X of the gelatin is equal to or greater than 0.1, on a support; a step B of forming conductive portions containing metal silver by performing exposure and then development treatment on the silver halide-containing photosensitive layer; and a step C of treating the support having the conductive portions with an oxidant which has a standard electrode potential of equal to or greater than +1.5 V and decomposes the gelatin.

Abstract translation: 导电片的制造方法包括：形成含有卤化银，明胶和不同于明胶的聚合物的含卤化银的感光层的步骤A，其中质量比（Y / X） 在支持体上聚合物相对于明胶质量X的Y等于或大于0.1; 通过对含有卤化银的感光层进行曝光，然后显影处理，形成含有金属银的导电部分的工序B; 以及步骤C，用标准电极电位等于或大于+ 1.5V的氧化剂处理具有导电部分的载体并分解明胶。

公开(公告)号：US20230341982A1

公开(公告)日：2023-10-26

申请号：US18347302

申请日：2023-07-05

Applicant: FUJIFILM Corporation

Inventor： Shinichi NAKAHIRA

IPC: G06F3/044

CPC classification number: G06F3/0445 ,  G06F2203/04102 ,  G06F2203/04103

Abstract: A conductive member for a touch panel, a touch panel, and a touch panel display device that suppresses peeling of a connection terminal portion while using a flexible substrate. The conductive member includes a flexible substrate; a first conductive layer disposed on the flexible substrate; an insulating layer disposed on the first conductive layer; and a second conductive layer disposed on the insulating layer and on the first conductive layer. The first conductive layer has an anchor electrode portion. The second conductive layer has a first connection terminal portion covering the anchor electrode portion. Contour lines of a shape pattern of a portion of the anchor electrode portion covered with the first connection terminal portion are set such that a total value of lengths of components orthogonal to a predetermined direction is equal to or more than a total value of lengths of components parallel to the predetermined direction.

公开(公告)号：US20140110638A1

公开(公告)日：2014-04-24

申请号：US14143983

申请日：2013-12-30

Applicant: Fujifilm Corporation

Inventor： Nori MIYAGISHIMA ,  Shinichi NAKAHIRA ,  Kenji NAOI

IPC: C09D5/24 ,  H01B1/02 ,  H01B13/00

CPC classification number: C09D5/24 ,  B82Y30/00 ,  C08K7/06 ,  C08K2201/011 ,  C09D5/028 ,  C09D7/70 ,  G06F3/041 ,  G06F2203/04103 ,  G06F2203/04112 ,  H01B1/02 ,  H01B13/0036

Abstract: The method for manufacturing a conductive film includes cleaning a metal nanowire dispersion, which contains metal nanowires with an average short axis length of 150 nm or less as metal particles and a dispersing agent by performing ultrafiltration using an ultrafiltration film, and coating a coating liquid for forming a conductive film, which contains the metal nanowire dispersion after cleaning, onto a support, where the content ({mass of the dispersing agent/(mass of all metal particles+mass of the dispersing agent)}×100) of the dispersing agent in the metal nanowire dispersion after cleaning is 3.2 mass % or more.

Abstract translation: 制造导电膜的方法包括通过使用超滤膜进行超滤来清洗含有平均短轴长度为150nm以下的金属纳米线作为金属颗粒的金属纳米线分散体和分散剂，并且涂覆用于 在载体上形成含有金属纳米线分散体的导电膜，其中分散剂的含量（{分散剂的质量/（所有金属颗粒的质量+分散剂的质量）}×100） 在清洗后的金属纳米线分散体中为3.2质量％以上。

公开(公告)号：US20140034360A1

公开(公告)日：2014-02-06

申请号：US14049379

申请日：2013-10-09

Applicant: FUJIFILM Corporation

Inventor： Satoshi TANAKA ,  Kenji NAOI ,  Shinichi NAKAHIRA ,  Kenichi YAMAMOTO

IPC: H05K1/02 ,  H05K3/10

CPC classification number: H05K1/02 ,  H01B1/124 ,  H01B1/22 ,  H01L31/022466 ,  H01L31/022491 ,  H01L31/1884 ,  H05K1/0201 ,  H05K1/0283 ,  H05K1/095 ,  H05K3/02 ,  H05K3/10 ,  H05K2201/026 ,  H05K2203/0514 ,  Y02E10/50

Abstract: A conductive member containing: a base material; a conductive layer provided on the base material, wherein the conductive layer includes a metallic nanowire having an average short axis length of 150 nm or less and a matrix; and a protective layer including a three-dimensional crosslinked structure represented by the following Formula (I), sequentially in this order, and which has a surface resistivity measured at a surface of the protective layer of 1,000 Ω/□ or less, a production method of the conductive member, and a touch panel and a solar cell, each of which uses the conductive member. The conductive member may provide high resistance against scratches and abrasion, excellent conductivity, excellent transparency, excellent heat resistance, excellent moisture and heat resistance, and excellent bendability. -M1-O-M1-  Formula (I): In the Formula (I), M1 represents an element selected from the group consisting of Si, Ti Zr and Al.

