公开(公告)号：US06872958B2

公开(公告)日：2005-03-29

申请号：US10059048

申请日：2002-01-28

申请人： Gerry B. Andeen ,  Martin E. Lee ,  N. William Parker ,  S. Daniel Miller

发明人： Gerry B. Andeen ,  Martin E. Lee ,  N. William Parker ,  S. Daniel Miller

IPC分类号： F16D3/56 ,  G01Q10/00 ,  G01Q20/00 ,  G01Q30/16 ,  G03F7/20 ,  H01J37/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/68 ,  F16B1/00

CPC分类号： G03F7/70716 ,  G03F7/70841 ,  G03F7/709 ,  H01J37/20 ,  H01L21/67259 ,  H01L21/682 ,  Y10T403/45

摘要： A system for precisely positioning and moving a platform relative to a support structure is disclosed herein. The platform is particularly suitable for carrying wafers. Charged particle optics can be attached to the support structure. The platform positioning system comprises a stage, comprising a base, a platform and stage actuators, the stage actuators being coupled to the platform and the platform being coupled to the base; a frame attached to the base; a support structure mechanically coupled to the frame; stage sensors attached to the support structure, for sensing the position of the platform relative to the support structure; and a current control system coupled to the stage sensors and the stage actuators. The current control system may include a predictor for generating an ouptut signal anticipating the actual position of the platform relative to the support structure in real time.

摘要翻译： 本文公开了一种用于相对于支撑结构精确地定位和移动平台的系统。 该平台特别适用于承载晶圆。 带电粒子光学元件可以附着在支撑结构上。 该平台定位系统包括一个台，包括基座，平台和平台致动器，平台致动器联接到平台并且平台联接到基座; 一个连接到基座的框架; 机架地连接到所述框架的支撑结构; 附接到支撑结构的级传感器，用于感测平台相对于支撑结构的位置; 以及耦合到载物台传感器和载物台致动器的电流控制系统。 当前控制系统可以包括用于生成预测平台相对于支撑结构的实际位置的实时发射信号的预测器。

公开(公告)号：US06355994B1

公开(公告)日：2002-03-12

申请号：US09543265

申请日：2000-04-05

申请人： Gerry B. Andeen ,  Martin E. Lee

发明人： Gerry B. Andeen ,  Martin E. Lee

IPC分类号： H02K3300

CPC分类号： G03F7/70716 ,  G03F7/70841 ,  G03F7/709 ,  H01J37/20 ,  H01L21/67259 ,  H01L21/682 ,  Y10T403/45

摘要： An ultra-high precision stage incorporating a novel, legged design suitable for applications requiring high voltage and vacuum is disclosed herein. The stage comprises: a base; a frame attached to the base; a platform with a bottom platform surface; at least three adjustable limbs coupled to the base and the bottom platform surface, each limb comprising a raising member attached to the base, a first attachment member attached to the raising member, a leg, a bottom end of the leg attached to the first attachment member, a second attachment member attached to a top end of the leg and the second attachment member attached to the bottom platform surface; and platform movement members coupled to the platform and the frame, providing precise positioning and movement of the platform. The attachment members can be flexure joints; further, they can be flexural thrust joints. The platform can have six degrees of freedom of movement and accommodate wafers with diameters of 300 mm. The stage can weigh less than 100 lbs.

摘要翻译： 本文公开了一种结合适用于需要高电压和真空的应用的新颖的腿式设计的超高精度级。 舞台包括：一个基地; 一个连接到基座的框架; 具有底部平台表面的平台; 至少三个可调节的肢体，其联接到所述基部和所述底部平台表面，每个肢体包括附接到所述基部的提升构件，附接到所述提升构件的第一附接构件，腿部，所述腿部的底端附接到所述第一附件 构件，附接到所述腿的顶端的第二附接构件和附接到所述底部平台表面的所述第二附接构件; 以及平台运动构件，其联接到平台和框架，提供平台的精确定位和移动。 附接构件可以是挠性接头; 此外，它们可以是弯曲推力接头。 该平台可以具有六个运动自由度，并适应直径为300 mm的晶圆。 舞台可以重量小于100磅。

公开(公告)号：US06888620B2

公开(公告)日：2005-05-03

申请号：US09997553

申请日：2001-11-29

申请人： Martin E. Lee ,  Mike Binnard ,  Douglas C. Watson

发明人： Martin E. Lee ,  Mike Binnard ,  Douglas C. Watson

IPC分类号： G03F7/20 ,  G03B27/60 ,  G03B27/58 ,  G03B27/62 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70716

摘要： A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20). Additionally, the stage assembly (10) can include a fluid connector (94) that connects the device holder (24) in fluid communication with the device table (20).

