公开(公告)号：US06459763B1

公开(公告)日：2002-10-01

申请号：US09744304

申请日：2001-03-26

申请人： Hideomi Koinuma ,  Masashi Kawasaki ,  Kazuhiko Omote ,  Tetsuo Kikuchi

发明人： Hideomi Koinuma ,  Masashi Kawasaki ,  Kazuhiko Omote ,  Tetsuo Kikuchi

IPC分类号： G01N2320

CPC分类号： G01N23/207 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00659 ,  B01J2219/00689 ,  B01J2219/00707 ,  B01J2219/00756

摘要： A combinatorial X-ray diffractor, particularly a combinatorial X-ray diffractor which can measure one row of samples among a plurality of samples arranged into a matrix simultaneously by X-ray diffraction. For the purpose of high throughput screening, a plurality of samples (10) are arranged into a row X1, a row X2, a row X3, and a row X4 on a sample stage and samples in each row are measured simultaneously by X-ray diffraction, measured data are processed by an information processor (20), information data useful for the evaluation of thin film material are automatically extracted and arranged and the extracted and arranged information data are displayed on a display apparatus (27).

摘要翻译： 组合X射线衍射器，特别是组合X射线衍射器，其可以通过X射线衍射同时测量排列成矩阵的多个样本中的一行样本。 为了高通量筛选的目的，将多个样品（10）排列在样品台上的行X1，行X2，行X3和行X4中，并且通过X射线同时测量每行中的样品 衍射，测量数据由信息处理器（20）处理，自动提取和布置用于评估薄膜材料的信息数据，并将提取和排列的信息数据显示在显示装置（27）上。

公开(公告)号：US06970532B2

公开(公告)日：2005-11-29

申请号：US09852111

申请日：2001-05-09

申请人： Seiichi Hayashi ,  Jimpei Harada ,  Tetsuo Kikuchi ,  Kazuhiko Omote ,  Katsuhiko Inaba

发明人： Seiichi Hayashi ,  Jimpei Harada ,  Tetsuo Kikuchi ,  Kazuhiko Omote ,  Katsuhiko Inaba

IPC分类号： G01B15/02 ,  G01N23/20

CPC分类号： C23C14/545 ,  G01B15/02

摘要： The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.

摘要翻译： 用于在设置在密封薄膜沉积炉中的基板的表面上沉积薄膜的薄膜沉积系统包括在与薄膜沉积炉连通的位置处的测量单元，测量单元包括薄膜沉积样品基板，用于允许 在测量单元的侧壁上设置X射线入射和提取窗口的同时从薄膜沉积炉流入的薄膜物质，其中在测量单元中的薄膜沉积样品基板上照射X射线 通过设置在薄膜沉积炉外部的薄膜测量单元通过X射线入射窗，并且通过X射线提取窗口感测从薄膜沉积样品基底反射的X射线。

公开(公告)号：US08699663B2

公开(公告)日：2014-04-15

申请号：US13233739

申请日：2011-09-15

申请人： Kazuhiko Omote ,  Makoto Kambe ,  Yoshihiro Takeda

发明人： Kazuhiko Omote ,  Makoto Kambe ,  Yoshihiro Takeda

IPC分类号： G01N23/20

CPC分类号： G03B42/02 ,  A61B6/4035 ,  A61B6/484 ,  A61B6/588 ,  A61B6/589

摘要： There is provided an X-ray image photographing method and an X-ray image photographing apparatus capable of photographing a high resolution phase contrast image and a high resolution absorption contrast image in a short time according to the purpose only by finely adjusting the distance between a specimen and a detector with respect to an X-ray source. The X-ray image photographing method enables photographing of a fine structure with a high space resolution while d/L is sufficiently smaller than 1, when L is a distance from an X-ray source 110 to a specimen 500 and d is a distance from the specimen 500 to a detector 130. Further, a distance between a peak position and a valley position of a phase contrast is not less than ⅓Δ and not more than 3Δ, when λ is an average wavelength of the X-ray and Δ is a resolution of the detector 130.

