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公开(公告)号：US20100005959A1
公开(公告)日：2010-01-14
申请号：US12168953
申请日：2008-07-08
CPC分类号： B01D53/228 , B01D69/12 , B01D2257/504 , B01D2323/36 , B01D2325/18 , B01D2325/26 , Y02C10/10
摘要： A layered structure can be formed having immobilized or segregated pH buffering groups that can be used to separate carbon dioxide or other gases. The pH buffering groups can be immobilized within a matrix, confined within a gel, or segregated by a semi-permeable membrane. The pH buffering groups can be configured to increase the efficiency of the system by maintaining a desirable pH profile within the cell and to permit the flow of the carbon-containing ions within the system while controlling diffusion of protons and/or hydroxyl ions.
摘要翻译： 可以形成具有可用于分离二氧化碳或其它气体的固定化或分离的pH缓冲基团的层状结构。 pH缓冲基团可固定在基质内，限制在凝胶内，或通过半透膜隔离。 pH缓冲基团可以被配置成通过在细胞内保持所需的pH分布并且允许含碳离子在系统内的流动同时控制质子和/或羟基离子的扩散来提高系统的效率。
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公开(公告)号：US07938890B2
公开(公告)日：2011-05-10
申请号：US12168953
申请日：2008-07-08
IPC分类号： B01D63/06
CPC分类号： B01D53/228 , B01D69/12 , B01D2257/504 , B01D2323/36 , B01D2325/18 , B01D2325/26 , Y02C10/10
摘要： A layered structure can be formed having immobilized or segregated pH buffering groups that can be used to separate carbon dioxide or other gases. The pH buffering groups can be immobilized within a matrix, confined within a gel, or segregated by a semi-permeable membrane. The pH buffering groups can be configured to increase the efficiency of the system by maintaining a desirable pH profile within the cell and to permit the flow of the carbon-containing ions within the system while controlling diffusion of protons and/or hydroxyl ions.
摘要翻译： 可以形成具有可用于分离二氧化碳或其它气体的固定化或分离的pH缓冲基团的层状结构。 pH缓冲基团可固定在基质内，限制在凝胶内，或通过半透膜隔离。 pH缓冲基团可以被配置成通过在细胞内保持所需的pH分布并且允许含碳离子在系统内的流动同时控制质子和/或羟基离子的扩散来提高系统的效率。
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公开(公告)号：US20110209610A1
公开(公告)日：2011-09-01
申请号：US13104556
申请日：2011-05-10
CPC分类号： B01D53/228 , B01D69/12 , B01D2257/504 , B01D2323/36 , B01D2325/18 , B01D2325/26 , Y02C10/10
摘要： A layered structure can be formed having immobilized or segregated pH buffering groups that can be used to separate carbon dioxide or other gases. The pH buffering groups can be immobilized within a matrix, confined within a gel, or segregated by a semi-permeable membrane. The pH buffering groups can be configured to increase the efficiency of the system by maintaining a desirable pH profile within the cell and to permit the flow of the carbon-containing ions within the system while controlling diffusion of protons and/or hydroxyl ions.
摘要翻译： 可以形成具有可用于分离二氧化碳或其它气体的固定化或分离的pH缓冲基团的层状结构。 pH缓冲基团可以固定在基质内，限制在凝胶内，或通过半透膜隔离。 pH缓冲基团可以被配置成通过在细胞内保持所需的pH分布并且允许含碳离子在系统内的流动同时控制质子和/或羟基离子的扩散来提高系统的效率。
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公开(公告)号：US07938891B2
公开(公告)日：2011-05-10
申请号：US12049406
申请日：2008-03-17
申请人： Karl Anthony Littau
发明人： Karl Anthony Littau
IPC分类号： B01D53/22
CPC分类号： B01D53/326 , B01D53/22 , B01D53/62 , B01D63/08 , B01D2251/102 , B01D2251/202 , B01D2257/504 , B01D2313/42 , H01M8/1009 , H01M2250/00 , Y02C10/04 , Y02C10/06 , Y02C10/10
摘要： Carbon dioxide or other gases can be separated from gas streams using ionic liquid, such as in an electrochemical cell. For example, a membrane can contain sufficient ionic liquid to reduce ionic current density of at least one of protons and hydroxyl ions, relative to carbon-containing ionic current density. A gas stream containing carbon dioxide can be introduced on a cathode side, while a source of hydrogen gas can be introduced on the anode side of the membrane. Operation of an electrochemical cell with such a membrane can separate the carbon dioxide from the gas stream and provide it at a separate outlet.
