摘要:
According to one embodiment, a memory cell includes a charge storage layer. A first air gap is provided between charge storage layers adjacent in a word line direction. A second air gap is provided between charge storage layers adjacent in a bit line direction.
摘要:
According to one embodiment, a part of a buried insulating film buried in a trench is removed; accordingly, an air gap is formed between adjacent floating gate electrodes in a word line direction, and the air gap is formed continuously along the trench in a manner of sinking below a control gate electrode.
摘要:
A nonvolatile semiconductor storage device is disclosed. The device includes a cell group having a first memory cell and a second memory cell located first directionally adjacent to the first memory cell, and a programming circuit. The first memory cell is used for data retention and the second memory cell is used for adjustment of a threshold voltage of the first memory cell. The programming circuit is configured to program the first memory cell by applying voltage to the second memory cell to control the threshold voltage of the first memory cell to be higher than a first threshold voltage.
摘要:
A storage device according to one embodiment includes memory cells which are connected in series in a first direction and are arranged in a matrix by the arranged series connections, and word lines which connect control gates of the memory cells in a second direction perpendicular to the first direction, in which a first interval and a second interval wider than that are alternately repeated for intervals in the second direction between the memory cells. The storage device according to the embodiment comprises a drive unit for writing data in a first cell, then writing data in a second cell which is connected to the same word line as the first cell and is spaced at the first interval in the second direction, then reading the data in the second cell, and reading the data in the first cell with correction based on the read value of the second cell.
摘要:
According to one embodiment, a semiconductor memory device having a memory cells and word lines is provided. The memory cells are formed in a semiconductor layer and arranged in matrix. Each of the memory cells has a floating gate and a control gate. Each plurality of the memory cells is connected in series in a row direction. Each of the word lines is connected to each plurality of the control gates in a column direction. First and second intervals are provided for the memory cells alternately in the column direction. The second interval is larger than the first interval.
摘要:
A nonvolatile semiconductor memory device according to an embodiment includes: a memory cell array in which a plurality of NAND cell units are arranged, the NAND cell units including a plurality of memory cells, and select gate transistors, the memory cell including a semiconductor layer, a gate insulating film, a charge accumulation layer, and a control gate; and a control circuit. The control circuit adjusts a write condition of each of the memory cells in accordance with write data to each of the memory cells and memory cells adjacent to the memory cells within the data to be written.
摘要:
A nonvolatile semiconductor memory device according to an embodiment includes: a memory cell array in which a plurality of NAND cell units are arranged, the NAND cell units including a plurality of memory cells, and select gate transistors, the memory cell including a semiconductor layer, a gate insulating film, a charge accumulation layer, and a control gate; and a control circuit. The control circuit adjusts a write condition of each of the memory cells in accordance with write data to each of the memory cells and memory cells adjacent to the memory cells within the data to be written.
摘要:
A nonvolatile semiconductor storage device is disclosed. The device includes a cell group having a first memory cell and a second memory cell located first directionally adjacent to the first memory cell, and a programming circuit. The first memory cell is used for data retention and the second memory cell is used for adjustment of a threshold voltage of the first memory cell. The programming circuit is configured to program the first memory cell by applying voltage to the second memory cell to control the threshold voltage of the first memory cell to be higher than a first threshold voltage.
摘要:
A nonvolatile semiconductor memory device according to an embodiment includes a plurality of cell array layers, each cell array layer including: a plurality of semiconductor layers that extends in a first direction; gate insulating layers; a plurality of floating gates arranged in the first direction; inter-gate insulating layers; and a plurality of control gates that extends in a second direction intersecting semiconductor layers, and faces the floating gates via the inter-gate insulating layers, in which, in the cell array layers adjacent each other in a stacking direction, the control gates of a lower cell array layer and the control gates of the an upper cell array layer are intersecting each other, and the floating gates within the lower cell array layer and the semiconductor layers within the upper cell array layer are aligned in position with each other.
摘要:
A semiconductor memory device includes a first block having first memory cells and first select transistors, a second block having second memory cells and second select transistors, and arranged adjacent to the first block in a first direction, the second select transistor being arranged to face the first select transistor and commonly having a diffusion region with the first select transistor, a first interconnection layer provided on the diffusion region between the first and second blocks and extending in a second direction, and a second interconnection layer having a first portion provided in contact with an upper portion of the first interconnection layer and extending to a portion outside the first interconnection layer, and a second portion extending in the second direction and connected to the first portion in a portion outside a portion on the first interconnection layer.