摘要翻译： 本发明提供了一种能够根据目的在短时间内拍摄高分辨率相位差图像和高分辨率吸收对比图像的X射线图像拍摄方法和X射线图像拍摄装置，仅通过精细地调整 样品和检测器相对于X射线源。 当L是从X射线源110到样本500的距离时，X射线图像拍摄方法能够以d / L足够小于1的方式拍摄具有高空间分辨率的精细结构，并且d是距离 样本500到检测器130.此外，相位对比度的峰值位置和谷谷位置之间的距离不小于1/3和Dgr; 并且不大于3＆Dgr;当λ是X射线和＆Dgr的平均波长时; 是检测器130的分辨率。

公开(公告)号：US20120051518A1

公开(公告)日：2012-03-01

申请号：US13266842

申请日：2010-04-14

申请人： Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

发明人： Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

IPC分类号： G01N23/201

CPC分类号： G21K1/06 ,  G01N23/201

摘要： A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.

摘要翻译： X射线散射测量装置和测量方法可以以高分辨率测量已经经历小角度散射和具有反射几何形状的衍射的X射线的强度，并且可以容易且精确地测量样品表面上的微结构。 X射线散射测量装置适用于样品表面的微结构测量，包括产生X射线的X射线源; 连续地反映所产生的X射线的第一镜和第二镜; 支持样品的样品台; 以及检测在样品表面上散射的X射线的二维检测器。 第一个镜子将生成的X射线聚焦到平行于样品表面的平面内的二维检测器上，而第二反射镜将由第一反射镜反射的X射线在垂直的平面内的样品表面上聚焦 到样品表面。

公开(公告)号：US07098459B2

公开(公告)日：2006-08-29

申请号：US10457464

申请日：2003-06-10

申请人： Kazuhiko Omote ,  Akito Sasaki ,  Yoshiyasu Ito

发明人： Kazuhiko Omote ,  Akito Sasaki ,  Yoshiyasu Ito

IPC分类号： G01F23/00 ,  G01N23/20 ,  G01N23/201

CPC分类号： G01N23/083 ,  G21K1/02

摘要： Disclosed herein is a sample-analyzing method, in which an incident beam slit is provided between an X-ray source and a sample, a receiving side beam slit is provided between the sample and an X-ray detector, the X-ray detector detects X-rays scattered again from the sample and coming through the receiving side beam slit when the sample is irradiated with the X-rays applied through the incident beam slit, and a value is measured from a value detected by the X-ray detector. In the method, a true value is measured from the value, by using a slit function representing an influence which the incident beam slit and receiving side beam slit impose on the detected value. The slit function is determined from an intensity distribution of the X-rays scattered again from the sample. The method obtains an accurate slit function in accordance with the structure of the optical system employed and can therefore analyze the sample with high precision.

公开(公告)号：US07039161B2

公开(公告)日：2006-05-02

申请号：US10967246

申请日：2004-10-19

申请人： Yoshiyasu Ito ,  Kazuhiko Omote

发明人： Yoshiyasu Ito ,  Kazuhiko Omote

IPC分类号： G01N23/001 ,  G01N23/20 ,  G01B15/02

CPC分类号： G01N23/201

摘要： A method and apparatus for analyzing a film structure analyze particle or pore size distribution with high accuracy and evaluate a shape of a surface or interface even in the case where the absolute amount of particles or pores in the thin film is small. The method includes fitting a simulated X-ray scattering curve obtained by simulation calculation to a measured X-ray scattering intensity curve obtained by emitting an X-ray onto a surface of a film specimen having a single layer or multi-layer structure at an angle in the vicinity of the critical angle to the surface, by varying at least one parameter characterizing a physical property of the specimen, and obtaining optimum values of parameters providing the minimum difference between the measured X-ray scattering curve and the simulated X-ray scattering curve, so as to determine the structure of the film specimen, in which plural combinations of incident angle and outgoing angle relative to the surface of the film specimen are set so that there is no correlation between the incident angle and the outgoing angle, and the simulated X-ray scattering curve is fitted to the X-ray scattering curve that is obtained by measuring X-ray intensity for the respective combinations of incident angle and outgoing angle.

