公开(公告)号：US12119387B2

公开(公告)日：2024-10-15

申请号：US17033471

申请日：2020-09-25

申请人： Intel Corporation

发明人： Gilbert Dewey ,  Nazila Haratipour ,  Siddharth Chouksey ,  Jack T. Kavalieros ,  Jitendra Kumar Jha ,  Matthew V. Metz ,  Mengcheng Lu ,  Anand S. Murthy ,  Koustav Ganguly ,  Ryan Keech ,  Glenn A. Glass ,  Arnab Sen Gupta

IPC分类号： H01L29/45 ,  H01L21/285 ,  H01L21/768 ,  H01L23/485 ,  H01L29/06 ,  H01L29/08 ,  H01L29/40 ,  H01L29/417 ,  H01L29/423 ,  H01L29/66 ,  H01L29/775 ,  H01L29/78 ,  H01L29/786

CPC分类号： H01L29/45 ,  H01L21/28518 ,  H01L29/0673 ,  H01L29/0847 ,  H01L29/41733 ,  H01L29/42392 ,  H01L29/66545 ,  H01L29/66742 ,  H01L29/66795 ,  H01L29/7851 ,  H01L29/78618 ,  H01L29/78696

摘要： Low resistance approaches for fabricating contacts, and semiconductor structures having low resistance metal contacts, are described. In an example, an integrated circuit structure includes a semiconductor structure above a substrate. A gate electrode is over the semiconductor structure, the gate electrode defining a channel region in the semiconductor structure. A first semiconductor source or drain structure is at a first end of the channel region at a first side of the gate electrode. A second semiconductor source or drain structure is at a second end of the channel region at a second side of the gate electrode, the second end opposite the first end. A source or drain contact is directly on the first or second semiconductor source or drain structure, the source or drain contact including a barrier layer and an inner conductive structure.

公开(公告)号：US12021081B2

公开(公告)日：2024-06-25

申请号：US17468522

申请日：2021-09-07

申请人： INTEL CORPORATION

发明人： Glenn A. Glass ,  Anand S. Murthy

IPC分类号： H01L27/092 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/8238 ,  H01L29/66 ,  H01L29/78

CPC分类号： H01L27/0924 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/823807 ,  H01L21/823821 ,  H01L29/66545 ,  H01L29/66818 ,  H01L29/785

摘要： Techniques are disclosed for achieving multiple fin dimensions on a single die or semiconductor substrate. In some cases, multiple fin dimensions are achieved by lithographically defining (e.g., hardmasking and patterning) areas to be trimmed using a trim etch process, leaving the remainder of the die unaffected. In some such cases, the trim etch is performed on only the channel regions of the fins, when such channel regions are re-exposed during a replacement gate process. The trim etch may narrow the width of the fins being trimmed (or just the channel region of such fins) by 2-6 nm, for example. Alternatively, or in addition, the trim may reduce the height of the fins. The techniques can include any number of patterning and trimming processes to enable a variety of fin dimensions and/or fin channel dimensions on a given die, which may be useful for integrated circuit and system-on-chip (SOC) applications.

公开(公告)号：US20240128340A1

公开(公告)日：2024-04-18

申请号：US18396174

申请日：2023-12-26

申请人： Intel Corporation

发明人： Patrick Morrow ,  Glenn A. Glass ,  Anand S. Murthy ,  Rishabh Mehandru

IPC分类号： H01L29/417 ,  H01L21/285 ,  H01L29/66 ,  H01L29/78

CPC分类号： H01L29/41791 ,  H01L21/28568 ,  H01L29/66795 ,  H01L29/7851

摘要： Disclosed herein are integrated circuit (IC) contact structures, and related devices and methods. For example, in some embodiments, an IC contact structure may include an electrical element, a metal on the electrical element, and a semiconductor material on the metal. The metal may conductively couple the semiconductor material and the electrical element.

