公开(公告)号：US20090068341A1

公开(公告)日：2009-03-12

申请号：US11909796

申请日：2006-03-28

申请人： Koichi Misumi ,  Yasushi Washio ,  Takahiro Senzaki ,  Koji Saito

发明人： Koichi Misumi ,  Yasushi Washio ,  Takahiro Senzaki ,  Koji Saito

IPC分类号： G03F7/20 ,  G03F7/09 ,  B05D5/12

CPC分类号： G03F7/0045 ,  G03F7/0397 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/131 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/81192 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01057 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/15747 ,  H01L2924/15788 ,  H01L2924/3025 ,  H05K3/0076 ,  H05K3/0079 ,  H05K3/3452 ,  H01L2924/00014 ,  H01L2924/00

摘要： This positive photoresist composition is a positive photoresist composition for exposing to light having one or more wavelengths selected from g-rays, h-rays and i-rays, comprising: (A) a compound which generates an acid under irradiation with active rays or radiation, and (B) a resin whose solubility in an alkali is enhanced by an action of an acid, wherein the component (A) contains an onium salt (A1) having a naphthalene ring in the cation moiety.

摘要翻译： 该正性光致抗蚀剂组合物是用于暴露于选自g射线，h射线和i射线中的一种或多种波长的光的正性光致抗蚀剂组合物，其包含：（A）在用活性射线或辐射照射下产生酸的化合物 （B）通过酸的作用使在碱中的溶解度增强的树脂，其中，成分（A）在阳离子部分含有具有萘环的鎓盐（A1）。

公开(公告)号：US20100047715A1

公开(公告)日：2010-02-25

申请号：US12515872

申请日：2007-10-18

申请人： Yasushi Washio ,  Mitsuaki Ohgake ,  Nobuko Ohgake ,  Kazuhide Uno ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito

发明人： Yasushi Washio ,  Mitsuaki Ohgake ,  Nobuko Ohgake ,  Kazuhide Uno ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  H01L21/0271

摘要： Disclosed are a chemically amplified positive-type photoresist composition for a thick film, a chemically amplified dry film for a thick film, and a method for producing a thick film resist pattern, all of which are capable of obtaining a satisfactory resist pattern with high sensitivity even on a substrate having a portion formed of copper on an upper surface thereof. The chemically amplified positive-type photoresist composition for a thick film comprises component (A) which includes at least one compound capable of producing an acid upon irradiation with an actinic ray or radiation, and component (B) which includes at least one resin whose alkali solubility increases by the action of an acid, in which the component (A) includes an onium fluorinated alkyl fluorophosphate having a specific structure.

摘要翻译： 公开了一种用于厚膜的化学放大正型光致抗蚀剂组合物，用于厚膜的化学放大干膜，以及制造厚膜抗蚀剂图案的方法，所有这些都能够以高灵敏度获得令人满意的抗蚀剂图案 即使在其上表面上具有由铜形成的部分的基板上。 用于厚膜的化学放大正型光致抗蚀剂组合物包含组分（A），其包含至少一种能够在用光化学射线或辐射照射时能够产生酸的化合物，和组分（B），其包含至少一种其碱 通过酸的作用，溶解度增加，其中组分（A）包括具有特定结构的鎓氟化烷基氟磷酸酯。

公开(公告)号：US08507180B2

公开(公告)日：2013-08-13

申请号：US12515872

申请日：2007-10-18

申请人： Yasushi Washio ,  Kazuhide Uno ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito ,  Nobuko Ohgake

发明人： Yasushi Washio ,  Mitsuaki Ohgake ,  Kazuhide Uno ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito

IPC分类号： G03F7/039

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  H01L21/0271

摘要： Disclosed are a chemically amplified positive-type photoresist composition for a thick film, a chemically amplified dry film for a thick film, and a method for producing a thick film resist pattern, all of which are capable of obtaining a satisfactory resist pattern with high sensitivity even on a substrate having a portion formed of copper on an upper surface thereof. The chemically amplified positive-type photoresist composition for a thick film comprises component (A) which includes at least one compound capable of producing an acid upon irradiation with an actinic ray or radiation, and component (B) which includes at least one resin whose alkali solubility increases by the action of an acid, in which the component (A) includes an onium fluorinated alkyl fluorophosphate having a specific structure.

