Method of fabricating semiconductor devices with a passivated surface
    1.
    发明授权
    Method of fabricating semiconductor devices with a passivated surface 失效
    制造具有钝化表面的半导体器件的方法

    公开(公告)号:US5719088A

    公开(公告)日:1998-02-17

    申请号:US556477

    申请日:1995-11-13

    摘要: A method of fabricating semiconductor devices with a passivated surface includes providing a contact layer on a substrate so as to define an inter-electrode surface area. A first layer and an insulating layer, which are selectively etchable relative to each other and to the substrate and the contact layer, are deposited on the contact layer and the inter-electrode surface area. The insulating layer and the first layer are individually and selectively etched to define an electrode contact area and to expose the inter-electrode surface area. The exposed inter-electrode surface area is passivated, either subsequent to or during the etching of the first layer. A metal contact is formed in the electrode contact area in abutting engagement with the insulating layer so as to seal the inter-electrode surface area.

    摘要翻译: 制造具有钝化表面的半导体器件的方法包括在衬底上提供接触层以便限定电极间表面积。 可以相对于彼此和基板和接触层选择性地蚀刻的第一层和绝缘层沉积在接触层和电极间表面区域上。 分别选择性地蚀刻绝缘层和第一层以限定电极接触面积并暴露电极间表面积。 暴露的电极间表面积在第一层蚀刻之前或期间被钝化。 在与绝缘层邻接的电极接触区域中形成金属接触,以密封电极间表面积。

    Method of fabricating semiconductor devices with a passivated surface
    2.
    发明授权
    Method of fabricating semiconductor devices with a passivated surface 失效
    制造具有钝化表面的半导体器件的方法

    公开(公告)号:US5733827A

    公开(公告)日:1998-03-31

    申请号:US557405

    申请日:1995-11-13

    摘要: A method of fabricating semiconductor devices with a passivated surface includes providing first cap and etch stop layers and second cap and etch stop layers with a contact layer thereon so as to define an inter-electrode surface area. A first layer and an insulating layer, which are selectively etchable relative to each other, are deposited on the contact layer and the inter-electrode surface area. The insulating layer and the first layer are individually etched to define an electrode contact area and to expose the inter-electrode surface area. Portions of the first etch stop and cap layers remaining in the contact area are selectively removed and a metal contact is formed in the contact area in abutting engagement with the insulating layer so as to seal the inter-electrode surface area.

    摘要翻译: 制造具有钝化表面的半导体器件的方法包括提供第一帽和蚀刻停止层以及其上具有接触层的第二帽和蚀刻停止层,以限定电极间表面积。 相对于彼此可选择性地蚀刻的第一层和绝缘层沉积在接触层和电极间表面区域上。 绝缘层和第一层被单独蚀刻以限定电极接触面积并暴露电极间表面积。 选择性地除去残留在接触区域中的第一蚀刻停止层和盖层的部分,并且在与绝缘层邻接接合的接触区域中形成金属接触,以密封电极间表面积。

    Method of fabricating GMR devices
    3.
    发明授权
    Method of fabricating GMR devices 失效
    制造GMR器件的方法

    公开(公告)号:US5861328A

    公开(公告)日:1999-01-19

    申请号:US723438

    申请日:1996-10-07

    CPC分类号: H01L43/12 H01L27/0688

    摘要: A method of fabricating GMR devices on a CMOS substrate structure with a semiconductor device formed therein. The method includes forming a dielectric system with a planar surface having a roughness in a range of 1 .ANG. to 20 .ANG. RMS on the substrate; disposing and patterning films of giant magneto-resistive material on the planar surface so as to form a memory cell; disposing a dielectric cap on the cell so as to seal the cell and provide a barrier to subsequent operations; forming vias through the dielectric cap and the dielectric system to interconnects of the semiconductor device; forming vias through the dielectric cap to the magnetic memory cell; and depositing a metal system through the vias to the interconnects and to the memory cell.