Abstract translation: 一种导电构件，包括：基材; 设置在所述基材上的导电层，其中所述导电层包括平均短轴长度为150nm以下的金属纳米线和基体; 以及包含下述式（I）所示的三维交联结构的保护层，依次是依次具有在1000Ω/□以下的保护层的表面上测得的表面电阻率的制造方法 的导电构件，以及触摸面板和太阳能电池，其中每个都使用导电构件。 导电构件可以提供高的耐划痕和磨损性，优异的导电性，优异的透明性，优异的耐热性，优异的耐湿性和耐热性，以及优异的弯曲性。 -M1-O-M1-式（I）：在式（I）中，M1表示选自Si，TiZr和Al的元素。

公开(公告)号：US20220342300A1

公开(公告)日：2022-10-27

申请号：US17707373

申请日：2022-03-29

Applicant: FUJIFILM Corporation

Inventor： Aya NAKAYAMA ,  Katsuyuki NUKUI ,  Yuya MOTOMURA ,  Toru OGAWA ,  Shinichi NAKAHIRA

IPC: G03F7/004 ,  C09D5/24 ,  C09D4/00 ,  C09D133/06 ,  C09D7/61 ,  G03F7/32 ,  H01B3/42 ,  H01B5/14 ,  H01B1/02 ,  G06F3/044

Abstract: A manufacturing method for a conductive substrate, with which a conductive substrate including a substrate and a conductive thin wire arranged on the substrate are manufactured, includes in the following order, a step 1 of forming a thin wire containing a metal on the substrate; a step 2 of bringing the thin wire into contact with a solution containing an organic acid; and a step 3 of subjecting the thin wire to a plating treatment to form a conductive thin wire.

公开(公告)号：US20190332225A1

公开(公告)日：2019-10-31

申请号：US16505172

申请日：2019-07-08

Applicant: FUJIFILM Corporation

Inventor： Shinichi NAKAHIRA ,  Akihiro ISHII ,  Keisho FUNATSU

IPC: G06F3/044 ,  H01B5/14 ,  H01B13/00

Abstract: A conductive film has a support and a conductive portion which is disposed on the support and contains a conductive component and a binder, the binder contains a resin, a gel fraction of the resin is 70% or more, and a moisture content of the resin is 3% or less.

公开(公告)号：US20140202531A1

公开(公告)日：2014-07-24

申请号：US14226400

申请日：2014-03-26

Applicant: FUJIFILM Corporation

Inventor： Toyohisa OYA ,  Shinichi NAKAHIRA

IPC: H01B1/22 ,  H01L31/0224

CPC classification number: H01L31/022425 ,  B32B7/02 ,  C08K7/06 ,  C09D5/24 ,  C09D7/67 ,  C09D7/70 ,  G03F7/004 ,  G06F3/044 ,  H01B1/22 ,  H01L31/022466 ,  H01L51/442 ,  Y10T428/31663

Abstract: A conductive composition includes at least: a) metal conductive fibers having an average minor axis length of from 1 nm to 150 nm; and b) a compound represented by the following Formula (1) or Formula (2) in an amount of from 0.1% by mass to 1000% by mass with respect to the metal conductive fibers: P—(CR1═Y)n-Q  Formula (1) wherein, in Formula (1), P and Q each independently represent a group represented by OH, NR2R3 or CHR4R5, in which R2 and R3 each independently represent a hydrogen atom or a group that can be substituted on a nitrogen atom, and R4 and R5 each independently represent a hydrogen atom or a substituent; Y represents CR6 or a nitrogen atom; R1 and R6 each independently represent a hydrogen atom or a substituent; at least two of the groups represented by R1, R2, R3, R4, R5 or R6 may be bonded to each other to form a ring; n represents an integer from 0 to 5; when n is 0, neither P nor Q is a group represented by OH or CHR4R5; and when n represents a number of 2 or greater, the plurality of atomic groups each represented by (CR1═Y) may be the same as or different from each other; R7—C(═O)—H  Formula (2) wherein, in Formula (2), R7 represents a hydrogen atom, an OH group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group.

Abstract translation: 导电组合物至少包括：a）平均短轴长度为1nm至150nm的金属导电纤维; 相对于金属导电纤维，b）由下式（1）或式（2）表示的化合物的量为0.1质量％至1000质量％：P-（CR 1 = Y）nQ式（ 1）其中，在式（1）中，P和Q各自独立地表示由OH，NR 2 R 3或CHR 4 R 5表示的基团，其中R 2和R 3各自独立地表示氢原子或可以在氮原子上被取代的基团， R4和R5各自独立地表示氢原子或取代基; Y表示CR 6或氮原子; R 1和R 6各自独立地表示氢原子或取代基; 由R 1，R 2，R 3，R 4，R 5或R 6表示的基团中的至少两个可以彼此键合形成环; n表示0〜5的整数， 当n为0时，P和Q都不是由OH或CHR4R5表示的基团; 并且当n表示2或更大的数时，由（CR 1 = Y）表示的多个原子团可以相同或不同; 式（2）其中，在式（2）中，R 7表示氢原子，OH基，烷基，烯基，炔基，芳基或杂环基 。

