公开(公告)号：US20110108932A1

公开(公告)日：2011-05-12

申请号：US11793853

申请日：2005-11-04

申请人： Hubert Benzel ,  Stefan Finkbeiner ,  Frank Fischer ,  Helmut Baumann ,  Lars Metzger ,  Roland Scheuerer ,  Peter Brauchle ,  Andreas Feustel ,  Matthias Neubauer

发明人： Hubert Benzel ,  Stefan Finkbeiner ,  Frank Fischer ,  Helmut Baumann ,  Lars Metzger ,  Roland Scheuerer ,  Peter Brauchle ,  Andreas Feustel ,  Matthias Neubauer

IPC分类号： H01L29/84 ,  H01L21/02

CPC分类号： G01L9/0073

摘要： A manufacturing method for producing a micromechanical sensor element which may be produced in a monolithically integrable design and has capacitive detection of a physical quantity is described. In addition to the manufacturing method, a micromechanical device containing such. a sensor element, e.g., a pressure sensor or an acceleration sensor, is described.

摘要翻译： 描述了可以以单片可集成设计制造并具有物理量的电容检测的微机械传感器元件的制造方法。 除了制造方法之外，还含有这样的微机械装置。 描述了传感器元件，例如压力传感器或加速度传感器。

公开(公告)号：US07740459B2

公开(公告)日：2010-06-22

申请号：US10564370

申请日：2004-07-07

申请人： Matthias Fuertsch ,  Hubert Benzel ,  Stefan Finkbeiner ,  Stefan Pinter ,  Frank Fischer ,  Heiko Stahl ,  Tjalf Pirk

发明人： Matthias Fuertsch ,  Hubert Benzel ,  Stefan Finkbeiner ,  Stefan Pinter ,  Frank Fischer ,  Heiko Stahl ,  Tjalf Pirk

IPC分类号： F04B17/03

CPC分类号： F04B43/043

摘要： A method for producing a micromechanical component, preferably for fluidic applications having cavities. The component is constructed from two functional layers, the two functional layers being patterned differently using micromechanical methods. A first etch stop layer having a first pattern is applied to a base plate. A first functional layer is applied to the first etch stop layer and to the first contact surfaces of the base plate. A second etch stop layer, having a second pattern, is applied to first functional layer. A second functional layer is applied to the second etch stop layer and to the second contact surfaces of the first functional layer. An etching mask is applied to the second functional layer. The second and the first functional layer are patterned as sacrificial layers by the use of the first and the second etch stop layer by etching methods and/or by using the first and the second etch stop layer. By supplementing patterning of the base plate, additional movable fluidic elements may be implemented, using the method. The method is preferably used for producing a micropump having an epitactic polysilicon layer as the pump diaphragm.

摘要翻译： 用于制造微机械部件的方法，优选用于具有空腔的流体应用。 该组件由两个功能层构成，两个功能层使用微机械方法被不同地图案化。 将具有第一图案的第一蚀刻停止层施加到基板。 第一功能层被施加到第一蚀刻停止层和基板的第一接触表面。 具有第二图案的第二蚀刻停止层被施加到第一功能层。 第二功能层被施加到第二蚀刻停止层和第一功能层的第二接触表面。 将蚀刻掩模施加到第二功能层。 通过使用第一和第二蚀刻停止层通过蚀刻方法和/或通过使用第一和第二蚀刻停止层将第二功能层和第一功能层图案化为牺牲层。 通过补充基板的图案化，可以使用该方法来实现附加的可移动流体元件。 该方法优选用于制造具有外延多晶硅层作为泵膜的微型泵。

公开(公告)号：US20060186085A1

公开(公告)日：2006-08-24

申请号：US10564370

申请日：2004-07-07

申请人： Matthias Fuertsch ,  Hubert Benzel ,  Stefan Finkbeiner ,  Stefan Pinter ,  Frank Fischer ,  Heiko Stahl ,  Tjalf Pirk

发明人： Matthias Fuertsch ,  Hubert Benzel ,  Stefan Finkbeiner ,  Stefan Pinter ,  Frank Fischer ,  Heiko Stahl ,  Tjalf Pirk

