公开(公告)号：US08903613B2

公开(公告)日：2014-12-02

申请号：US13996068

申请日：2011-10-28

申请人： Kenichi Mori ,  Hidetoshi Taniguchi ,  Yutaka Kaneko

发明人： Kenichi Mori ,  Hidetoshi Taniguchi ,  Yutaka Kaneko

IPC分类号： G06F7/00 ,  G06F17/00 ,  G06F19/00 ,  B60W10/11 ,  B60K23/08 ,  F16H13/14 ,  B60W10/06

CPC分类号： B60W10/11 ,  B60K23/08 ,  B60K2023/0816 ,  B60W10/06 ,  F16H13/14

摘要： A crankshaft is normally and reversely rotated at a constant speed, during which the singular points of crankshaft driving motor current responding to the drive torque change of the crankshaft are detected. A crankshaft rotational angle reference point is set based on the midpoint between the crankshaft rotational positions obtained when, among these singular points, singular points having the same type appear during the respective normal and reverse rotations. Therefore, the crankshaft rotational angle reference point can be reliably set regardless of the variations and errors.

摘要翻译： 曲轴以恒定的速度正常和反向旋转，在此期间，检测曲轴驱动马达电流响应于曲轴的驱动转矩变化的电流的奇点。 基于曲轴旋转位置之间的中点设置曲轴旋转角度参考点，在这些奇异点中，在相应的正向和反向旋转期间出现具有相同类型的奇异点。 因此，无论变化和错误如何，都可以可靠地设定曲轴转角参考点。

公开(公告)号：US20130289838A1

公开(公告)日：2013-10-31

申请号：US13996068

申请日：2011-10-28

申请人： Kenichi Mori ,  Hidetoshi Taniguchi ,  Yutaka Kaneko

发明人： Kenichi Mori ,  Hidetoshi Taniguchi ,  Yutaka Kaneko

IPC分类号： B60W10/11 ,  B60W10/06

CPC分类号： B60W10/11 ,  B60K23/08 ,  B60K2023/0816 ,  B60W10/06 ,  F16H13/14

摘要： A crankshaft is normally and reversely rotated at a constant speed, during which the singular points of crankshaft driving motor current responding to the drive torque change of the crankshaft are detected. A crankshaft rotational angle reference point is set based on the midpoint between the crankshaft rotational positions obtained when, among these singular points, singular points having the same type appear during the respective normal and reverse rotations. Therefore, the crankshaft rotational angle reference point can be reliably set regardless of the variations and errors.

摘要翻译： 曲轴以恒定的速度正常和反向旋转，在此期间，检测曲轴驱动马达电流响应于曲轴的驱动转矩变化的电流的奇点。 基于曲轴旋转位置之间的中点设置曲轴旋转角度参考点，在这些奇异点中，在相应的正向和反向旋转期间出现具有相同类型的奇异点。 因此，无论变化和错误如何，都可以可靠地设定曲轴转角参考点。

公开(公告)号：US08886428B2

公开(公告)日：2014-11-11

申请号：US13877052

申请日：2012-02-22

申请人： Kenichi Mori ,  Yutaka Kaneko

发明人： Kenichi Mori ,  Yutaka Kaneko

IPC分类号： G06F19/00 ,  F16H13/00

CPC分类号： F16D41/08 ,  B60K5/02 ,  B60K17/344 ,  B60K17/3462 ,  B60K23/08 ,  B60K23/0808 ,  B60K2023/0825 ,  B60K2023/0858 ,  F16D41/105 ,  Y10T74/19019 ,  Y10T74/19074

摘要： An unlocking controller is provided for an irreversible rotary transmission system having the irreversible rotary transmission system having an irreversible rotation transmission element arranged between an input shaft and an output shaft. The unlocking controller includes an input shaft rotation direction determination section and an unlocking torque setting section. The input shaft rotation direction determination section determines whether an input shaft rotational direction is the same as, or opposite to, a direction of the load torque of the output shaft. The unlocking torque setting section conducts an unlocking torque control that sets the unlocking torque a higher value when the input shaft rotational direction and the direction of the load torque of the output shaft are the same as while the lock is released, than when the input shaft rotational direction is opposite to the direction of the direction of the load torque of the output shaft.

