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    Bottom antireflective coating compositions and processes thereof
    5.
    发明授权
    Bottom antireflective coating compositions and processes thereof 有权
    底部抗反射涂料组合物及其工艺

    公开(公告)号：US08623589B2

    公开(公告)日：2014-01-07

    申请号：US13153765

    申请日：2011-06-06

    申请人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    发明人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    IPC分类号： G03F7/38 ,  G03F7/40 ,  C09D5/00 ,  G03F7/039 ,  G03F7/11

    CPC分类号： C09D5/006 ,  G03F7/091

    摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

    摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。

    Process for Imaging a Photoresist Coated over an Antireflective Coating
    6.
    发明申请
    Process for Imaging a Photoresist Coated over an Antireflective Coating 审中-公开
    在抗反射涂层上涂覆光刻胶的方法

    公开(公告)号：US20090162800A1

    公开(公告)日：2009-06-25

    申请号：US11961581

    申请日：2007-12-20

    申请人： David Abdallah ,  Alberto Dioses ,  Allen Timko ,  Ruzhi Zhang

    发明人： David Abdallah ,  Alberto Dioses ,  Allen Timko ,  Ruzhi Zhang

    IPC分类号： G03F7/30

    CPC分类号： G03F7/091 ,  G02B1/111 ,  G02B27/0006 ,  G03F7/0752 ,  G03F7/16

    摘要： The process of the present invention relates to imaging a photoresist film coated over an antireflective coating film comprising a) forming an antireflective coating film from an antireflective coating composition, where the composition comprises a siloxane polymer, b) treating the antireflective film with an aqueous alkaline treating solution, c) rinsing the antireflective film treated with an aqueous rinsing solution, d) forming a coating of a photoresist over the film of the antireflective coating composition, e) imagewise exposing the photoresist film, and, f) developing the photoresist with an aqueous alkaline developing solution.

    摘要翻译： 本发明的方法涉及对涂覆在抗反射涂膜上的光致抗蚀剂膜进行成像，其包括：a）从防反射涂料组合物形成抗反射涂膜，其中组合物包含硅氧烷聚合物，b）用碱性水溶液处理抗反射膜 处理溶液，c）冲洗用水性漂洗溶液处理的抗反射膜，d）在抗反射涂料组合物的膜上形成光致抗蚀剂涂层，e）成像曝光光致抗蚀剂膜，以及f）用 水性碱性显影液。

    BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
    7.
    发明申请
    BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF 有权
    底部抗反射涂料组合物及其工艺

    公开(公告)号：US20120308939A1

    公开(公告)日：2012-12-06

    申请号：US13153765

    申请日：2011-06-06

    申请人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    发明人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    IPC分类号： G03F7/20 ,  C08K5/42

    CPC分类号： C09D5/006 ,  G03F7/091

    摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

    摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。