公开(公告)号：US5811754A

公开(公告)日：1998-09-22

申请号：US444871

申请日：1995-05-19

申请人： Hajime Nakatani ,  Atsushi Sugitatsu ,  Masao Izumo ,  Tadao Minagawa ,  Yasushi Minamitani ,  Yoshifumi Matsushita ,  Toshinori Yagi ,  Nobuyuki Zumoto

发明人： Hajime Nakatani ,  Atsushi Sugitatsu ,  Masao Izumo ,  Tadao Minagawa ,  Yasushi Minamitani ,  Yoshifumi Matsushita ,  Toshinori Yagi ,  Nobuyuki Zumoto

IPC分类号： H05K3/00 ,  H05K3/46 ,  B23K26/02

CPC分类号： B23K26/046 ,  B23K26/04 ,  B23K26/043 ,  B23K26/048 ,  B23K26/066 ,  H05K3/0026 ,  H05K2203/056

摘要： An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

公开(公告)号：US5305339A

公开(公告)日：1994-04-19

申请号：US793430

申请日：1991-12-17

申请人： Hajime Nakatani ,  Atsushi Sugitatsu ,  Yasushi Minamitani

发明人： Hajime Nakatani ,  Atsushi Sugitatsu ,  Yasushi Minamitani

IPC分类号： H01S3/0971 ,  H01S3/00

CPC分类号： H01S3/0971

摘要： By dissipating a reverse voltage energy occurring on the pulse generation capacitor (4) of a pulse laser apparatus through the diode (11) connected in parallel with this pulse generation capacitor (4), arc or streamer becomes not occurring, and hence the lifetime of the main discharge electrodes become long and a high-repetition rate oscillation becomes possible.

摘要翻译： PCT No.PCT / JP91 / 00152 Sec。 371 1991年12月17日第 102（e）1991年12月17日PCT 1991年2月8日PCT。通过与该脉冲并联连接的二极管（11）消散在脉冲激光装置的脉冲发生电容器（4）上产生的反向电压能量 发电电容器（4）不会发生电弧或流光，因此主放电电极的寿命变长，高重复率振荡成为可能。

公开(公告)号：US5243614A

公开(公告)日：1993-09-07

申请号：US795793

申请日：1991-11-21

申请人： Hitoshi Wakata ,  Atsushi Sugitatsu ,  Hajime Nakatani ,  Yasushi Minamitani

发明人： Hitoshi Wakata ,  Atsushi Sugitatsu ,  Hajime Nakatani ,  Yasushi Minamitani

IPC分类号： G01J1/44 ,  G01J3/26 ,  H01S3/137 ,  H01S3/225

CPC分类号： G01J3/02 ,  G01J3/0237 ,  G01J3/26 ,  H01S3/137 ,  G01J2001/4493 ,  G01J2003/265 ,  H01S3/225

摘要： A wavelength monitor/stabilizer for narrowly controlling the bandwidth of laser; the monitor/stabilizer uses parameters Q, F or G derived by measuring diameters of interference fringes given by the beam of the wavelength-controlled narrow bandwidth laser e.g. excimer laser and those given by the reference light e.g. of a mercury lamp. The controlling is made by controlling the parameter to be in a predetermined range. An image sensing unit for detecting the interference fringes are splitted into plural image sensors with adjustable distance for enabling more rapid measurement by skipping the in-between part.

摘要翻译： 用于狭窄控制激光带宽的波长监视器/稳定器; 监视器/稳定器使用通过测量由波长控制的窄带宽激光束的波束给出的干涉条纹的直径导出的参数Q，F或G，例如 准分子激光和由参考光给出的那些。 的水银灯。 通过将参数控制在预定范围内来进行控制。 用于检测干涉条纹的图像感测单元被分割成具有可调节距离的多个图像传感器，以通过跳过中间部分来实现更快速的测量。

公开(公告)号：US5661744A

公开(公告)日：1997-08-26

申请号：US512710

申请日：1995-08-08

申请人： Kazuyuki Murakami ,  Hajime Nakatani ,  Atsushi Sugitatsu ,  Tadao Minagawa ,  Toshinori Yagi ,  Keiko Ito

发明人： Kazuyuki Murakami ,  Hajime Nakatani ,  Atsushi Sugitatsu ,  Tadao Minagawa ,  Toshinori Yagi ,  Keiko Ito

IPC分类号： B23K26/38 ,  H05K3/00 ,  H05K3/46 ,  H01S3/22 ,  H01S3/223

CPC分类号： B23K26/083 ,  B23K26/066

摘要： An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby allowing the workpiece to be scanned with the excimer laser beam. The workpiece can be processed uniformly and stably in accordance with a pattern of the patterning mask with high accuracy and reliability.

