公开(公告)号：US07781237B2

公开(公告)日：2010-08-24

申请号：US11147114

申请日：2005-06-08

申请人： Gert-Jan Heerens ,  Anastasius Jacobus Anicetus Bruinsma ,  Jacob Fredrik Frisco Klinkhamer ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Hubert Adriaan Van Mierlo ,  Willem Arthur Vliegenthart

发明人： Gert-Jan Heerens ,  Anastasius Jacobus Anicetus Bruinsma ,  Jacob Fredrik Frisco Klinkhamer ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Hubert Adriaan Van Mierlo ,  Willem Arthur Vliegenthart

IPC分类号： G01R31/26 ,  H01L21/66

CPC分类号： G03F9/7065 ,  G03F9/7076 ,  G03F9/7088

摘要： An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.

摘要翻译： 一种装置包括：第一支撑结构，其构造成支撑具有设置有至少一个高度差的对准标记的元件。 该装置还包括对准传感器，该对准传感器包括被配置为提供照射对准标记的光束的光源; 以及至少一个检测器，被配置为通过分析由所述对准标记物反射的光束来检测所述对准标记的所述至少一个高度差。 可以使用这样的装置来相对于第一支撑结构对准元件。

公开(公告)号：US07480028B2

公开(公告)日：2009-01-20

申请号：US11069058

申请日：2005-03-02

申请人： Michael Van Der Veen ,  Anastasius Jacobus Anicetus Bruinsma ,  Henricus Wilhelmus Maria Van Buel ,  Jacob Fredrik Friso Klinkhamer ,  Martinus Hendrikus Antonius Leenders ,  Christianus Gerardus Maria De Mol ,  Hubert Adriaan Van Mierlo

发明人： Michael Van Der Veen ,  Anastasius Jacobus Anicetus Bruinsma ,  Henricus Wilhelmus Maria Van Buel ,  Jacob Fredrik Friso Klinkhamer ,  Martinus Hendrikus Antonius Leenders ,  Christianus Gerardus Maria De Mol ,  Hubert Adriaan Van Mierlo

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F9/7084 ,  G03F7/70425 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7076

摘要： The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.

摘要翻译： 本发明旨在通过将未识别基底上的两个特征之间的测量距离与一个或多个存储的距离进行比较来实现基底识别。 一个或多个存储的距离是在一个或多个基板的设计期间的距离。 通过与测量距离对应的存储距离来识别未识别的底物。 两个特征从可以放置在基板的背面或前侧的多个特征中选择。 提供了用于从基板的背面或前侧读取特征的光学系统。

公开(公告)号：US07177009B2

公开(公告)日：2007-02-13

申请号：US10954654

申请日：2004-10-01

申请人： Jacob Frederik Friso Klinkhamer ,  Anastasius Jacobus Anicetus Bruinsma ,  Martinus Hendrikus Antonius Leenders ,  Hubert Adriaan Van Mierlo

发明人： Jacob Frederik Friso Klinkhamer ,  Anastasius Jacobus Anicetus Bruinsma ,  Martinus Hendrikus Antonius Leenders ,  Hubert Adriaan Van Mierlo

IPC分类号： G03B27/32 ,  G03B27/42

CPC分类号： G03B27/42 ,  G03F9/7084 ,  G03F9/7088

摘要： An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.

摘要翻译： 可以应用本发明的实施例来测量具有传感器的掩模上的对准区域中的特征的位置。 从设计中已知对准区域中的特征的位置。 通过将测量的特征与从设计已知的相对位置进行比较来识别测量位置的特征。 从所识别的特征的测量位置减去识别的特征的已知位置，以给出掩模的位置。

公开(公告)号：US07233384B2

公开(公告)日：2007-06-19

申请号：US11150882

申请日：2005-06-13

申请人： Willem Jurrianus Venema ,  Anastasius Jacobus Anicetus Bruinsma ,  Joeri Lof ,  Eduardus Johannes Gerardus Boon

发明人： Willem Jurrianus Venema ,  Anastasius Jacobus Anicetus Bruinsma ,  Joeri Lof ,  Eduardus Johannes Gerardus Boon

IPC分类号： G03B27/42 ,  G03B27/74 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03F7/70291 ,  G03F7/70516

摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.

摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，投影系统，衬底台和传感器系统。 照明系统提供一束辐射。 独立可控元件的阵列使光束成像。 投影系统将图案化的光束投射到目标平面上，图案化的光束包括辐射点阵列。 衬底台支撑衬底，使得衬底的目标表面基本上与靶平面重合。 传感器系统包括被布置成接收至少一个斑点的检测器元件的阵列。 传感器系统测量该接收点或每个接收点的能量，并提供指示该或每个接收点的能量的输出信号。

公开(公告)号：US20110090495A1

公开(公告)日：2011-04-21

申请号：US12935786

申请日：2009-03-27

申请人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

发明人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

IPC分类号： G01N21/17

CPC分类号： G03F7/70916 ,  G01N21/94 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70941

摘要： A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

摘要翻译： 光刻设备包括：容器，其包围具有待探测以用于污染控制的测试表面的部件; 以及被配置为发送和接收光学探测光束的光学探针。 该容器包括被配置为将光学探测光束传送到测试表面的第一光学端口和被配置为接收反射光学探测光束的第二光学端口。 光探头包括被配置为提供光学探测光束的光源，被配置为向探测光束提供预定极化状态的偏振光学调节器和光谱分析器。 偏振调节器被预设为为最小传输波长提供最小的传输，并且频谱分析仪布置成响应于由于污染的存在而导致的偏振变化来检测最小传输波长的波长偏移。

公开(公告)号：US20100265484A1

公开(公告)日：2010-10-21

申请号：US12809730

申请日：2008-12-22

申请人： Peter Gerhardus Wilhelmus Bussink ,  Anastasius Jacobus Anicetus Bruinsma ,  Hendricus Johannes Maria Meijer

发明人： Peter Gerhardus Wilhelmus Bussink ,  Anastasius Jacobus Anicetus Bruinsma ,  Hendricus Johannes Maria Meijer

IPC分类号： G03B27/72

CPC分类号： G03F9/7034 ,  G03F9/7003

摘要： A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.

