公开(公告)号：US20200001427A1

公开(公告)日：2020-01-02

申请号：US16448980

申请日：2019-06-21

申请人： Hari Soundararajan ,  Shou-Sung Chang ,  Haosheng Wu ,  Jianshe Tang ,  Jeonghoon Oh ,  Rajeev Bajaj ,  Andrew Siordia

发明人： Hari Soundararajan ,  Shou-Sung Chang ,  Haosheng Wu ,  Jianshe Tang ,  Jeonghoon Oh ,  Rajeev Bajaj ,  Andrew Siordia

IPC分类号： B24B37/015 ,  B24B57/02 ,  B24B37/20

摘要： A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a dispenser to supply a polishing liquid to the polishing surface, and a temperature control system including a body configured to contact the polishing surface or the polishing liquid on the polishing surface. The body supports a thermal control module positioned over the polishing pad.

公开(公告)号：US20200001426A1

公开(公告)日：2020-01-02

申请号：US16448874

申请日：2019-06-21

申请人： Hari Soundararajan ,  Shou-Sung Chang ,  Haosheng Wu ,  Jianshe Tang ,  Jeonghoon Oh ,  Rajeev Bajaj ,  Andrew Siordia

发明人： Hari Soundararajan ,  Shou-Sung Chang ,  Haosheng Wu ,  Jianshe Tang ,  Jeonghoon Oh ,  Rajeev Bajaj ,  Andrew Siordia

IPC分类号： B24B37/015 ,  B24B37/20 ,  B24B37/27 ,  G05D23/24

摘要： A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a dispenser to supply a polishing liquid to the polishing surface, and a temperature control system. The temperature control system includes a plurality of thermal control modules positioned above the polishing pad at a plurality of different radial positions to heat or cool a plurality of regions of the polishing pad. Each thermal control module is configured to independently heat or cool a radial region of the polishing pad.

公开(公告)号：US20130192761A1

公开(公告)日：2013-08-01

申请号：US13754733

申请日：2013-01-30

申请人： Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

发明人： Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

IPC分类号： C23C16/54 ,  B05C13/00

CPC分类号： C23C16/54 ,  B05C13/00 ,  C23C16/45551

摘要： A substrate processing system for processing multiple substrates is provided and generally includes at least one processing platform and at least one staging platform. Each substrate is positioned on a substrate carrier disposed on a substrate support assembly. Multiple substrate carriers, each is configured to carry a substrate thereon, are positioned on the surface of the substrate support assembly. The processing platform and the staging platform, each includes a separate substrate support assembly, which can be rotated by a separate rotary track mechanism. Each rotary track mechanism is capable of supporting the substrate support assembly and continuously rotating multiple substrates carried by the substrate carriers and disposed on the substrate support assembly. Each substrate is thus processed through at least one shower head station and at least one buffer station, which are positioned at a distance above the rotary track mechanism of the processing platform. Each substrate can be transferred between the processing platform and the staging platform and in and out the substrate processing system.

摘要翻译： 提供了一种用于处理多个基板的基板处理系统，并且通常包括至少一个处理平台和至少一个分段平台。 每个衬底位于设置在衬底支撑组件上的衬底载体上。 多个衬底载体，每个被配置为在其上承载衬底，位于衬底支撑组件的表面上。 处理平台和分段平台各自包括单独的基板支撑组件，其可以通过单独的旋转轨道机构旋转。 每个旋转轨道机构能够支撑基板支撑组件并且连续旋转由基板载体承载并且设置在基板支撑组件上的多个基板。 因此，每个基板通过至少一个淋浴喷头站和至少一个缓冲站进行处理，所述至少一个缓冲站位于处理平台的旋转轨道机构上方的距离处。 每个基板可以在处理平台和分段平台之间传送并进出基板处理系统。

公开(公告)号：US08454413B2

公开(公告)日：2013-06-04

申请号：US11614940

申请日：2006-12-21

申请人： Jeonghoon Oh ,  Tsz-Sin Siu ,  Hung Chih Chen ,  Andrew J. Nagengast ,  Steven M. Zuniga ,  Thomas B. Brezoczky

发明人： Jeonghoon Oh ,  Tsz-Sin Siu ,  Hung Chih Chen ,  Andrew J. Nagengast ,  Steven M. Zuniga ,  Thomas B. Brezoczky

IPC分类号： B24B41/06

CPC分类号： B24B37/30 ,  B24B41/06 ,  B29C33/424 ,  B29C35/02 ,  B29K2023/00 ,  B29K2083/00 ,  B29K2995/0074 ,  B29L2031/755

摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.

摘要翻译： 用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到 基座组件。 翼片的至少一个表面具有表面纹理以防止粘附。

公开(公告)号：US07727055B2

公开(公告)日：2010-06-01

申请号：US11741692

申请日：2007-04-27

申请人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

发明人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

IPC分类号： B24B5/35

CPC分类号： B24B37/30 ,  Y10T428/24174 ,  Y10T428/24182

摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge and an annular recess above the hinge along the outer wall of the outer annular portion.

