公开(公告)号：US09935060B2

公开(公告)日：2018-04-03

申请号：US15430582

申请日：2017-02-13

Applicant: Infineon Technologies AG

Inventor： Srinivasa Reddy Yeduru ,  Karl Heinz Gasser ,  Stefan Woehlert ,  Karl Mayer ,  Francisco Javier Santos Rodriguez

IPC: H01L23/00 ,  H01L21/683 ,  H01L21/288

CPC classification number: H01L23/562 ,  H01L21/288 ,  H01L21/4814 ,  H01L21/6835 ,  H01L23/49838 ,  H01L24/03 ,  H01L24/05 ,  H01L24/27 ,  H01L24/29 ,  H01L24/30 ,  H01L24/32 ,  H01L24/83 ,  H01L24/94 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/03002 ,  H01L2224/04026 ,  H01L2224/0508 ,  H01L2224/05082 ,  H01L2224/05083 ,  H01L2224/05084 ,  H01L2224/05571 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/05687 ,  H01L2224/27002 ,  H01L2224/27005 ,  H01L2224/2732 ,  H01L2224/2747 ,  H01L2224/29011 ,  H01L2224/29014 ,  H01L2224/29021 ,  H01L2224/29023 ,  H01L2224/29035 ,  H01L2224/29036 ,  H01L2224/29111 ,  H01L2224/29147 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/29294 ,  H01L2224/29339 ,  H01L2224/29347 ,  H01L2224/29393 ,  H01L2224/32245 ,  H01L2224/94 ,  H01L2924/12042 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01023 ,  H01L2924/01015 ,  H01L2924/04941 ,  H01L2924/01014 ,  H01L2924/01029 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05124 ,  H01L2224/05187 ,  H01L2924/0665 ,  H01L2924/01006 ,  H01L2924/0105 ,  H01L2924/01047 ,  H01L2924/00012 ,  H01L2224/03 ,  H01L2224/27 ,  H01L2924/0781 ,  H01L2924/07802

Abstract: A method for processing a wafer in accordance with various embodiments may include: removing wafer material from an inner portion of the wafer to form a structure at an edge region of the wafer to at least partially surround the inner portion of the wafer, and printing material into the inner portion of the wafer using the structure as a printing mask. A method for processing a wafer in accordance with various embodiments may include: providing a carrier and a wafer, the wafer having a first side and a second side opposite the first side, the first side of the wafer being attached to the carrier, the second side having a structure at an edge region of the wafer, the structure at least partially surrounding an inner portion of the wafer; and printing material onto at least a portion of the second side of the wafer.

公开(公告)号：US09589880B2

公开(公告)日：2017-03-07

申请号：US14049340

申请日：2013-10-09

Applicant: Infineon Technologies AG

Inventor： Srinivasa Reddy Yeduru ,  Karl Heinz Gasser ,  Stefan Woehlert ,  Karl Mayer ,  Francisco Javier Santos Rodriguez

IPC: H01L21/04 ,  H01L23/498 ,  H01L21/48 ,  H01L21/683 ,  H01L23/00

CPC classification number: H01L23/562 ,  H01L21/288 ,  H01L21/4814 ,  H01L21/6835 ,  H01L23/49838 ,  H01L24/03 ,  H01L24/05 ,  H01L24/27 ,  H01L24/29 ,  H01L24/30 ,  H01L24/32 ,  H01L24/83 ,  H01L24/94 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/03002 ,  H01L2224/04026 ,  H01L2224/0508 ,  H01L2224/05082 ,  H01L2224/05083 ,  H01L2224/05084 ,  H01L2224/05571 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/05687 ,  H01L2224/27002 ,  H01L2224/27005 ,  H01L2224/2732 ,  H01L2224/2747 ,  H01L2224/29011 ,  H01L2224/29014 ,  H01L2224/29021 ,  H01L2224/29023 ,  H01L2224/29035 ,  H01L2224/29036 ,  H01L2224/29111 ,  H01L2224/29147 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/29294 ,  H01L2224/29339 ,  H01L2224/29347 ,  H01L2224/29393 ,  H01L2224/32245 ,  H01L2224/94 ,  H01L2924/12042 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01023 ,  H01L2924/01015 ,  H01L2924/04941 ,  H01L2924/01014 ,  H01L2924/01029 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05124 ,  H01L2224/05187 ,  H01L2924/0665 ,  H01L2924/01006 ,  H01L2924/0105 ,  H01L2924/01047 ,  H01L2924/00012 ,  H01L2224/03 ,  H01L2224/27 ,  H01L2924/0781 ,  H01L2924/07802