IPC分类号： C23F1/00 ,  F04B17/00

CPC分类号： F04B43/043

摘要： A method for producing a micromechanical component, preferably for fluidic applications having cavities. The component is constructed from two functional layers, the two functional layers being patterned differently using micromechanical methods. A first etch stop layer having a first pattern is applied to a base plate. A first functional layer is applied to the first etch stop layer and to the first contact surfaces of the base plate. A second etch stop layer, having a second pattern, is applied to first functional layer. A second functional layer is applied to the second etch stop layer and to the second contact surfaces of the first functional layer. An etching mask is applied to the second functional layer. The second and the first functional layer are patterned as sacrificial layers by the use of the first and the second etch stop layer by etching methods and/or by using the first and the second etch stop layer. By supplementing patterning of the base plate, additional movable fluidic elements may be implemented, using the method. The method is preferably used for producing a micropump having an epitactic polysilicon layer as the pump diaphragm.

摘要翻译： 用于制造微机械部件的方法，优选用于具有空腔的流体应用。 该组件由两个功能层构成，两个功能层使用微机械方法被不同地图案化。 将具有第一图案的第一蚀刻停止层施加到基板。 第一功能层被施加到第一蚀刻停止层和基板的第一接触表面。 具有第二图案的第二蚀刻停止层被施加到第一功能层。 第二功能层被施加到第二蚀刻停止层和第一功能层的第二接触表面。 将蚀刻掩模施加到第二功能层。 通过使用第一和第二蚀刻停止层通过蚀刻方法和/或通过使用第一和第二蚀刻停止层将第二功能层和第一功能层图案化为牺牲层。 通过补充基板的图案化，可以使用该方法来实现附加的可移动流体元件。 该方法优选用于制造具有外延多晶硅层作为泵膜的微型泵。

公开(公告)号：US08174082B2

公开(公告)日：2012-05-08

申请号：US11628100

申请日：2005-04-28

申请人： Frank Fischer ,  Eckhard Graf ,  Heiko Stahl ,  Hartmut Kueppers ,  Roland Scheuerer

发明人： Frank Fischer ,  Eckhard Graf ,  Heiko Stahl ,  Hartmut Kueppers ,  Roland Scheuerer

IPC分类号： H01L27/14

CPC分类号： B81B7/0041 ,  B81B7/02 ,  B81B2201/025 ,  B81C2201/019 ,  B81C2203/0145

摘要： A micromechanical component having at least two caverns is provided, the caverns being delimited by the micromechanical component and a cap, and the caverns having different internal atmospheric pressures. The micromechanical component and cap are hermetically joined to one another at a first specifiable atmospheric pressure, then an access to at least one cavern is produced, and subsequently the access is hermetically closed off at a second specifiable atmospheric pressure.

摘要翻译： 提供具有至少两个洞穴的微机械部件，该洞穴由微机械部件和盖限定，并且该洞穴具有不同的内部大气压力。 微机械部件和盖子以第一可指定的大气压力彼此气密地接合，然后产生对至少一个洞穴的通路，随后在第二可指定的大气压力下将通道气密地关闭。

公开(公告)号：US20080136000A1

公开(公告)日：2008-06-12

申请号：US11628100

申请日：2005-04-28

申请人： Frank Fischer ,  Eckhard Graf ,  Heiko Stahl ,  Hartmut Kueppers ,  Roland Scheuerer

发明人： Frank Fischer ,  Eckhard Graf ,  Heiko Stahl ,  Hartmut Kueppers ,  Roland Scheuerer

IPC分类号： H01L23/055 ,  H01L21/58

CPC分类号： B81B7/0041 ,  B81B7/02 ,  B81B2201/025 ,  B81C2201/019 ,  B81C2203/0145

摘要： A micromechanical component having at least two caverns is provided, the caverns being delimited by the micromechanical component and a cap, and the caverns having different internal atmospheric pressures. The micromechanical component and cap are hermetically joined to one another at a first specifiable atmospheric pressure, then an access to at least one cavern is produced, and subsequently the access is hermetically closed off at a second specifiable atmospheric pressure.

