公开(公告)号：US08710657B2

公开(公告)日：2014-04-29

申请号：US13242864

申请日：2011-09-23

Applicant: Jeong-woo Park ,  Moon-gi Cho ,  Ui-hyoung Lee ,  Sun-hee Park

Inventor： Jeong-woo Park ,  Moon-gi Cho ,  Ui-hyoung Lee ,  Sun-hee Park

IPC: H01L21/44

CPC classification number: H01L23/49833 ,  H01L23/3128 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/48 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/0361 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/06155 ,  H01L2224/06156 ,  H01L2224/1145 ,  H01L2224/11452 ,  H01L2224/11462 ,  H01L2224/1147 ,  H01L2224/13005 ,  H01L2224/13012 ,  H01L2224/13016 ,  H01L2224/13082 ,  H01L2224/13109 ,  H01L2224/13118 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13166 ,  H01L2224/13169 ,  H01L2224/13171 ,  H01L2224/13193 ,  H01L2224/14051 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/17517 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48225 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06565 ,  H01L2225/06568 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/0104 ,  H01L2924/01042 ,  H01L2924/01044 ,  H01L2924/01045 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01052 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01087 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/15311 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: Semiconductor packages connecting a semiconductor chip to an external device by bumps are provided. The semiconductor packages may include a connection pad on a semiconductor chip, a connecting bump on and configured to be electrically connected to the connection pad and a supporting bump on the semiconductor chip and configured to be electrically isolated from the connection pad. The connection bump may include a first pillar and a first solder ball and the supporting bump may include a second pillar and a second solder ball. The semiconductor packages may further include a solder channel in the second pillar configured to allow a portion of the second solder ball to extend into the solder channel along a predetermined direction.

Abstract translation: 提供了通过凸块将半导体芯片连接到外部设备的半导体封装。 半导体封装可以包括半导体芯片上的连接焊盘，连接焊盘，并且构造成电连接到连接焊盘，并且在半导体芯片上具有支撑突起，并且被配置为与连接焊盘电隔离。 连接凸起可以包括第一柱和第一焊球，并且支撑凸起可以包括第二柱和第二焊球。 半导体封装还可以包括在第二柱中的焊料通道，其被配置为允许第二焊球的一部分沿着预定方向延伸到焊料通道中。

公开(公告)号：US20070059923A1

公开(公告)日：2007-03-15

申请号：US11445458

申请日：2006-06-02

Applicant: Hyo-jong Lee ,  Ui-hyoung Lee ,  Hong-jae Shin ,  Nae-in Lee ,  Soo-geun Lee

Inventor： Hyo-jong Lee ,  Ui-hyoung Lee ,  Hong-jae Shin ,  Nae-in Lee ,  Soo-geun Lee

IPC: H01L21/4763

CPC classification number: H01L21/76885 ,  H01L21/76802 ,  H01L21/76834 ,  H01L21/76843

Abstract: Methods of fabricating an interconnection line in a semiconductor device and a semiconductor device including such an interconnection line. The method involves forming a lower interconnection line on a semiconductor substrate, forming a mold pattern that defines an opening through which the lower interconnection line is exposed, filling the opening with a conductive material to form a via, removing the mold pattern to make the via remain on the lower interconnection line, forming an interlevel dielectric (ILD) layer that covers the lower interconnection line and the via, patterning the ILD layer, exposing the via, forming a trench that defines a region in which an interconnection line is to be formed, and filling the trench to fabricate a damascene interconnection line connected to the via.

Abstract translation: 在半导体器件中制造互连线的方法和包括这种互连线的半导体器件。 该方法包括在半导体衬底上形成下部互连线，形成限定下部互连线暴露的开口的模具图案，用导电材料填充开口以形成通孔，去除模具图案以形成通孔 保持在下互连线上，形成覆盖下互连线和通孔的层间电介质（ILD）层，图案化ILD层，暴露通孔，形成限定要形成互连线的区域的沟槽 ，并填充沟槽以制造连接到通孔的镶嵌互连线。