摘要翻译： 即使准分子激光束的强度分布发生多次反射也能够用准分子照射光束最佳地处理工件的准分子激光束照射装置是不均匀的。 图形掩模具有用于允许准分子激光束通过的透光部分和用于反射它的反射层。 与反射层相对设置的高反射率反射镜将从反射层反射的准分子激光束朝向图案掩模反射。 成像透镜将通过图案化掩模透射的准分子激光束的图案成像到工件上以进行照射。 工件移动机构和掩模移动机构分别移动工件和掩模移动机构。 控制单元控制工件移动机构和掩模移动机构，使得图案掩模和工件沿着与准分子激光束在位置上移动的方向一致的扫描移动方向沿同一轴线同步地移位，同时 在图案掩模和反射装置之间被反射，从而允许用准分子激光束扫描工件。 可以以高精度和可靠性根据图案化掩模的图案均匀且稳定地加工工件。

公开(公告)号：US5347531A

公开(公告)日：1994-09-13

申请号：US752573

申请日：1991-10-02

申请人： Hajime Nakatani ,  Atsushi Sugitatsu

发明人： Hajime Nakatani ,  Atsushi Sugitatsu

IPC分类号： H01S3/038 ,  H01S3/0971 ,  H01S3/097

CPC分类号： H01S3/09716 ,  H01S3/0385 ,  H01S3/0384

摘要： This invention relates to a transverse discharge pumping type pulse laser oscillating device including an electron capturing gas, especially to the configuration of preliminary ionization electrodes (4a, 4b, 8a, 8b). A transverse discharge exciting type pulse laser oscillating device according to this invention has preliminary ionization parts such that the dominant parts of corona discharge are directed to the part between main electrodes (1,2) and the developing lengths (1) of the corona discharge are long. The long developing lengths (1) increase the quantity of emitted ultraviolet rays and the electrodes (4a, 4b, 8a, 8b) are so arranged that the air between the main electrodes (1,2) is irradiated with ultraviolet rays emitted from near the initiating regions of the corona discharge, the initiating regions emitting light whose intensity is greater than those of other regions in the corona discharges. Thereby, a homogeneous main discharge is obtained and the efficiency of the laser oscillation is improved.

摘要翻译： PCT No.PCT / JP91 / 00159 Sec。 371日期1991年10月2日 102（e）1991年10月2日PCT PCT 1991年2月8日PCT公布。 出版物WO92 / 14285 本发明涉及包括电子捕获气体的横向放电泵浦型脉冲激光振荡装置，特别涉及初步电离电极（4a，4b，8a，8b）的构型。 根据本发明的横向放电励磁型脉冲激光振荡装置具有初步电离部分，使得电晕放电的主要部分被引导到主电极（1,2）和电晕放电的显影长度（1）之间的部分 长。 长显影长度（1）增加发射紫外线的量，并且电极（4a，4b，8a，8b）被布置成使得主电极（1,2）之间的空气被照射在从 启动电晕放电的区域，起始区域发射强度大于电晕放电中其他区域的光强度的光。 由此，得到均匀的主放电，提高了激光振荡的效率。

公开(公告)号：US5090021A

公开(公告)日：1992-02-18

申请号：US523688

申请日：1990-05-15

申请人： Hajime Nakatani ,  Atsushi Sugitatsu

发明人： Hajime Nakatani ,  Atsushi Sugitatsu

IPC分类号： H01S3/097 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/225

CPC分类号： H01S3/09713 ,  H01S3/038 ,  H01S3/0384 ,  H01S3/225

摘要： A discharge exciting pulse laser device such as an exima laser device. The laser device is capable of accelerating the timing of rise of the voltage between an auxiliary electrode and one of main electrodes without decreasing a discharge start voltage between the main electrodes, so that the laser output power is increased and the laser oscillation efficiency is improved.

公开(公告)号：US08915602B2

公开(公告)日：2014-12-23

申请号：US13516895

申请日：2009-12-18

申请人： Atsushi Sugitatsu

发明人： Atsushi Sugitatsu

IPC分类号： F21V9/14 ,  G02B6/42

CPC分类号： G02B6/4246 ,  G02B6/4204 ,  G02B6/4208 ,  G02B6/4214 ,  G02B6/4215

摘要： An optical module includes a casing, a first light output unit that is fixed to the casing and generates a first light signal, a second light output unit that is fixed to the casing while an angle thereof is set to be different from that of the first light output unit and generates a second light signal having a wavelength different from that of the first light signal, a first branching filter that refracts at least any one of the first light signal and the second light signal so that optical axes of the first light signal and the second light signal are partially overlapped, and one isolator that is located at a portion where optical axes of the first light signal and the second light signal are overlapped and performs isolation on the first light signal and the second light signal.

