公开(公告)号：US20110006400A1

公开(公告)日：2011-01-13

申请号：US12827171

申请日：2010-06-30

申请人： Jean-Charles SOURIAU ,  Stéphane Caplet

发明人： Jean-Charles SOURIAU ,  Stéphane Caplet

IPC分类号： H01L29/00 ,  H01L21/02

CPC分类号： H01L23/544 ,  H01L21/6835 ,  H01L21/6836 ,  H01L2221/68309 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/3025 ,  H01L2924/00

摘要： The invention relates to a method for making a handle wafer (20′) for microelectronic functional wafers, including at least one transparent window (22, 24) for viewing through the thickness of the handle wafer, this method including: a) the making of at least one cavity (21, 23) in said handle wafer, b) the formation of at least one viewing window in said cavity on an alignment or receiving surface.

摘要翻译： 本发明涉及一种用于制造用于微电子功能晶片的处理晶片（20'）的方法，所述方法包括至少一个用于通过所述处理晶片的厚度观察的透明窗口（22,24），所述方法包括：a） 所述处理晶片中的至少一个空腔（21,23），b）在对准或接收表面上的所述空腔中形成至少一个观察窗。

公开(公告)号：US08288841B2

公开(公告)日：2012-10-16

申请号：US12827171

申请日：2010-06-30

申请人： Jean-Charles Souriau ,  Stéphane Caplet

发明人： Jean-Charles Souriau ,  Stéphane Caplet

IPC分类号： H01L29/00

CPC分类号： H01L23/544 ,  H01L21/6835 ,  H01L21/6836 ,  H01L2221/68309 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/3025 ,  H01L2924/00

摘要： A handle wafer for microelectronic functional wafers, including at least one cavity through the thickness of the wafer, this cavity including a viewing window in solid or solidified material.

摘要翻译： 一种用于微电子功能晶片的处理晶片，包括通过晶片厚度的至少一个空腔，该空腔包括固体或固化材料的观察窗。

公开(公告)号：US08367929B2

公开(公告)日：2013-02-05

申请号：US12848386

申请日：2010-08-02

申请人： Xavier Baillin ,  Stéphane Caplet ,  Thierry Hilt

发明人： Xavier Baillin ,  Stéphane Caplet ,  Thierry Hilt

IPC分类号： H05K5/00

CPC分类号： B81C1/00293 ,  B81C2203/0145 ,  Y10T156/1057

摘要： A microcavity structure including: a first substrate, a cover attached to the first substrate such that a space formed between the cover and the first substrate forms the microcavity, at least one hole passing through the cover, and at least one closing flap of the hole placed inside the microcavity and including at least two portions of materials with different thermal expansion coefficients placed one against the other, at least one first end of the two portions being mechanically linked to the cover, at least a second end of the two portions being free, and at least a part of the closing flap being placed opposite the hole, the two portions being capable of closing or not the hole under the effect of a temperature variation.

摘要翻译： 一种微腔结构，包括：第一基板，附接到第一基板的盖，使得形成在盖和第一基板之间的空间形成微腔，穿过盖的至少一个孔和孔的至少一个封闭盖 放置在所述微腔内部并且包括具有不同热膨胀系数的材料的至少两部分彼此相对放置，所述两个部分的至少一个第一端机械地连接到所述盖，所述两个部分的至少第二端是自由的 并且所述封闭翼片的至少一部分与所述孔相对放置，所述两个部分能够在温度变化的作用下闭合所述孔。

公开(公告)号：US20110030989A1

公开(公告)日：2011-02-10

申请号：US12848386

申请日：2010-08-02

申请人： Xavier BAILLIN ,  Stéphane Caplet ,  Thierry Hilt

发明人： Xavier BAILLIN ,  Stéphane Caplet ,  Thierry Hilt

IPC分类号： H05K5/00 ,  B32B38/04 ,  B32B37/24

CPC分类号： B81C1/00293 ,  B81C2203/0145 ,  Y10T156/1057

摘要： Microcavity structure comprising: a substrate, a cover attached to the substrate such that a space formed between the cover and the substrate forms the microcavity, at least one hole passing through the cover, and at least one closing flap for the hole placed inside the microcavity and comprising at least two portions of materials with different thermal expansion coefficients placed one against the other, one first end of said two portions being mechanically linked to the cover, a second end of said two portions being free, and at least a part of the closing flap being placed opposite the hole, said two portions being suitable for closing or not the hole under the effect of a variation of temperature.