摘要翻译： 二氧化碳或其他气体可以使用离子液体，例如在电化学电池中与气流分离。 例如，相对于含碳的离子电流密度，膜可以包含足够的离子液体以降低质子和羟基离子中的至少一种的离子电流密度。 可以在阴极侧引入含有二氧化碳的气流，同时可以在膜的阳极侧引入氢气源。 具有这种膜的电化学电池的操作可以将二氧化碳与气流分离并将其提供在单独的出口处。
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公开(公告)号：US6103014A
公开(公告)日：2000-08-15
申请号：US605809
申请日：1996-02-23
申请人： Lawrence Chung-Lai Lei , Ilya Perlov , Karl Anthony Littau , Alan Ferris Morrison , Mei Chang , Ashok K. Sinha
发明人： Lawrence Chung-Lai Lei , Ilya Perlov , Karl Anthony Littau , Alan Ferris Morrison , Mei Chang , Ashok K. Sinha
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , C23C16/46 , H01L21/00 , H01L21/68 , H01L21/687 , C23C16/00
CPC分类号： C23C16/45519 , C23C16/4412 , C23C16/45521 , C23C16/458 , C23C16/4583 , C23C16/4585 , C23C16/46 , H01L21/67103 , H01L21/68 , H01L21/68721 , H01L21/68728 , H01L21/68735 , H01L21/6875 , H01L21/68785 , H01L21/68792 , Y10S438/935
摘要： Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providing uniform temperatures across the susceptor mount for a substrate. A purge gas line is connected to openings in the susceptor outside of the periphery of the substrate to prevent edge and backside contamination of the substrate. A vacuum feed line mounts the substrate to the susceptor plate during processing. A refractory purge guide, or a plurality of placement pins, maintain a fixed gap passage for the purge gases to pass alongside the edge of the wafer and into the processing area of the chamber. An exhaust pumping plate improves the uniformity of exhaustion of spent gases from the chamber.
摘要翻译： 公开了真空CVD室，其在衬底上提供更均匀地沉积的薄膜。 用于衬底的腔室基座安装件被电阻加热，单个线圈在基座的所有侧面上牢固地接触基座的金属，从而在基座的基座上提供均匀的温度。 吹扫气体管线连接到基座外部的基座上的开口，以防止衬底的边缘和背面污染。 在加工过程中，真空进料管将基板安装到基座板上。 耐火吹扫引导件或多个安置销保持固定的间隙通道，以使净化气体沿着晶片的边缘并入腔室的处理区域中。 排气泵板改善了来自腔室的废气排出的均匀性。
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公开(公告)号：US07938892B2
公开(公告)日：2011-05-10
申请号：US12136109
申请日：2008-06-10
申请人： Karl Anthony Littau
发明人： Karl Anthony Littau
IPC分类号： B01D53/22
CPC分类号： B01D69/10 , B01D53/228 , B01D2325/18 , B01D2325/26 , Y02C10/10
摘要： Ionic liquids can be immobilized in a membrane by, for example, bonding to a support such as a matrix, or by inclusion within a gel. Immobilized ionic liquids can be used in a number of applications, such as separation of carbon dioxide or other gases from gas streams. Membranes can be included in electrochemical cells. For example, a membrane can contain sufficient immobilized ionic liquid to reduce ionic current density of at least one of protons and hydroxyl ions, relative to carbon-containing ionic current density. A gas stream containing carbon dioxide can be introduced on a cathode side, while a source of hydrogen gas can be introduced on the anode side of the membrane. Operation of an electrochemical cell with such a membrane can separate the carbon dioxide from the gas stream and provide it at a separate outlet.