摘要翻译： 公开了一种用于厚膜的化学放大正型光致抗蚀剂组合物，用于厚膜的化学放大干膜，以及制造厚膜抗蚀剂图案的方法，所有这些都能够以高灵敏度获得令人满意的抗蚀剂图案 即使在其上表面上具有由铜形成的部分的基板上。 用于厚膜的化学放大正型光致抗蚀剂组合物包含组分（A），其包含至少一种能够在用光化学射线或辐射照射时能够产生酸的化合物，和组分（B），其包含至少一种其碱 通过酸的作用，溶解度增加，其中组分（A）包括具有特定结构的鎓氟化烷基氟磷酸酯。

公开(公告)号：US07977030B2

公开(公告)日：2011-07-12

申请号：US12136354

申请日：2008-06-10

申请人： Takahiro Senzaki ,  Koichi Misumi ,  Koji Saito

发明人： Takahiro Senzaki ,  Koichi Misumi ,  Koji Saito

IPC分类号： G03F7/029 ,  G03F7/11 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC分类号： C08F2/50 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/161 ,  Y10S430/122 ,  Y10S430/126 ,  Y10S430/127

摘要： A photosensitive resin composition, a photosensitive resin laminate, and a method for forming a pattern capable of realizing high hardness while using an epoxy group-containing acrylic resin are provided. In a photosensitive resin composition including (A) an epoxy group-containing acrylic resin, (B) a photopolymerization initiator, and (C) a sensitizer, an onium salt having a specific structure is used as the component (B), and at least one kind selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and 2,6-dihydroxynaphthalene is used as the component (C).

摘要翻译： 提供了一种感光性树脂组合物，感光性树脂层叠体，以及在使用含有环氧基的丙烯酸类树脂时能够实现高硬度的图案的形成方法。 在包含（A）含环氧基丙烯酸树脂，（B）光聚合引发剂和（C）敏化剂）的感光性树脂组合物中，使用具有特定结构的鎓盐作为（B）成分，至少 使用1,5-二羟基萘，2,3-二羟基萘和2,6-二羟基萘中的一种作为（C）成分。

公开(公告)号：US20110123928A1

公开(公告)日：2011-05-26

申请号：US12223913

申请日：2007-02-15

申请人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

发明人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/0385

摘要： Problem: Providing a photosensitive resin composition that has high sensitivity, sustains a slight shrinkage in volume when cured under heating and can form resist patterns having high-aspect profiles, and a pattern forming method using such a composition.Means for Resolution: A photosensitive resin composition characterized by containing (a) a polyfunctional epoxy resin, (b) a cationic polymerization initiator and (c) an aromatic polycyclic compound as a sensitizer (such as 2,3-dihydroxynaphthalene, 1,5-dihydroxynaphthalene or 2,6-dihydroxynaphthalene), which has at least two substituents capable of forming cross-links with component (a).

摘要翻译： 问题：提供一种具有高灵敏度的感光性树脂组合物，在加热下固化时能够容易地体积收缩，并且可以形成具有高外形轮廓的抗蚀剂图案，以及使用这种组合物的图案形成方法。 解决方法：一种感光性树脂组合物，其特征在于，含有（a）多官能环氧树脂，（b）阳离子聚合引发剂和（c）作为敏化剂的芳香族多环化合物（如2,3-二羟基萘， 二羟基萘或2,6-二羟基萘），其具有至少两个能够与组分（a）形成交联的取代基。

公开(公告)号：US08187408B2

公开(公告)日：2012-05-29

申请号：US12304974

申请日：2007-06-14

申请人： Atsushi Yamanouchi ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito

发明人： Atsushi Yamanouchi ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito

IPC分类号： B32B37/00 ,  B29C65/00

CPC分类号： B32B37/0023 ,  B29C65/02 ,  B29C65/14 ,  B29C65/18 ,  B29C65/7894 ,  B29C66/4722 ,  B29C66/474 ,  B29C66/71 ,  B29C66/723 ,  B29C66/8362 ,  B29C66/9141 ,  B29C66/91421 ,  B29C66/91645 ,  B29C66/919 ,  B29C66/9241 ,  B29C66/929 ,  B29C66/934 ,  B29C66/939 ,  B29L2016/00 ,  B29L2031/767 ,  B32B3/30 ,  B32B7/06 ,  B32B27/08 ,  B32B27/18 ,  B32B27/24 ,  B32B27/32 ,  B32B27/36 ,  B32B27/38 ,  B32B37/0046 ,  B32B2250/24 ,  B32B2307/308 ,  B32B2307/70 ,  B32B2307/734 ,  B32B2307/748 ,  Y10T156/10 ,  Y10T156/1043 ,  B29K2023/06 ,  B29K2023/12 ,  B29K2067/003

摘要： A method of forming a precision microspace with given configuration and volume; a process for manufacturing a member having a precision microspace with given configuration and volume; etc. There is provided a method of forming a precision microspace by the step of laying a film on a substratum having a precision microscopic depressed portion, comprising the steps of mounting such a substratum on a first stage and setting a second stage covering the outer circumference of the first stage so that the uppermost face of the second stage is higher than that of the first stage; and laying a film on the substratum to thereby obtain a precision microspace with given configuration and volume.

