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公开(公告)号:US09915622B2
公开(公告)日:2018-03-13
申请号:US14838194
申请日:2015-08-27
发明人: Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
IPC分类号: G01N21/95 , G01N21/47 , G01N21/88 , G01N21/956
CPC分类号: G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to direct pulses of light to an area on a wafer; a scanning subsystem configured to scan the pulses of light across the wafer; a collection subsystem configured to image pulses of light scattered from the area on the wafer to a sensor, wherein the sensor is configured to integrate a number of the pulses of scattered light that is fewer than a number of the pulses of scattered light that can be imaged on the entire area of the sensor, and wherein the sensor is configured to generate output responsive to the integrated pulses of scattered light; and a computer subsystem configured to detect defects on the wafer using the output generated by the sensor.
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公开(公告)号:US20170003572A1
公开(公告)日:2017-01-05
申请号:US15197715
申请日:2016-06-29
发明人: Dirk Woll
CPC分类号: G02F1/353 , G02B27/09 , G02F1/3501 , G02F1/3551 , G02F2001/3503 , G02F2001/3505 , H01S3/005 , H01S3/0092
摘要: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.
摘要翻译: 一种系统包括非线性晶体,其被定位成使得激光束的焦点在与激光束的光束传播方向垂直的至少一个平面中的非线性晶体之外。 非晶体晶体设置在晶体安装组件中。 激光束可以被引导到用于波长转换的非线性晶体。 该系统可用作深UV波长转换器。
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公开(公告)号:US20180040518A1
公开(公告)日:2018-02-08
申请号:US15358507
申请日:2016-11-22
发明人: Dirk Woll
CPC分类号: H01L22/12 , F27D21/02 , G01N21/9501 , G03F1/84 , G03F7/7065 , H01L21/67288
摘要: A cartridge in an oven enclosure includes a pre-heating feature for an incoming purge gas before the purge gas enters the space around an optical component, such as a nonlinear optical crystal, in an oven cell. The incoming purge gas can be pre-heated as it travels along a gas pathway around a cartridge. The cartridge can include a heater. The oven enclosure can have two windows positioned such that a laser beam can enter through one of the windows, pass through the optical component, and exit through another of the windows. A second harmonic beam can be generated with the optical component.
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公开(公告)号:US10153215B2
公开(公告)日:2018-12-11
申请号:US15358507
申请日:2016-11-22
发明人: Dirk Woll
摘要: A cartridge in an oven enclosure includes a pre-heating feature for an incoming purge gas before the purge gas enters the space around an optical component, such as a nonlinear optical crystal, in an oven cell. The incoming purge gas can be pre-heated as it travels along a gas pathway around a cartridge. The cartridge can include a heater. The oven enclosure can have two windows positioned such that a laser beam can enter through one of the windows, pass through the optical component, and exit through another of the windows. A second harmonic beam can be generated with the optical component.
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公开(公告)号:US10120262B2
公开(公告)日:2018-11-06
申请号:US15809016
申请日:2017-11-10
发明人: Dirk Woll
摘要: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.
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公开(公告)号:US09841655B2
公开(公告)日:2017-12-12
申请号:US15197715
申请日:2016-06-29
发明人: Dirk Woll
CPC分类号: G02F1/353 , G02B27/09 , G02F1/3501 , G02F1/3551 , G02F2001/3503 , G02F2001/3505 , H01S3/005 , H01S3/0092
摘要: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.
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公开(公告)号:US20180164228A1
公开(公告)日:2018-06-14
申请号:US15882946
申请日:2018-01-29
发明人: Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
IPC分类号: G01N21/95 , G01N21/47 , G01N21/956 , G01N21/88
CPC分类号: G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to direct pulses of light to an area on a wafer; a scanning subsystem configured to scan the pulses of light across the wafer; a collection subsystem configured to image pulses of light scattered from the area on the wafer to a sensor, wherein the sensor is configured to integrate a number of the pulses of scattered light that is fewer than a number of the pulses of scattered light that can be imaged on the entire area of the sensor, and wherein the sensor is configured to generate output responsive to the integrated pulses of scattered light; and a computer subsystem configured to detect defects on the wafer using the output generated by the sensor.
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公开(公告)号:US20180067377A1
公开(公告)日:2018-03-08
申请号:US15809016
申请日:2017-11-10
发明人: Dirk Woll
CPC分类号: G02F1/353 , G02B27/09 , G02F1/3501 , G02F1/3551 , G02F2001/3503 , G02F2001/3505 , H01S3/005 , H01S3/0092
摘要: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.
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公开(公告)号:US09678350B2
公开(公告)日:2017-06-13
申请号:US13845587
申请日:2013-03-18
发明人: Christian Wolters , Jijen Vazhaeparambil , Dirk Woll , Anatoly Romanovsky , Bret Whiteside , Stephen Biellak , Guoheng Zhao
CPC分类号: G02B27/1006 , G02B26/10 , G02B26/106 , G02F1/0105 , G02F1/353 , G03F7/7065 , H01S3/0071 , H01S3/0092
摘要: A method and system for providing illumination is disclosed. The method may include providing a laser having a predetermined wavelength; performing at least one of: beam splitting or beam scanning prior to a frequency conversion; converting a frequency of each output beam of the at least one of: beam splitting or beam scanning; and providing the frequency converted output beam for illumination.
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公开(公告)号:US20150369753A1
公开(公告)日:2015-12-24
申请号:US14838194
申请日:2015-08-27
发明人: Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
CPC分类号: G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to direct pulses of light to an area on a wafer; a scanning subsystem configured to scan the pulses of light across the wafer; a collection subsystem configured to image pulses of light scattered from the area on the wafer to a sensor, wherein the sensor is configured to integrate a number of the pulses of scattered light that is fewer than a number of the pulses of scattered light that can be imaged on the entire area of the sensor, and wherein the sensor is configured to generate output responsive to the integrated pulses of scattered light; and a computer subsystem configured to detect defects on the wafer using the output generated by the sensor.
摘要翻译: 提供了配置用于检查晶片的系统。 一个系统包括被配置为将光脉冲引导到晶片上的区域的照明子系统; 扫描子系统,被配置为扫描穿过所述晶片的光脉冲; 配置为将从晶片上的区域散射的光脉冲成像到传感器的集合子系统,其中,所述传感器被配置为将少数散射光的脉冲的数量积分成散射光的脉冲数, 在传感器的整个区域成像,并且其中传感器被配置为响应于散射光的积分脉冲产生输出; 以及计算机子系统,被配置为使用由所述传感器产生的输出来检测所述晶片上的缺陷。
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