摘要翻译： 用于移动和定位装置（26）的平台组件（10）包括装置台（20），保持装置（26）的装置保持器（24）和平台移动器组件（14）。 台架组件（10）包括可以隔离设备保持器24和设备（26）不变形的一个或多个特征。 在一些实施例中，台架组件（10）允许装置（26）在第一位置（42）和第二位置（44）之间精确地旋转，而不影响装置（26）的平坦度，并且不会使装置偏转和变形 （26）。 例如，台架组件（10）可以包括托架（60）和托架连接器组件（62）。 载体（60）被支撑在装置台（20）上方并相对于装置台（20）旋转。 支架连接器组件（62）将装置支架（24）连接到支架（60）上。 此外，台架组件（10）可以包括相对于设备台（20）旋转设备保持器（24）的保持器移动器（120）。 另外，台架组件（10）可以包括流体连接器（94），其连接与装置台（20）流体连通的装置保持器（24）。

公开(公告)号：USH2114H1

公开(公告)日：2005-02-01

申请号：US10298286

申请日：2002-11-14

申请人： W. Thomas Novak ,  John H. McCoy ,  Martin E. Lee

发明人： W. Thomas Novak ,  John H. McCoy ,  Martin E. Lee

摘要： An inspection system and method are disclosed. The inspection system is configured to inspect a projection unit having multiple optical subsystems. The optical subsystems are configured to project an image during a lithography step. The inspection system provides self calibration by measuring both a test mask and the aerial image of the test mask with the same detector assembly. The inspection system is also capable of measuring multiple fields simultaneously using multiple detectors and 6 axis interferometry to accurately determine the position of each detector. Additionally, the inspection system is capable of measuring the distance between the test mask and the detector assembly with an indirect path around the projection unit which normally blocks the direct path.

公开(公告)号：US06188195B1

公开(公告)日：2001-02-13

申请号：US09318623

申请日：1999-05-26

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： H01L21027

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709 ,  Y10T74/20201

摘要： A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

摘要翻译： 适于在光刻机中支撑掩模版的引导阶段机构包括在基座上沿X-Y方向移动的台。 围绕舞台的是一个矩形的窗框导轨，它通过与固定在底座上的磁道配合的窗框导轨上的电机线圈在两个固定导轨上沿X轴方向驱动。 通过位于与窗框引导件上的磁迹配合的台上的电动机线圈，该平台在Y轴方向上在窗框引导件的内部被驱动。 来自窗框引导件和台架的驱动马达的力通过载物台的重心传递，从而消除不必要的惯性矩。 此外，由驱动马达引起的反作用力与投影透镜和光刻机的对准部分隔离。 这种隔离是通过为舞台独立于其窗框引导件的支撑提供机械支撑来实现的。 窗框引导件是由于连接窗框引导构件的铰链弯曲而能够轻微偏转（旋转）运动的铰链结构。

公开(公告)号：US6132091A

公开(公告)日：2000-10-17

申请号：US193915

申请日：1998-11-17

申请人： Martin E. Lee ,  Michael R. Sogard

发明人： Martin E. Lee ,  Michael R. Sogard

IPC分类号： F16C19/00 ,  F16C29/00 ,  F16C32/00 ,  H01L21/68

CPC分类号： H01L21/682 ,  F16C19/00 ,  F16C29/00 ,  F16C32/00 ,  Y10S248/913 ,  Y10T74/20354

摘要： A two-axis stage assembly includes a generally planar horizontally mounted base plate; a stage plate generally parallel to the base plate, the stage plate having a first axis and second orthogonal axis; a set of spaced bearings depending from a bottom surface of said stage plate, the bearings each having an arcuate bottom surface in rocking contact with a facing support surface of the base plate; a joint attached to the bottom surface of the stage plate and pivotably mounting each bearing, the joint being positioned at the center of curvature of the arcuate bottom surface of the associated bearing; and where an axial movement of the stage plate rocks the bearing arcuate bottom surfaces with respect to the facing support surface of the base plate.