摘要翻译： 提供具有至少两个洞穴的微机械部件，该洞穴由微机械部件和盖限定，并且该洞穴具有不同的内部大气压力。 微机械部件和盖子以第一可指定的大气压力彼此气密地接合，然后产生对至少一个洞穴的通路，随后在第二可指定的大气压力下将通道气密地关闭。

公开(公告)号：US07495302B2

公开(公告)日：2009-02-24

申请号：US11072859

申请日：2005-03-03

申请人： Frank Fischer ,  Hans Artmann ,  Lars Metzger ,  Arnim Hoechst ,  Julian Gonska

发明人： Frank Fischer ,  Hans Artmann ,  Lars Metzger ,  Arnim Hoechst ,  Julian Gonska

IPC分类号： H01L27/00

CPC分类号： B81B7/0029 ,  B81B2201/0264 ,  B81B2203/0127 ,  B81B2203/0315 ,  B81B2203/0338 ,  B81C2201/0109

摘要： A micromechanical component having a diaphragm is provided, the structure of which effectively prevents the penetration of dirt particles into the cavity. A method for manufacturing such a component is also provided. The structure of the component is implemented in a layer structure which includes at least one first sacrificial layer and a layer system over the first sacrificial layer. A cavity is formed in the first sacrificial layer underneath the diaphragm. In the region of the diaphragm between the upper layer and the lower layer of the layer system situated directly above the first sacrificial layer, at least one access channel to the cavity is formed which has at least one opening in the upper layer and at least one opening in the lower layer, the opening in the upper layer and the opening in the lower layer being offset with respect to each other.

摘要翻译： 提供了具有隔膜的微机械部件，其结构有效地防止了灰尘颗粒进入空腔。 还提供了制造这种部件的方法。 组件的结构以包括至少一个第一牺牲层和第一牺牲层上的层系统的层结构来实现。 在隔膜下方的第一牺牲层中形成空腔。 在位于第一牺牲层正上方的层系统的上层和下层之间的隔膜区域中，形成至少一个到空腔的通道，其在上层中具有至少一个开口，并且至少一个开口 在下层中开口，上层中的开口和下层中的开口相对于彼此偏移。

公开(公告)号：US07261825B2

公开(公告)日：2007-08-28

申请号：US10522694

申请日：2003-02-21

申请人： Lars Metzger ,  Frank Fischer

发明人： Lars Metzger ,  Frank Fischer

IPC分类号： H01L21/302 ,  C23F1/00

CPC分类号： B81C1/00142 ,  B81B2201/042 ,  B81C2201/0132 ,  G02B26/0833

摘要： A method for producing a micromechanical device, e.g., a micromechanical oscillating mirror device, is provided. It is provided, starting from the front side of an SOI/EOI(epipoly on insulator) substrate, to penetrate to the desired depth of the silicon substrate layer in two successive, separate deep etching steps, and to use this in its upper region that is close to the oxide layer as sacrificial layer for vertically exposing the island structures that are positioned above the oxide layer in the functional layer. The method according to the present invention of a sacrificial layer process for generating large vertical deflections utilizes purely surface micromechanical process steps.

摘要翻译： 提供了一种用于制造微机械装置的方法，例如微机械振荡镜装置。 提供从SOI / EOI（绝缘体上的绝缘体上）的正面开始，在两个连续的，独立的深刻蚀步骤中穿透到硅衬底层的期望深度，并且在其上部区域中使用 靠近氧化层作为用于垂直曝光位于功能层中的氧化物层上方的岛状结构的牺牲层。 根据本发明的用于产生大的垂直偏转的牺牲层工艺的方法利用纯表面微机械工艺步骤。

公开(公告)号：US07148077B2

公开(公告)日：2006-12-12

申请号：US10970069

申请日：2004-10-19

申请人： Matthias Fuertsch ,  Stefan Pinter ,  Heribert Weber ,  Frank Fischer ,  Lars Metzger ,  Christoph Schelling ,  Frieder Sundermeier

发明人： Matthias Fuertsch ,  Stefan Pinter ,  Heribert Weber ,  Frank Fischer ,  Lars Metzger ,  Christoph Schelling ,  Frieder Sundermeier

IPC分类号： H01L21/00

CPC分类号： B81B3/007 ,  B81B2201/0264 ,  B81B2203/0127 ,  B81C2201/0167

摘要： A micromechanical structural element, having a very stable diaphragm, implemented in a pure front process and in a layer construction on a substrate. The layer construction includes at least one sacrificial layer and one diaphragm layer above the sacrificial layer, which is structured for laying bare the diaphragm and generating stabilizing elements on the diaphragm, at least one recess being generated for a stabilizing element of the diaphragm. The structure generated in the sacrificial layer is then at least superficially closed with at least one material layer being deposited above the structured sacrificial layer, this material layer forming at least a part of the diaphragm layer and being structured to generate at least one etch hole for etching the sacrificial layer, which is removed from the region under the etch hole, the diaphragm and the at least one stabilizing element being laid bare, a cavity being created under the diaphragm.