摘要翻译： 提供了一种用于不可逆旋转传动系统的解锁控制器，其具有设置在输入轴和输出轴之间的不可逆转动传动元件的不可逆旋转传动系统。 解锁控制器包括输入轴旋转方向确定部和解锁转矩设定部。 输入轴旋转方向确定部分确定输入轴旋转方向是否与输出轴的负载转矩的方向相同或相反。 解锁转矩设定部，当输入轴的旋转方向和输出轴的负载转矩方向与释放锁定时相同时，进行解锁转矩控制，将解锁转矩设定为较高值，与输入轴 旋转方向与输出轴的负载转矩方向相反。

公开(公告)号：US20140039771A1

公开(公告)日：2014-02-06

申请号：US13877052

申请日：2012-02-22

申请人： Kenichi Mori ,  Yutaka Kaneko

发明人： Kenichi Mori ,  Yutaka Kaneko

IPC分类号： F16D41/08

CPC分类号： F16D41/08 ,  B60K5/02 ,  B60K17/344 ,  B60K17/3462 ,  B60K23/08 ,  B60K23/0808 ,  B60K2023/0825 ,  B60K2023/0858 ,  F16D41/105 ,  Y10T74/19019 ,  Y10T74/19074

摘要： An unlocking controller is provided for an irreversible rotary transmission system having the irreversible rotary transmission system having an irreversible rotation transmission element arranged between an input shaft and an output shaft. The unlocking controller includes an input shaft rotation direction determination section and an unlocking torque setting section. The input shaft rotation direction determination section determines whether an input shaft rotational direction is the same as, or opposite to, a direction of the load torque of the output shaft. The unlocking torque setting section conducts an unlocking torque control that sets the unlocking torque a higher value when the input shaft rotational direction and the direction of the load torque of the output shaft are the same as while the lock is released, than when the input shaft rotational direction is opposite to the direction of the direction of the load torque of the output shaft.

摘要翻译： 提供了一种用于不可逆旋转传动系统的解锁控制器，其具有设置在输入轴和输出轴之间的不可逆旋转传动元件的不可逆旋转传动系统。 解锁控制器包括输入轴旋转方向确定部和解锁转矩设定部。 输入轴旋转方向确定部分确定输入轴旋转方向是否与输出轴的负载转矩的方向相同或相反。 解锁转矩设定部，当输入轴的旋转方向和输出轴的负载转矩方向与释放锁定时相同时，进行解锁转矩控制，将解锁转矩设定为较高值，与输入轴 旋转方向与输出轴的负载转矩方向相反。

公开(公告)号：US08604430B2

公开(公告)日：2013-12-10

申请号：US13366874

申请日：2012-02-06

申请人： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Hiroshi Toyama

发明人： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Hiroshi Toyama

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  G01N23/20 ,  G01N23/2251 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/04 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/04756 ,  H01J2237/20221 ,  H01J2237/2444 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/31766

摘要： The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector scans the beam over a sample, an objective lens converges the electron beam on the sample, a detector located between the sample and the objective lens detects charged particles emitted from the sample, a power supply applies a retarding voltage to the sample for decelerating the electron beam to the sample, an electrode is disposed between the objective lens and the sample, and a voltage is generated between the sample and the electrode by said electrode, the voltage being determined depending on the sample. The apparatus solves problems encountered in conventional inspection systems.

摘要翻译： 所公开的检查装置产生电子束，加速电极加速电子束，会聚透镜会聚电子束，电子束偏转器扫描样品上的光束，物镜会将电子束会聚在样品上，检测器位于 在样品和物镜之间检测从样品发射的带电粒子，电源向样品施加延迟电压以将电子束减速到样品，电极设置在物镜和样品之间，电压为 通过所述电极在样品和电极之间产生，电压根据样品确定。 该装置解决了常规检测系统遇到的问题。

公开(公告)号：US07417444B2

公开(公告)日：2008-08-26

申请号：US11269617

申请日：2005-11-09

申请人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

发明人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

IPC分类号： G01R31/305 ,  H01J37/28

CPC分类号： G01R31/305 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.

