Abstract:
Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2═C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.
Abstract:
A process produces vinyl ether compounds and includes allowing a vinyl ester compound represented by following Formula (1): wherein R1, R2, R3 and R4 are the same or different and are each a hydrogen atom or an organic group, to react with a hydroxy compound represented by following Formula (2): R5OH (2) wherein R5 is an organic group, in the presence of at least one transition element compound to thereby yield a vinyl ether compound represented by following Formula (3): wherein R2, R3, R4 and R5 have the same meanings as defined above. Such transition element compounds include iridium compounds and other compounds containing Group VIII elements.
Abstract:
A monomer containing an electron-withdrawing group of the present invention is represented by following Formula (a), (b) or (c): wherein A1, A2, and A3 are each a ring; Ra, Rb, Rc, and Ru are the same or different and are each a hydrogen atom or organic group; at least one of Rs, Rw and Rv, at least one of Rt and Rw1, and at least one of the two Rw2s are each an electron-withdrawing group, and the others are each a hydrogen atom or organic group; W1 is a single bond or linkage group; and n denotes an integer of 2 to 25, where at least two of Ra, Rb, Rc, Rs, Rt, Ru, Rv, Rw, Rw1, Rw2, W1, and carbon atoms constituting ring A1, carbon atoms constituting ring A2, and carbon atoms constituting ring A3 may be combined to form a ring, respectively. The electron-withdrawing groups in Rs, Rt, Rv, Rw, Rw1, and Rw2 are, for example, groups each containing a fluorine atom. The monomer is useful as a raw material for photoresist polymeric compounds.
Abstract translation:含有本发明吸电子基团的单体由下式(a),(b)或(c)表示:其中A 1,A 2, 和A <3>各自为环; R a,R b,R c和R u相同或不同,各自为氢 原子或有机基团; R 0和R 2中的至少一个,R 0和R 2中的至少一个,R 0和R 2, SUP> w1,并且两个R 2 w 2中的至少一个各自为吸电子基团,其余各自为氢原子或有机基团; W 1是单键或连接基团; n表示2〜25的整数,其中R a,R b,R b,R c,R i,R b, R 1,R 2,R 2,R 2,R 2,R 2,R 2,R 2, W 2,W 1,和构成环A 1的碳原子,构成环A 2的碳原子, 并且构成环A 3的碳原子可以分别结合形成环。 R“,”R“,”R“,”R“,”R“,”R“中的吸电子基团, w1,w2,...,w2都是例如各自含有氟原子的基团。 该单体可用作光致抗蚀剂聚合物的原料。
Abstract:
A compound represented by the formula: ##STR1## wherein R represents a hydrogen atom or a lower alkyl group;R.sup.1 represents a higher alkyl group which may be substituted;R.sup.2 represents a hydrogen atom or a lower alkyl group, a lower alkanoyl group or a nitrogen-containing 5- to 7-membered heterocyclic group each of which may be substituted; X represents a divalent group represented by the formula:--(OCH.sub.2 CH.sub.2).sub.p -- wherein p represents an integer of 1 to 5, a divalent group represented by the formula:--O(CH.sub.2).sub.q -- wherein q represents an integer of 3 to 8, or a divalent group represented by the formula:--(OCH.sub.2 CH.sub.2).sub.p --J--(CH.sub.2).sub.q -- wherein J represents an oxygen atom or a group represented by the formula: --S(O).sub.r -- (wherein r represents 0, 1 or 2), and p and q are the same as defined above; Y represents a divalent group containing tertiary or quaternary nitrogen atom(s); and Z represents an alkylene group which may be substituted and/or interrupted, or a group represented by the formula:--Q--T-- or --T--W-- wherein Q and W represent an alkylene group which may be substituted, and T represents a phenhylene group, a naphthylene group, a cycloalkylene group; and a salt thereof exhibit excellent antitumor action including differentiation inducing action and are useful as pharmaceuticals.
Abstract:
Phospholipid derivatives of the formula: ##STR1## wherein R.sup.1 is a higher alkyl, acylmethyl or alkylcarbamoyl group which may be substituted by cycloalkyl; R.sup.2 is a lower alkyl which may be substituted by carboxy, formyl or lower acyl, a carbamoyl or thiocarbamoyl group which is substituted by lower alkyl, or an acetoacetyl group; R.sup.3, R.sup.4 and R.sup.5 are independently hydrogen or lower alkyl, or ##STR2## represents a cyclic ammonio group; and n represents an integer of 8 to 14, and salts thereof have antitumor activity.
Abstract:
A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2═C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.
Abstract:
A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.
Abstract translation:用于光刻目的的聚合物至少具有由以下通式(I)表示的重复结构单元。 在式(I)中,R 1,R 3,R 4和R 6各自独立地表示氢原子,卤素原子,氰基,烷基或卤代烷基; R2和R5各自独立地表示氢原子,氰基等; X1和X2各自独立地表示单键,或取代或未取代的二价亚烷基,亚烯基或亚环烷基等; X 3和X 4各自独立地表示单键或-CO-; R 7,R 8,R 9和R 10各自独立地表示氢原子,烷基或环烷基。 用于光刻目的的聚合物在线边缘粗糙度(LER)和耐蚀刻性之间具有良好的平衡,并且允许非常精细和均匀的图案化。
Abstract:
A process produces vinyl ether compounds and includes allowing a vinyl ester compound represented by following Formula (1): wherein R1, R2, R3 and R4 are the same or different and are each a hydrogen atom or an organic group, to react with a hydroxy compound represented by following Formula (2): R5OH (2) wherein R5 is an organic group, in the presence of at least one transition element compound to thereby yield a vinyl ether compound represented by following Formula (3): wherein R2, R3, R4 and R5 have the same meanings as defined above. Such transition element compounds include iridium compounds and other compounds containing Group VIII elements.
Abstract:
A process produces vinyl ether compounds and includes allowing a vinyl ester compound represented by following Formula (1): wherein R1, R2, R3 and R4 are the same or different and are each a hydrogen atom or an organic group, to react with a hydroxy compound represented by following Formula (2): R5OH (2) wherein R5 is an organic group, in the presence of at least one transition element compound to thereby yield a vinyl ether compound represented by following Formula (3): wherein R2, R3, R4 and R5 have the same meanings as defined above. Such transition element compounds include iridium compounds and other compounds containing Group VIII elements.
Abstract:
A polymeric compound having a repeated unit corresponding to an unsaturated carboxylic acid hemiacetal ester represented by the following formula (1); wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of carbon number 1 to 6 or a haloalkyl group of carbon number 1 to 6, Rb is a hydrocarbon group having a hydrogen atom at a first poison, Rc is a hydrogen atom or a hydrocarbon group and Rd is an organic group having a cyclic skeleton. This polymeric compound, further, may have a repeated unit corresponding to at least one monomer selected from a monomer having a lactone skeleton, a monomer having a cyclic ketone skeleton, a monomer having an acid anhydride group and a monomer having an imide group [except for a repeated unit corresponding to the said unsaturated carboxylic acid hemiacetal ester] and/or a repeated unit corresponding to at least one monomer selected from a monomer having a hydroxyl group and others. This polymeric compound shows superior acid-eliminating function in case of using as photoresist.