Abstract: A method for processing a wafer in accordance with various embodiments may include: removing wafer material from an inner portion of the wafer to form a structure at an edge region of the wafer to at least partially surround the inner portion of the wafer, and printing material into the inner portion of the wafer using the structure as a printing mask. A method for processing a wafer in accordance with various embodiments may include: providing a carrier and a wafer, the wafer having a first side and a second side opposite the first side, the first side of the wafer being attached to the carrier, the second side having a structure at an edge region of the wafer, the structure at least partially surrounding an inner portion of the wafer; and printing material onto at least a portion of the second side of the wafer.

Abstract translation: 根据各种实施例的用于处理晶片的方法可以包括：从晶片的内部部分去除晶片材料以在晶片的边缘区域处形成至少部分地围绕晶片内部的结构，以及印刷材料 使用该结构作为印刷掩模进入晶片的内部。 根据各种实施例的用于处理晶片的方法可以包括：提供载体和晶片，所述晶片具有第一侧和与第一侧相对的第二侧，晶片的第一侧附接到载体，第二 所述结构在所述晶片的边缘区域具有结构，所述结构至少部分地围绕所述晶片的内部; 并将印刷材料印刷在晶片的第二面的至少一部分上。

公开(公告)号：US20150097294A1

公开(公告)日：2015-04-09

申请号：US14049340

申请日：2013-10-09

Applicant: Infineon Technologies AG

Inventor： Srinivasa Reddy Yeduru ,  Karl Heinz Gasser ,  Stefan Woehlert ,  Karl Mayer ,  Francisco Javier Santos Rodriguez

IPC: H01L23/498 ,  H01L21/48

CPC classification number: H01L23/562 ,  H01L21/288 ,  H01L21/4814 ,  H01L21/6835 ,  H01L23/49838 ,  H01L24/03 ,  H01L24/05 ,  H01L24/27 ,  H01L24/29 ,  H01L24/30 ,  H01L24/32 ,  H01L24/83 ,  H01L24/94 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/03002 ,  H01L2224/04026 ,  H01L2224/0508 ,  H01L2224/05082 ,  H01L2224/05083 ,  H01L2224/05084 ,  H01L2224/05571 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/05687 ,  H01L2224/27002 ,  H01L2224/27005 ,  H01L2224/2732 ,  H01L2224/2747 ,  H01L2224/29011 ,  H01L2224/29014 ,  H01L2224/29021 ,  H01L2224/29023 ,  H01L2224/29035 ,  H01L2224/29036 ,  H01L2224/29111 ,  H01L2224/29147 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/29294 ,  H01L2224/29339 ,  H01L2224/29347 ,  H01L2224/29393 ,  H01L2224/32245 ,  H01L2224/94 ,  H01L2924/12042 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01023 ,  H01L2924/01015 ,  H01L2924/04941 ,  H01L2924/01014 ,  H01L2924/01029 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05124 ,  H01L2224/05187 ,  H01L2924/0665 ,  H01L2924/01006 ,  H01L2924/0105 ,  H01L2924/01047 ,  H01L2924/00012 ,  H01L2224/03 ,  H01L2224/27 ,  H01L2924/0781 ,  H01L2924/07802

Abstract: A method for processing a wafer in accordance with various embodiments may include: removing wafer material from an inner portion of the wafer to form a structure at an edge region of the wafer to at least partially surround the inner portion of the wafer, and printing material into the inner portion of the wafer using the structure as a printing mask. A method for processing a wafer in accordance with various embodiments may include: providing a carrier and a wafer, the wafer having a first side and a second side opposite the first side, the first side of the wafer being attached to the carrier, the second side having a structure at an edge region of the wafer, the structure at least partially surrounding an inner portion of the wafer; and printing material onto at least a portion of the second side of the wafer.

