公开(公告)号：US20150107550A1

公开(公告)日：2015-04-23

申请号：US14397041

申请日：2013-04-15

申请人： Jörg Remele ,  Christina Sauer ,  Aron Toth ,  Andreas Flohr ,  Alexander Bernhard ,  Florian Bach ,  Erika Schaefer ,  Ulrich Spicher ,  Christoph Teetz

发明人： Jörg Remele ,  Christina Sauer ,  Aron Toth ,  Andreas Flohr ,  Alexander Bernhard ,  Florian Bach ,  Erika Schaefer ,  Ulrich Spicher ,  Christoph Teetz

IPC分类号： F02D19/06 ,  F02D41/30

CPC分类号： F02D19/0615 ,  F02D19/061 ,  F02D19/0649 ,  F02D19/081 ,  F02D41/0025 ,  F02D41/3011 ,  F02D41/3047 ,  F02D41/3094 ,  F02D2041/3881 ,  Y02T10/128 ,  Y02T10/36

摘要： A method is proposed for controlling and regulating an internal combustion engine according to the HCCI combustion method, in which a first fuel in a basic mixture is ignited using a pilot fuel, and in which the fuel quantities of the first fuel and the pilot fuel are changed to represent an operating point of the internal combustion engine. The invention is characterized in that a target combustion energy (VE(SL)) is calculated as a function of a power demand and, based on the target combustion energy (VE(SL)), the fuel quantity of the first fuel and the fuel quantity of the pilot fuel are determined using a distribution factor (CHI), wherein the distribution factor (CHI) is calculated as a function of an actual combustion position (VL(IST)) to a target combustion position (VL(SL)) using a combustion position controller (18).

摘要翻译： 提出了一种根据HCCI燃烧方法控制和调节内燃机的方法，其中使用引燃燃料点燃碱性混合物中的第一燃料，其中第一燃料和引燃燃料的燃料量为 改为表示内燃机的工作点。 本发明的特征在于，作为功率需求的函数计算目标燃烧能量（VE（SL）），并且基于目标燃烧能量（VE（SL）），第一燃料和燃料的燃料量 使用分配因子（CHI）确定导向燃料的数量，其中根据与目标燃烧位置（VL（SL））的实际燃烧位置（VL（IST））的函数计算分配因子（CHI），其使用 燃烧位置控制器（18）。

公开(公告)号：US09013676B2

公开(公告)日：2015-04-21

申请号：US13172448

申请日：2011-06-29

申请人： Armin Werber ,  Norbert Muehlberger ,  Florian Bach

发明人： Armin Werber ,  Norbert Muehlberger ,  Florian Bach

IPC分类号： G03B27/54 ,  G03B27/72 ,  G02B26/08 ,  G02B5/09 ,  G03F7/20 ,  G03B27/68 ,  G03B27/52 ,  G03B27/32

CPC分类号： G02B26/0841 ,  G02B5/09 ,  G03F7/70075

摘要： An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.

摘要翻译： 单独的镜子用于构造一面镜。 单个反射镜的镜体被构造成相对于刚性载体主体倾斜倾斜关节的至少一个倾斜轴线。 倾斜接头被构造为固体接头。 垂直于倾斜轴的固体接头具有接头厚度S，并且沿倾斜轴线具有接头长度L.以下适用：L / S> 50。 结果是构建一个小平面镜的单独的镜子，其可以被再现并且是精确的可调节的并且同时确保足够的散热，特别是由个体反射镜反射的残余吸收的有用辐射产生的热量， 加热由镜体。

公开(公告)号：US20110273694A1

公开(公告)日：2011-11-10

申请号：US13172448

申请日：2011-06-29

申请人： Armin Werber ,  Norbert Muehlberger ,  Florian Bach

发明人： Armin Werber ,  Norbert Muehlberger ,  Florian Bach

IPC分类号： G03F7/20 ,  G02B7/185 ,  G03B27/70 ,  G02B7/198

CPC分类号： G02B26/0841 ,  G02B5/09 ,  G03F7/70075

摘要： An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.

