公开(公告)号：US20130220798A1

公开(公告)日：2013-08-29

申请号：US13594133

申请日：2012-08-24

申请人： Junji ANDO ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Akinori Iwai ,  Nobuyoshi Yoshimura ,  Hiroyuki Hashitomi

发明人： Junji ANDO ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Akinori Iwai ,  Nobuyoshi Yoshimura ,  Hiroyuki Hashitomi

IPC分类号： C23C14/06

CPC分类号： C23C14/0611 ,  C23C16/26 ,  C23C16/458 ,  C23C16/50 ,  F16C3/03 ,  F16C2206/04 ,  F16C2326/06 ,  F16D3/06 ,  F16D2250/0046 ,  F16D2300/10 ,  H01J37/32669

摘要： Plural spline shafts are arranged around columnar plasma, and plural spline shafts are coaxially aligned in a direction that the columnar plasma extends within a vacuum chamber. The plural coaxially aligned spline shafts are positioned so that axial gap is formed between the respective male spline sections. The axial gap of the plural male spline sections is positioned at a center of the columnar plasma in the direction that the columnar plasma extends.

摘要翻译： 多个花键轴布置在柱状等离子体周围，并且多个花键轴沿着柱状等离子体在真空室内延伸的方向同轴对准。 多个同轴对准的花键轴被定位成使得在各个花键部之间形成轴向间隙。 多个雄花键部的轴向间隙位于柱状等离子体的柱状等离子体延伸的方向的中心。

公开(公告)号：US09217196B2

公开(公告)日：2015-12-22

申请号：US13594133

申请日：2012-08-24

申请人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Akinori Iwai ,  Nobuyoshi Yoshimura ,  Hiroyuki Hashitomi

发明人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Akinori Iwai ,  Nobuyoshi Yoshimura ,  Hiroyuki Hashitomi

IPC分类号： H05H1/24 ,  C23C14/06 ,  C23C16/26 ,  C23C16/458 ,  C23C16/50 ,  F16D3/06 ,  F16C3/03 ,  H01J37/32

CPC分类号： C23C14/0611 ,  C23C16/26 ,  C23C16/458 ,  C23C16/50 ,  F16C3/03 ,  F16C2206/04 ,  F16C2326/06 ,  F16D3/06 ,  F16D2250/0046 ,  F16D2300/10 ,  H01J37/32669

摘要： Plural spline shafts are arranged around columnar plasma, and plural spline shafts are coaxially aligned in a direction that the columnar plasma extends within a vacuum chamber. The plural coaxially aligned spline shafts are positioned so that axial gap is formed between the respective male spline sections. The axial gap of the plural male spline sections is positioned at a center of the columnar plasma in the direction that the columnar plasma extends.

摘要翻译： 多个花键轴布置在柱状等离子体周围，并且多个花键轴沿着柱状等离子体在真空室内延伸的方向同轴对准。 多个同轴对准的花键轴被定位成使得在各个花键部之间形成轴向间隙。 多个雄花键部的轴向间隙位于柱状等离子体的柱状等离子体延伸的方向的中心。

公开(公告)号：US08734913B2

公开(公告)日：2014-05-27

申请号：US13204208

申请日：2011-08-05

申请人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiya Kubo ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

发明人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiya Kubo ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

IPC分类号： C23C16/32 ,  H05H1/24

CPC分类号： C23C16/042 ,  C23C16/26 ,  C23C16/50 ,  C23C16/515 ,  F16C3/03 ,  F16C2206/04 ,  H01J37/34 ,  H01J37/3447

摘要： A formation method of a coating that coats a coated body with the coating includes: generating cylindrical plasma in a vacuum deposition chamber as well as supplying material gas into the vacuum deposition chamber; applying pulse voltage to the coated body; and attaching a shield member that shields an uncoated member to an uncoated part where the coating of the coated body is not formed with separation spacing over a coated part where the coating is to be formed for preventing decrease of hardness of the coating in the coated part.

