摘要:
The invention provides a charged particle beam device for irradiating a specimen, comprising a particle source for providing a beam of charged particles, an optical device for directing the beam of charged particles onto the specimen and an ozone unit for reducing the charging and/or contamination of the specimen. The ozone unit comprises a supply of ozone and a specimen nozzle unit for directing an ozone gas flow to the specimen. Further, the invention provides a charged particle beam device for irradiating a specimen comprising a particle source for providing a beam of charged particles, an optical device for directing the beam of charged particles onto the specimen, a detector and a gas unit for reducing the charging and/or contamination of the detector. The gas unit comprises a supply of gas and a detector nozzle unit for directing a gas flow to the detector. Further, the present invention provides methods for operating charged particle beam devices according to the present invention.
摘要:
The invention provides a charged particle beam device for irradiating a specimen, comprising a particle source for providing a beam of charged particles, an optical device for directing the beam of charged particles onto the specimen and an ozone unit for reducing the charging and/or contamination of the specimen. The ozone unit comprises a supply of ozone and a specimen nozzle unit for directing an ozone gas flow to the specimen. Further, the invention provides a charged particle beam device for irradiating a specimen comprising a particle source for providing a beam of charged particles, an optical device for directing the beam of charged particles onto the specimen, a detector and a gas unit for reducing the charging and/or contamination of the detector. The gas unit comprises a supply of gas and a detector nozzle unit for directing a gas flow to the detector. Further, the present invention provides methods for operating charged particle beam devices according to the present invention.
摘要:
A focused ion beam device is described comprising a gas field ion source with an emitter emitting an ion beam including ions of gas, an ion beam column and a beam current control loop comprising a beam current measurement device. Furthermore, the focused ion beam device may have a sample charge control comprising measuring the sample charge. A method of operating a focused ion beam device is provided comprising applying a voltage between an emitter an electrode, applying gas to the emitter, emitting ions of a gas from the emitter and controlling a beam current by measuring the beam current with a beam current measurement device.
摘要:
The present invention relates to a beam optical component (1, 201) for acting on a charged particle beam (63) including a first element (3; 203) having a first opening (9; 209) for acting on the charged particle beam (63), at least a second element (5; 205) for acting on the charged particle beam (63); at least one distance piece (20a, 20b, 20c) positioned between the first element (3; 203) and the second element (5; 205) to define a minimum distance between the first element (3; 203) and the second element (5; 205); and a first holding piece (30a; 30b; 30c) for abutting the first element (3) to the at least one distance piece (20a, 20b, 20c), whereby the first holding piece (30a; 30b; 30c) is attached to the at least one distance piece (20a, 20b, 20c). First and second elements (3; 203; 5; 205) are preferably electrodes or pole pieces to act on the charged particle beam by an electrostatic or magnetic force. With the first holding piece (30a; 30b; 30c) attached to the at least one distance piece, distorting mechanical forces on the first and second elements (3, 5) are reduced which improves the performance of the respective beam optical components (1; 201).
摘要:
The present invention relates to a beam optical component including a charged particle lens for focusing a charged particle beam, the charged particle lens comprising a first element having a first opening for focusing the charged particle beam; a second element having a second opening for focusing the charged particle beam and first driving means connected with at least one of the first element and the second element for aligning the first opening with respect to the second opening. With the first driving means, the first opening and the second opening can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focusing. The present invention also relates to a charged particle beam device that uses said beam optical component for focusing the charged particle beam, and a method to align first opening and second opening with respect to each other.
摘要:
Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.
摘要:
An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.
摘要:
The present invention relates to a charged particle device with improved detection scheme. The device has a charged particle source providing a beam of primary charged particles; a first unit for providing a potential; a second unit for providing a potential; and a center unit positioned between the first unit and the second unit. The center unit is capable of providing a potential different from the potential of the first and the second unit for decelerating the primary charged particles to a first low energy and for accelerating the primary charged particles to a second high energy. Therein, the first unit and/or the second unit is a detector for detecting secondary electrons released at a specimen.
摘要:
The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a potential is provided, whereby charged particles of the charged particles beam are redirected at the potential-saddle depending on the energy of the charged articles.
摘要:
A spectrometer objective includes a generally asymmetrical objective lens having a short focal length, a deflection system disposed within the objective lens symmetrically relative to an optical axis, and an electrostatic retarding field spectrometer including an electrode arrangement for accelerating the secondary electrons generated on the specimen. The electrode arrangement of the retarding field spectrometer includes an electrode pair for establishing a spherically symmetrical retarding field. The electrode arrangement for extracting and accelerating the secondary particles includes a grid electrode disposed in a region of the lower pole piece of the objective lens and of a planar electrode disposed in the particle beam path immediately above the specimen, wherein the planar electrode is charged with a potential lying between the potential of the specimen and the potential of the grid electrode.