摘要翻译： 两轴级组件包括大致平面的水平安装的底板; 大体平行于基板的台板，台板具有第一轴线和第二正交轴线; 一组间隔的轴承，其从所述台板的底面垂直，所述轴承各自具有与所述基板的相对的支撑表面摇摆接触的弓形底表面; 连接在台板的底面上并且可枢转地安装每个轴承的接头，该接头定位在相关轴承的弧形底表面的曲率中心处; 并且其中台板的轴向运动相对于基板的相对的支撑表面摇摆支承弓形底表面。

公开(公告)号：US4425037A

公开(公告)日：1984-01-10

申请号：US378370

申请日：1982-05-14

申请人： Ronald S. Hershel ,  Martin E. Lee

发明人： Ronald S. Hershel ,  Martin E. Lee

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  G03B27/52 ,  G03B27/70

CPC分类号： G03F7/70691 ,  G03F7/70225 ,  G03F9/7026

摘要： The apparatus forms one-to-one reticle images on a wafer. The apparatus includes means for holding a reticle containing an image pattern corresponding to the size of the desired wafer pattern. An illumination system substantially uniformly illuminates the reticle pattern. A one-to-one stationary projection optical system projects an image of the reticle pattern onto a predetermined focal plane. Suitable means such as a vacuum chuck holds the wafer. An alignment system steps and orients a wafer chuck to register markings on the individual dies of the wafer with the projected image of corresponding markings on the reticle. A fluid servo system acts on the chuck to hold at least a portion of the wafer in the predetermined focal plane of the projection optical system.

摘要翻译： 该装置在晶片上形成一对一的掩模版图像。 该装置包括用于保持包含对应于所需晶片图案的尺寸的图像图案的掩模版的装置。 照明系统基本均匀地照射标线图案。 一对一固定投影光学系统将掩模版图案的图像投影到预定焦平面上。 合适的装置如真空吸盘夹持晶片。 对准系统对晶片卡盘进行步骤和定位，以使晶片的各个管芯上的标记与掩模版上相应标记的投影图像对准。 流体伺服系统作用在卡盘上以将晶片的至少一部分保持在投影光学系统的预定焦平面中。

公开(公告)号：US08767172B2

公开(公告)日：2014-07-01

申请号：US12926159

申请日：2010-10-28

申请人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

发明人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70891

摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

摘要翻译： 投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

公开(公告)号：US06882126B2

公开(公告)日：2005-04-19

申请号：US09997144

申请日：2001-11-29

申请人： Douglas C. Watson ,  Mike Binnard ,  Andrew J. Hazelton ,  Martin E. Lee

发明人： Douglas C. Watson ,  Mike Binnard ,  Andrew J. Hazelton ,  Martin E. Lee

IPC分类号： B64C17/06 ,  G05B1/06

CPC分类号： B23Q1/623

摘要： A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20). Additionally, the stage assembly (10) can include a fluid connector (94) that connects the device holder (24) in fluid communication with the device table (20).

摘要翻译： 用于移动和定位装置（26）的平台组件（10）包括装置台（20），保持装置（26）的装置保持器（24）和平台移动器组件（14）。 台架组件（10）包括可以隔离设备保持器24和设备（26）不变形的一个或多个特征。 在一些实施例中，台架组件（10）允许装置（26）在第一位置（42）和第二位置（44）之间精确地旋转，而不影响装置（26）的平坦度，并且不会使装置偏转和变形 （26）。 例如，台架组件（10）可以包括托架（60）和托架连接器组件（62）。 载体（60）被支撑在装置台（20）上方并相对于装置台（20）旋转。 支架连接器组件（62）将装置支架（24）连接到支架（60）上。 此外，台架组件（10）可以包括相对于设备台（20）旋转设备保持器（24）的保持器移动器（120）。 另外，台架组件（10）可以包括流体连接器（94），其连接与装置台（20）流体连通的装置保持器（24）。

公开(公告)号：US06747732B1

公开(公告)日：2004-06-08

申请号：US10611260

申请日：2003-07-02

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： G03B2762

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709 ,  Y10T74/20201

摘要： A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

摘要翻译： 适于在光刻机中支撑掩模版的引导阶段机构包括在基座上沿X-Y方向移动的台。 围绕舞台的是一个矩形的窗框导轨，它通过与固定在底座上的磁道配合的窗框导轨上的电机线圈在两个固定导轨上沿X轴方向驱动。 通过位于与窗框引导件上的磁迹配合的台上的电动机线圈，该平台在Y轴方向上在窗框引导件的内部被驱动。 来自窗框引导件和台架的驱动马达的力通过载物台的重心传递，从而消除不必要的惯性矩。 此外，由驱动马达引起的反作用力与投影透镜和光刻机的对准部分隔离。 这种隔离是通过为舞台独立于其窗框引导件的支撑提供机械支撑来实现的。 窗框引导件是由于连接窗框引导构件的铰链弯曲而能够轻微偏转（旋转）运动的铰链结构。