摘要翻译： 微腔结构包括：衬底，附接到衬底的盖，使得形成在盖和衬底之间的空间形成微腔，穿过盖的至少一个孔和放置在微腔内的孔的至少一个闭合瓣 并且包括具有不同热膨胀系数的材料的至少两部分彼此相对放置，所述两个部分的一个第一端机械连接到所述盖，所述两个部分的第二端是自由的，并且所述两个部分的至少一部分 所述两个部分适于在温度变化的作用下关闭或不关闭所述孔。

公开(公告)号：US20120328779A1

公开(公告)日：2012-12-27

申请号：US13530513

申请日：2012-06-22

申请人： Stéphane Caplet ,  Xavier Baillin

发明人： Stéphane Caplet ,  Xavier Baillin

IPC分类号： B05D5/00

CPC分类号： B81B7/0038

摘要： Process for making a device comprising at least the following steps: produce a getter structure comprising at least one portion of getter material permeable to gas covered by at least one protective layer hermetic to gas; hermetic encapsulation of the getter structure in a cavity; production of at least one local opening passing through the protective layer and forming an access to the portion of getter material permeable to gas.

摘要翻译： 制造装置的方法至少包括以下步骤：产生吸气剂结构，该吸气剂结构包括至少一部分吸气剂材料，所述吸气剂材料可透气至少一层气体保护层所覆盖的气体; 吸气剂结构在空腔中的气密封装; 产生通过保护层的至少一个局部开口，并形成通向气体的吸气剂材料部分的通路。

公开(公告)号：US06546623B2

公开(公告)日：2003-04-15

申请号：US10095477

申请日：2002-03-13

申请人： Stéphane Caplet ,  Marie-Thérèse Delaye

发明人： Stéphane Caplet ,  Marie-Thérèse Delaye

IPC分类号： H05K310

CPC分类号： G01L19/0069 ,  G01B7/003 ,  H01L21/76898 ,  H01L23/481 ,  H01L2924/0002 ,  Y10T29/49126 ,  Y10T29/49155 ,  Y10T29/49165 ,  H01L2924/00012 ,  H01L2924/00

摘要： A process for manufacturing a structure equipped with at least one electrical contact, including forming on a substrate a first layer, forming on a front side of the first layer the structure equipped with at least one electrical contact, forming at least one hole though the substrate revealing a rear side of the first layer, and forming an electrical contact to the rear side in a cavity overhung by an edge of the at least one hole closest to the first layer, the edge allowing for electrical insulation of the electrical contact from the substrate.

摘要翻译： 一种用于制造装配有至少一个电接触的结构的方法，包括在基底上形成第一层，在第一层的正面上形成配备有至少一个电接触的结构，该结构至少形成一个穿过基底的孔 露出第一层的后侧，并且在由最靠近第一层的至少一个孔的边缘悬垂的空腔中形成与后侧的电接触，该边缘允许电接触从基底电绝缘 。

公开(公告)号：US09063410B2

公开(公告)日：2015-06-23

申请号：US13108663

申请日：2011-05-16

申请人： Stéphane Caplet ,  Claude Venin

发明人： Stéphane Caplet ,  Claude Venin

IPC分类号： G03F7/20 ,  G03F7/00 ,  G03F1/00 ,  G02F1/1333

CPC分类号： G03F7/0007 ,  G02F1/133377 ,  G03F1/14 ,  G03F7/0005 ,  G03F7/2014

摘要： A method for forming a micro-optical or sub-micro-optical device is provided, including: forming a photolithographic mask on a transparent support, depositing a layer of a photosensitive material of negative polarity on the face, a so called front face, of the support which supports the mask, wherein the mask is disposed under the areas where the photosensitive material should be removed, insolating the layer of the photosensitive material through the rear face of the support, developing the photosensitive material in order to obtain walls of micron or submicron cavities, removing the mask areas located at the bottom of the cavities in order to obtain cavities without any mask material between the walls, introducing a fluid into the cavities of the device, and forming a closure layer on the walls in photosensitive material.

