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    Positive photoresists containing novel photoactive compounds
    1.
    发明授权
    Positive photoresists containing novel photoactive compounds 失效
    含有新型光活性化合物的正性光致抗蚀剂

    公开(公告)号：US5876897A

    公开(公告)日：1999-03-02

    申请号：US812542

    申请日：1997-03-07

    申请人： Dana L. Durham ,  Ping-Hung Lu ,  Joseph E. Oberlander ,  Dinesh N. Khanna

    发明人： Dana L. Durham ,  Ping-Hung Lu ,  Joseph E. Oberlander ,  Dinesh N. Khanna

    IPC分类号： C08K5/00 ,  C08L61/06 ,  C08L101/12 ,  G03F7/004 ,  G03F7/022 ,  G03F7/039 ,  H01L21/027 ,  G03F7/023 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  G03F7/022

    摘要： A light sensitive positive composition comprising an alkali soluble resin, a novel photoactive compound represented by the structure ##STR1## where, X is O, S or N--R', where R' is H, alkyl, substituted alkyl, aryl or aralkyl,Y is a connecting group such as SO.sub.2, CO, O or NR',Z is a carbon containing organic ballast moiety having a molecular weight greater than about 75 and can form a bond with the connecting group,R is independently H, alkyl, alkoxy, aryl, aralkyl, halo or fluoroalkyl,m=1-3, and n.gtoreq.1;and a solvent or mixture of solvents. The invention further comprises a process for imaging the composition of this invention to give positive image. The light sensitive composition is especially useful as a positive deep-uv photoresist.

    摘要翻译： 一种光敏正性组合物，其包含碱溶性树脂，由结构表示的新型光敏化合物，其中X为O，S或N-R'，其中R'为H，烷基，取代的烷基，芳基或芳烷基， Y是连接基团，例如SO 2，CO，O或NR'，Z是分子量大于约75的含碳有机镇流器部分，可与连接基团形成键，R独立地为H，烷基，烷氧基 ，芳基，芳烷基，卤代或氟烷基，m = 1-3，n≥1; 和溶剂或溶剂混合物。 本发明还包括用于对本发明的组合物进行成像以给出正像的方法。 光敏组合物特别适用于正深紫外光致抗蚀剂。

    Photosensitive composition and use thereof
    9.
    发明授权
    Photosensitive composition and use thereof 失效
    感光组合物及其用途

    公开(公告)号：US07078157B2

    公开(公告)日：2006-07-18

    申请号：US10376356

    申请日：2003-02-27

    申请人： Hong Zhuang ,  Joseph E. Oberlander ,  Ping-Hung Lu ,  Stanely F. Wanat ,  Robert R. Plass

    发明人： Hong Zhuang ,  Joseph E. Oberlander ,  Ping-Hung Lu ,  Stanely F. Wanat ,  Robert R. Plass

    IPC分类号： G03C1/73 ,  G03F7/028 ,  G03F7/20 ,  G03F7/30 ,  G03F7/42

    CPC分类号： G03F7/033 ,  Y10S430/117

    摘要： A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.

    摘要翻译： 一种组合物，其包含含有至少两个侧链不饱和基团的光聚合化合物; 至少一种烯键式不饱和光聚合聚环氧烷亲水单体; 至少一种非离子表面活性剂; 并提供至少一种光引发剂。 组合物还优选含有至少一种胺改性的丙烯酸低聚物和染料。 其他常规光致抗蚀剂组分如光敏剂，粘合促进剂，流平剂和溶剂也可以包括在组合物中。 这样的组合物可用于在基底上形成图案，例如在基底上图案化微光刻电路。