摘要:
An apparatus for setting a welding operation condition, enabling the simple setting of an operation and a welding condition is disclosed. The apparatus is provided with a welding information recording portion for recording information concerning a welding machine used in arc welding and welding operation, information concerning a welding operation such as shielding gas related information. A welding wire related information or the like, welding information inputting and outputting device is provided for inputting and outputting the welding operation information. A welding operation information setting device is provided for setting the welding operation information. A retrieving device is provided for retrieving the corresponding information from among the information in the welding information recording portion on the basis of the set information. An information controlling device is provided for applying a retrieval demand to the retrieving device when retrieving the information from the information recording portion and outputting the welding information.
摘要:
An image processing apparatus includes a detecting unit that detects whether image data for each of the lines in generated image information is chromatic or achromatic; and a determining unit that determines whether the original is chromatic or achromatic based on a detection result of the detecting unit for a first area of the image information, excluding a detection result for a predetermined second area of the image information, the predetermined second area including an end line among the lines in a scanning direction of the original.
摘要:
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要:
The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.
摘要:
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要:
A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.
摘要:
A radiation-sensitive resin composition useful as a chemically amplified resist excelling particularly in depth of focus (DOF) and capability of substantially decreasing development defects, while maintaining excellent basic performance as a resist is provided. The radiation-sensitive resin composition comprises (A) a siloxane resin containing an acid-dissociable group and (B) a photoacid generator, wherein when a coating formed from the radiation-sensitive resin composition is exposed to radiation and heated, the contact angle (α) with water in an unexposed area and the contact angle (β) with water in an exposed area satisfy an inequality formula of (α−β)>5. The component (A) is preferably a compound having a structural unit (I) shown by the following formula (I) and a structural unit (II) shown by the following formula (II), wherein A represents a substituted or unsubstituted divalent cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, X represents a single bond or a substituted or unsubstituted divalent hydrocarbon group, Y represents a single bond or a divalent coupling means, and Z represents a single bond or a substituted or unsubstituted divalent hydrocarbon group.
摘要:
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要:
A radiation sensitive resin composition which can be processed and molded at low temperatures and has resolution, solvent resistance, adhesion to a substrate and storage stability required as an interlaminar insulating film. This radiation sensitive resin composition comprises: (A) a copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy compound such as &bgr;-methylglycidyl acrylate and/or an epoxy compound such as a monomer represented by the following formula (3): and (a3) an olefinic unsaturated compound other than the above (a1) and (a2); and (B) a 1,2-quinonediazide compound.
摘要:
A first scanner unit and a second scanner unit simultaneously read the front surface and rear surface of a document, respectively, once stores the read image data in a first memory while adjusting the timing by a memory I/F, and then transfers the same to an ASIC. The image data is read out of the first memory and is inputted into an R channel and a B channel at an identical timing. The ASIC executes predetermined image processings and stores monochrome data on the front surface and rear surface of the document in a second memory through a PCI bus in parallel.