SEMICONDUCTOR DEVICE INCLUDING A CAVITY LID
    7.
    发明申请
    SEMICONDUCTOR DEVICE INCLUDING A CAVITY LID 审中-公开
    半导体器件,包括一个CAVITY LID

    公开(公告)号:US20160297672A1

    公开(公告)日:2016-10-13

    申请号:US14684815

    申请日:2015-04-13

    Abstract: A semiconductor device having a lid, and method of making a semiconductor device having a lid is disclosed. The semiconductor device includes a substrate. A device is positioned at the substrate. A lid made of a semiconductor material is positioned over the device to form a protective cavity about the device. The lid is formed using a semiconductor process. In other examples, the lid may be made of a nonconductive material, such as a polymer material. The lids may be formed as part of a batch process.

    Abstract translation: 本发明公开了一种具有盖的半导体器件和制造具有盖的半导体器件的方法。 半导体器件包括衬底。 设备位于基板上。 由半导体材料制成的盖子位于该装置上方以形成围绕该装置的保护腔。 使用半导体工艺形成盖。 在其他示例中,盖可以由非导电材料制成,例如聚合物材料。 盖可以形成为批处理的一部分。

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