摘要翻译： 提供了一种用于形成微光学或亚微光学器件的方法，包括：在透明支撑体上形成光刻掩模，在所述表面上沉积具有负极性的感光材料层，即所谓的正面 支撑掩模的支撑件，其中掩模设置在感光材料应被去除的区域之下，通过支撑体的背面使感光材料的层剥离，使感光材料显影，以获得微米或 亚微米腔，去除位于空腔底部的掩模区域，以获得在壁之间没有任何掩模材料的空腔，将流体引入装置的空腔中，以及在感光材料的壁上形成封闭层。

公开(公告)号：US08557698B2

公开(公告)日：2013-10-15

申请号：US12336317

申请日：2008-12-16

申请人： Stéphane Caplet

发明人： Stéphane Caplet

IPC分类号： H01L21/477

CPC分类号： B81B3/001

摘要： A method for producing a micromechanical and/or nanomechanical device includes partial etching of at least one sacrificial layer arranged between a first layer and a substrate, forming at least one cavity in which is arranged at least one portion of the sacrificial layer in contact with the first layer and/or the substrate. The method also includes chemical transformation of at least one wall of the first layer and/or the substrate in the cavity, delimiting at least one stop in the first layer and/or the substrate at the level of the portion of the sacrificial layer. The portion of the sacrificial layer and the chemically transformed wall of the first layer and/or the substrate is also eliminated.

摘要翻译： 一种用于制造微机械和/或纳米机械装置的方法包括对布置在第一层和衬底之间的至少一个牺牲层进行部分蚀刻，形成至少一个空腔，其中将牺牲层的至少一部分与 第一层和/或衬底。 该方法还包括在空腔中的第一层和/或基底的至少一个壁的化学转化，在牺牲层的该部分的水平面限定第一层和/或基底中的至少一个止挡部。 也消除了第一层和/或衬底的牺牲层和化学转化壁的部分。

公开(公告)号：US06878566B2

公开(公告)日：2005-04-12

申请号：US10330644

申请日：2002-12-27

申请人： Stéphane Caplet

发明人： Stéphane Caplet

IPC分类号： G01P15/125 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  G01P15/08 ,  H01L29/84 ,  H01L21/00

CPC分类号： B81C1/00896 ,  B81B7/0012 ,  G01P2015/0814

摘要： A mechanical microstructure including a deformable first layer overhanging a second layer and defining a cavity set back from an external face of the deformable first layer and having an abutment stud projecting into the cavity, in which a wire is connected to a portion of an internal face of the deformable first layer. The portion of the first layer is opposite a bottom area of the cavity into which the abutment stud projects, but the abutment stud remains at a distance from the deformable first layer. A method of producing the mechanical microstructure is also disclosed.

摘要翻译： 一种机械显微组织，包括可变形的第一层，所述可变形的第一层突出第二层并且限定从所述可变形的第一层的外表面设置的空腔，并且具有突出到所述空腔中的抵接突起，其中，线连接到内表面的一部分 的可变形的第一层。 第一层的部分与空腔的底部区域相对，邻接突起突出到底部区域中，但是邻接螺柱保持与可变形的第一层一定距离。 还公开了一种生产机械微结构的方法。

公开(公告)号：US09005353B2

公开(公告)日：2015-04-14

申请号：US13530596

申请日：2012-06-22

申请人： Stéphane Caplet

发明人： Stéphane Caplet

IPC分类号： B01D53/02 ,  B81B7/00

CPC分类号： B81B7/0038

摘要： A getter structure including at least one portion of getter material at least one face of which is positioned against at least one portion of gas-permeable material such that said portion of getter material is able to achieve a gaseous absorption and/or adsorption at least by said face through at least said portion of gas-permeable material, and in which the portion of gas-permeable material includes one or more channels made at the level of a face of said portion of gas-permeable material which is in contact with the portion of getter material, where the portion of getter material is able to achieve a gaseous absorption, or a gaseous adsorption, or both a gaseous absorption and a gaseous adsorption, via the channel or channels.

摘要翻译： 吸气剂结构，其包括吸气剂材料的至少一部分，其至少一个表面抵靠气体可渗透材料的至少一部分定位，使得吸气剂材料的所述部分能够至少通过以下方式实现气体吸收和/或吸附： 所述表面通过所述透气材料的至少所述部分，并且其中所述透气材料部分包括在透气材料的所述部分的表面的水平处形成的一个或多个通道，该通道与所述部分 的吸气剂材料，其中吸气材料的一部分能够通过通道或通道实现气体吸收，或气体吸附，或气态吸收和气体吸附。