摘要翻译： 具有非常稳定的隔膜的微机械结构元件以纯正的前工艺和基底上的层结构实现。 该层结构包括至少一个牺牲层和牺牲层上方的一个隔膜层，其被构造用于铺设隔膜并在隔膜上产生稳定元件，为隔膜的稳定元件产生至少一个凹槽。 然后在牺牲层中产生的结构至少被表面封闭，其中至少一个材料层沉积在结构化牺牲层的上方，该材料层形成隔膜层的至少一部分并被构造成产生至少一个蚀刻孔 蚀刻从蚀刻孔下方的区域去除的牺牲层，隔膜和至少一个稳定元件被裸露，在隔膜下面形成空腔。

公开(公告)号：US07321156B2

公开(公告)日：2008-01-22

申请号：US10897449

申请日：2004-07-22

申请人： Frank Fischer ,  Hans-Peter Trah ,  Franz Laermer ,  Lars Metzger

发明人： Frank Fischer ,  Hans-Peter Trah ,  Franz Laermer ,  Lars Metzger

IPC分类号： H01L29/82

CPC分类号： G01L9/0073

摘要： A device for manufacturing a capacitive pressure measurement includes an insulated base electrode, a mechanically deflectable counterelectrode composed of a layer made of at least one of a monocrystalline and polycrystalline semiconductor material, a contact arrangement for electrically connecting the electrodes, and at least one semiconductor component, all integrated onto a semiconductor substrate. The connection for the base electrode is formed by an electrically insulated conductive polycrystalline semiconductor layer. The method for manufactured the device includes the step of arranging a conductive polycrystalline semiconductor layer between two insulating layers on the semiconductor substrate for forming a base electrode.

摘要翻译： 用于制造电容式压力测量的装置包括绝缘基极，由由单晶和多晶半导体材料中的至少一种构成的层，用于电连接电极的接触装置和至少一个半导体元件 ，全部集成到半导体衬底上。 用于基极的连接由电绝缘的导电多晶半导体层形成。 制造该器件的方法包括在用于形成基极的半导体衬底上的两个绝缘层之间布置导电多晶半导体层的步骤。

公开(公告)号：US06867061B2

公开(公告)日：2005-03-15

申请号：US10467216

申请日：2002-02-04

申请人： Frank Fischer ,  Wilhelm Frey ,  Lars Metzger

发明人： Frank Fischer ,  Wilhelm Frey ,  Lars Metzger

IPC分类号： B81B3/00 ,  B81C1/00 ,  G01P15/08 ,  G01P15/125 ,  H01L21/00 ,  H01L27/20 ,  H01L29/82 ,  H01L29/84

CPC分类号： G01P15/125 ,  B81B2201/025 ,  B81C1/00619 ,  B81C2201/0112 ,  G01P15/0802 ,  G01P2015/0814

摘要： A method is described for producing surface micromechanical structures having a high aspect ratio, a sacrificial layer being provided between a substrate and a function layer, trenches being provided by a plasma etching process in the function layer, at least some of these trenches exposing surface regions of the sacrificial layer. To increase the aspect ratio of the trenches, an additional layer is deposited on the side walls of the trenches in at least some sections, but not on the exposed surface regions of the sacrificial layer. In addition, a sensor is described, in particular an acceleration sensor or a rotational rate sensor.

摘要翻译： 描述了一种用于生产具有高纵横比的表面微机械结构的方法，牺牲层设置在衬底和功能层之间，沟槽通过功能层中的等离子体蚀刻工艺提供，这些沟槽中的至少一些暴露表面区域 的牺牲层。 为了增加沟槽的纵横比，在至少一些部分中的沟槽的侧壁上而不是在牺牲层的暴露的表面区域上沉积附加层。 此外，描述了传感器，特别是加速度传感器或转速传感器。