摘要翻译： 光学模块包括壳体，固定到壳体并产生第一光信号的第一光输出单元，固定到壳体的第二光输出单元，其角度被设定为与第一光信号的角度不同 光输出单元并产生具有与第一光信号不同的波长的第二光信号;第一分路滤波器，折射第一光信号和第二光信号中的至少一个，使得第一光信号的光轴 并且所述第二光信号部分地重叠，并且一个隔离器位于所述第一光信号和所述第二光信号的光轴重叠并对所述第一光信号和所述第二光信号执行隔离的部分。

公开(公告)号：US07390683B2

公开(公告)日：2008-06-24

申请号：US11375016

申请日：2006-03-15

申请人： Atsushi Sugitatsu ,  Hitoshi Tada ,  Susumu Noda

发明人： Atsushi Sugitatsu ,  Hitoshi Tada ,  Susumu Noda

IPC分类号： H01L21/00

CPC分类号： H01S5/0425 ,  B82Y20/00 ,  G02B6/12004 ,  G02B6/1225 ,  G02F1/025 ,  G02F2202/32 ,  H01L2933/0083 ,  H01S5/0424 ,  H01S5/105 ,  H01S5/1085 ,  H01S5/2004 ,  H01S5/3054 ,  H01S5/32

摘要： A semiconductor device has a two-dimensional slab photonic crystal structure in which a substrate supports a sheet-like slab layer including, sequentially stacked, a lower cladding layer, an active layer, and an upper cladding layer. A periodic refractive index profile structure, in surfaces of the stacked layers, introduces a linear defect region that serves as a waveguide. A p-type region and an n-type region in the slab layer define a pn junction surface at a predetermined angle with respect to the surfaces of the stacked layers in the slab layer.

摘要翻译： 半导体器件具有二维平板光子晶体结构，其中基板支撑包括顺序堆叠的下包层，有源层和上包层的片状板层。 在堆叠层的表面中的周期性折射率分布结构引入用作波导的线性缺陷区域。 板状层中的p型区域和n型区域相对于板坯层中的堆叠层的表面以预定的角度限定pn结表面。

公开(公告)号：US20050018734A1

公开(公告)日：2005-01-27

申请号：US10897004

申请日：2004-07-23

申请人： Atsushi Sugitatsu ,  Susumu Noda

发明人： Atsushi Sugitatsu ,  Susumu Noda

IPC分类号： G02B6/12 ,  H01S3/10 ,  H01S5/00 ,  H01S5/026 ,  H01S5/22 ,  H01S5/343 ,  H01S5/50

CPC分类号： H01S5/0265 ,  B82Y20/00 ,  H01S3/10076 ,  H01S5/101 ,  H01S5/34306 ,  H01S5/50 ,  H01S5/5045

摘要： In an optical device, a slab layer includes an active layer sandwiched between cladding layers. The slab layer has a periodic refractive index profile structure in a two-dimensional plane, as a two-dimensional slab photonic crystal structure, and a linear defect region serving as a waveguide in the periodic refractive index profile structure. Regions having different widths of the waveguides, as segments of the waveguide, are connected in series.

摘要翻译： 在光学装置中，平板层包括夹在包层之间的有源层。 板状层在二维平面中具有周期性折射率分布结构，作为二维平板光子晶体结构，以及在周期性折射率分布结构中用作波导的线性缺陷区域。 作为波导段的波导宽度不同的区域串联连接。

公开(公告)号：US08395765B2

公开(公告)日：2013-03-12

申请号：US13315678

申请日：2011-12-09

申请人： Keita Mochizuki ,  Hiroshi Aruga ,  Atsushi Sugitatsu

发明人： Keita Mochizuki ,  Hiroshi Aruga ,  Atsushi Sugitatsu

IPC分类号： G01J1/42

CPC分类号： H01S5/4025 ,  H01S5/0014 ,  H01S5/0071 ,  H01S5/0687

摘要： In a wavelength monitor that monitors a wavelength of laser light emitted from at least two semiconductor lasers formed in parallel on a semiconductor substrate, the wavelength monitor includes a collimating lens that collimates laser light from each of the semiconductor lasers, an etalon that is arranged so that laser light collimated by the collimating lens is capable of entering and has a periodicity, and a photodetector that receives laser light transmitted through the etalon and detects a light intensity, wherein a beam propagation angle in the etalon of laser light emitted from each of the semiconductor lasers becomes a predetermined angle obtained by formula 1.

摘要翻译： 在监测从在半导体衬底上平行形成的至少两个半导体激光器发射的激光的波长的波长监视器中，波长监视器包括准直透镜，其准直来自每个半导体激光器的激光，所述标准具被布置成 由准直透镜准直的激光能够进入并具有周期性;以及光电检测器，其接收通过标准具透射的激光并检测光强度，其中从每个发射的激光的标准具中的光束传播角度 半导体激光器成为由公式1得到的预定角度。