    摘要翻译: 一种在其上形成有半导体器件的CMOS衬底结构上制造GMR器件的方法。 该方法包括形成具有平坦表面的电介质系统,该平面表面在衬底上的粗糙度范围为1安培至20安培RMS; 在平坦表面上设置和构图巨磁阻材料的薄膜以形成记忆单元; 在电池上设置电介质盖,以密封电池并为后续操作提供屏障; 通过所述电介质盖和所述介电系统形成通孔以连接所述半导体器件; 通过介电盖形成通孔到磁存储单元; 以及通过所述通孔将金属系统沉积到所述互连件和所述存储器单元。

    Multi-layer magnetic memory cells with improved switching characteristics
    4.
    发明授权
    Multi-layer magnetic memory cells with improved switching characteristics 失效
    具有改进的开关特性的多层磁存储单元

    公开(公告)号:US5768183A

    公开(公告)日:1998-06-16

    申请号:US723159

    申请日:1996-09-25

    IPC分类号: G11C11/15 G11C11/56

    摘要: A plurality of layers of magnetic material are stacked in parallel, overlying relationship and separated by layers of non-magnetic material so as to form a multi-layer magnetic memory cell. The width of the cell is less than a width of magnetic domain walls within the magnetic layers so that magnetic vectors in the magnetic layers point along a length of the magnetic layers, and the ratio of the length to the width of the magnetic memory cell is in a range of 1.5 to 10. The magnetic layers are antiferromagnetically coupled when the ratio is less than 4 and ferromagnetically coupled when the ratio is greater than 4.

    摘要翻译: 多层磁性材料以平行的方式堆叠叠置,由非磁性材料层隔开,形成多层磁性存储单元。 电池的宽度小于磁性层内的磁畴壁的宽度,使得磁性层中的磁矢量沿着磁性层的长度指向,并且磁性存储单元的长度与宽度的比率是 在1.5至10的范围内。当该比率小于4时,磁性层反铁磁耦合,并且当该比率大于4时被磁化耦合。

    Method of operating a random access memory device having a plurality of
pairs of memory cells as the memory device
    5.
    发明授权
    Method of operating a random access memory device having a plurality of pairs of memory cells as the memory device 失效
    操作具有多对存储单元的随机存取存储器件作为存储器件的方法

    公开(公告)号:US5699293A

    公开(公告)日:1997-12-16

    申请号:US728023

    申请日:1996-10-09

    IPC分类号: G11C11/15 G11C11/16 G11C11/00

    CPC分类号: G11C11/15 G11C11/16

    摘要: A magnetic random access memory device (10) has a plurality of pairs of memory cells (21a,21b), a column decoder (31), a row decoder (32), and a comparator (60). The pair of memory cells (21a,21b) is designated by column decoder (31) and row decoder (32) in response to a memory address. Complementary bits ("0" and "1") are stored in the pair of memory cells (21a,21b). When the state in the pair of memory cell (21a,21b) is read, both bits in the pair of memory cells (21a,21b) are compared to produce an output at one read cycle time to a bit line (70). This memory device omits a conventional auto-zeroing step so that a high speed MRAM device can be attained.

    摘要翻译: 磁性随机存取存储器件(10)具有多对存储单元(21a,21b),列解码器(31),行解码器(32)和比较器(60)。 响应于存储器地址,由列解码器(31)和行解码器(32)指定该对存储单元(21a,21b)。 互补位(“0”和“1”)存储在一对存储单元(21a,21b)中。 当读出该对存储单元(21a,21b)中的状态时,将该对存储单元(21a,21b)中的两个位进行比较,以在一个读周期时间向位线(70)产生输出。 该存储器件省略了常规的自动归零步骤,从而可以获得高速MRAM器件。

    Magnetic random access memory and fabricating method thereof
    6.
    发明授权
    Magnetic random access memory and fabricating method thereof 有权
    磁性随机存取存储器及其制造方法

    公开(公告)号:US06174737B1

    公开(公告)日:2001-01-16

    申请号:US09339460

    申请日:1999-06-24

    IPC分类号: H01L2100

    摘要: An improved and novel MRAM device with magnetic memory elements and circuitry for controlling magnetic memory elements is provided. The circuitry, for example, transistor (12a) having a gate (17a), a drain (18) and a source (16a) is integrated on a substrate (11) and coupled to a magnetic memory element (43) on the circuitry through a plug conductor (19a) and a conductor line (45). The circuitry is fabricated first under the CMOS process and then magnetic memory elements (43, 44). Digit line (29) and bit line (48) are placed under and on top of magnetic memory element (43), respectively, and enabled to access magnetic memory element (43). These lines are enclosed by a high permeability layer (31, 56, 58) excluding a surface facing magnetic memory element (43), which shields and focuses a magnetic field toward magnetic memory element (43).

