Nanostructured gas sensor
    2.
    发明授权

    公开(公告)号:US10545108B2

    公开(公告)日:2020-01-28

    申请号:US15539999

    申请日:2015-12-28

    IPC分类号: G01N33/00 G01N27/12 H01L21/02

    摘要: A thin film gas sensor device includes a substrate, a first pillar, a second pillar, a nanostructured thin film layer, and a first and a second electrical contact. The first and second pillars are supported by the substrate. The nanostructured thin film layer is formed with a semi-conductor material including holes. The semiconductor material is configured to undergo a reduction in a density of the holes in the presence of a target gas, thereby increasing an electrical resistance of the nanostructured thin film layer. The first and the second electrical contacts are operably connected to the nanostructured thin film layer, such that the increase in electrical resistance can be detected.