摘要:
The present invention relates to a method and apparatus for correcting defects of an X-ray mask which includes a focused ion beam used to irradiate at least a region having a defective portion of an X-ray mask having a protective film and eliminating the protective film; exposing a circuit pattern having a defective portion located under the region or setting this circuit pattern to the state near the exposure; detecting one of the secondary electrons, secondary ions, reflected electrons, or absorbing current generated from that region and detecting a true defective position. Then positioning the focused ion beam to the true defective position and irradiating the focused ion beam to the defective portion thereby correcting the defect.
摘要:
A position of a chuck 10 is detected. The movements of the stages 5 and 7 are controlled according to a result of detecting the position of the chuck 10, so as to position the chuck 10. Further, a light receiving means 51 is disposed on the chuck 10 for receiving a light beam irradiated from a head 20a of a light beam irradiation device 20. The misalignment of the head 20a of the light beam irradiation device 20 is detected based on the received light beam. According to a result of detecting the misalignment, a coordinate of drawing data supplied to a DMD driving circuit 27 of each light beam irradiation device 20 is modified. Moreover, the drawing data with the modified coordinate is supplied to the DMD driving circuit 27 of each light beam irradiation device 20.
摘要:
A range of a coordinate of drawing data supplied to a digital micromirror device (DMD) driving circuit 27 of a light beam irradiation device 20 is determined to configure a bandwidth of a light beam irradiated from an irradiation optical system of the light beam irradiation device 20. The drawing data having the determined range of the coordinate is supplied to the DMD driving circuit 27 of the light beam irradiation device 20. Movement of a stage 7 is controlled to move a chuck 10 for only a distance less than the bandwidth of the light beam irradiated from the irradiation optical system of the light beam irradiation device 20 towards a direction perpendicular to a scanning direction of the substrate by the light beam of the light beam irradiation device 20, at each scanning, and a same region of the substrate is scanned multiple times.
摘要:
A DNA base sequencer including a gel electrophoretic means having tracks for electrophoresing fluorophore-labelled DNA fragments, a laser diode as a light source for illuminating said tracks with exciting laser light and a CCD sensor for detecting the fluorescence emitted from the illuminated DNA fragments, the laser diode has a control unit including a Peltier device for controlling the temperature of the laser diode, a Peltier device temperature setting generating means having a processor and a memory, and a temperature control circuit that generates a drive current to the Peltier device for controlling its temperature. The CCD sensor receives part of the exciting light from the laser diode as stray light and detects its wavelength. The Peltier device temperature setting generating means is such that, in accordance with the wavelength of stray light as detected periodically with said CCD sensor according to the program stored in said memory, it calculates a corrective value that adjusts the detected wavelength of stray light to the desired wavelength of exciting light that corresponds to the desired temperature setting and that an appropriate temperature setting signal is generated on the basis of said corrective value and the desired temperature setting and sent to the Peltier device temperature control circuit.
摘要:
An automatic contaminants detection apparatus comprises a polarized laser beam source, a polarized laser beam irradiation optical system having irradiation angle switching means for switching an irradiation angle depending on the presence or absence of a pattern on a sample surface to irradiate the polarized laser beam emitted by the polarized laser beam source to the sample surface with an angle of grazing, a detector for detecting condensed scattered or reflected lights of the laser beam from the sample surface with or without interleave of an analyzer, and analyzer switching means for inserting or removing the analyzer into or from a detection light path of the detector depending on the presence or absence of the pattern on the sample surface. The apparatus can detect contaminants on the patterned or non-patterned sample surface with a high sensitivity.
摘要:
A video camera system comprises a lens block and a camera block which are attachable and detachable through a block coupling mechanism to and from each other. The detachable lens block incorporates a focus lens drive mechanism for driving a focus lens and an autofocus control section for executing autofocus control. The autofocus control section receives a composite video signal obtained by processing a video signal from an image pickup device in a signal processing section of the camera block. The autofocus control section produces a focus control signal on the basis of the composite video signal to control the focus lens drive mechanism for the execution of the autofocus control. In addition, the detachable lens block is composed of an iris drive mechanism for optically adjusting an aperture of a lens and an autoiris control section for automatically controlling the iris drive mechanism, so that automatic iris control is executed on the basis of the composite video signal outputted from the camera block. This video camera system can decrease the number of connecting lines to be provided between the detachable lens block and the camera block.
摘要:
A system for detecting abnormal patterns in a surface pattern on the surface of a sample wherein, when the abnormal pattern has a portion smaller than the surface pattern, the light for illuminating the sample is stopped down to an opening so that the abnormal pattern can be distinguished over the surface pattern, the surface pattern is limited to a predetermined opening by the illumination light to form an image on a detector, and the surface pattern detected by the detector is processed to detect the abnormal pattern in the surface pattern. Further, the plurality of light rays having good directivity are illuminated onto a point on the surface of the sample from dissimilar directions maintaining a predetermined angle of incidence, the detect signals are separated to be corresponded to said light rays, and the above processing is carried out to enhance the precision of detection.
摘要:
A method of and an apparatus for detecting a fine foreign substance in which the surface of a specimen is illuminated with linearly-polarized laser beam to detect light scattered from the surface and having passed through a polarization filter, the back side of the specimen is illuminated with light from a light source such as a mercury lamp to obtain the light and darkness information or phase information on the specimen surface by transmitted light from the specimen, and fine massive and filmy foreign substances on the specimen surface are detected on the basis of information given by the scattered light and transmitted light.
摘要:
An apparatus for detecting contaminants depositing on the reticle of a reduction projection mask aligner comprises a laser spot projector which conducts a laser beam to the light path upstream of the condenser lens of the aligner such that the laser beam is in the same direction as of the exposure light beam. The laser spot projector projects the laser beam from above the reticle through the condenser lens so as to form a laser spot on the upper surface of the reticle. A laser spot scanner which scans the entire area of the reticle by the laser spot projected on to the reticle by the laser spot projector, and a photoelectric detector which receives the scattered light emitted aslant on the reticle surface, whereby a contaminant on the reticle is detected in accordance with the signal produced by the detector.
摘要:
A laser processing apparatus which achieves both shorter TAT and reduction in processing defects. In the apparatus, a laser radiation section, an undulation measurement section for measuring undulation of a substrate or a film thickness measuring section for measuring the thickness of a thin film formed on the substrate, and an optical inspection section for optically inspecting grooves formed by laser-processing the thin film on the substrate are fixed so that their positional relationship is kept constant.