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    Collection of secondary electrons through the objective lens of a scanning electron microscope
    1.
    发明授权
    Collection of secondary electrons through the objective lens of a scanning electron microscope 有权
    通过扫描电子显微镜的物镜收集二次电子

    公开(公告)号：US06946654B2

    公开(公告)日：2005-09-20

    申请号：US09840558

    申请日：2001-04-23

    Applicant: Robert L. Gerlach ,  Karel D. van der Mast ,  Michael R. Scheinfein

    Inventor： Robert L. Gerlach ,  Karel D. van der Mast ,  Michael R. Scheinfein

    IPC: H01J37/252 ,  G01Q10/04 ,  G01Q30/02 ,  G01Q30/04 ,  H01J37/141 ,  H01J37/244 ,  H01J37/28 ,  G01N23/00 ,  G21K7/00

    CPC classification number: H01J37/141 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485

    Abstract: A high resolution scanning electron microscope collects secondary Auger electrons through its objective lens to sensitively determine the chemical make-up with extremely fine positional resolution. The system uses a magnetic high resolution objective lens, such as a snorkel lens or a dual pole magnetic lens which provides an outstanding primary electron beam performance. The Auger electrons are deflected from the path of the primary beam by a transfer spherical capacitor. The primary beam is shielded, by a tube or plates, as it traverses the spherical capacitor to prevent aberration of the primary beam and the external wall of the shield maintains a potential gradient related to that of the spherical capacitor to reduce aberration of the primary electron beam. The coaxial configuration of the primary electron beam and the collected secondary electron beam allows the Auger image to coincide with the SEM view.

    Abstract translation: 高分辨率扫描电子显微镜通过其物镜收集次级俄歇电子，以非常精细的位置分辨率灵敏地确定化学成分。 该系统使用磁性高分辨率物镜，例如浮潜透镜或提供优异的一次电子束性能的双极磁性透镜。 俄歇电子通过转移球形电容器从主光束的路径偏转。 主梁被穿过球形电容器时被管或屏蔽屏蔽，以防止主光束的像差，并且屏蔽的外壁保持与球形电容器相关的电位梯度，以减少初级电子的像差 光束。 一次电子束和收集的二次电子束的同轴配置允许俄歇图与SEM视图一致。

    Charged particle beam device
    2.
    发明授权
    Charged particle beam device 失效

    公开(公告)号：US5221844A

    公开(公告)日：1993-06-22

    申请号：US837517

    申请日：1992-02-18

    Applicant: Karel D. van der Mast ,  Alan F. De Jong

    Inventor： Karel D. van der Mast ,  Alan F. De Jong

    IPC: G21K5/04 ,  G01Q30/02 ,  H01J37/153 ,  H01J37/26

    CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1514

    Abstract: In an electron microscope correction of spherical and chromatic aberration can be achieved in a number of freely adjustable directions by using a multipole correction element whereby a magnetic or electrostatic octupole field, rotatable about the optical axis, or a combined rotatable magnetic and electrostatic quadrupole field is generated. A corrected overall image can be obtained by combination of images successively corrected in different directions. In the case of holographic images, correction in the direction perpendicular to the line direction in the hologram enhances the accuracy of phase determination. A correction element of this kind, having comparatively small dimensions of from 1 to 2 cm, can be simply mounted, notably in a transmission electron microscope, in a space provided for the stigmator.

    Environmental SEM with a magnetic field for improved secondary electron direction
    3.
    发明授权
    Environmental SEM with a magnetic field for improved secondary electron direction 有权
    环境扫描电镜用磁场改善二次电子方向

    公开(公告)号：US06365896B1

    公开(公告)日：2002-04-02

    申请号：US09205526

    申请日：1998-12-03

    Applicant: Karel D. van der Mast

    Inventor： Karel D. van der Mast

    IPC: H01J37244

    CPC classification number: H01J37/244 ,  H01J2237/2448 ,  H01J2237/2608

    Abstract: The current of secondary electrons emanating from the specimen 14 in an ESEM is amplified by an avalanche-like ionization of the molecules 41 of the gas atmosphere. However, in order to achieve an adequate number of successive ionizations, a comparatively high voltage is required at the detector electrode 30 and, because of the risk of electric breakdowns, the distance between the specimen and the detector may not be smaller than a comparatively large minimum distance. Consequently, the number of successive ionizations is limited and hence also the current amplification. In order to achieve a higher amplification, the invention proposes the application of an additional magnetic field B in the ionization space. The path length of the secondary electrons is thus substantially increased so that a significantly larger number of ionizations takes place and hence a higher amplification is achieved.

