公开(公告)号：US08124946B2

公开(公告)日：2012-02-28

申请号：US12477631

申请日：2009-06-03

申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC分类号： H01J37/317 ,  H01J49/30 ,  H01J49/42

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US20100181470A1

公开(公告)日：2010-07-22

申请号：US12357688

申请日：2009-01-22

申请人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

发明人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

IPC分类号： G01D18/00 ,  A61N5/00 ,  H01J5/18

CPC分类号： H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542

摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.

摘要翻译： 一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。 一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与 第一梁部分。 光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。 板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

公开(公告)号：US20050191409A1

公开(公告)日：2005-09-01

申请号：US11029004

申请日：2005-01-05

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

IPC分类号： H01L21/265 ,  B05D1/00 ,  C23C14/00 ,  C23C16/00 ,  H01J27/00 ,  H01J37/244 ,  H01J37/304 ,  H01J37/317 ,  H01L21/425 ,  H01L21/66

CPC分类号： H01J37/3171 ,  H01J37/304 ,  H01J2237/30455 ,  H01J2237/31703

摘要： This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.

摘要翻译： 本发明涉及用于离子注入机的离子束监测装置，其中期望监测用于植入的离子束的通量和/或横截面轮廓。 通常期望在离子注入机中测量离子束的通量和/或横截面轮廓，以便改进对半导体晶片或类似物的离子注入的控制。 本发明描述了适配晶片保持器以允许执行这种光束轮廓。 衬底保持器可以逐渐地用于从下游通量监视器闭塞离子束，或者通量监视器可以位于设置有狭缝入口孔的晶片保持器上。

公开(公告)号：US20110042578A1

公开(公告)日：2011-02-24

申请号：US12926158

申请日：2010-10-28

申请人： Adrian Murrell ,  Bernard F. Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

发明人： Adrian Murrell ,  Bernard F. Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

IPC分类号： H01J3/26

CPC分类号： H01J37/3171 ,  H01J37/304 ,  H01J2237/30455 ,  H01J2237/31703

摘要： This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.

摘要翻译： 本发明涉及用于离子注入机的离子束监测装置，其中期望监测用于植入的离子束的通量和/或横截面轮廓。 通常期望在离子注入机中测量离子束的通量和/或横截面轮廓，以便改进对半导体晶片或类似物的离子注入的控制。 本发明描述了适配晶片保持器以允许执行这种光束轮廓。 衬底保持器可以逐渐地用于从下游通量监视器闭塞离子束，或者通量监视器可以位于设置有狭缝入口孔的晶片保持器上。

公开(公告)号：US20080142727A1

公开(公告)日：2008-06-19

申请号：US11589156

申请日：2006-10-30

申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

IPC分类号： G01K1/08

CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 该阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

公开(公告)号：US20090321630A1

公开(公告)日：2009-12-31

申请号：US12477631

申请日：2009-06-03

申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC分类号： B01D59/44 ,  A61N5/00 ,  H01J37/08

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US07479644B2

公开(公告)日：2009-01-20

申请号：US11589156

申请日：2006-10-30

申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

IPC分类号： H01J37/317 ,  H01L21/265

CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

公开(公告)号：US08168941B2

公开(公告)日：2012-05-01

申请号：US12357688

申请日：2009-01-22

申请人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

发明人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

IPC分类号： H01J3/00 ,  G01N27/62

CPC分类号： H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542

摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.

摘要翻译： 一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。 一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与 第一梁部分。 光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。 板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

公开(公告)号：US08633458B2

公开(公告)日：2014-01-21

申请号：US13296436

申请日：2011-11-15

申请人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, Jr. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

发明人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, Jr. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

IPC分类号： G21G5/00

CPC分类号： C23C14/48 ,  H01J37/1475 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/1523 ,  H01J2237/20214

摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.

公开(公告)号：US20130119263A1

公开(公告)日：2013-05-16

申请号：US13296436

申请日：2011-11-15

申请人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, JR. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

发明人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, JR. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

IPC分类号： H01J1/50

CPC分类号： C23C14/48 ,  H01J37/1475 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/1523 ,  H01J2237/20214

摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.

摘要翻译： 使用鼓式扫描轮的离子注入装置保持总锥角小于60°的晶片。 准直的扫描的离子束，例如H +，沿着与扫描轮的旋转轴线成至少45°的角度的最终光束路径被引导。 在扫描或质量分析之前，从源中提取离子并沿线性加速路径加速至高注入能量（大于500keV）。 质量分析器可以位于旋转轴附近，并且不需要的离子被引导到可以安装在扫描轮上的环形光焦点。