摘要翻译： 涂覆涂层的涂层的形成方法包括：在真空沉积室中产生圆柱形等离子体，以及将材料气体供应到真空沉积室中; 向涂层体施加脉冲电压; 以及将未涂覆部件遮蔽的未遮蔽部件的屏蔽部件，其中涂布体的涂层在形成涂层的涂布部分上没有形成分隔间隔，以防止涂布部分中涂层的硬度降低 。

公开(公告)号：US20120034393A1

公开(公告)日：2012-02-09

申请号：US13204208

申请日：2011-08-05

申请人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiya Kubo ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

发明人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiya Kubo ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

IPC分类号： H05H1/24

CPC分类号： C23C16/042 ,  C23C16/26 ,  C23C16/50 ,  C23C16/515 ,  F16C3/03 ,  F16C2206/04 ,  H01J37/34 ,  H01J37/3447

摘要： A formation method of a coating that coats a coated body with the coating includes: generating cylindrical plasma in a vacuum deposition chamber as well as supplying material gas into the vacuum deposition chamber; applying pulse voltage to the coated body; and attaching a shield member that shields an uncoated member to an uncoated part where the coating of the coated body is not formed with separation spacing over a coated part where the coating is to be formed for preventing decrease of hardness of the coating in the coated part.

摘要翻译： 涂覆涂层的涂层的形成方法包括：在真空沉积室中产生圆柱形等离子体，以及将材料气体供应到真空沉积室中; 向涂层体施加脉冲电压; 以及将未涂覆部件遮蔽的未遮蔽部件的屏蔽部件，其中涂布体的涂层在形成涂层的涂布部分上没有形成分隔间隔，以防止涂布部分中涂层的硬度降低 。

公开(公告)号：US08673409B2

公开(公告)日：2014-03-18

申请号：US13204208

申请日：2011-08-05

申请人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiya Kubo ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

发明人： Junji Ando ,  Tomoo Suzuki ,  Tomoki Ogawa ,  Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiya Kubo ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

IPC分类号： C23C16/32 ,  H05H1/24

摘要： A formation method of a coating that coats a coated body with the coating includes: generating cylindrical plasma in a vacuum deposition chamber as well as supplying material gas into the vacuum deposition chamber; applying pulse voltage to the coated body; and attaching a shield member that shields an uncoated member to an uncoated part where the coating of the coated body is not formed with separation spacing over a coated part where the coating is to be formed for preventing decrease of hardness of the coating in the coated part.

公开(公告)号：US20100210488A1

公开(公告)日：2010-08-19

申请号：US12707308

申请日：2010-02-17

申请人： Masahiro SUZUKI ,  Kazuyoshi Yamakawa ,  Toshiyuki Saito ,  Junji Ando ,  Tomoo Suzuki ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

发明人： Masahiro SUZUKI ,  Kazuyoshi Yamakawa ,  Toshiyuki Saito ,  Junji Ando ,  Tomoo Suzuki ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

IPC分类号： F16C33/20

CPC分类号： F16C3/03 ,  C23C16/0272 ,  C23C16/0281 ,  C23C16/26 ,  C23C28/322 ,  C23C28/325 ,  C23C28/34 ,  C23C28/343 ,  C23C28/347 ,  F16C29/02 ,  F16C33/04 ,  F16C2206/04 ,  F16D3/06 ,  F16D2001/103

摘要： A sliding member has a base material whose surface is at least partially covered with a DLC film, wherein an intermediate layer is interposed between the base material and the DLC film, and the intermediate layer has a multilayer structure obtained by stacking a first Cr layer, a CrN layer and a second Cr layer successively from the side closer to the base material.

