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    Charged particle beam emitting device and method for operating a charged particle beam emitting device
    1.
    发明授权
    Charged particle beam emitting device and method for operating a charged particle beam emitting device 有权
    带电粒子束发射装置和用于操作带电粒子束发射装置的方法

    公开(公告)号：US07595490B2

    公开(公告)日：2009-09-29

    申请号：US11469728

    申请日：2006-09-01

    申请人： Fang Zhou ,  Pavel Adamec ,  Jürgen Frosien ,  Jimmy Vishnipolsky

    发明人： Fang Zhou ,  Pavel Adamec ,  Jürgen Frosien ,  Jimmy Vishnipolsky

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/073 ,  H01J2237/022 ,  H01J2237/06325

    摘要： A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.

    摘要翻译： 提供了一种用于操作带电粒子束发射器件的方法，特别是包括冷场发射器的电子束发射器件。 该方法包括以下步骤：将冷场发射器置于给定压力的真空中，发射体在给定的电提取场下表现出高的初始发射电流I0和较低的稳定平均发射电流IS; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过向冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理，由此在冷场发射器的发射电流已经下降到较低的稳定平均发射值IS之前进行清洁处理; 并重复清洁处理以将发射极的发射电流连续地保持在基本上稳定的发射值IS上。

    CHARGED PARTICLE BEAM EMITTING DEVICE AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM EMITTING DEVICE
    2.
    发明申请
    CHARGED PARTICLE BEAM EMITTING DEVICE AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM EMITTING DEVICE 有权
    充电颗粒射束发射装置和用于操作充电颗粒光束发射装置的方法

    公开(公告)号：US20070158588A1

    公开(公告)日：2007-07-12

    申请号：US11469728

    申请日：2006-09-01

    申请人： Fang Zhou ,  Pavel Adamec ,  Jurgen Frosien ,  Jimmy Vishnipolsky

    发明人： Fang Zhou ,  Pavel Adamec ,  Jurgen Frosien ,  Jimmy Vishnipolsky

    IPC分类号： A61N5/00

    CPC分类号： H01J37/073 ,  H01J2237/022 ,  H01J2237/06325

    摘要： A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.

    摘要翻译： 提供了一种用于操作带电粒子束发射器件的方法，特别是包括冷场发射器的电子束发射器件。 该方法包括以下步骤：将冷场发射器置于给定压力的真空中，发射体表现出高的初始发射电流I 0和较低的稳定平均发射电流I S， 在给定的电提取场下; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过对冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理，由此在冷场发射器的发射电流已经下降到较低的稳定平均发光值I < S

    Field emitter arrangement and method of cleansing an emitting surface of a field emitter
    3.
    发明申请
    Field emitter arrangement and method of cleansing an emitting surface of a field emitter 审中-公开
    场发射器布置和清洁场发射器的发射表面的方法

    公开(公告)号：US20070018562A1

    公开(公告)日：2007-01-25

    申请号：US11489979

    申请日：2006-07-20

    申请人： Pavel Adamec ,  Fang Zhou

    发明人： Pavel Adamec ,  Fang Zhou

    IPC分类号： H01J1/02

    CPC分类号： H01J37/06 ,  H01J37/02 ,  H01J37/073 ,  H01J49/48 ,  H01J2237/06316

    摘要： A field emitter arrangement and a method of cleaning an emitting surface of a field emitter are provided. The field emitter arrangement may include a field emitter tip having an emitting surface, wherein said field emitter tip is adapted to generate a primary beam of charged particles, and at least one electron source adapted to illuminate the emitting surface of the field emitter tip. The method of cleaning the emitting surface may include providing the field emitter having the emitting surface and at least one electron source adapted to illuminate the emitting surface and illuminating the emitting surface of the field emitter with a cleansing electron beam generated by the at least one electron source.

    摘要翻译： 提供场发射器布置和清洁场发射器的发射表面的方法。 场发射器配置可以包括具有发射表面的场发射器尖端，其中所述场发射极尖端适于产生带电粒子的主光束，以及适于照射场发射器尖端的发射表面的至少一个电子源。 清洁发射表面的方法可以包括提供具有发射表面的场致发射体和至少一个电子源，其适于照射发射表面并用由至少一个电子产生的清洁电子束照射场发射器的发射表面 资源。

    Beam current calibration system
    5.
    发明授权
    Beam current calibration system 有权
    光束电流校准系统

    公开(公告)号：US07982179B2

    公开(公告)日：2011-07-19

    申请号：US12366465

    申请日：2009-02-05

    申请人： Pavel Adamec ,  Fang Zhou

    发明人： Pavel Adamec ,  Fang Zhou

    IPC分类号： H01J23/00 ,  G12B13/00

    CPC分类号： H01J37/244 ,  H01J37/261 ,  H01J2237/2443 ,  H01J2237/24507 ,  H01J2237/2826

    摘要： A charged particle beam device is described. The charged particle beam device includes an emitter adapted for emitting a primary charged particle beam, a specimen location adapted for holding a specimen, from which secondary and/or backscattered charged particles are released on impingement of the primary charged particle beam, a detection unit adapted for detecting the secondary particles and/or secondary particles, and a beam guiding unit adapted for guiding the primary charged particle beam to the detection unit for impingement of a primary charged particle beam on the detection unit.