摘要翻译： 描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。 柔性膜具有主要部分和外部环形部分，其中主要部分和外部环形部分之间的接合处包括周边边缘铰链和沿着外部环形部分的外壁的铰链上方的环形凹部。

公开(公告)号：US20100062694A1

公开(公告)日：2010-03-11

申请号：US12206338

申请日：2008-09-08

申请人： Jin Yi ,  Jeonghoon Oh ,  Hung Chih Chen ,  Samuel Chu-Chiang Hsu

发明人： Jin Yi ,  Jeonghoon Oh ,  Hung Chih Chen ,  Samuel Chu-Chiang Hsu

IPC分类号： B24B5/00 ,  B24B47/02

CPC分类号： B24B37/32

摘要： One embodiment provides a retaining ring assembly. The retaining ring assembly comprises a retaining ring configured to circumferentially surround and retain the substrate within an inner surface of the retaining ring, and a flexure coupled to the retaining ring. The flexure is configured to maintain a gap between an inner surface of a carrier ring and an outer surface of the retaining ring, and the carrier ring is circumferentially surrounding the retaining ring.

摘要翻译： 一个实施例提供一种保持环组件。 保持环组件包括保持环，所述保持环被构造成周向地围绕并保持在保持环的内表面内的基板，以及耦合到保持环的挠曲件。 挠曲构造成在承载环的内表面和保持环的外表面之间保持间隙，并且承载环周向围绕保持环。

公开(公告)号：US07503837B2

公开(公告)日：2009-03-17

申请号：US11682257

申请日：2007-03-05

申请人： Jeonghoon Oh ,  Hung Chih Chen ,  Thomas B. Brezoczky ,  Douglas R. McAllister ,  David Datong Huo

发明人： Jeonghoon Oh ,  Hung Chih Chen ,  Thomas B. Brezoczky ,  Douglas R. McAllister ,  David Datong Huo

IPC分类号： B24B29/00

CPC分类号： B24B37/32

摘要： A two part retaining ring is described that has a lower ring and an upper ring. The lower ring contacts a polishing surface during chemical mechanical polishing. The upper surface and the lower surface of the lower ring have thick and thin subportions to increase the flexibility of the lower ring.

摘要翻译： 描述了具有下环和上环的两部分保持环。 在化学机械抛光期间，下环接触抛光表面。 下环的上表面和下表面具有厚而薄的子部分，以增加下环的柔性。

公开(公告)号：US20080196833A1

公开(公告)日：2008-08-21

申请号：US12049650

申请日：2008-03-17

申请人： Hung Chih Chen ,  Steven M. Zuniga ,  Charles C. Garretson ,  Douglas R. McAllister ,  Jian Lin ,  Stacy Meyer ,  Sidney P. Huey ,  Jeonghoon Oh ,  Trung T. Doan ,  Jeffrey Schmidt ,  Martin S. Wohlert ,  Kerry F. Hughes ,  James C. Wang ,  Danny Cam Toan Lu ,  Romain Beau De Lamenie ,  Venkata R. Balagani ,  Aden Martin Allen ,  Michael Jon Fong

发明人： Hung Chih Chen ,  Steven M. Zuniga ,  Charles C. Garretson ,  Douglas R. McAllister ,  Jian Lin ,  Stacy Meyer ,  Sidney P. Huey ,  Jeonghoon Oh ,  Trung T. Doan ,  Jeffrey Schmidt ,  Martin S. Wohlert ,  Kerry F. Hughes ,  James C. Wang ,  Danny Cam Toan Lu ,  Romain Beau De Lamenie ,  Venkata R. Balagani ,  Aden Martin Allen ,  Michael Jon Fong

IPC分类号： H01L21/306 ,  B24B1/00

CPC分类号： B24B37/32 ,  Y10T29/49815

摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

摘要翻译： 保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。 保持环的底面可以包括平坦的，倾斜的和弯曲的部分。 可以使用专用于研磨保持环底面的机器进行研磨。 在研磨期间，可以允许环围绕环的轴线自由旋转。 保持环的底面可以具有弯曲或平坦的部分。

公开(公告)号：US20070289124A1

公开(公告)日：2007-12-20

申请号：US11757069

申请日：2007-06-01

申请人： Jeonghoon Oh ,  Andrew Nagengast ,  Steven M. Zuniga ,  Hung Chih Chen

发明人： Jeonghoon Oh ,  Andrew Nagengast ,  Steven M. Zuniga ,  Hung Chih Chen

IPC分类号： H05K13/04

CPC分类号： H01L21/6838 ,  B24B37/30 ,  H01L21/67005 ,  Y10T29/5313 ,  Y10T279/11

摘要： The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.

摘要翻译： 本发明涉及一种用于改善和加速基板加载过程的装置和方法。 一个实施例提供了用于真空吸附衬底的方法。 该方法包括将配置用于安装衬底的柔性膜的中心室排出，移动衬底，使得衬底的背面与柔性膜完全接触，并且抽真空中心室以将衬底的背面真空吸附到 柔性膜。

公开(公告)号：US20070197146A1

公开(公告)日：2007-08-23

申请号：US11682257

申请日：2007-03-05

申请人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

发明人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

IPC分类号： B24B29/00 ,  B24B5/00 ,  B24B21/00

CPC分类号： B24B37/32

摘要： A two part retaining ring is described that has a lower ring and an upper ring. The lower ring contacts a polishing surface during chemical mechanical polishing. The upper surface and the lower surface of the lower ring have thick and thin subportions to increase the flexibility of the lower ring.

摘要翻译： 描述了具有下环和上环的两部分保持环。 在化学机械抛光期间，下环接触抛光表面。 下环的上表面和下表面具有厚而薄的子部分，以增加下环的柔性。