    Abstract translation: 在ESEM中从样品14发出的二次电子的电流通过气体气氛的分子41的雪崩状电离放大。 然而，为了获得足够数量的连续电离，在检测器电极30处需要较高的电压，并且由于电击穿的风险，试样和检测器之间的距离可以不小于较大的 最小距离 因此，连续电离的数量是有限的，因此也是电流放大。 为了实现更高的放大，本发明提出了在电离空间中应用附加磁场B. 因此，二次电子的路径长度显着增加，从而发生显着更大数量的电离，因此实现更高的放大。

    Semiconductor device having a cold cathode
    4.
    发明授权
    Semiconductor device having a cold cathode 失效
    具有冷阴极的半导体器件

    公开(公告)号：US4766340A

    公开(公告)日：1988-08-23

    申请号：US21564

    申请日：1987-03-02

    Applicant: Karel D. van der Mast ,  Arthur M. E. Hoeberechts ,  Gerardus G. P. van Gorkom

    Inventor： Karel D. van der Mast ,  Arthur M. E. Hoeberechts ,  Gerardus G. P. van Gorkom

    IPC: H01J29/04 ,  H01J1/308 ,  H01J31/12 ,  H01J31/38 ,  H01J37/073 ,  H01L31/00

    CPC classification number: H01J1/308

    Abstract: In a semiconductor cathode, the electron-emitting part of a pn junction is provided in the tip of a projecting portion of the semiconductor surface which is situated within an opening in an insulating layer on which an acceleration electrode is disposed. Due to the increased electric field near the tip, a reduction of the work function (Schottky effect) is obtained. As a result, cathodes can be realized in which a material reducing the work function, such as caesium, may be either dispensed with or replaced, if required, by another material, which causes lower work function, but is less volatile. The field strength remains so low that no field emission occurs and serarate cathodes can be driven individually, which is favorable for applications in electron microscopy and electron lithography.

    Abstract translation: 在半导体阴极中，pn结的电子发射部分设置在半导体表面的突出部分的尖端中，半导体表面的突出部分位于设置有加速电极的绝缘层中的开口内。 由于尖端附近的电场增加，可以获得功函数（肖特基效应）的降低。 结果，可以实现阴极，其中如果需要，可以通过另一种材料来省去或替换诸如铯的功能降低功函数，这导致较低的功函数，但是较不易挥发。 场强保持如此之低，不会发生场发射，可以单独驱动平均阴极，这有利于电子显微镜和电子光刻中的应用。

    Automatically adjustable electron microscope
    7.
    发明授权
    Automatically adjustable electron microscope 失效
    自动调节电子显微镜

    公开(公告)号：US4618766A

    公开(公告)日：1986-10-21

    申请号：US773721

    申请日：1985-09-09

    Applicant: Karel D. van der Mast ,  Ulrich Gross

    Inventor： Karel D. van der Mast ,  Ulrich Gross

    IPC: H01J37/22 ,  H01J37/153 ,  H01J37/21 ,  H01J37/26 ,  G01N23/04 ,  G01N23/225

    CPC classification number: H01J37/153 ,  H01J37/21

    Abstract: In order to find criteria for the adjustment of an optimum focus, lens correction, specimen shift and the like, measurements are performed by means of a beam wobbler and the corresponding generation of a variable F(s)=.THETA..vertline.(Xi-Yi+s).vertline.* in order to determine that s-value for which F(s) is a minimum. Using this image shift value is then used to make a correction preferably automatically.

    Abstract translation: 为了找到用于调整最佳焦点，透镜校正，样本移位等的标准，通过波束摆动器执行测量，并且相应地产生变量F（s）= THETA |（Xi-Yi + s）| *，以便确定F（s）最小的s值。 然后使用该图像偏移值来优选地自动进行校正。

    Correction device for correcting chromatic aberration in particle-optical apparatus
    8.
    发明授权
    Correction device for correcting chromatic aberration in particle-optical apparatus 失效
    用于校正颗粒光学装置中的色差的校正装置

    公开(公告)号：US5986269A

    公开(公告)日：1999-11-16

    申请号：US932981

    申请日：1997-09-18

    Applicant: Marcellinus P. C. M. Krijn ,  Alexander Henstra ,  Karel D. van der Mast

    Inventor： Marcellinus P. C. M. Krijn ,  Alexander Henstra ,  Karel D. van der Mast

    IPC: H01J37/153 ,  H01J37/10 ,  H01J37/145

    CPC classification number: H01J37/153 ,  H01J2237/1534

    Abstract: Particle-optical rotationally symmetrical lenses inevitably have chromatic aberration. This lens fault determines the limit of the resolution of known particle-optical apparatus at a comparatively low acceleration voltage (0.5 kV to 5 kV) of the particle beam. This lens fault cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution of the particle-optical apparatus nevertheless, it has already been proposed to mitigate said lens fault by means of a Wien type corrector. Such a known configuration is provided with a number of electrical and magnetic multipoles. In order to achieve easier adjustment of the various multipole fields, the pole faces (30-i) governing the multipole fields according to the invention have a specific length L=(2.pi..sup.2 n.sup.2)/(K.sub.obj.sup.2 C.sub.c,obj), in which K.sub.obj is the strength of the focusing lens to be corrected and C.sub.c,obj is the coefficient of chromatic aberration of this lens.

    Abstract translation: 颗粒光学旋转对称透镜不可避免地具有色差。 这种镜片故障在粒子束的相对低的加速电压（0.5kV至5kV）下确定了已知的粒子光学装置的分辨率的极限。 这种透镜故障不能通过旋转对称场的补偿来消除。 然而，为了提高粒子光学装置的分辨率，已经提出通过维恩型校正器来减轻所述透镜故障。 这种已知的配置设置有多个电和磁多极。 为了实现各种多极场的更容易的调整，根据本发明的控制多极场的极面（30-i）具有特定长度L =（2πnn2）/（Kobj2Cc，obj），其中Kobj是 要校正的聚焦透镜的强度和Cc，obj是该透镜的色差系数。

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