    摘要翻译： 描述带电粒子束装置。 带电粒子束装置包括适于发射初级带电粒子束的发射器，适于保持试样的试样位置，从而从初级带电粒子束的冲击中释放辅助和/或反向散射的带电粒子，检测单元适于 用于检测二次粒子和/或二次粒子的光束引导单元，以及用于将初级带电粒子束引导到检测单元的光束引导单元，用于将一次带电粒子束撞击在检测单元上。

    Device and method for selecting an emission area of an emission pattern
    6.
    发明授权
    Device and method for selecting an emission area of an emission pattern 有权
    用于选择发射模式的发射区域的装置和方法

    公开(公告)号：US07847266B2

    公开(公告)日：2010-12-07

    申请号：US11469753

    申请日：2006-09-01

    申请人： Fang Zhou ,  Jürgen Frosien

    发明人： Fang Zhou ,  Jürgen Frosien

    IPC分类号： H01J3/14

    CPC分类号： H01J37/06 ,  H01J2237/045 ,  H01J2237/06316 ,  H01J2237/15

    摘要： A charged particle beam apparatus and a method for measuring an emission pattern of such an apparatus are provided. The apparatus comprises an emitter with an emission pattern including at least two emission peaks, a gun lens, and a diaphragm, wherein the gun lens comprises a deflector unit and the deflector unit is adapted to direct an emission peak of the at least two emission peaks to an opening of the diaphragm to thereby select the emission peak of the at least two emission peaks from the emission pattern.

    摘要翻译： 提供一种带电粒子束装置和用于测量这种装置的发射图案的方法。 该装置包括具有包括至少两个发射峰值的发射图案的发射器，枪式透镜和隔膜，其中枪形透镜包括偏转器单元，偏转器单元适于引导至少两个发射峰的发射峰 到所述隔膜的开口，从而从所述发射图案中选择所述至少两个发射峰的发射峰。

    Charged particle beam emitting device and method for operating a charged particle beam emitting device
    8.
    发明授权
    Charged particle beam emitting device and method for operating a charged particle beam emitting device 有权
    带电粒子束发射装置和用于操作带电粒子束发射装置的方法

    公开(公告)号：US07501638B1

    公开(公告)日：2009-03-10

    申请号：US11553160

    申请日：2006-10-26

    申请人： Fang Zhou

    发明人： Fang Zhou

    IPC分类号： H01J37/10 ,  H01J37/147

    CPC分类号： H01J9/505 ,  H01J3/06 ,  H01J37/067 ,  Y02W30/828

    摘要： A charged particle beam emitting device includes at least two charged particle beam guns, each of the at least two charged particle beam guns having a separate charged particle emitter with an emitting surface for emitting a respective charged particle beam. The charged particle beam emitting device further includes an aperture element comprising at least one aperture opening and a deflector unit. The deflector unit is adapted for alternatively directing the charged particle beams of the at least two charged particle beam guns on the at least one aperture opening so that, at the same time, one of the at least two charged particle beams is directed on the aperture opening while the respective other charged particle beam of the at least two charged particle beams is deflected from the aperture opening by the deflector unit. At the same time, only one of the two charged particle beam guns is used so that the temporarily unused charged particle beam gun can be subjected to a cleaning procedure. This ensures that the emitting surfaces of both charged particle beam guns can be alternatively and frequently cleaned with minimum interruption of the operation of the charged particle beam device.

    摘要翻译： 带电粒子束发射装置包括至少两个带电粒子束枪，所述至少两个带电粒子束枪中的每一个具有分离的带电粒子发射器，具有用于发射相应带电粒子束的发射表面。 带电粒子束发射装置还包括孔元件，该孔元件包括至少一个孔口和偏转器单元。 偏转器单元适于将至少两个带电粒子束枪的带电粒子束交替地引导到至少一个孔口上，使得同时，至少两个带电粒子束中的一个被引导到孔 所述至少两个带电粒子束的相应的其它带电粒子束由所述偏转器单元从所述开口偏转。 同时，仅使用两个带电粒子束枪中的一个，使得临时使用的带电粒子束枪可以进行清洁程序。 这确保了两个带电粒子束枪的发射表面可以以最小的带电粒子束装置的操作中断来交替地和频繁地清洁。