摘要翻译： 滑动构件具有表面至少部分被DLC膜覆盖的基材，其中在基材和DLC膜之间插入中间层，并且中间层具有通过层叠第一Cr层， CrN层和第二Cr层，从靠近基材的一侧开始。

公开(公告)号：US08518863B2

公开(公告)日：2013-08-27

申请号：US12707308

申请日：2010-02-17

申请人： Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiyuki Saito ,  Junji Ando ,  Tomoo Suzuki ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

发明人： Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiyuki Saito ,  Junji Ando ,  Tomoo Suzuki ,  Hiroyuki Hashitomi ,  Daigo Yamamoto

IPC分类号： C10M103/02

CPC分类号： F16C3/03 ,  C23C16/0272 ,  C23C16/0281 ,  C23C16/26 ,  C23C28/322 ,  C23C28/325 ,  C23C28/34 ,  C23C28/343 ,  C23C28/347 ,  F16C29/02 ,  F16C33/04 ,  F16C2206/04 ,  F16D3/06 ,  F16D2001/103

摘要： A sliding member has a base material whose surface is at least partially covered with a DLC film, wherein an intermediate layer is interposed between the base material and the DLC film, and the intermediate layer has a multilayer structure obtained by stacking a first Cr layer, a CrN layer and a second Cr layer successively from the side closer to the base material.

摘要翻译： 滑动构件具有表面至少部分被DLC膜覆盖的基材，其中在基材和DLC膜之间插入中间层，并且中间层具有通过层叠第一Cr层， CrN层和第二Cr层，从靠近基材的一侧开始。

公开(公告)号：US20100314005A1

公开(公告)日：2010-12-16

申请号：US12521584

申请日：2007-11-09

申请人： Toshiyuki Saito ,  Masahiro Suzuki ,  Hiroyuki Hashitomi

发明人： Toshiyuki Saito ,  Masahiro Suzuki ,  Hiroyuki Hashitomi

IPC分类号： C23C8/26 ,  B32B15/18 ,  B05D1/36 ,  C23C16/00

CPC分类号： C23C8/26 ,  C23C8/80 ,  C23C14/024 ,  C23C14/0605 ,  C23C16/0272 ,  C23C16/26 ,  C23C28/044 ,  C23C28/046 ,  C23C28/322 ,  C23C28/343 ,  C23C28/347 ,  F16C33/12 ,  F16C33/122 ,  F16C33/14 ,  F16C33/16 ,  F16C2206/04 ,  F16C2223/14 ,  F16C2223/60 ,  Y10T428/12625 ,  Y10T428/31678

摘要： A highly corrosion-resistant member that is equipped with: a substrate made of stainless steel; an intermediate layer coated on at least a part of a surface of the substrate; and an amorphous carbon film coated on at least a part of a surface of the intermediate layer is completed by forming the intermediate layer and amorphous carbon film at such a low temperature that a temperature of the surface of the substrate is 450° C. or less. Another highly corrosion-resistant member that is equipped with: a substrate made of stainless steel, substrate whose superficial-layer portion is subjected to nitriding treatment; and an amorphous carbon film coated on at least a part of a surface of the superficial-layer portion is completed by carrying out the nitriding treatment and a formation of the amorphous carbon film at such a low temperature that a temperature of a surface of said substrate is 450° C. or less.In the aforementioned highly corrosion-resistant members, the surface of the substrate that is made of stainless steel is not exposed to high temperatures (>450° C.). Consequently, the corrosion resistance of the substrate is kept equivalent to the corrosion resistance of the original stainless steel that has not been exposed to any high temperature.

摘要翻译： 一种高耐腐蚀性的构件，配备有：不锈钢制的基材; 涂覆在所述基材表面的至少一部分上的中间层; 并且通过在基板的表面的温度为450℃以下的低温下形成中间层和无定形碳膜来完成涂布在中间层的表面的至少一部分上的无定形碳膜 。 另一种耐腐蚀性高的构件，其配备有：由不锈钢制成的基材，其表层部分进行氮化处理的基材; 并且通过在低温下进行氮化处理和形成无定形碳膜来完成涂覆在表层的表面的至少一部分上的无定形碳膜，使得所述基板的表面的温度 为450℃以下。 在上述高耐蚀性构件中，由不锈钢制成的基板的表面不暴露于高温（> 450℃）。 因此，基板的耐腐蚀性保持与未暴露于任何高温的原始不锈钢的耐腐蚀性相当。