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88 条记录 (耗时 0.028 秒)

    Antireflective coating material for photoresists
    6.
    发明授权
    Antireflective coating material for photoresists 失效
    用于光致抗蚀剂的抗反射涂层材料

    公开(公告)号：US6106995A

    公开(公告)日：2000-08-22

    申请号：US373319

    申请日：1999-08-12

    申请人： Sunit S. Dixit ,  M. Dalil Rahman ,  Dinesh N. Khanna ,  Joseph E. Oberlander ,  Dana L. Durham

    发明人： Sunit S. Dixit ,  M. Dalil Rahman ,  Dinesh N. Khanna ,  Joseph E. Oberlander ,  Dana L. Durham

    IPC分类号： G03F7/004 ,  C09D5/00 ,  C09D179/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  G03C1/492

    CPC分类号： G03F7/091

    摘要： The present invention relates to an antireflective coating composition comprising an admixture of:a) a polymer defined by the following structure: ##STR1## where, R.sub.1 & R.sub.2 are independently hydrogen, or C.sub.1 to C.sub.5 alkylR.sub.3 is a methyl, ethyl, propyl or butyl groupR.sub.4 -R.sub.7 are independently hydrogen, or C.sub.1 to C.sub.5 alkyln=10 to 50,000(b) a fluorine-containing, sparingly water-soluble (0.1%-10% by weight in water) organic C.sub.3 -C.sub.13 aliphatic carboxylic acid;(c) a non-metallic hydroxide; and(d) a solvent.The invention also relates to a method for producing such an antireflective coating composition and to a method for producing a microelectronic device using such an antireflective coating composition in conjunction with a photoresist composition.

    摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含以下混合物的混合物：a）由以下结构定义的聚合物：其中R1和R2独立地为氢，或C1至C5烷基，R3为甲基，乙基，丙基或丁基R4 -R7独立地为氢，或C 1至C 5烷基n = 10至50,000（b）含氟的微水溶性（0.1重量％-10重量％的水）有机C 3 -C 13脂族羧酸; （c）非金属氢氧化物; 和（d）溶剂。 本发明还涉及一种制备这种抗反射涂料组合物的方法和一种使用这种抗反射涂料组合物与光致抗蚀剂组合物一起生产微电子器件的方法。

    Preparation of fractionated novolak resins by a novel extraction technique
    7.
    发明授权
    Preparation of fractionated novolak resins by a novel extraction technique 失效
    通过新的提取技术制备分馏的酚醛清漆树脂

    公开(公告)号：US6121412A

    公开(公告)日：2000-09-19

    申请号：US418239

    申请日：1999-10-14

    申请人： Stanley F. Wanat ,  M. Dalil Rahman ,  John J. Kokoszka ,  Balaji Narasimhan

    发明人： Stanley F. Wanat ,  M. Dalil Rahman ,  John J. Kokoszka ,  Balaji Narasimhan

    IPC分类号： C08G8/00 ,  C08G8/08 ,  G03F7/023 ,  C08F6/04 ,  C08F6/22 ,  C08G14/04

    CPC分类号： G03F7/0236

    摘要： The present invention provides a method for producing a film forming, fractionated novolak resin, by:a) condensing formaldehyde with one or more phenolic compounds, and thereby producing a novolak resin;b) adding a photoresist solvent, and optionally a water-soluble organic polar solvent;c) feeding the mixture into a liquid/liquid centrifuge and feeding a C.sub.5 -C.sub.8 alkane, water or aromatic hydrocarbon solvent into the liquid/liquid centrifuge at a ratio of optional water-soluble organic polar solvent and photoresist solvent to C.sub.5 -C.sub.8 alkane, water or aromatic solvent, of from 5:1 to 0.5:1;d) rotating the liquid/liquid centrifuge containing the mixture at a speed of at least 500 rpm and thereby separating the mixture into two phases, collecting the two phases;e) optionally separating the lighter phase (L) into two second phases;f) removing residual C.sub.5 -C.sub.8 alkane, water or aromatic hydrocarbon solvent from the heavier phase (H) from step d) and leaving the novolak resin dissolved in the photoresist solvent;A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing microelectronic devices using such a photoresist composition.

    摘要翻译： 本发明提供一种通过以下方法制备成膜分馏的酚醛清漆树脂的方法：a）将甲醛与一种或多种酚类化合物缩合，从而制备酚醛清漆树脂; b）添加光致抗蚀剂溶剂和任选的水溶性有机极性溶剂; c）将混合物进料到液体/液体离心机中，并将C5-C8烷烃，水或芳烃溶剂以任选的水溶性有机极性溶剂和光致抗蚀剂溶剂与C 5 -C 8烷烃的比例向液/液离心机中进料， 水或芳族溶剂为5：1至0.5：1; d）以至少500rpm的速度旋转含有混合物的液/液离心机，从而将混合物分离成两相，收集两相; e）任选地将较轻相（L）分离成两个第二相; f）从步骤d）的较重相（H）除去残留的C5-C8烷烃，水或芳族烃溶剂，并将酚醛清漆树脂溶解在光致抗蚀剂溶剂中; 还提供了用于从这种分级酚醛清漆树脂制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的微电子器件的方法。