公开(公告)号：US11764275B2

公开(公告)日：2023-09-19

申请号：US16074373

申请日：2016-04-01

申请人： Intel Corporation

发明人： Chandra S. Mohapatra ,  Glenn A. Glass ,  Harold W. Kennel ,  Anand S. Murthy ,  Willy Rachmady ,  Gilbert Dewey ,  Sean T. Ma ,  Matthew V. Metz ,  Jack T. Kavalieros ,  Tahir Ghani

IPC分类号： H01L29/417 ,  H01L29/201 ,  H01L29/66 ,  H01L29/78

CPC分类号： H01L29/41791 ,  H01L29/201 ,  H01L29/66795 ,  H01L29/785 ,  H01L2029/7858

摘要： An apparatus including a transistor device disposed on a surface of a circuit substrate, the device including a body including opposing sidewalls defining a width dimension and a channel material including indium, the channel material including a profile at a base thereof that promotes indium atom diffusivity changes in the channel material in a direction away from the sidewalls. A method including forming a transistor device body on a circuit substrate, the transistor device body including opposing sidewalls and including a buffer material and a channel material on the buffer material, the channel material including indium and the buffer material includes a facet that promotes indium atom diffusivity changes in the channel material in a direction away from the sidewalls; and forming a gate stack on the channel material.

公开(公告)号：US11658217B2

公开(公告)日：2023-05-23

申请号：US16242670

申请日：2019-01-08

申请人： Intel Corporation

发明人： Han Wui Then ,  Marko Radosavljevic ,  Glenn A. Glass ,  Sansaptak Dasgupta ,  Nidhi Nidhi ,  Paul B. Fischer ,  Rahul Ramaswamy ,  Walid M. Hafez ,  Johann Christian Rode

IPC分类号： H01L29/00 ,  H01L29/40 ,  H01L21/265 ,  H01L29/778 ,  H01L29/205

CPC分类号： H01L29/405 ,  H01L21/265 ,  H01L29/205 ,  H01L29/404 ,  H01L29/408 ,  H01L29/7786

摘要： Disclosed herein are IC structures, packages, and devices assemblies that use ions or fixed charge to create field plate structures which are embedded in a dielectric material between gate and drain electrodes of a transistor. Ion- or fixed charge-based field plate structures may provide viable approaches to changing the distribution of electric field at a transistor drain to increase the breakdown voltage of a transistor without incurring the large parasitic capacitances associated with the use of metal field plates. In one aspect, an IC structure includes a transistor, a dielectric material between gate and drain electrodes of the transistor, and an ion- or fixed charge-based region within the dielectric material, between the gate and the drain electrodes. Such an ion- or fixed charge-based region realizes an ion- or fixed charge-based field plate structure. Optionally, the IC structure may include multiple ion- or fixed charge-based field plate structures.

公开(公告)号：US11476344B2

公开(公告)日：2022-10-18

申请号：US17643742

申请日：2021-12-10

申请人： Intel Corporation

发明人： Glenn A. Glass ,  Anand S. Murthy ,  Tahir Ghani

IPC分类号： H01L21/28 ,  H01L21/76 ,  H01L29/08 ,  H01L29/16 ,  H01L29/66 ,  H01L29/78 ,  H01L29/45 ,  H01L29/165 ,  H01L21/285 ,  H01L21/768

摘要： Techniques are disclosed for forming transistor devices having reduced parasitic contact resistance relative to conventional devices. The techniques can be implemented, for example, using a standard contact stack such as a series of metals on, for example, silicon or silicon germanium (SiGe) source/drain regions. In accordance with one example such embodiment, an intermediate boron doped germanium layer is provided between the source/drain and contact metals to significantly reduce contact resistance. Numerous transistor configurations and suitable fabrication processes will be apparent in light of this disclosure, including both planar and non-planar transistor structures (e.g., FinFETs), as well as strained and unstrained channel structures. Graded buffering can be used to reduce misfit dislocation. The techniques are particularly well-suited for implementing p-type devices, but can be used for n-type devices if so desired.

公开(公告)号：US20220059656A1

公开(公告)日：2022-02-24

申请号：US17453088

申请日：2021-11-01

申请人： Intel Corporation

发明人： Stephen M. Cea ,  Roza Kotlyar ,  Harold W. Kennel ,  Anand S. Murthy ,  Glenn A. Glass ,  Kelin J. Kuhn ,  Tahir Ghani

IPC分类号： H01L29/10 ,  H01L29/66 ,  H01L29/778 ,  H01L29/165 ,  H01L21/84 ,  H01L27/12 ,  H01L21/8238 ,  H01L27/092 ,  H01L29/161

摘要： Techniques and methods related to strained NMOS and PMOS devices without relaxed substrates, systems incorporating such semiconductor devices, and methods therefor may include a semiconductor device that may have both n-type and p-type semiconductor bodies. Both types of semiconductor bodies may be formed from an initially strained semiconductor material such as silicon germanium. A silicon cladding layer may then be provided at least over or on the n-type semiconductor body. In one example, a lower portion of the semiconductor bodies is formed by a Si extension of the wafer or substrate. By one approach, an upper portion of the semiconductor bodies, formed of the strained SiGe, may be formed by blanket depositing the strained SiGe layer on the Si wafer, and then etching through the SiGe layer and into the Si wafer to form the semiconductor bodies or fins with the lower and upper portions.