    摘要翻译: 提供了一种具有磁存储器元件和用于控制磁存储元件的电路的改进和新颖的MRAM器件。 电路,例如具有栅极(17a),漏极(18)和源极(16a)的晶体管(12a)集成在衬底(11)上并且耦合到电路上的磁存储元件(43),通过 插头导体(19a)和导线(45)。 首先在CMOS工艺之下制造电路,然后制造磁存储元件(43,44)。 数字线(29)和位线(48)分别放置在磁存储元件(43)的下面和顶部,并且能够访问磁存储元件(43)。 这些线被除了面向磁性存储元件(43)的高磁导率层(31,56,58)包围,磁性层屏蔽并将磁场聚焦到磁性存储元件(43)。

    Magnetic random access memory and fabricating method thereof
    7.
    发明授权
    Magnetic random access memory and fabricating method thereof 有权
    磁性随机存取存储器及其制造方法

    公开(公告)号:US5940319A

    公开(公告)日:1999-08-17

    申请号:US144686

    申请日:1998-08-31

    摘要: An improved and novel MRAM device with magnetic memory elements and circuitry for controlling magnetic memory elements is provided. The circuitry, for example, transistor (12a) having a gate (17a), a drain (18) and a source (16a) is integrated on a substrate (11) and coupled to a magnetic memory element (43) on the circuitry through a plug conductor (19a) and a conductor line (45). The circuitry is fabricated first under the CMOS process and then magnetic memory elements (43, 44). Digit line (29) and bit line (48) are placed under and on top of magnetic memory element (43), respectively, and enabled to access magnetic memory element (43). These lines are enclosed by a high permeability layer (31, 56, 58) excluding a surface facing magnetic memory element (43), which shields and focuses a magnetic field toward magnetic memory element (43).

    摘要翻译: 提供了一种具有磁存储器元件和用于控制磁存储元件的电路的改进和新颖的MRAM器件。 电路,例如具有栅极(17a),漏极(18)和源极(16a)的晶体管(12a)集成在衬底(11)上并且耦合到电路上的磁存储元件(43),通过 插头导体(19a)和导线(45)。 首先在CMOS工艺之下制造电路,然后制造磁存储元件(43,44)。 数字线(29)和位线(48)分别放置在磁存储元件(43)的下面和顶部,并且能够访问磁存储元件(43)。 这些线被除了面向磁性存储元件(43)的高磁导率层(31,56,58)包围,磁性层屏蔽并将磁场聚焦到磁性存储元件(43)。

    Spin polarized apparatus
    8.
    发明授权
    Spin polarized apparatus 失效
    旋转极化装置

    公开(公告)号:US5838607A

    公开(公告)日:1998-11-17

    申请号:US723162

    申请日:1996-09-25

    摘要: Spin polarized apparatus includes a spin polarizing section of magnetic material with an electron input port and a polarized electron port and a transport section of magnetic material with a polarized electron input port electrically coupled to the polarized electron port of the polarizing section and an electron output port. Electrons traversing the polarizing section all have similar spin directions at the output dependent upon the magnetization direction of the polarizing section. Electrons traversing the transport section all have spins in a first direction at the output. The cell has a low resistance when the magnetization direction of the polarizing section is in the first direction (electrons entering the transport section all have spins in the first direction) and a high resistance when the magnetization direction is in an opposite direction (electrons entering the transport section all have spins in the opposite direction).