摘要翻译： 离子液体可以通过例如结合到诸如基质的载体上或通过包含在凝胶中而固定在膜中。 固定离子液体可用于许多应用中，例如从气流中分离二氧化碳或其它气体。 膜可以包括在电化学电池中。 例如，相对于含碳的离子电流密度，膜可以包含足够的固定化离子液体以降低质子和羟基离子中的至少一种的离子电流密度。 可以在阴极侧引入含有二氧化碳的气流，同时可以在膜的阳极侧引入氢气源。 具有这种膜的电化学电池的操作可以将二氧化碳与气流分离并将其提供在单独的出口处。
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公开(公告)号：US20090301297A1
公开(公告)日：2009-12-10
申请号：US12136109
申请日：2008-06-10
申请人： Karl Anthony Littau
发明人： Karl Anthony Littau
CPC分类号： B01D69/10 , B01D53/228 , B01D2325/18 , B01D2325/26 , Y02C10/10
摘要： Ionic liquids can be immobilized in a membrane by, for example, bonding to a support such as a matrix, or by inclusion within a gel. Immobilized ionic liquids can be used in a number of applications, such as separation of carbon dioxide or other gases from gas streams. Membranes can be included in electrochemical cells. For example, a membrane can contain sufficient immobilized ionic liquid to reduce ionic current density of at least one of protons and hydroxyl ions, relative to carbon-containing ionic current density. A gas stream containing carbon dioxide can be introduced on a cathode side, while a source of hydrogen gas can be introduced on the anode side of the membrane. Operation of an electrochemical cell with such a membrane can separate the carbon dioxide from the gas stream and provide it at a separate outlet.
摘要翻译： 离子液体可以通过例如结合到诸如基质的载体上或通过包含在凝胶中而固定在膜中。 固定离子液体可用于许多应用中，例如从气流中分离二氧化碳或其它气体。 膜可以包括在电化学电池中。 例如，相对于含碳的离子电流密度，膜可以包含足够的固定化离子液体以降低质子和羟基离子中的至少一种的离子电流密度。 可以在阴极侧引入含有二氧化碳的气流，同时可以在膜的阳极侧引入氢气源。 具有这种膜的电化学电池的操作可以将二氧化碳与气流分离并将其提供在单独的出口处。
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公开(公告)号：US6125859A
公开(公告)日：2000-10-03
申请号：US893922
申请日：1997-07-11
IPC分类号： H05H1/46 , C23C16/44 , C23C16/50 , C23C16/511 , C23C16/52 , H01J9/38 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/00
CPC分类号： H01J37/32862 , C23C16/511 , C23C16/52 , H01J37/32192 , H01J37/32357 , H01J9/38 , Y10S156/916 , Y10S438/905
摘要： A method for a multiple-stage microwave plasma cleaning technique for efficiently cleaning a substrate processing chamber. In a specific embodiment, a two-stage cleaning process is described. The first stage begins by flowing a reactive gas from a gas source into a processing chamber where microwaves ignite and maintain a plasma from the reactive gas. Reactive radicals generated which react with residues on the interior surfaces of the processing chamber. In the second stage, an inert gas is flowed into the processing chamber in addition to the reactive gas. Microwaves then ignite and maintain a plasma from the reactive gas and optionally, the inert gas as well. Optionally, an inert gas can be flowed into the processing chamber prior to the first stage to remove loose particles from the processing chamber. The reactive gas in such embodiments is preferably NF.sub.3, but other fluorine-containing gases such as carbon tetrafluoride (CF.sub.4) or sulfur hexafluoride (SF.sub.6) may also be used. Moreover, chlorine- or other halogen-containing gases may also be used as the reactive gas in other embodiments in place of fluorine-containing gases.
