公开(公告)号：US4655584A

公开(公告)日：1987-04-07

申请号：US729968

申请日：1985-05-03

申请人： Hiroshi Tanaka ,  Yukio Kakizaki ,  Hiromitsu Iwata ,  Tsuyoshi Naraki

发明人： Hiroshi Tanaka ,  Yukio Kakizaki ,  Hiromitsu Iwata ,  Tsuyoshi Naraki

IPC分类号： G03F7/20 ,  G03B27/42 ,  A23G9/00

CPC分类号： G03F7/7075 ,  Y10S414/136

摘要： An apparatus for positioning a planar substrate on a plane relative to a stage comprises means for supporting the substrate on the plane, the supporting means being provided on the stage for rotation about an axis perpendicular to the plane, first drive means for moving the substrate relative to the supporting means in a predetermined direction along the plane, a reference member disposed on the stage and having a reference surface intersecting the plane, the reference member having a position in which the reference surface is opposed to the substrate moved in the predetermined position so that the reference surface is brought into contact with the circumferential end of the substrate moved by the first drive means to thereby position the substrate, and a biased position in which the reference surface is biased away from the circumferential end of the substrate from the opposed position, and second drive means for displacing the reference member between the opposed position and the biased position.

摘要翻译： 用于将平面基板定位在相对于平台的平面上的装置包括用于在平面上支撑基板的装置，支撑装置设置在平台上用于围绕垂直于平面的轴线旋转;第一驱动装置，用于移动基板相对 在沿着平面的预定方向上到支撑装置的参考构件，设置在平台上并具有与平面交叉的参考表面的基准构件，基准构件具有基准表面与在预定位置移动的基板相对的位置，从而 参考表面与由第一驱动装置移动的基板的周向端部接触，从而定位基板;以及偏置位置，在该偏置位置，参考表面偏离基板的周向端部，从相对位置 以及第二驱动装置，用于使参考构件在相对位置和双侧之间移位 sed位置。

公开(公告)号：US4716299A

公开(公告)日：1987-12-29

申请号：US821743

申请日：1986-01-23

申请人： Hiroshi Tanaka ,  Hiromitsu Iwata ,  Yukio Kakizaki

发明人： Hiroshi Tanaka ,  Hiromitsu Iwata ,  Yukio Kakizaki

IPC分类号： B65G1/00 ,  B65G1/04 ,  B65G1/08 ,  G01N21/94 ,  G03F1/62 ,  G03F1/84 ,  H01L21/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66 ,  H01L21/67 ,  H01L21/677 ,  G01N21/86

CPC分类号： H01L21/67778 ,  G01N21/94 ,  H01L21/67271 ,  H01L21/67748 ,  H01L21/681

摘要： An arrangement in an apparatus for handling a substrate such as a photomask or a reticle used in a process of manufacturing a semiconductor device comprises a container unit for containing therein the substrate in a substantially horizontal posture, an inspection unit having means for inspecting a surface of the substrate, the inspecting means including a radiation source for supplying a directional beam, and a device for detecting the scattering of the directional beam, a holding member for supporting the substrate substantially horizontally, a device for moving the holding member between the container unit and the inspection unit and conveying the substrate from the container unit to the inspection unit by the use of the holding member, and a scanning device for moving the holding member in a horizontal direction relative to the inspecting means and moving the substrate relative to the directional beam while subjecting the surface of the substrate to the directional beam.

摘要翻译： 在用于处理半导体器件制造工艺中使用的诸如光掩模或掩模版的基板的设备中的布置包括用于以基本上水平的姿势容纳基板的容器单元，检查单元具有用于检查 所述检查装置包括用于提供定向光束的辐射源和用于检测所述方向光束的散射的装置，用于基本上水平地支撑所述基板的保持部件，用于使所述保持部件移动在所述容器单元和 检查单元，并且通过使用保持构件将基板从容器单元传送到检查单元;以及扫描装置，用于相对于检查装置沿水平方向移动保持构件，并使基板相对于定向梁 同时使基板的表面经受定向梁。

公开(公告)号：US4770531A

公开(公告)日：1988-09-13

申请号：US51514

申请日：1987-05-19

申请人： Hiroshi Tanaka ,  Yukio Kakizaki

发明人： Hiroshi Tanaka ,  Yukio Kakizaki

IPC分类号： H01L21/30 ,  G01B5/00 ,  G01B11/00 ,  G03F7/20 ,  G05D3/00 ,  G12B5/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68

CPC分类号： G03F7/70716

摘要： A stage device comprises an XY-stage movable two-dimensionally in a predetermined reference plane, a Z-stage provided on the XY-stage and capable of a vernier movement in a Z-direction substantially perpendicular to said reference plane, and a levelling stage provided on the Z-stage and capable of an arbitrary inclining movement with respect to the reference plane. There is also provided a laser interferometer for measuring the position of a stage base portion in the X- or Y-direction by projecting a light beam onto a mirror provided on the Z-stage, and the measuring axis of the interferometer is so selected as to be contained in the reference plane. The levelling stage can be inclined in an arbitrary direction with means for driving plural points of the levelling stage independently in the Z-direction. Further it is so designed that the moving points are approximately positioned on the reference plane when the driving points are in a predetermined neutral stage.