    摘要翻译: 旋转极化装置包括具有电子输入端口和偏振电子端口的磁性材料的自旋极化部分和具有电耦合到偏振部分的偏振电子端口的偏振电子输入端口的磁性材料的传送部分和电子输出端口 。 穿过偏振部分的电子根据偏振部分的磁化方向在输出处都具有相似的自旋方向。 穿过传送部分的电子都在输出端处沿着第一方向旋转。 当偏振片的磁化方向处于第一方向(进入输送部分的电子全部在第一方向上具有自旋)时,电池具有低电阻,当磁化方向为相反方向(电子进入 运输部分都沿相反方向旋转)。

    Magnetic element with insulating veils and fabricating method thereof
    9.
    发明授权
    Magnetic element with insulating veils and fabricating method thereof 失效
    具有绝缘面纱的磁性元件及其制造方法

    公开(公告)号:US06912107B2

    公开(公告)日:2005-06-28

    申请号:US10830264

    申请日:2004-04-21

    摘要: An improved and novel device and fabrication method for a magnetic element, and more particularly a magnetic element (10) including a first electrode (14), a second electrode (18) and a spacer layer (16). The first electrode (14) and the second electrode (18) include ferromagnetic layers (26 & 28). A spacer layer (16) is located between the ferromagnetic layer (26) of the first electrode (14) and the ferromagnetic layer (28) of the second electrode (16) for permitting tunneling current in a direction generally perpendicular to the ferromagnetic layers (26 & 28). The device includes insulative veils (34) characterized as electrically isolating the first electrode (14) and the second electrode (18), the insulative veils (34) including non-magnetic and insulating dielectric properties. Additionally disclosed is a method of fabricating the magnetic element (10) with insulative veils (34) that have been transformed from having conductive properties to insulative properties through oxygen plasma ashing techniques.

    摘要翻译: 一种用于磁性元件的改进和新颖的器件和制造方法,更具体地,包括第一电极(14),第二电极(18)和间隔层(16)的磁性元件(10)。 第一电极(14)和第二电极(18)包括铁磁层(26和28)。 间隔层(16)位于第一电极(14)的铁磁层(26)和第二电极(16)的铁磁层(28)之间,用于允许隧道电流沿大致垂直于铁磁层的方向 26和28)。 该装置包括绝缘面纱(34),其特征在于电隔离第一电极(14)和第二电极(18),绝缘面纱(34)包括非磁性和绝缘的介电性质。 另外公开了一种通过氧等离子体灰化技术制造具有绝缘面纱(34)的磁性元件(10)的方法,其已经从具有导电性能转变为绝缘性能。

    Method of fabricating a magnetic element with insulating veils
    10.
    发明授权
    Method of fabricating a magnetic element with insulating veils 有权
    制造具有绝缘面纱的磁性元件的方法

    公开(公告)号:US06835423B2

    公开(公告)日:2004-12-28

    申请号:US10349702

    申请日:2003-01-22

    IPC分类号: H05H100

    摘要: An improved and novel device and fabrication method for a magnetic element, and more particularly a magnetic element (10) including a first electrode (14), a second electrode (18) and a spacer layer (16). The first electrode (14) and the second electrode (18) include ferromagnetic layers (26 & 28). A spacer layer (16) is located between the ferromagnetic layer (26) of the first electrode (14) and the ferromagnetic layer (28) of the second electrode (16) for permitting tunneling current in a direction generally perpendicular to the ferromagnetic layers (26 & 28). The device includes insulative veils (34) characterized as electrically isolating the first electrode (14) and the second electrode (18), the insulative veils (34) including non-magnetic and insulating dielectric properties. Additionally disclosed is a method of fabricating the magnetic element (10) with insulative veils (34) that have been transformed from having conductive properties to insulative properties through oxygen plasma ashing techniques.

    摘要翻译: 一种用于磁性元件的改进和新颖的器件和制造方法,更具体地,包括第一电极(14),第二电极(18)和间隔层(16)的磁性元件(10)。 第一电极(14)和第二电极(18)包括铁磁层(26和28)。 间隔层(16)位于第一电极(14)的铁磁层(26)和第二电极(16)的铁磁层(28)之间,用于允许隧道电流沿大致垂直于铁磁层的方向 26和28)。 该装置包括绝缘面纱(34),其特征在于电隔离第一电极(14)和第二电极(18),绝缘面纱(34)包括非磁性和绝缘的介电性质。 另外公开了一种通过氧等离子体灰化技术制造具有绝缘面纱(34)的磁性元件(10)的方法,其已经从具有导电性能转变为绝缘性能。