公开(公告)号：US20140048131A1

公开(公告)日：2014-02-20

申请号：US14062244

申请日：2013-10-24

Applicant: FUJIFILM Corporation

Inventor： Satoshi TANAKA ,  Shinichi NAKAHIRA ,  Yuki MATSUNAMI ,  Tomohito ASAI

IPC: H05K1/09 ,  H01L31/18 ,  H01L31/0224

CPC classification number: H05K1/092 ,  G06F3/041 ,  G06F2203/04103 ,  H01B1/22 ,  H01L31/022425 ,  H01L31/022466 ,  H01L31/186 ,  H01L31/1884 ,  Y02E10/50

Abstract: A conductive member containing a base material and a conductive layer provided on the base material, wherein the conductive layer includes (i) a metallic nanowire having an average short-axis length of 150 nm or less and (ii) a binder, the binder including a three-dimensional crosslinked structure that includes a partial structure represented by the following Formula (Ia) and a partial structure represented by the following Formula (IIa) or Formula (IIb). In the Formulae, each of M1 and M2 independently represents an element selected from the group consisting of Si, Ti and Zr. Each R3 independently represents a hydrogen or a hydrocarbon group.

Abstract translation: 一种导电构件，其包含设置在所述基材上的基材和导电层，其中，所述导电层包括（i）平均短轴长度为150nm以下的金属纳米线，和（ii）粘合剂，所述粘合剂包含 包含由下式（Ia）表示的部分结构和由下式（IIa）或式（IIb）表示的部分结构的三维交联结构。 在式中，M1和M2各自独立地表示选自Si，Ti和Zr的元素。 每个R 3独立地表示氢或烃基。

公开(公告)号：US20140069488A1

公开(公告)日：2014-03-13

申请号：US14062504

申请日：2013-10-24

Applicant: FUJIFILM CORPORATION

Inventor： Satoshi TANAKA ,  Shinichi NAKAHIRA ,  Yuki MATSUNAMI ,  Tomohito ASAI

IPC: H01B1/22 ,  H01L21/02 ,  H05K1/02

CPC classification number: H05K1/02 ,  G06F3/045 ,  G06F2203/04103 ,  H01B1/22 ,  H01L21/02 ,  H01L31/022466 ,  H01L31/022483 ,  H01L31/1888 ,  Y02E10/541 ,  Y02P70/521

Abstract: A conductive member including: a base material; and a conductive layer disposed on the base material, wherein the conductive layer includes: a metal nanowire including a metal element (a) and having an average minor axis length of 150 nm or less; and a sol-gel cured product obtained by hydrolyzing and polycondensing an alkoxide compound of an element (b) selected from the group consisting of Si, Ti, Zr, and Al; and a ratio of the substance amount of the element (b) contained in the conductive layer to the substance amount of the metal element (a) contained in the conductive layer is in a range of from 0.10/1 to 22/1.

Abstract translation: 一种导电构件，包括：基材; 以及设置在所述基材上的导电层，其中所述导电层包括：包含金属元素（a）并且平均短轴长度为150nm以下的金属纳米线; 和通过水解和缩聚选自Si，Ti，Zr和Al的元素（b）的醇盐化合物而获得的溶胶 - 凝胶固化产物; 并且导电层中所含的元素（b）的物质量与导电层中所含的金属元素（a）的物质量的比例在0.10 / 1〜22/1的范围内。

公开(公告)号：US20130129465A1

公开(公告)日：2013-05-23

申请号：US13731987

申请日：2012-12-31

Applicant: Fujifilm Corporation

Inventor： Kentaro OKAZAKI ,  Yuki MATSUNAMI ,  Fumio OBATA ,  Kenji NAOI ,  Shinichi NAKAHIRA

IPC: H01B1/00

CPC classification number: H01B1/00 ,  G06F3/044 ,  G06F3/045 ,  Y10T428/24975

Abstract: An electroconductive layer-transferring material including: a base material; a cushion layer on the base material; and an electroconductive layer on the cushion layer, the electroconductive layer containing metal nanowires having an average minor axis length of 100 nm or less and an average major axis length of 2 μm or more, wherein the electroconductive layer-transferring material satisfies A/B=0.1 to 0.7, where A is a total thickness of an average thickness of the electroconductive layer and an average thickness of the cushion layer, and B is an average thickness of the base material, wherein the average thickness of the electroconductive layer is 0.01 μm to 0.2 μm, and wherein the average thickness of the cushion layer is 1 μm to 50 μm.

Abstract translation: 一种导电层转移材料，包括：基材; 基材上的缓冲层; 以及在缓冲层上的导电层，所述导电层含有平均短轴长度为100nm以下且平均长轴长度为2μm以上的金属纳米线，其中，所述导电性层转印材料满足A / B = 0.1〜0.7，其中A是导电层的平均厚度和缓冲层的平均厚度的总厚度，B是基材的平均厚度，其中导电层的平均厚度为0.01μm至 0.2μm，其中缓冲层的平均厚度为1〜50μm。