摘要翻译： 舞台装置包括在预定基准平面中二维可移动的XY平台，设置在XY平台上并能够在大致垂直于所述参考平面的Z方向上的游标移动的Z级，以及调平级 设置在Z平台上并且能够相对于参考平面的任意倾斜运动。 还提供了一种激光干涉仪，用于通过将光束投射到设置在Z平台上的镜子上来测量台架基部在X或Y方向上的位置，并且干涉仪的测量轴被选择为 被包含在参考平面中。 平整台可以在任意方向上倾斜，而在Z方向独立地驱动调平台的多个点的装置。 此外，它被设计成当驱动点处于预定中立阶段时，移动点大致位于参考平面上。

公开(公告)号：US06583597B2

公开(公告)日：2003-06-24

申请号：US09899946

申请日：2001-07-06

申请人： Keiichi Tanaka ,  Yukiharu Okubo ,  Hiroaki Narushima ,  Yukio Kakizaki ,  Yasushi Yoda

发明人： Keiichi Tanaka ,  Yukiharu Okubo ,  Hiroaki Narushima ,  Yukio Kakizaki ,  Yasushi Yoda

IPC分类号： G05B1100

CPC分类号： G03F7/70816 ,  F16C29/025 ,  F16C32/0618 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70758 ,  H01J37/20 ,  H01J2237/20278

摘要： Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow &thgr;-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings. The sliders can be driven by a combination of a linear motor and a gas cylinder, the latter assisting the driving force by the linear motor during acceleration and deceleration of the stage.

摘要翻译： 公开了用于在微光刻系统中保持物体（例如，基板或掩模版）的平台装置，特别是用于在真空环境中执行微光刻的系统。 舞台装置提供在导向平面的X和Y方向上的舞台（用于保持物体）的运动。 平台安装到臂构件，臂构件具有至少第一和第二端相对于平台对称设置。 端部包括与相应的定子相互作用的线性马达驱动器，并且当载物台在引导平面内移动时，包括在相对于其它表面滑动的表面上的气体轴承。 线性马达移动器可以是一维或二维移动器，并且期望地允许载物台的θ方向运动。 其他构造包括引导构件和滑块，其经由非接触气体轴承相对于引导构件经历滑动运动。 滑块可以通过线性马达和气瓶的组合来驱动，后者在加速和减速阶段通过线性马达来辅助驱动力。

公开(公告)号：US08749753B2

公开(公告)日：2014-06-10

申请号：US12109069

申请日：2008-04-24

申请人： Keiichi Tanaka ,  Yukio Kakizaki

发明人： Keiichi Tanaka ,  Yukio Kakizaki

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03B27/62 ,  G03F7/20 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  F16C29/025 ,  F16C32/0603 ,  G03F7/70808 ,  G03F7/70816 ,  G03F7/70841 ,  G03F7/70866

摘要： The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.

摘要翻译： 晶片侧密封单元的静态气体轴承构件的上端通过波纹管连接到处于气密状态的室的曝光光束的出射侧的边缘部分，并且下端表面处于形成状态 与晶片和晶片保持器的预定间隙。 通过这种布置，室的内部与外部隔离。 因此，可以保持曝光光束的光路周围的真空环境，而不设置真空室来容纳晶片，晶片保持器和晶片台，这允许整个曝光装置的尺寸 减少，并且也使得容易进入晶片台附近。

公开(公告)号：US06570641B2

公开(公告)日：2003-05-27

申请号：US09955116

申请日：2001-09-19

申请人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kato

发明人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kato

IPC分类号： G03B2118

CPC分类号： G03F7/70775 ,  G03F7/70358 ,  G03F7/70716 ,  G03F9/70

摘要： The projection exposure apparatus can include an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.

摘要翻译： 投影曝光装置可以包括照射光学系统，用于以掩模形式的一部分掩模图案照射预定形状的曝光辐射通量，固定支撑件，固定在固定支架上的投影光学系统，用于投影图像的图像 掩模图案的照明部分到基板上，以及滑架，用于一体地保持掩模和基板，滑架可相对于投影光学系统沿预定方向移动，连续地将基板与由 曝光辐射通量。 投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统 掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

公开(公告)号：US06040096A

公开(公告)日：2000-03-21

申请号：US224061

申请日：1998-12-31

申请人： Yukio Kakizaki ,  Toru Kiuchi ,  Kesayoshi Amano ,  Toshikazu Umatate

发明人： Yukio Kakizaki ,  Toru Kiuchi ,  Kesayoshi Amano ,  Toshikazu Umatate

IPC分类号： G03F1/44 ,  G03F1/50 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G06F9/00 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/707 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70891 ,  G03F9/70 ,  G03F9/7011

摘要： In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.