摘要翻译： 单独的镜子用于构造一面镜。 单个反射镜的镜体被构造成相对于刚性载体主体倾斜倾斜关节的至少一个倾斜轴线。 倾斜接头被构造为固体接头。 垂直于倾斜轴的固体接头具有接头厚度S，并且沿倾斜轴线具有接头长度L.以下适用：L / S> 50。 结果是构建一个小平面镜的单独的镜子，其可以被再现并且是精确的可调节的并且同时确保足够的散热，特别是由个体反射镜反射的残余吸收的有用辐射产生的热量， 加热由镜体。

公开(公告)号：US20110181850A1

公开(公告)日：2011-07-28

申请号：US13044160

申请日：2011-03-09

申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

IPC分类号： G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

公开(公告)号：US20110001947A1

公开(公告)日：2011-01-06

申请号：US12848603

申请日：2010-08-02

申请人： Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

发明人： Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

IPC分类号： G03F7/20 ,  G02B7/185 ,  G03B27/54 ,  G03B27/70

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/06 ,  G02B26/0816 ,  G02B26/0833 ,  G02B27/0927 ,  G03F7/70075 ,  G03F7/70116

摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.

摘要翻译： 在用于微光刻的投影曝光装置中，将使用小平面镜作为束引导光学部件。 小平面镜具有多个独立的反射镜。 对于入射照明光的单独偏转，分离的反射镜在每种情况下都以致动器的方式连接，使得它们可以围绕至少一个倾斜轴线单独倾斜。 连接到致动器的控制装置被配置成使得可以将分离的反射镜的给定分组分组成分离的反射镜组，每个反射镜组在每种情况下包括至少两个分离的反射镜。 其结果是，当安装在投影曝光装置中时，增加了用于设置由投影曝光装置照亮的对象场的各种照明几何形状的可变性的刻面镜。 描述了用于形成小平面反射镜的分立反射镜的各种实施例。

公开(公告)号：US20140233006A1

公开(公告)日：2014-08-21

申请号：US14255302

申请日：2014-04-17

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Manfred Maul ,  Johannes Eisenmenger ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Damian Fiolka ,  Andras G. Major ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Manfred Maul ,  Johannes Eisenmenger ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Damian Fiolka ,  Andras G. Major ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03F7/20 ,  G01N21/55

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

公开(公告)号：US08797507B2

公开(公告)日：2014-08-05

申请号：US13044160

申请日：2011-03-09

申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

公开(公告)号：US20120293784A1

公开(公告)日：2012-11-22

申请号：US13556408

申请日：2012-07-24

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03B27/54

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

摘要翻译： 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

公开(公告)号：US20110181852A1

公开(公告)日：2011-07-28

申请号：US13052265

申请日：2011-03-21

申请人： Sascha Bleidistel ,  Yim-Bun Patrick Kwan ,  Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber

发明人： Sascha Bleidistel ,  Yim-Bun Patrick Kwan ,  Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber

IPC分类号： G03B27/52

CPC分类号： G03F7/702 ,  G02B7/1827 ,  G02B17/002 ,  G02B26/0833 ,  G03F7/70116 ,  G03F7/70291 ,  G03F7/70891

摘要： A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

摘要翻译： 微光刻投影曝光装置具有具有基体和多个反射镜单元的反射镜阵列。 每个反射镜单元包括反射镜和固态关节，其具有将反射镜连接到基体的至少一个铰接部分。 控制装置可以改变相应镜子相对于基体的对准。 反射镜和基体相互相对的表面或连接到其的反射镜支撑体相互相对的表面被设计成滑动轴承的相应的滑动表面。

公开(公告)号：US20100261120A1

公开(公告)日：2010-10-14

申请号：US12707783

申请日：2010-02-18

申请人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

发明人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B7/192

CPC分类号： G02B7/1815 ,  G02B5/0808 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891

摘要： A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

摘要翻译： 反射镜用于引导辐射束。 反射镜具有基体和基体的反射表面的涂层，涂层增加了反射镜的反射率。 散热装置用于消散沉积在涂层中的热量。 散热装置具有至少一个珀耳帖元件。 涂层直接施加在珀耳帖元件上。 温度设定装置具有至少一个用于反射表面的温度的温度传感器。 温度设定装置的调节装置可以连接到至少一个珀耳帖元件，并且与至少一个温度传感器信号连接。 结果是提供了散热装置的散热能力的反射镜。