Trench isolation without grooving

    公开(公告)号:US06924542B2

    公开(公告)日:2005-08-02

    申请号:US10901948

    申请日:2004-07-29

    CPC分类号: H01L21/76229

    摘要: A method and structure to form shallow trench isolation regions without trench oxide grooving is provided. In particular, a method includes a two-step oxide process in which an oxide liner lines the inside surface of a trench and the trench is filled with a bulk oxide layer, preferably using a high density plasma chemical vapor deposition (HDP-CVD) process. The oxide liner and the bulk oxide layer are formed to have similar etch rates. Thus, when etching the oxide liner and the bulk oxide layer between stack structures, a common dielectric top surface is formed that is substantially planar and without grooves.

    Method of forming trench isolation without grooving
    2.
    发明授权
    Method of forming trench isolation without grooving 有权
    无沟槽形成沟槽隔离的方法

    公开(公告)号:US06787409B2

    公开(公告)日:2004-09-07

    申请号:US10305464

    申请日:2002-11-26

    IPC分类号: H01L218238

    CPC分类号: H01L21/76229

    摘要: A method and structure to form shallow trench isolation regions without trench oxide grooving is provided. In particular, a method includes a two-step oxide process in which an oxide liner lines the inside surface of a trench and the trench is filled with a bulk oxide layer, preferably using a high density plasma chemical vapor deposition (HDP-CVD) process. The oxide liner and the bulk oxide layer are formed to have similar etch rates. Thus, when etching the oxide liner and the bulk oxide layer between stack structures, a common dielectric top surface is formed that is substantially planar and without grooves.

    摘要翻译: 提供了一种形成没有沟槽氧化物开槽的浅沟槽隔离区的方法和结构。 特别地,一种方法包括两步氧化法,其中氧化物衬垫在沟槽的内表面上划线,并且沟槽填充有本体氧化物层,优选使用高密度等离子体化学气相沉积(HDP-CVD)工艺 。 氧化物衬垫和本体氧化物层被形成为具有相似的蚀刻速率。 因此,当在堆叠结构之间蚀刻氧化物衬垫和本体氧化物层时,形成基本平坦且没有凹槽的公共电介质顶表面。

    SMALL CALIBER LAPAROSCOPE SURGICAL APPARATUS
    4.
    发明申请
    SMALL CALIBER LAPAROSCOPE SURGICAL APPARATUS 有权
    小标尺手术器械

    公开(公告)号:US20100280543A1

    公开(公告)日:2010-11-04

    申请号:US12738478

    申请日:2008-10-16

    IPC分类号: A61B17/29 A61B17/00

    摘要: A laparoscopic surgical instrument includes a shaft and a head having a distal end to which a variety of surgical instruments are attached. The laparoscopic surgical instrument also includes a flexible joint installed between the shaft and the head; a longitudinal-driving unit including a longitudinal-driving wire connected with both longitudinal ends of the head and a longitudinal-driving roller turning the longitudinal-driving wire and a transverse-driving unit including a transverse-driving wire connected with both transverse ends of the head and a transverse-driving roller turning the transverse-driving wire. The longitudinal-driving unit turns the flexible joint in the longitudinal direction, the transverse-driving unit turns the flexible joint in the transverse direction, and the shaft has a small diameter.

    摘要翻译: 腹腔镜手术器械包括轴和具有远端的头部,多个外科器械附接到该远端。 腹腔镜手术器械还包括安装在轴和头部之间的柔性接头; 纵向驱动单元,包括与头部的两个纵向端连接的纵向驱动线和转动纵向驱动线的纵向驱动辊;以及横向驱动单元,横向驱动单元包括横向驱动线,该横向驱动线与 头部和横向驱动辊转动横向驱动线。 纵向驱动单元沿纵向旋转柔性接头,横向驱动单元使柔性接头在横向上转动,并且轴具有小的直径。

    Magnetic memory and manufacturing method thereof
    7.
    发明授权
    Magnetic memory and manufacturing method thereof 有权
    磁记忆及其制造方法

    公开(公告)号:US09105572B2

    公开(公告)日:2015-08-11

    申请号:US14203400

    申请日:2014-03-10

    摘要: According to one embodiment, a magnetic memory includes a cell transistor including a first source/drain diffusion layer and a second source/drain diffusion layer, a first contact on the first source/drain diffusion layer, a memory element on the first contact, and a second contact on the second source/drain diffusion layer, the second contact including a first plug on the second source/drain diffusion layer, and a second plug on the first plug.

    摘要翻译: 根据一个实施例,磁存储器包括单元晶体管,其包括第一源极/漏极扩散层和第二源极/漏极扩散层,第一源极/漏极扩散层上的第一触点,第一触点上的存储元件,以及 在第二源/漏扩散层上的第二触点,第二触点包括在第二源极/漏极扩散层上的第一插头和第一插头上的第二插头。

    Small caliber laparoscope surgical apparatus
    8.
    发明授权
    Small caliber laparoscope surgical apparatus 有权
    小口径腹腔镜手术器械

    公开(公告)号:US08702748B2

    公开(公告)日:2014-04-22

    申请号:US12738478

    申请日:2008-10-16

    IPC分类号: A61B17/00

    摘要: A laparoscopic surgical instrument includes a shaft and a head having a distal end to which a variety of surgical instruments are attached. The laparoscopic surgical instrument also includes a flexible joint installed between the shaft and the head; a longitudinal-driving unit including a longitudinal-driving wire connected with both longitudinal ends of the head and a longitudinal-driving roller turning the longitudinal-driving wire and a transverse-driving unit including a transverse-driving wire connected with both transverse ends of the head and a transverse-driving roller turning the transverse-driving wire. The longitudinal-driving unit turns the flexible joint in the longitudinal direction, the transverse-driving unit turns the flexible joint in the transverse direction, and the shaft has a small diameter.

    摘要翻译: 腹腔镜手术器械包括轴和具有远端的头部,多个外科器械附接到该远端。 腹腔镜手术器械还包括安装在轴和头部之间的柔性接头; 纵向驱动单元,包括与头部的两个纵向端连接的纵向驱动线和转动纵向驱动线的纵向驱动辊;以及横向驱动单元,横向驱动单元包括横向驱动线,该横向驱动线与 头部和横向驱动辊转动横向驱动线。 纵向驱动单元沿纵向旋转柔性接头,横向驱动单元使柔性接头在横向上转动,并且轴具有小的直径。

    Method for forming capacitor of semiconductor device

    公开(公告)号:US06410381B1

    公开(公告)日:2002-06-25

    申请号:US09867658

    申请日:2001-05-31

    IPC分类号: H01L218242

    摘要: The present invention discloses a method for forming a capacitor of a semiconductor device which can increase a capacitance and prevent a leakage current at the same time. The method includes the steps of depositing a cap oxide film on a semiconductor substrate, patterning the cap oxide film to expose a capacitor region of the semiconductor substrate, consecutively depositing an Ru film for a lower electrode on the patterned cap oxide film and the semiconductor substrate in in-situ according to a low pressure chemical vapor deposition(LPCVD) and a plasma enhanced chemical vapor deposition(PECVD), forming a cylindrical lower electrode, by performing a chemical mechanical polishing process on the Ru film and removing the cap oxide film, forming an amorphous TaON film having a high dielectric constant on the lower electrode, crystallizing the amorphous TaON film according to a thermal treatment, and forming a metal film for an upper electrode on the crystallized TaON film.