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    Charged particle beam emitting device and method for operating a charged particle beam emitting device
    1.
    发明授权
    Charged particle beam emitting device and method for operating a charged particle beam emitting device 有权
    带电粒子束发射装置和用于操作带电粒子束发射装置的方法

    公开(公告)号：US07595490B2

    公开(公告)日：2009-09-29

    申请号：US11469728

    申请日：2006-09-01

    申请人： Fang Zhou ,  Pavel Adamec ,  Jürgen Frosien ,  Jimmy Vishnipolsky

    发明人： Fang Zhou ,  Pavel Adamec ,  Jürgen Frosien ,  Jimmy Vishnipolsky

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/073 ,  H01J2237/022 ,  H01J2237/06325

    摘要： A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.

    摘要翻译： 提供了一种用于操作带电粒子束发射器件的方法，特别是包括冷场发射器的电子束发射器件。 该方法包括以下步骤：将冷场发射器置于给定压力的真空中，发射体在给定的电提取场下表现出高的初始发射电流I0和较低的稳定平均发射电流IS; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过向冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理，由此在冷场发射器的发射电流已经下降到较低的稳定平均发射值IS之前进行清洁处理; 并重复清洁处理以将发射极的发射电流连续地保持在基本上稳定的发射值IS上。

    CHARGED PARTICLE BEAM EMITTING DEVICE AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM EMITTING DEVICE
    2.
    发明申请
    CHARGED PARTICLE BEAM EMITTING DEVICE AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM EMITTING DEVICE 有权
    充电颗粒射束发射装置和用于操作充电颗粒光束发射装置的方法

    公开(公告)号：US20070158588A1

    公开(公告)日：2007-07-12

    申请号：US11469728

    申请日：2006-09-01

    申请人： Fang Zhou ,  Pavel Adamec ,  Jurgen Frosien ,  Jimmy Vishnipolsky

    发明人： Fang Zhou ,  Pavel Adamec ,  Jurgen Frosien ,  Jimmy Vishnipolsky

    IPC分类号： A61N5/00

    CPC分类号： H01J37/073 ,  H01J2237/022 ,  H01J2237/06325

    摘要： A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.

    摘要翻译： 提供了一种用于操作带电粒子束发射器件的方法，特别是包括冷场发射器的电子束发射器件。 该方法包括以下步骤：将冷场发射器置于给定压力的真空中，发射体表现出高的初始发射电流I 0和较低的稳定平均发射电流I S， 在给定的电提取场下; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过对冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理，由此在冷场发射器的发射电流已经下降到较低的稳定平均发光值I < S

    Managing work-piece deflection
    4.
    发明授权
    Managing work-piece deflection 有权
    管理工件偏转

    公开(公告)号：US06932873B2

    公开(公告)日：2005-08-23

    申请号：US10209284

    申请日：2002-07-30

    申请人： Betsalel Tzvi Rechav ,  Jimmy Vishnipolsky ,  Efim Vinnitsky

    发明人： Betsalel Tzvi Rechav ,  Jimmy Vishnipolsky ,  Efim Vinnitsky

    IPC分类号： B01J3/03 ,  H01L21/00 ,  H01L21/20 ,  C23C16/00

    CPC分类号： H01L21/67126 ,  B01J3/03

    摘要： A work-piece deflection management system including: (a) a first and a second vacuum chambers, each said vacuum chamber having an air-bearing seal circumscribing one of its sides, and (b) a work-piece plate; wherein the air-bearing seals are aligned to face one-another with the work-piece plate respectively there-between, allowing the work-piece to be laterally slid with respect to the air-bearing seals while maintaining a first predefined vacuum level within the first vacuum chamber and maintaining a second predefined vacuum level within the second vacuum chamber.