摘要翻译： 一种用于高效清洗基板处理室的多级微波等离子体清洗技术的方法。 在具体实施例中，描述了两阶段清洁过程。 第一阶段开始于将反应气体从气体源流入处理室，其中微波点燃并维持来自反应气体的等离子体。 所产生的反应性基团与处理室内表面上的残留物反应。 在第二阶段中，除了反应性气体之外，惰性气体也流入处理室。 微波然后点燃和维持来自反应气体的等离子体以及任选的惰性气体。 任选地，惰性气体可以在第一阶段之前流入处理室以从处理室去除松散的颗粒。 在这些实施方案中，反应性气体优选为NF 3，但也可以使用其它含氟气体如四氟化碳（CF 4）或六氟化硫（SF 6）。 此外，在其它实施方案中，也可以使用氯或其它含卤素的气体作为反应气体来代替含氟气体。
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公开(公告)号：US6024799A
公开(公告)日：2000-02-15
申请号：US890805
申请日：1997-07-11
申请人： Chen-An Chen , Karl Anthony Littau
发明人： Chen-An Chen , Karl Anthony Littau
IPC分类号： C23C16/44 , C23C16/455 , C30B25/14 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/455 , C30B25/14
摘要： A manifold for use in a chemical vapor deposition reactor, optimized for providing effective deposition on a substrate of a specific diameter. The manifold has upstream and downstream faces and is of substantially circular shape, with a central region of the downstream face being perforated by a plurality of upstream-directed bores. The central region is substantially larger than a circle of the specific wafer diameter for which the reactor is optimized. A centrally located plurality of the bores are through-bores or holes to the upstream face of the manifold that define a gas flow path from an upstream gas source to the wafer.
摘要翻译： 用于化学气相沉积反应器的歧管，其优化用于在特定直径的基底上提供有效的沉积。 歧管具有上游和下游面，并且具有大致圆形形状，下游面的中心区域被多个上游定向孔打孔。 中心区域实际上大于反应器优化的特定晶片直径的圆。 位于中心的多个孔是通向歧管的上游面的通孔或孔，其限定从上游气体源到晶片的气体流动路径。
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公开(公告)号：US5935338A
公开(公告)日：1999-08-10
申请号：US606267
申请日：1996-02-23
申请人： Lawrence Chung-Lai Lei , Ilya Perlov , Karl Anthony Littau , Alan Ferris Morrison , Mei Chang , Ashok K. Sinha
发明人： Lawrence Chung-Lai Lei , Ilya Perlov , Karl Anthony Littau , Alan Ferris Morrison , Mei Chang , Ashok K. Sinha
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , C23C16/46 , H01L21/00 , H01L21/68 , H01L21/687 , C23C16/00
CPC分类号： C23C16/45519 , C23C16/4412 , C23C16/45521 , C23C16/458 , C23C16/4583 , C23C16/4585 , C23C16/46 , H01L21/67103 , H01L21/68 , H01L21/68721 , H01L21/68728 , H01L21/68735 , H01L21/6875 , H01L21/68785 , H01L21/68792 , Y10S438/935
摘要： Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providing uniform temperatures across the susceptor mount for a substrate. A purge gas line is connected to openings in the susceptor outside of the periphery of the substrate to prevent edge and backside contamination of the substrate. A vacuum feed line mounts the substrate to the susceptor plate during processing. A refractory purge guide, or a plurality of placement pins, maintain a fixed gap passage for the purge gases to pass alongside the edge of the wafer and into the processing area of the chamber. An exhaust pumping plate improves the uniformity of exhaustion of spent gases from the chamber.
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