摘要翻译： 用于分析胶片结构的方法和装置以高精度分析颗粒或孔径分布，并且即使在薄膜中的颗粒或孔的绝对量小的情况下也可评估表面或界面的形状。 该方法包括将通过模拟计算获得的模拟X射线散射曲线拟合到通过将X射线发射到具有单层或多层结构的膜试样的表面上获得的测量的X射线散射强度曲线 在与表面临界角附近，通过改变至少一个表征样本的物理性质的参数，并获得提供所测量的X射线散射曲线和模拟X射线散射之间的最小差的参数的最佳值 曲线，以确定膜试样的结构，其中入射角和出射角相对于膜试样的表面的多个组合被设置为使得入射角和出射角之间没有相关性，并且 模拟的X射线散射曲线拟合到通过测量入射的各个组合的X射线强度而获得的X射线散射曲线 gle和出射角度。

公开(公告)号：US07035373B2

公开(公告)日：2006-04-25

申请号：US10802139

申请日：2004-03-17

申请人： Kazuhiko Omote

发明人： Kazuhiko Omote

IPC分类号： G01N23/20

CPC分类号： G01N23/20 ,  G21K1/06

摘要： An -ray emitted from an incident optical system is incident on a sample supported by a sample support mechanism, and a diffracted X-ray is detected by a receiving optical system. The incident optical system includes an X-ray source and a multilayer-film mirror. An attitude controlling unit of the sample support mechanism switches a condition of the sample support mechanism from a state maintaining the sample to have a first attitude in which a normal line of the surface of the sample is parallel with a first axis of rotation to another state maintaining the sample to have a second attitude in which the normal line of the surface of the sample is perpendicular to the first axis of rotation. When the receiving optical system is rotated around the first axis of rotation while maintaining the sample in the first attitude, in-plane diffraction measurement is possible. On the other hand, when the receiving optical system is rotated in the same way while maintaining the sample in the second attitude, out-of-plane diffraction measurement is possible.

摘要翻译： 从入射光学系统发射的射线入射到由样品支撑机构支撑的样品上，并且由接收光学系统检测衍射的X射线。 入射光学系统包括X射线源和多层膜镜。 样品支撑机构的姿态控制单元将样品支撑机构的状态从保持样品的状态切换成具有第一姿态，其中，样品的表面的法线与第一旋转轴线平行到另一状态 将样品保持为具有样品表面的法线垂直于第一旋转轴线的第二姿态。 当接收光学系统围绕第一旋转轴线旋转同时将样品保持在第一姿态时，可以进行面内衍射测量。 另一方面，当接收光学系统以相同的方式旋转同时将样品保持在第二姿态时，可以进行面外衍射测量。

公开(公告)号：US06937694B2

公开(公告)日：2005-08-30

申请号：US10129415

申请日：2002-05-01

申请人： Ryouichi Yokoyama ,  Kazuhiko Omote ,  Kamihisa Endo ,  Ryuji Matsuo

发明人： Ryouichi Yokoyama ,  Kazuhiko Omote ,  Kamihisa Endo ,  Ryuji Matsuo

IPC分类号： G01N23/207

CPC分类号： G01N23/207

摘要： A method for measuring a pole of a sample, using a reflection method, is effective substantially over all measurement regions ranging from the region of high-tilting-angle α of a conventional pole measuring to the in-plane diffraction region corresponding to low-tilting-angle α.