摘要翻译： 一种电路图案检查方法及其装置，其中待检查样品的待检查部分的整个部分被制成处于预定的充电状态，被检查的部分用图像形成高分辨率照射， 在扫描电子束时，在从电子束照射的时刻起经过规定的时间后，在照射电子束的部分检测到二次带电粒子，根据这样检测的次级 通过使用如此形成的图像来检查带电粒子信号，并检查待检查的部分。

公开(公告)号：US07026830B2

公开(公告)日：2006-04-11

申请号：US10379555

申请日：2003-03-06

申请人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

发明人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

IPC分类号： G01R31/305 ,  G01R31/28

CPC分类号： G01R31/305 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

摘要： To make possible the in-line inspection of a pattern of an insulating material.A patterned wafer 40 formed with a pattern by a resist film is placed on a specimen table 21 of a patterned wafer inspection apparatus 1 in opposed relation to a SEM 3. An electron beam 10 of a large current is emitted from an electron gun 11 and the pattern of the patterned wafer is scanned only once at a high scanning rate. The secondary electrons generated by this scanning from the patterned wafer are detected by a secondary electron detector 16 thereby to acquire an electron beam image. Using this electron beam image, the comparative inspection is conducted on the patterned wafer through an arithmetic operation unit 32 and a defect determining unit 33. Since an electron beam image of high contrast can be obtained by scanning an electron beam only once, a patterned wafer inspection method using a SEM can be implemented in the IC fabrication method.

摘要翻译： 使绝缘材料的图案能够在线检查。 通过抗蚀剂膜形成图案的图案化晶片40与SEM 3相对地放置在图案化晶片检查装置1的样本台21上。 从电子枪11发射大电流的电子束10，以高扫描速度扫描图案化晶片的图案一次。 通过二次电子检测器16检测来自图案化晶片的该扫描产生的二次电子，从而获得电子束图像。 使用该电子束图像，通过算术运算单元32和缺陷判定单元33对图案化晶片进行比较检查。由于可以通过仅扫描电子束一次来获得高对比度的电子束图像，因此图案化晶片 使用SEM的检查方法可以在IC制造方法中实现。

公开(公告)号：US07012252B2

公开(公告)日：2006-03-14

申请号：US11108877

申请日：2005-04-19

申请人： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Hiroshi Toyama

发明人： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Hiroshi Toyama

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  G01N23/20 ,  G01N23/2251 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/04 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/04756 ,  H01J2237/20221 ,  H01J2237/2444 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/31766

摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.

公开(公告)号：US20060043982A1

公开(公告)日：2006-03-02

申请号：US11269617

申请日：2005-11-09

申请人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

发明人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

IPC分类号： G01R31/305

CPC分类号： G01R31/305 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.

摘要翻译： 一种电路图案检查方法及其装置，其中待检查样品的待检查部分的整个部分被制成处于预定的充电状态，被检查的部分用图像形成高分辨率照射， 在扫描电子束时，在从电子束照射的时刻起经过规定的时间后，在照射电子束的部分检测到二次带电粒子，根据这样检测的次级 通过使用如此形成的图像来检查带电粒子信号，并检查待检查的部分。

公开(公告)号：US06559663B2

公开(公告)日：2003-05-06

申请号：US09983703

申请日：2001-10-25

申请人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

发明人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

IPC分类号： G01R31305

CPC分类号： G01R31/305 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with: the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.

摘要翻译： 一种电路图案检查方法及其装置，其中待检查样品的待检查部分的整个部分被制成处于预定的充电状态，被检查的部分用图像形成高分辨率照射， 在扫描电子束的同时，在从照射电子束的时刻起经过规定时间后，照射电子束的部位检测到二次带电粒子，根据这样检测出形成图像 通过使用如此形成的图像来检查次级带电粒子信号和待检查的部分。