公开(公告)号：US11195919B2

公开(公告)日：2021-12-07

申请号：US16148621

申请日：2018-10-01

申请人： Intel Corporation

发明人： Stephen M. Cea ,  Roza Kotlyar ,  Harold W. Kennel ,  Anand S. Murthy ,  Glenn A. Glass ,  Kelin J. Kuhn ,  Tahir Ghani

IPC分类号： H01L29/10 ,  H01L29/66 ,  H01L29/778 ,  H01L21/84 ,  H01L21/8238 ,  H01L29/161 ,  H01L29/04 ,  H01L29/165 ,  H01L27/12 ,  H01L27/092

摘要： Techniques and methods related to strained NMOS and PMOS devices without relaxed substrates, systems incorporating such semiconductor devices, and methods therefor may include a semiconductor device that may have both n-type and p-type semiconductor bodies. Both types of semiconductor bodies may be formed from an initially strained semiconductor material such as silicon germanium. A silicon cladding layer may then be provided at least over or on the n-type semiconductor body. In one example, a lower portion of the semiconductor bodies is formed by a Si extension of the wafer or substrate. By one approach, an upper portion of the semiconductor bodies, formed of the strained SiGe, may be formed by blanket depositing the strained SiGe layer on the Si wafer, and then etching through the SiGe layer and into the Si wafer to form the semiconductor bodies or fins with the lower and upper portions.

公开(公告)号：US11189730B2

公开(公告)日：2021-11-30

申请号：US16649716

申请日：2017-12-26

申请人： INTEL CORPORATION

发明人： Glenn A. Glass ,  Anand S. Murthy ,  Karthik Jambunathan ,  Cory C. Bomberger ,  Tahir Ghani ,  Jack T. Kavalieros ,  Benjamin Chu-Kung ,  Seung Hoon Sung ,  Siddharth Chouksey

IPC分类号： H01L29/78 ,  H01L27/088 ,  H01L29/161 ,  H01L29/06 ,  H01L29/08 ,  H01L29/417 ,  H01L29/423 ,  H01L29/786 ,  H01L21/02 ,  H01L29/66

摘要： Integrated circuit transistor structures and processes are disclosed that reduce n-type dopant diffusion, such as phosphorous or arsenic, from the source region and the drain region of a germanium n-MOS device into adjacent channel regions during fabrication. The n-MOS transistor device may include at least 70% germanium (Ge) by atomic percentage. In an example embodiment, source and drain regions of the transistor are formed using a low temperature, non-selective deposition process of n-type doped material. In some embodiments, the low temperature deposition process is performed in the range of 450 to 600 degrees C. The resulting structure includes a layer of doped mono-crystyalline silicon (Si), or silicon germanium (SiGe), on the source/drain regions. The structure also includes a layer of doped amorphous Si:P (or SiGe:P) on the surfaces of a shallow trench isolation (STI) region and the surfaces of contact trench sidewalls.

公开(公告)号：US11171057B2

公开(公告)日：2021-11-09

申请号：US16465490

申请日：2016-12-30

申请人： INTEL CORPORATION

发明人： Glenn A. Glass ,  Chytra Pawashe ,  Anand S. Murthy ,  Daniel Pantuso ,  Tahir Ghani

IPC分类号： H01L21/82 ,  H01L21/8234 ,  H01L27/088 ,  H01L29/06

摘要： Fin-based transistor structures, such as finFET and nanowire transistor structures, are disclosed. The fins have a morphology including a wave pattern and/or one or more ridges and/or nodules which effectively mitigate fin collapse, by limiting the inter-fin contact during a fin collapse condition. Thus, while the fins may temporarily collapse during wet processing, the morphology allows the collapsed fins to recover back to their uncollapsed state upon drying. The fin morphology may be, for example, an undulating pattern having peaks and troughs (e., sine, triangle, or ramp waves). In such cases, the undulating patterns of neighboring fins are out of phase, such that inter-fin contact during fin collapse is limited to peak/trough contact. In other embodiments, one or more ridges or nodules (short ridges), depending on the length of the fin, effectively limit the amount of inter-fin contact during fin collapse, such that only the ridges/nodules contact the neighboring fin.