Abstract translation: 根据各种实施例的用于处理晶片的方法可以包括：从晶片的内部部分去除晶片材料以在晶片的边缘区域处形成至少部分地围绕晶片内部的结构，以及印刷材料 使用该结构作为印刷掩模进入晶片的内部。 根据各种实施例的用于处理晶片的方法可以包括：提供载体和晶片，所述晶片具有第一侧和与第一侧相对的第二侧，晶片的第一侧附接到载体，第二 所述结构在所述晶片的边缘区域具有结构，所述结构至少部分地围绕所述晶片的内部; 并将印刷材料印刷在晶片的第二面的至少一部分上。

公开(公告)号：US20170154857A1

公开(公告)日：2017-06-01

申请号：US15430582

申请日：2017-02-13

Applicant: Infineon Technologies AG

Inventor： Srinivasa Reddy Yeduru ,  Karl Heinz Gasser ,  Stefan Woehlert ,  Karl Mayer ,  Francisco Javier Santos Rodriguez

IPC: H01L23/00 ,  H01L21/288 ,  H01L21/683

CPC classification number: H01L23/562 ,  H01L21/288 ,  H01L21/4814 ,  H01L21/6835 ,  H01L23/49838 ,  H01L24/03 ,  H01L24/05 ,  H01L24/27 ,  H01L24/29 ,  H01L24/30 ,  H01L24/32 ,  H01L24/83 ,  H01L24/94 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/03002 ,  H01L2224/04026 ,  H01L2224/0508 ,  H01L2224/05082 ,  H01L2224/05083 ,  H01L2224/05084 ,  H01L2224/05571 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/05687 ,  H01L2224/27002 ,  H01L2224/27005 ,  H01L2224/2732 ,  H01L2224/2747 ,  H01L2224/29011 ,  H01L2224/29014 ,  H01L2224/29021 ,  H01L2224/29023 ,  H01L2224/29035 ,  H01L2224/29036 ,  H01L2224/29111 ,  H01L2224/29147 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/29294 ,  H01L2224/29339 ,  H01L2224/29347 ,  H01L2224/29393 ,  H01L2224/32245 ,  H01L2224/94 ,  H01L2924/12042 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01023 ,  H01L2924/01015 ,  H01L2924/04941 ,  H01L2924/01014 ,  H01L2924/01029 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05124 ,  H01L2224/05187 ,  H01L2924/0665 ,  H01L2924/01006 ,  H01L2924/0105 ,  H01L2924/01047 ,  H01L2924/00012 ,  H01L2224/03 ,  H01L2224/27 ,  H01L2924/0781 ,  H01L2924/07802

Abstract: A method for processing a wafer in accordance with various embodiments may include: removing wafer material from an inner portion of the wafer to form a structure at an edge region of the wafer to at least partially surround the inner portion of the wafer, and printing material into the inner portion of the wafer using the structure as a printing mask. A method for processing a wafer in accordance with various embodiments may include: providing a carrier and a wafer, the wafer having a first side and a second side opposite the first side, the first side of the wafer being attached to the carrier, the second side having a structure at an edge region of the wafer, the structure at least partially surrounding an inner portion of the wafer; and printing material onto at least a portion of the second side of the wafer.

公开(公告)号：US09614045B2

公开(公告)日：2017-04-04

申请号：US14488334

申请日：2014-09-17

Applicant: Infineon Technologies AG

Inventor： Srinivasa Reddy Yeduru ,  Joachim Hirschler ,  Harald Wiedenhofer ,  Franz Kleinbichler

IPC: H01L29/41 ,  H01L21/02 ,  H01L21/3105

CPC classification number: H01L29/41 ,  H01L21/02063 ,  H01L21/02068 ,  H01L21/31058 ,  H01L21/4853 ,  H01L23/49811

Abstract: In various embodiments, a method of processing a semiconductor device may include providing a semiconductor device comprising a contact pad and a polymer layer; and subjecting at least a part of the contact pad and the polymer layer to a plasma comprising ammonia.