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    LAMP DESIGNED TO USE SOLID-STATE LIGHT EMITTING DEVICE AS LIGHT SOURCE
    3.
    发明申请
    LAMP DESIGNED TO USE SOLID-STATE LIGHT EMITTING DEVICE AS LIGHT SOURCE 审中-公开
    灯设计用作光源的固态发光器件

    公开(公告)号：US20120063129A1

    公开(公告)日：2012-03-15

    申请号：US13319993

    申请日：2011-03-02

    申请人： Hiroki Nakagawa ,  Yoshinori Kakuno ,  Takaari Uemoto ,  Kazushige Sugita

    发明人： Hiroki Nakagawa ,  Yoshinori Kakuno ,  Takaari Uemoto ,  Kazushige Sugita

    IPC分类号： F21V7/00 ,  F21V29/00 ,  F21V21/00

    CPC分类号： F21V29/85 ,  F21K9/20 ,  F21K9/68 ,  F21V3/00 ,  F21V7/05 ,  F21V29/506 ,  F21V29/70 ,  F21Y2103/10 ,  F21Y2113/13 ,  F21Y2115/10

    摘要： Provided is a lamp designed to use as a light source a solid-state light emitting device with a simple and inexpensive structure and having an improved heat dissipation performance. A lamp uses a solid-state light emitting device as a light source. A cap is mounted to an external apparatus at the time of use. A housing is made of a translucent material and is connected to the cap. A light-emitting module includes one or a plurality of solid-state light emitting devices and is mounted such that the main-light-emission side (lower side in FIG. 1) thereof is in close contact with the inner wall of the housing. Further, the gap between the housing and the light-emitting module may be filled with a thermal conductive material having a translucency and a thermal conductivity.

    摘要翻译： 提供一种设计成将光源用作具有简单且便宜的结构并具有改善的散热性能的固态发光器件的灯。 灯使用固态发光器件作为光源。 在使用时将盖子安装到外部设备。 壳体由半透明材料制成并连接到帽盖上。 发光模块包括一个或多个固态发光器件，并且安装成使得其主发光侧（图1中的下侧）与壳体的内壁紧密接触。 此外，壳体和发光模块之间的间隙可以填充有具有半透明性和导热性的导热材料。

    Copolymer and top coating composition
    4.
    发明授权
    Copolymer and top coating composition 有权
    共聚物和顶涂组合物

    公开(公告)号：US08580482B2

    公开(公告)日：2013-11-12

    申请号：US13338569

    申请日：2011-12-28

    申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22 ,  C08F26/02 ,  C08F28/02

    CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

    摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
    6.
    发明授权
    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
    用于液浸的上层成膜组合物和形成光致抗蚀剂图案的方法

    公开(公告)号：US08247165B2

    公开(公告)日：2012-08-21

    申请号：US10586187

    申请日：2005-01-14

    申请人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    发明人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    IPC分类号： G03C1/00 ,  G03F7/00 ,  C08F18/20

    CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    摘要翻译： 提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中 在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。 当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂， 和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上的侧链上含有氟烷基的具有醇羟基的树脂成分。

    Ejector
    7.
    发明申请
    Ejector 有权
    喷射器

    公开(公告)号：US20110236227A1

    公开(公告)日：2011-09-29

    申请号：US13065695

    申请日：2011-03-28

    申请人： Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

    发明人： Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

    IPC分类号： F04F5/00

    CPC分类号： F04F5/20 ,  F04F5/46

    摘要： A nozzle of an ejector depressurizes and injects fluid, which is supplied to the nozzle. The nozzle is received in a receiving space of a body. The nozzle and the body are formed by press working. The nozzle includes nozzle-side ribs, which extend in an axial direction and project radially outward. The body includes body-side ribs, which extend in the axial direction and project radially outward. In a predetermined cross section of each of the nozzle and the body, which is perpendicular to the axial direction and includes the corresponding ribs, the nozzle or the body is formed seamlessly as a continuous single piece member.

    摘要翻译： 喷射器的喷嘴减压并喷射供给喷嘴的流体。 喷嘴被容纳在身体的容纳空间中。 喷嘴和主体通过冲压加工形成。 喷嘴包括沿轴向延伸并径向向外突出的喷嘴侧肋。 主体包括沿轴向延伸并径向向外突出的主体侧肋。 在每个喷嘴和主体的垂直于轴向方向并且包括相应的肋的预定横截面中，喷嘴或主体无缝地形成为连续的单件构件。

    FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
    9.
    发明申请
    FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION 有权
    含氟聚合物，纯化方法和辐射敏感性树脂组合物

    公开(公告)号：US20090202945A1

    公开(公告)日：2009-08-13

    申请号：US12294386

    申请日：2007-03-23

    申请人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

    发明人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

    IPC分类号： G03F7/039 ,  C08F20/22

    CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

    摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

    摘要翻译： 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

    Cutting tool and processing method by the same
    10.
    发明申请
    Cutting tool and processing method by the same 失效
    切削刀具和加工方法相同

    公开(公告)号：US20080080939A1

    公开(公告)日：2008-04-03

    申请号：US11906548

    申请日：2007-10-02

    申请人： Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

    发明人： Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

    IPC分类号： B23B51/00

    CPC分类号： B23B51/02 ,  B23B2251/241 ,  B23B2251/248 ,  B23B2251/62 ,  B23B2270/12 ,  Y10T408/03 ,  Y10T408/52 ,  Y10T408/567

    摘要： A cutting tool is provided to process a processed member having an opening portion with a curved inner surface, so that a through hole is formed and a part of the inner surface of the opening portion corresponding to the through hole is processed. The through hole extends from a surface of the processed member to reach the opening portion. The cutting tool includes a shank member, and a processing member having a smaller diameter than the shank member. A groove portion of the processing member has a cutting edge, and a chip evacuation groove through which chip is expelled outward. A self guide portion of the processing member is arranged between the groove portion and the shank member and provided with a substantially cylindrical shape, to guide the cutting edge toward the part of the inner surface of the opening portion corresponding to the through hole in the processing.

    摘要翻译： 提供了一种切割工具来处理具有弯曲内表面的开口部分的加工构件，从而形成通孔，并且处理与通孔相对应的开口部分的内表面的一部分。 通孔从被处理构件的表面延伸到达开口部分。 切割工具包括柄部件和直径小于柄部件的加工部件。 处理部件的槽部具有切削刃，芯片排出槽通过芯片向外侧排出。 处理部件的自引导部分设置在槽部和柄部件之间并且设置有大致圆筒形状，以在加工中将切削刃朝向对应于通孔的开口部的内表面的一部分引导 。