SYSTEMS AND METHODS FOR IMPROVED DISPLAYS

    公开(公告)号:US20250089414A1

    公开(公告)日:2025-03-13

    申请号:US18464201

    申请日:2023-09-09

    Abstract: An optical element includes a planar body having a circular profile including a plurality of annuli of decreasing width with increasing radius, where the circular profile includes a sequential arrangement of: (a) a first annulus including alternating azimuthal segments of high and low refractive index materials, (b) a second annulus including the high refractive index material, (c) a third annulus including alternating azimuthal segments of the high and low refractive index materials, and (d) a fourth annulus including the low refractive index material. The optical element may be configured to increase the light extraction efficiency and directionality of light output from a light emitting diode.

    Bonding methods for light emitting diodes

    公开(公告)号:US11631587B2

    公开(公告)日:2023-04-18

    申请号:US17738735

    申请日:2022-05-06

    Abstract: Disclosed herein are techniques for bonding LED components. According to certain embodiments, a first component including a semiconductor layer stack is hybrid bonded to a second component including a substrate that has a different thermal expansion coefficient than the semiconductor layer stack. The semiconductor layer stack includes an n-side semiconductor layer, an active light emitting layer, and a p-side semiconductor layer. The first component and the second component further include first contacts and second contacts, respectively. To hybrid bond the two components, the first contacts are aligned with the second contacts. Then dielectric bonding is performed to bond respective dielectric materials of both components. The dielectric bonding is followed by metal bonding of the contacts, using annealing. To compensate run-out between the first contacts and the second contacts, aspects of the present disclosure relate to changing a curvature of the first component and/or the second component during the annealing stage.

    Hybrid-bonded and run-out compensated light emitting diodes

    公开(公告)号:US11569091B2

    公开(公告)日:2023-01-31

    申请号:US16863572

    申请日:2020-04-30

    Abstract: Disclosed herein are techniques for bonding components of LEDs. According to certain embodiments, a device includes a first component and a second component. The first component includes a semiconductor layer stack having an n-side semiconductor layer, an active light emitting layer, and a p-side semiconductor layer. The semiconductor layer stack includes a III-V semiconductor material. The second component includes a passive or an active matrix integrated circuit within a Si layer. A first dielectric material of the first component is bonded to a second dielectric material of the second component. First contacts of the first component are aligned with and bonded to second contacts of the second component. The first contacts of the first component form a first pattern within the first dielectric material of the first component, and the second contacts of the second component form a second pattern within the second dielectric material of the second component.

    Bonding methods for light emitting diodes

    公开(公告)号:US11430658B2

    公开(公告)日:2022-08-30

    申请号:US16863576

    申请日:2020-04-30

    Abstract: Disclosed herein are techniques for bonding components of LEDs. According to certain embodiments, a method includes performing p-side processing of a first component. The p-side processing is performed from a direction adjacent to a surface of a p-side semiconductor layer of the first component that is opposite to an active light emitting layer of the first component. The method also includes aligning first contacts of the first component with second contacts of the second component, and subsequently performing hybrid bonding of the first component to the second component by performing dielectric bonding of a first dielectric material of the first component with a second dielectric material of the second component at a first temperature, and subsequently performing metal bonding of the first contacts of the first component with the second contacts of the second component by annealing the first contacts and the second contacts at a second temperature.

    Reduction of surface recombination losses in micro-LEDs

    公开(公告)号:US11581457B1

    公开(公告)日:2023-02-14

    申请号:US17242002

    申请日:2021-04-27

    Abstract: Disclosed herein are systems and methods for reducing surface recombination losses in micro-LEDs. In some embodiments, a method includes increasing a bandgap in an outer region of a semiconductor layer by implanting ions in the outer region of the semiconductor layer and subsequently annealing the outer region of the semiconductor layer to intermix the ions with atoms within the outer region of the semiconductor layer. The semiconductor layer includes an active light emitting layer. A light outcoupling surface of the semiconductor layer has a diameter that is less than twice an electron diffusion length of the semiconductor layer. The outer region of the semiconductor layer extends from an outer surface of the semiconductor layer to a central region of the semiconductor layer that is shaded by a mask during the implanting of the ions.

    Reduction of surface recombination losses in micro-LEDs

    公开(公告)号:US12021168B1

    公开(公告)日:2024-06-25

    申请号:US18160911

    申请日:2023-01-27

    CPC classification number: H01L33/24 G02B27/0172 H01L33/44 H10K50/80

    Abstract: Disclosed herein are systems and methods for reducing surface recombination losses in micro-LEDs. In some embodiments, a method of forming an LED involves forming a semiconductor structure on a substrate. The semiconductor structure includes a p-side semiconductor layer, an n-side semiconductor layer, and an active light emitting layer between the p-side semiconductor layer and the n-side semiconductor layer. The semiconductor structure is also formed to include a light outcoupling surface facing the substrate. The light outcoupling surface has a diameter less than twice an electron diffusion length of a material of the semiconductor structure. The method further involves implanting ions in an outer region of the semiconductor structure, then annealing the outer region after the ions have been implanted. The annealing causes the ions to intermix with atoms within the outer region, thereby increasing a bandgap of the outer region.

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