摘要翻译： 使用反射方法测量样品的极点的方法基本上在所有测量范围内有效，所述测量范围从常规极点测量的高倾斜角α的区域到对应于低倾斜度的面内衍射区域 角α。

公开(公告)号：US20120087473A1

公开(公告)日：2012-04-12

申请号：US13264222

申请日：2010-04-12

申请人： Kazuhiko Omote ,  Yohiyasu Ito

发明人： Kazuhiko Omote ,  Yohiyasu Ito

IPC分类号： G01N23/201 ,  G01B15/04

CPC分类号： G01B15/04

摘要： There is provided a surface microstructure measurement method, a surface microstructure measurement data analysis method, and an X-ray scattering measurement device which can accurately measure a microstructure on a surface and which can evaluate a three-dimensional structural feature. In the surface microstructure measurement method, the specimen surface is irradiated with X-ray at a grazing incident angle and a scattering intensity is measured; a specimen model with a microstructure on a surface in which one or more layers is formed in a direction perpendicular to the surface and unit structures are periodically arranged in a direction parallel to the surface within the layers is assumed; a scattering intensity of X-ray scattered by the microstructure is calculated in consideration of effects of refraction and reflection caused by the layer; and the scattering intensity of X-ray calculated by the specimen model is fitted to the measured scattering intensity. Then, as a result of the fitting, an optimum value of a parameter for specifying the shape of the unit structures is determined. Therefore, it is possible to accurately measure a microstructure.

摘要翻译： 提供了可以精确地测量表面上的微结构并且可以评估三维结构特征的表面微结构测量方法，表面微结构测量数据分析方法和X射线散射测量装置。 在表面微结构测定方法中，以放射入射角对X射线照射试样表面，测定散射强度; 在垂直于表面的方向上形成一个或多个层的表面上的微结构的样本模型和单元结构在与层内的表面平行的方向上周期性地布置; 考虑到由该层引起的折射和反射的影响，计算由微结构散射的X射线的散射强度; 并且通过样本模型计算的X射线的散射强度适合于测量的散射强度。 然后，作为拟合的结果，确定用于指定单位结构的形状的参数的最佳值。 因此，可以精确地测量微结构。

公开(公告)号：US07342997B2

公开(公告)日：2008-03-11

申请号：US11435237

申请日：2006-05-16

申请人： Tomoyasu Ueda ,  Yoshiyasu Ito ,  Kazuhiko Omote

发明人： Tomoyasu Ueda ,  Yoshiyasu Ito ,  Kazuhiko Omote

IPC分类号： G01N23/20

CPC分类号： G01T1/171

摘要： The dead time of a pulse type X-ray detector is measured without estimation of a true X-ray intensity. The first and the second conditions are used for varying an intensity of an X-ray entering the X-ray detector. The first condition may be the slit width of a receiving slit, at least three kinds of slit width being selected. The second condition may be with or without an absorption plate. The first observed X-ray intensities are observed, with the absorption plate inserted, for three or more values in slit width. Next, the second observed X-ray intensities are observed similarly but with the absorption plate removed. A predetermined relational expression is made up among the first observed X-ray intensity, the second observed X-ray intensity, a ratio k of the second observed X-ray intensity to the first observed X-ray intensity (depending upon attenuation in X-ray intensity caused by the absorption plate) and the dead time τ of the X-ray detector. Based on the relational expression, a fitting operation is carried out with the least squares method so as to determine the dead time τ precisely.

摘要翻译： 在不估计真实X射线强度的情况下测量脉冲型X射线检测器的死区时间。 第一和第二条件用于改变进入X射线检测器的X射线的强度。 第一条件可以是接收狭缝的狭缝宽度，至少选择三种狭缝宽度。 第二条件可以是带或不带吸收板。 观察到第一个观察到的X射线强度，其中插入吸收板，具有三个或更多个狭缝宽度的值。 接下来，类似地观察第二观察到的X射线强度，但是除去吸收板。 在第一观察到的X射线强度，第二观察到的X射线强度，第二观察到的X射线强度的比率k与第一观察到的X射线强度（取决于X射线中的衰减） 由吸收板引起的射线强度）和X射线检测器的死区时间τ。 基于关系式，用最小二乘法进行拟合，精确地确定死区时间τ。