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    ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION
    5.
    发明申请
    ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION 审中-公开
    用于离子植入的可调偏差光学

    公开(公告)号：US20100065761A1

    公开(公告)日：2010-03-18

    申请号：US12212507

    申请日：2008-09-17

    申请人： Michael A. Graf ,  Bo H. Vanderberg ,  Edward Eisner

    发明人： Michael A. Graf ,  Bo H. Vanderberg ,  Edward Eisner

    IPC分类号： H01J37/08 ,  H01J3/14

    CPC分类号： H01J37/3171 ,  H01J37/147 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/049 ,  H01J2237/12

    摘要： A deflection component suitable for use in an ion implantation system comprises multiple electrodes that can be selectively biased to cause an ion beam passing therethrough to bend, deflect, focus, converge, diverge, accelerate, decelerate, and/or decontaminate. Since the electrodes can be selectively biased, and thus one or more of them can remain unbiased or off, the effective length of the beam path can be selectively adjusted as desired (e.g., based upon beam properties, such as energy, dose, species, etc.).

    摘要翻译： 适合用于离子注入系统的偏转部件包括多个电极，其可被选择性地偏置以使离子束通过其中以弯曲，偏转，聚焦，收敛，发散，加速，减速和/或去污。 由于电极可以被选择性地偏置，并且因此它们中的一个或多个可以保持不偏差或截止，可以根据需要选择性地调节光束路径的有效长度（例如，基于光束性质，例如能量，剂量，物种， 等等。）。

    Methods and systems for trapping ion beam particles and focusing an ion beam
    10.
    发明授权
    Methods and systems for trapping ion beam particles and focusing an ion beam 有权
    用于捕获离子束粒子并聚焦离子束的方法和系统

    公开(公告)号：US07598495B2

    公开(公告)日：2009-10-06

    申请号：US11739934

    申请日：2007-04-25

    申请人： Peter L. Kellerman ,  Victor M. Benveniste ,  Alexander S. Perel ,  Brian S. Freer ,  Michael A. Graf

    发明人： Peter L. Kellerman ,  Victor M. Benveniste ,  Alexander S. Perel ,  Brian S. Freer ,  Michael A. Graf

    IPC分类号： H01J3/18

    CPC分类号： H01J37/3171 ,  H01J37/12 ,  H01J2237/022 ,  H01J2237/049

    摘要： A focusing particle trap system for ion implantation comprising an ion beam source that generates an ion beam, a beam line assembly that receives the ion beam from the ion beam source comprising a mass analyzer that selectively passes selected ions, a focusing electrostatic particle trap that receives the ion beam and removes particles from the ion beam comprising an entrance electrode comprising an entrance aperture and biased to a first base voltage, wherein the first surface of the entrance electrode is facing away from a center electrode and is approximately flat, wherein the second surface of the entrance electrode is facing toward the center electrode and is concave, wherein the center electrode is positioned a distance downstream from the entrance electrode comprising a center aperture and biased to a center voltage, wherein the center voltage is less than the first base voltage, wherein the first surface of the center electrode is facing toward the entrance electrode and is convex, wherein the second surface of the center electrode is facing away from the entrance electrode and is approximately flat, an exit electrode positioned a distance downstream from the center electrode comprising an exit aperture and biased to a second base voltage, and wherein the first surface of the exit electrode is facing toward the center electrode and is approximately flat, wherein the second surface of the exit electrode is facing away from the center electrode and is approximately flat, wherein a first electrostatic field is generated from the entrance electrode toward the center electrode and a second electrostatic field is generated from the exit electrode toward the center electrode; wherein the second base voltage is greater than the center voltage, and an end station that is downstream from the beam line assembly and receives the ion beam.

    摘要翻译： 一种用于离子注入的聚焦粒子捕获系统，包括产生离子束的离子束源，接收来自离子束源的离子束的束线组件，该束束组件包括选择性地通过选定离子的质量分析器，接收 离子束并且从离子束中除去包含入口电极并且被偏置到第一基极电压的入口电极的颗粒，其中入口电极的第一表面背离中心电极并且近似平坦，其中第二表面 所述入口电极面向所述中心电极并且是凹形的，其中所述中心电极位于与所述入口电极的下游距离的位置，所述入口电极包括中心孔并被偏压到中心电压，其中所述中心电压小于所述第一基极电压， 其中所述中心电极的所述第一表面面向所述入口电极并且被连接 vex，其中所述中心电极的所述第二表面背离所述入口电极并且近似平坦，所述出口电极在所述中心电极的下游距离包括出口孔并且被偏压到第二基极电压，并且其中所述第一表面 所述出射电极的面向所述中心电极并且近似平坦，其中所述出射电极的所述第二表面背离所述中心电极并且近似平坦，其中从所述入射电极朝向所述中心电极产生第一静电场 并且从出射电极向中心电极产生第二静电场; 其中所述第二基极电压大于所述中心电压，以及在所述束线组件的下游并接收所述离子束的端站。