摘要翻译： 一种光刻设备，被配置为将图案化的辐射束投影到基底上。 该装置包括被配置为保持图案化物体的支撑件和被配置为检测存在于图案化物体的用户区域上的用户区域结构的取向和/或密度的测量系统。

公开(公告)号：US07280228B2

公开(公告)日：2007-10-09

申请号：US10882685

申请日：2004-07-02

申请人： Gerrit Johannes Nijmeijer ,  Anastasius Jacobus Anicetus Bruinsma ,  Christiaan Alexander Hoogendam ,  Jeroen Thomas Broekhuijse ,  Sigurd Dressler ,  Edwin Eduard Nicolaas Josephus Krijnen ,  Robbert Edgar Van Leeuwen ,  Roeland Nicolaas Maria Vanneer ,  Cornelis Christiaan Ottens

发明人： Gerrit Johannes Nijmeijer ,  Anastasius Jacobus Anicetus Bruinsma ,  Christiaan Alexander Hoogendam ,  Jeroen Thomas Broekhuijse ,  Sigurd Dressler ,  Edwin Eduard Nicolaas Josephus Krijnen ,  Robbert Edgar Van Leeuwen ,  Roeland Nicolaas Maria Vanneer ,  Cornelis Christiaan Ottens

IPC分类号： G01B11/14

CPC分类号： G03F9/7088 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F9/7015 ,  G03F9/7096 ,  H01L21/682

摘要： A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.

摘要翻译： 光刻设备包括测量系统，该测量系统包括至少一个光学部件和至少一个电气部件。 电气部件被配置为散热。 光学部件安装在设备的第一框架上，并且电气部件安装在与第一框架热和机械分离的设备的第二框架上。 在第一框架和第二框架之间设置光耦合器。

公开(公告)号：US08514368B2

公开(公告)日：2013-08-20

申请号：US12809730

申请日：2008-12-22

申请人： Peter Gerhardus Wilhelmus Bussink ,  Anastasius Jacobus Anicetus Bruinsma ,  Hendricus Johannes Maria Meijer

发明人： Peter Gerhardus Wilhelmus Bussink ,  Anastasius Jacobus Anicetus Bruinsma ,  Hendricus Johannes Maria Meijer

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F9/7034 ,  G03F9/7003

摘要： A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.

摘要翻译： 一种光刻设备，被配置为将图案化的辐射束投影到基底上。 该装置包括被配置为保持图案化物体的支撑件和被配置为检测存在于图案化物体的用户区域上的用户区域结构的取向和/或密度的测量系统。

公开(公告)号：US07342644B2

公开(公告)日：2008-03-11

申请号：US11023628

申请日：2004-12-29

申请人： Johannes Jacobus Matheus Baselmans ,  Anastasius Jacobus Anicetus Bruinsma ,  Pieter Willem Herman De Jager ,  Robert-Han Munnig Schmidt ,  Henri Johannes Petrus Vink

发明人： Johannes Jacobus Matheus Baselmans ,  Anastasius Jacobus Anicetus Bruinsma ,  Pieter Willem Herman De Jager ,  Robert-Han Munnig Schmidt ,  Henri Johannes Petrus Vink

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/7005

摘要： A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.

摘要翻译： 光刻照明装置和方法包括从多个对应的辐射源接收多个源辐射束，沿着公共光束路径偏转多个源辐射束，从而产生投影辐射束，将辐射束投射到 横截面图案，以及将图案化的投影辐射束投影到基板的目标部分上。

公开(公告)号：US07148494B2

公开(公告)日：2006-12-12

申请号：US11022593

申请日：2004-12-29

申请人： Anastasius Jacobus Anicetus Bruinsma ,  Frank Staals ,  Robert Jan Van Wijk ,  Stoyan Nihtianov

发明人： Anastasius Jacobus Anicetus Bruinsma ,  Frank Staals ,  Robert Jan Van Wijk ,  Stoyan Nihtianov

IPC分类号： A61N5/00

CPC分类号： G01B17/00 ,  G01S15/46 ,  G03F9/7034

摘要： The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, such that the signal is at least partially reflected by the substrate to render a reflected signal. The receiver is arranged to receive at least part of the reflected signal, and the level sensor is arranged to determine the surface height of the substrate with respect to the level sensor based on the emitted and received signal. The signal includes a pressure wave.

摘要翻译： 本发明涉及一种用于确定基板表面高度的光刻设备中的液位传感器。 电平传感器包括发射器和接收器，其中发射器布置成发射指向衬底表面上的预定位置的信号，使得信号至少部分地被衬底反射以产生反射信号。 接收器布置成接收反射信号的至少一部分，并且液位传感器被布置成基于发射和接收的信号来确定基板相对于液位传感器的表面高度。 信号包括压力波。