摘要翻译： 形成具有给定配置和体积的精密微孔的方法; 用于制造具有给定配置和体积的精密微空间的构件的方法; 提供了一种通过将膜放置在具有精密微小凹部的基底上的步骤来形成精密微空间的方法，包括以下步骤：将这种基底安装在第一阶段上，并设置覆盖外周的第二阶段 使得第二阶段的最上面的面高于第一阶段的最上面; 并在基底上铺上薄膜，从而获得具有给定配置和体积的精密微孔。

公开(公告)号：US20080311511A1

公开(公告)日：2008-12-18

申请号：US12136354

申请日：2008-06-10

申请人： Takahiro Senzaki ,  Koichi Misumi ,  Koji Saito

发明人： Takahiro Senzaki ,  Koichi Misumi ,  Koji Saito

IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F2/50

CPC分类号： C08F2/50 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/161 ,  Y10S430/122 ,  Y10S430/126 ,  Y10S430/127

摘要： A photosensitive resin composition, a photosensitive resin laminate, and a method for forming a pattern capable of realizing high hardness while using an epoxy group-containing acrylic resin are provided. In a photosensitive resin composition including (A) an epoxy group-containing acrylic resin, (B) a photopolymerization initiator, and (C) a sensitizer, an onium salt having a specific structure is used as the component (B), and at least one kind selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and 2,6-dihydroxynaphthalene is used as the component (C).

摘要翻译： 提供了一种感光性树脂组合物，感光性树脂层叠体，以及在使用含有环氧基的丙烯酸类树脂时能够实现高硬度的图案的形成方法。 在包含（A）含环氧基丙烯酸树脂，（B）光聚合引发剂和（C）敏化剂）的感光性树脂组合物中，使用具有特定结构的鎓盐作为（B）成分，至少 使用1,5-二羟基萘，2,3-二羟基萘和2,6-二羟基萘中的一种作为（C）成分。

公开(公告)号：US08288078B2

公开(公告)日：2012-10-16

申请号：US12449060

申请日：2008-01-11

申请人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

发明人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

IPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0385 ,  G03F7/40

摘要： A photosensitive resin composition is provided that is highly safe, provides a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability. According to a photosensitive resin composition including, in addition to an onium fluorinated alkyl fluorophosphate based cation polymerization initiator having a specific structure, a specified solvent or a specified sensitizing agent as essential components, a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and also is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability.

摘要翻译： 提供一种高度安全的感光性树脂组合物，提供均匀性优异的涂膜，可以提高固化树脂图案的固化密度，并且能够形成具有大膜厚度和高纵横比的微观抗蚀剂图案， 灵敏度高，分辨能力高。 根据具有特定结构的含氟氟烷基氟磷酸酯类阳离子聚合引发剂，特定溶剂或特定敏化剂作为必要成分的感光性树脂组合物，具有均匀性优异的涂膜可以提高固化密度 固化树脂图案，并且还能够以高灵敏度和高分辨能力形成具有大膜厚度和高纵横比的微抗蚀剂图案。

公开(公告)号：US20100068648A1

公开(公告)日：2010-03-18

申请号：US12448913

申请日：2008-01-11

申请人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

发明人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/0385 ,  G03F7/40

摘要： A photosensitive resin composition capable of controlling occurrence of defects and capable of forming a resist pattern having a favorable configuration, and a method for forming a resist pattern using the same are provided. According to a photosensitive resin composition including, as component (a), a polyfunctional epoxy resin, and, as component (b), a cation polymerization initiator, in which the concentration of propylene carbonate in the photosensitive resin composition is no greater than 10% by mass, the occurrence of defects can be controlled, and a resist pattern having a favorable shape can be formed.

摘要翻译： 提供能够控制缺陷发生并且能够形成具有良好结构的抗蚀剂图案的光敏树脂组合物，以及使用其形成抗蚀剂图案的方法。 根据包含作为组分（a）的多官能环氧树脂和作为组分（b））的光敏树脂组合物，其中感光性树脂组合物中的碳酸亚丙酯的浓度不大于10％ ，可以控制缺陷的发生，并且可以形成具有良好形状的抗蚀剂图案。

公开(公告)号：US20100068649A1

公开(公告)日：2010-03-18

申请号：US12449060

申请日：2008-01-11

申请人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

发明人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0385 ,  G03F7/40

摘要： A photosensitive resin composition is provided that is highly safe, provides a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability. According to a photosensitive resin composition including, in addition to an onium fluorinated alkyl fluorophosphate based cation polymerization initiator having a specific structure, a specified solvent or a specified sensitizing agent as essential components, a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and also is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability.

摘要翻译： 提供一种高度安全的感光性树脂组合物，提供均匀性优异的涂膜，可以提高固化树脂图案的固化密度，并且能够形成具有大膜厚度和高纵横比的微观抗蚀剂图案， 灵敏度高，分辨能力高。 根据具有特定结构的含氟氟烷基氟磷酸酯类阳离子聚合引发剂，特定溶剂或特定敏化剂作为必要成分的感光性树脂组合物，具有均匀性优异的涂膜可以提高固化密度 固化树脂图案，并且还能够以高灵敏度和高分辨能力形成具有大膜厚度和高纵横比的微抗蚀剂图案。