    摘要翻译： 一种工件偏转管理系统，包括：（a）第一和第二真空室，每个所述真空室具有围绕其一侧的空气轴承密封件，（b）工件板; 其中所述空气轴承密封件被对准以分别与所述工件板相对对置，允许所述工件相对于所述空气轴承密封件横向滑动，同时保持所述第一预定义的真空度在所述 第一真空室并且在第二真空室内保持第二预定义的真空度。

    Method and device for rastering source redundancy
    6.
    发明授权
    Method and device for rastering source redundancy 有权
    扫描源冗余的方法和设备

    公开(公告)号：US06894435B2

    公开(公告)日：2005-05-17

    申请号：US10289882

    申请日：2002-11-06

    申请人： David Aviel ,  Jimmy Vishnipolsky ,  Radel Ben-Av

    发明人： David Aviel ,  Jimmy Vishnipolsky ,  Radel Ben-Av

    IPC分类号： G03F7/00 ,  G09G3/10 ,  G21G5/00 ,  H01J37/302 ,  H01J37/317 ,  H05B37/00

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31762 ,  H01J2237/31766 ,  H01J2237/31767 ,  H01J2237/31771 ,  H01J2237/31774

    摘要： A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a source 106 and the same plurality of target points is scanned with at least one further charged particle beam emitted by at least one further source. Further, the charged particle beams from the source and the at least one further source are emitted on the same target point at different times. Additionally, a multiple charged particle beam source and a data feed system are provided. A source array 104 comprises at least one logical emitting unit 106, wherein patterning information is shifted in a shift circuit 140, and redundancy emitting units 106, wherein individual redundancy emitting units obtain patterning information from the shift register.

    摘要翻译： 用于用源组的带电粒子的束102扫描试样105的方法。 因此，用源106发射的带电粒子束扫描多个目标点402，并且用至少一个另外的源发射的至少一个另外带电的粒子束扫描相同的多个目标点。 此外，来自源极和至少一个另外的源的带电粒子束在不同时间被发射在相同的目标点上。 另外，提供多重带电粒子束源和数据馈送系统。 源阵列104包括至少一个逻辑发射单元106，其中图形化信息在移位电路140中移位，以及冗余发射单元106，其中各个冗余发射单元从移位寄存器获得图形信息。

    INSPECTION OF EUV MASKS BY A DUV MASK INSPECTION TOOL
    7.
    发明申请
    INSPECTION OF EUV MASKS BY A DUV MASK INSPECTION TOOL 有权
    通过DUV面罩检查工具检查EUV面罩

    公开(公告)号：US20110121193A1

    公开(公告)日：2011-05-26

    申请号：US12950058

    申请日：2010-11-19

    申请人： Chaim Braude ,  Mariano Abramson ,  Adam Baer ,  Jimmy Vishnipolsky ,  Yuri Belenky

    发明人： Chaim Braude ,  Mariano Abramson ,  Adam Baer ,  Jimmy Vishnipolsky ,  Yuri Belenky

    IPC分类号： G01J1/42

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/84

    摘要： A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses a EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.

    摘要翻译： 一种系统，包括：（a）掩模操纵器，其被设置为：接收包围EUV掩模的不透明EUV舱，在高度清洁的环境中从EUV的外舱和内舱提取EUV掩模 并且覆盖EUV面罩的上表面，其保护罩对于DUV辐射至少部分透明; （b）扫描仪，扫描EUV掩模，使用DUV照明，同时在扫描仪中保持清洁度低于可耐受的EUV面罩清洁度水平的环境; 以及传送系统，其布置成在扫描仪和掩模操纵器之间传送EUV掩模和保护盖。

    Inspection of EUV masks by a DUV mask inspection tool
    8.
    发明授权
    Inspection of EUV masks by a DUV mask inspection tool 有权
    通过DUV面罩检查工具检查EUV面罩

    公开(公告)号：US08207504B2

    公开(公告)日：2012-06-26

    申请号：US12950058

    申请日：2010-11-19

    申请人： Chaim Braude ,  Mariano Abramson ,  Adam Baer ,  Jimmy Vishnipolsky ,  Yuri Belenky

    发明人： Chaim Braude ,  Mariano Abramson ,  Adam Baer ,  Jimmy Vishnipolsky ,  Yuri Belenky

    IPC分类号： G01J1/42

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/84

    摘要： A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses an EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged to scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and (c) a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.

    摘要翻译： 一种系统，包括：（a）掩模操纵器，其被设置为：接收包围EUV掩模的不透明EUV舱，在高度清洁的环境中从EUV的外舱和内舱提取EUV掩模 并且覆盖EUV面罩的上表面，其保护罩对于DUV辐射至少部分透明; （b）扫描器，被设置为使用DUV照明扫描EUV掩模，同时在扫描仪中保持清洁度低于耐受的EUV面罩清洁度水平的环境; 以及（c）运送系统，其布置成在扫描仪和掩模操纵器之间输送EUV掩模和保护盖。