摘要翻译： 为了在将电路图案转印到感光基板上时减少由于掩模基板的膨胀引起的掩模图案转移误差，掩模基板被松散地支撑在掩模台上的多个安装座上，使得掩模基板可以自由地响应地膨胀 其温度变化。 使用测量仪器（例如温度传感器或干涉仪）来测量表示掩模基板的膨胀量的值。 基于测量值，调整掩模基板和感光基板的对准和定位以响应于掩模版的扩展量。

公开(公告)号：US5929973A

公开(公告)日：1999-07-27

申请号：US735082

申请日：1996-10-22

申请人： Yukio Kakizaki ,  Hidetoshi Mori

发明人： Yukio Kakizaki ,  Hidetoshi Mori

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/32

CPC分类号： G03F7/70225 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70425 ,  G03F9/70

摘要： Disclosed is a double-side exposure apparatus having a substrate holder for holding a photosensitizable substrate; a first exposure system containing a first light source, a first illumination unit for striking a ray of light emitted from the first light source in a first mask, and a first projection optical unit for projecting an image of the first mask onto a front surface of the photosensitizable substrate; and a second exposure system, mounted at the side opposite to the first exposure system, containing a second light source, a second illumination unit for striking a ray of light emitted from the first light source in a second mask, and a second projection optical unit for projecting an image of the second mask onto a back surface of the photosensitizable substrate; wherein the pattern of the first mask is exposed to the front surface of the photosensitizable substrate and the pattern of the second mask is exposed to the back surface thereof substantially simultaneously with exposure of the pattern of the first mask to the front surface thereof. Also, further disclosed is an exposing method for exposure of both surfaces of a substrate with the double-side exposure apparatus having the structure as described above, which involves aligning a first mask for a first exposing surface of a substrate with a second mask for a second exposing surface of the substrate in a state that no the substrate is interposed between a first projection optical unit for projecting a pattern of the first mask to the first exposing surface of the substrate and a second projection optical unit for projecting a pattern of the second mask to the second exposing surface of the substrate.

摘要翻译： 公开了一种具有用于保持光敏性基板的基板保持件的双面曝光装置; 包含第一光源的第一曝光系统，用于在第一掩模中击打从第一光源发出的光线的第一照明单元和用于将第一掩模的图像投影到第一掩模的前表面的第一投影光学单元 光敏基材; 以及第二曝光系统，其安装在与所述第一曝光系统相对的一侧，所述第二曝光系统包含第二光源，用于在第二掩模中击打从所述第一光源发出的光线的第二照明单元，以及第二投影光学单元 用于将第二掩模的图像投影到可光敏化基板的背面上; 其中所述第一掩模的图案暴露于所述可光敏化基板的前表面，并且所述第二掩模的图案基本上与所述第一掩模的图案暴露于其前表面同时暴露于其背面。 此外，进一步公开了一种曝光方法，用于利用具有上述结构的双面曝光装置对基板的两个表面进行曝光，其包括将用于基板的第一曝光表面的第一掩模与用于基板的第二掩模对准 在基板被插入到用于将第一掩模的图案投影到基板的第一曝光表面的第一投影光学单元之间的状态下的基板的第二曝光表面和用于将第二掩模的图案投影到第二投影光学单元的第二投影光学单元 掩模到基板的第二曝光表面。

公开(公告)号：US5617211A

公开(公告)日：1997-04-01

申请号：US515783

申请日：1995-08-16

申请人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01U21/86 ,  G06K7/015 ,  G03B27/52

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.

摘要翻译： 本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。 多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。 掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置 并且测量掩模侧参考标记。 根据位移量校正多个投影光学系统的成像特性。

公开(公告)号：US4776693A

公开(公告)日：1988-10-11

申请号：US120231

申请日：1987-11-12

申请人： Kazunori Imamura ,  Akikazu Tanimoto ,  Yukio Kakizaki

发明人： Kazunori Imamura ,  Akikazu Tanimoto ,  Yukio Kakizaki

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94

摘要： A system for placing thereron an object to be inspected, scanning the surface of the object to be inspected by a light spot and inspecting a foreign substance on the basis of light information produced by the foreign substance on the surface of the object to be inspected includes light information producing means including a member for producing light information substantially similar to the light information produced by the foreign substance, and means for disposing the member on a surface substantially identical to the surface of the object to be inspected placed on the system.

摘要翻译： 一种用于将该物体放置在被检查物体上的系统，用光点扫描待检查物体的表面，并根据被检测物体表面上的异物产生的光信息检查异物，包括： 光信息产生装置，包括用于产生与由异物产生的光信息基本相似的光信息的部件，以及用于将该部件设置在与要被检查物体的表面基本相同的表面放置在系统上的装置。