    Fractionation of resins using a static mixer and a liquid-liquid centrifuge
    8.
    发明授权
    Fractionation of resins using a static mixer and a liquid-liquid centrifuge 失效

    公开(公告)号：US06512087B1

    公开(公告)日：2003-01-28

    申请号：US09698724

    申请日：2000-10-27

    申请人： Stanley F. Wanat ,  M. Dalil Rahman ,  Zhong Xiang

    发明人： Stanley F. Wanat ,  M. Dalil Rahman ,  Zhong Xiang

    IPC分类号： C08F604

    CPC分类号： C08G8/08 ,  C08G8/10 ,  G03F7/0236

    摘要： Disclosed is a method for producing low molecular weight oligomers of a film forming resin, which involves: a) providing a solution of the film forming resin in a first solvent system comprising a photoresist solvent, and optionally a water-soluble organic solvent; b) providing a second solvent system comprising at least one substantially pure C5-C8 alkane and/or at least one aromatic compound having at least one hydrocarbyl substituent and/or water/C1-C4 alcohol mixture; and performing steps c)-e) in the following order: c) mixing the solutions from a) and second solvent system from b) in a static mixer for a time period sufficient for efficient mixing; d) feeding the mixture from c) and second solvent system from b) through two separate inlet ports into a liquid/liquid centrifuge, one of the inlet ports feeding the mixture from c), the second inlet port feeding the second solvent system from b) into said liquid/liquid centrifuge at a feed ratio of the mixture from c) to the second solvent system from b) of from about 10/90 to about 90/10, at a temperature of from about 0° C. up to maximum temperature that is less than the boiling point of the lowest boiling solvent in the first or second solvent system; e) rotating the mixture from step d) inside the liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step d) into two separate phases, and then collecting the two separate phases, each from two separate outlet ports, into two separate containers, wherein the heavier phase (H) comprises a fractionated film forming resin comprising higher molecular weight fractions of the film forming resin and the lighter phase (L) comprises low molecular weight oligomers of the film forming resin. The present invention also provides a method for producing a photoresist composition, and method for producing a microelectronic device using the aforementioned fractionated resin or low molecular weight oligomers of the film forming resin.

    Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge
    9.
    发明授权
    Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge 失效
    使用液/液离心机降低成膜树脂的金属离子含量的方法

    公开(公告)号：US06297352B1

    公开(公告)日：2001-10-02

    申请号：US09597440

    申请日：2000-06-20

    申请人： Stanley F. Wanat ,  M. Dalil Rahman

    发明人： Stanley F. Wanat ,  M. Dalil Rahman

    IPC分类号： C08F604

    CPC分类号： B01J45/00 ,  G03F7/0236

    摘要： The present invention provides a method for reducing the metal ion content of a film-forming resin, said method comprising the steps of: a) providing a solution of the film-forming resin in a water-immiscible solvent system comprising at least one water-immiscible solvent; b) providing a washing solution comprising water or a dilute solution of a water-soluble metal ion chelating agent; c) feeding the solutions from a) and b) through two separate inlet ports into a liquid/liquid centrifuge, one of said inlet ports feeding solution from a), the second inlet port feeding the solution from b) into said liquid/liquid centrifuge at a feed rate ratio of the solution from a) to that from b) from about 10/90 to about 90/10, at a temperature of from about 0° C. up to a maximum temperature that is less than the boiling point of the lowest boiling water-immiscible solvent in the water-immiscible solvent system; and d) rotating the mixture from step c) inside said liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step c) into two separate phases, and then collecting the two separate phases, each through a separate outlet port, into two separate containers, wherein the heavier phase (H) comprises the film-forming resin having a reduced metal ion content in the water-immiscible solvent system, with a minor amount of water; and the lighter phase (L) comprises: 1) an aqueous solution of metal ions and a minor amount of a mixture of 2) the water-immiscible solvent system, and 3) the film-forming resin. The present invention also provides for a method for producing a photoresist composition and a method for producing a microelectronic device utilizing a film-forming resin produced by the aforementioned method.

    摘要翻译： 本发明提供了一种降低成膜树脂的金属离子含量的方法，所述方法包括以下步骤：a）将成膜树脂的溶液提供在与水不混溶的溶剂体系中，该溶液体系包含至少一种水 - 不混溶溶剂; b）提供包含水或水溶性金属离子螯合剂的稀溶液的洗涤溶液; c）将来自a）和b）的溶液通过两个单独的入口端口进入液体/液体离心机，所述入口端口中的一个从a）供给溶液，将来自b）的溶液供给到所述液体/液体离心机 以a）至b）的溶液的进料速率比为约10/90至约90/10，温度为约0℃至最低温度为低于 与水不混溶的溶剂体系中最低沸水不溶混溶剂; 以及d）将所述液体/液体离心机内的步骤c）中的混合物以足以将混合物从步骤c）分离成两个分开的相的旋转速度旋转，然后通过单独的出口端收集两个分离的相， 两个单独的容器，其中较重的相（H）包括在与水不混溶的溶剂体系中具有降低的金属离子含量的成膜树脂，少量的水; 轻相（L）包括：1）金属离子的水溶液和少量的2）水不混溶溶剂体系的混合物，和3）成膜树脂。 本发明还提供一种光致抗蚀剂组合物的制造方法和利用上述方法制造的成膜树脂的微电子器件的制造方法。