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公开(公告)号：US20170338618A1
公开(公告)日：2017-11-23
申请号：US15671572
申请日：2017-08-08
发明人： Weihua JIANG , Hiroshi UMEDA , Hakaru MIZOGUCHI , Takashi MATSUNAGA , Hiroaki TSUSHIMA , Tomoyuki OHKUBO
CPC分类号： H01S3/09702 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08009 , H01S3/0971 , H01S3/10069 , H01S3/134 , H01S3/225
摘要： A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.
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公开(公告)号：US20150028231A1
公开(公告)日：2015-01-29
申请号：US14455685
申请日：2014-08-08
申请人： GIGAPHOTON INC
CPC分类号： H05G2/008 , H01S3/0064 , H01S3/0315 , H01S3/038 , H01S3/041 , H01S3/0971 , H01S3/2232 , H01S3/2316 , H01S3/2366 , H05G2/005
摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier provided in a beam path of the laser beam, at least one saturable absorber gas cell provided downstream from the at least one amplifier and configured to contain a saturable absorber gas for absorbing a part of the laser beam, the part of the laser beam having a beam intensity equal to or lower than a predetermined beam intensity, a fan provided in the saturable absorber gas cell and configured to cause the saturable absorber gas to circulate, and a heat exchanger provided in the saturable absorber gas cell and configured to cool the saturable absorber gas.
摘要翻译： 激光装置可以包括被配置为输出激光束的主振荡器，设置在激光束的光束路径中的至少一个放大器，设置在至少一个放大器的下游的至少一个饱和吸收器气体单元，并且被配置为包含可饱和 用于吸收激光束的一部分的吸收气体，所述激光束的一部分具有等于或小于预定光束强度的光束强度;风扇，设置在所述可饱和吸收器气体单元中并且构造成使所述饱和吸收剂气体循环 以及设置在可饱和吸收器气体电池中并且构造成冷却可饱和吸收剂气体的热交换器。
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公开(公告)号：US20130319466A1
公开(公告)日：2013-12-05
申请号：US13907818
申请日：2013-05-31
申请人： GIGAPHOTON INC
发明人： Hakaru MIZOGUCHI , Shinji NAGAI
IPC分类号： G03F7/20
CPC分类号： G03F7/70925
摘要： A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.
摘要翻译： EUV发光装置的清洁方法可以包括：关闭连接部分，使得当不产生EUV光时，室内部和曝光装置的内部不通信，提供用于蚀刻积聚在 在连接部分关闭的状态下将光学元件的反射表面连接到室内部，并且在供应蚀刻剂气体的同时使用排气装置排出室内部。
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公开(公告)号：US20190037677A1
公开(公告)日：2019-01-31
申请号：US16137312
申请日：2018-09-20
申请人： Gigaphoton Inc.
IPC分类号： H05G2/00 , H01S3/00 , H01S3/23 , H01S3/223 , H01S3/16 , H01S3/11 , H01S3/104 , H01S3/09 , H01S3/102
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20180110116A1
公开(公告)日：2018-04-19
申请号：US15832476
申请日：2017-12-05
申请人： Gigaphoton Inc.
IPC分类号： H05G2/00 , H01S3/00 , H01S3/23 , H01S3/223 , H01S3/16 , H01S3/11 , H01S3/104 , H01S3/09 , H01S3/102
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20150264793A1
公开(公告)日：2015-09-17
申请号：US14724737
申请日：2015-05-28
申请人： GIGAPHOTON INC.
IPC分类号： H05G2/00
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
摘要翻译： 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。
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公开(公告)号：US20190252846A1
公开(公告)日：2019-08-15
申请号：US16396072
申请日：2019-04-26
发明人： Weihua JIANG , Hiroshi UMEDA , Hakaru MIZOGUCHI , Takashi MATSUNAGA , Hiroaki TSUSHIMA , Tomoyuki OHKUBO
CPC分类号： H01S3/09702 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08009 , H01S3/0971 , H01S3/10069 , H01S3/134 , H01S3/225
摘要： A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.
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公开(公告)号：US20160128172A1
公开(公告)日：2016-05-05
申请号：US14992506
申请日：2016-01-11
申请人： GIGAPHOTON INC
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20150102239A1
公开(公告)日：2015-04-16
申请号：US14578141
申请日：2014-12-19
申请人： GIGAPHOTON INC.
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , G03F7/70033 , H05G2/005
摘要： The extreme ultraviolet light generation system may be configured to irradiate a target with a first pulse laser beam and a second pulse laser beam to turn the target into plasma thereby generating extreme ultraviolet light. The system may include a chamber having at least one aperture configured to introduce the first pulse laser beam and the second pulse laser beam; a target supply device configured to supply the target to a predetermined region in the chamber; a first laser apparatus configured to output the first pulse laser beam with which the target in the chamber is to be irradiated, the first pulse laser beam having pulse duration less than 1 ns; and a second laser apparatus configured to output the second pulse laser beam with which the target which has been irradiated with the first pulse laser beam is to be further irradiated.
摘要翻译： 远紫外线发生系统可以被配置为用第一脉冲激光束和第二脉冲激光束照射目标物，以将靶转化成等离子体，从而产生极紫外光。 该系统可以包括具有配置成引入第一脉冲激光束和第二脉冲激光束的至少一个孔的腔室; 目标供给装置，被配置为将所述目标物供给到所述室中的预定区域; 第一激光装置，被配置为输出要照射所述室中的靶的所述第一脉冲激光束，所述脉冲持续时间小于1ns的所述第一脉冲激光束; 以及第二激光装置，被配置为输出要被进一步照射已经被第一脉冲激光束照射的靶的第二脉冲激光束。
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公开(公告)号：US20190141826A1
公开(公告)日：2019-05-09
申请号：US16221699
申请日：2018-12-17
申请人： Gigaphoton Inc.
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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