摘要:
A cured organopolysiloxane resin film having gas barrier properties in which a layer of cured organopolysiloxane that contains an organic functional group, an organic group produced by the polymerization of polymerizable organic functional groups, or the hydrosilyl group or silanol group, is formed on a visible region-transparent film comprising cured organopolysiloxane resin yielded by hydrosilylation reaction-mediated crosslinking, and in which a silicon oxynitride layer, silicon nitride layer, or silicon oxide layer is formed on the aforementioned layer of cured organopolysiloxane. Also, a method of producing this cured organopolysiloxane resin film having gas barrier properties.
摘要:
A copper indium diselenide (CIS)-based photovoltaic device includes a CIS-based solar absorber layer including copper, indium, and selenium. The CIS-based photovoltaic device further includes a substrate including a silicone layer formed from a silicone composition and a metal foil layer. The substrate, due to the presence of the silicone layer and the metal foil layer, is both flexible and sufficiently able to withstand annealing temperatures in excess of 500° C. to obtain maximum efficiency of the device.
摘要:
In an embodiment, one reinforced substrate for use in a photovoltaic device includes a polymer base material and a reinforcing structure bonded with the base material. The reinforced substrate presents a surface in a condition that is made-ready for deposition of thin film layers of the photovoltaic device. A thin film photovoltaic device includes the reinforced substrate, a back contact layer formed on the surface of the reinforced substrate, and a solar absorber layer formed on the back contact layer. A plurality of thin film photovoltaic devices may be formed on a common reinforced substrate. A process of producing a reinforced substrate includes combining a fluid base material and a fiber reinforcing structure to form an impregnated fiber reinforcement. The impregnated fiber reinforcement is cured to form the reinforced substrate, and the reinforced substrate is annealed.
摘要:
In an embodiment, one reinforced substrate for use in a photovoltaic device includes a polymer base material and a reinforcing structure bonded with the base material. The reinforced substrate presents a surface in a condition that is made-ready for deposition of thin film layers of the photovoltaic device. A thin film photovoltaic device includes the reinforced substrate, a back contact layer formed on the surface of the reinforced substrate, and a solar absorber layer formed on the back contact layer. A plurality of thin film photovoltaic devices may be formed on a common reinforced substrate. A process of producing a reinforced substrate includes combining a fluid base material and a fiber reinforcing structure to form an impregnated fiber reinforcement. The impregnated fiber reinforcement is cured to form the reinforced substrate, and the reinforced substrate is annealed.
摘要:
A free-standing film comprising a cured organopolysiloxane resin obtained by conducting a cross-linking reaction between (A) an organopolysiloxane resin represented by the following average siloxane unit formula: [R1aR23-aSiO1/2]v[R3SiO3/2]w (1) or [R1aR23-aSiO1/2]x[R3SiO3/2]y[SiO4/2]z (2) (where R1 designates univalent hydrocarbon groups of one or more than one type selected from alkyl groups having 1 to 4 carbon atoms and univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; R2 designate alkenyl groups having 2 to 6 carbon atoms; R3 designates alkyl groups with 1 to 4 carbon atoms or univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; at least 50 mole % of R3 groups being phenyl groups; “a” is 0, 1, or 2; 0.8≦w
摘要翻译:通过在(A)由以下平均硅氧烷单元式:[R a R 23-a SiO 1/2/2] v [R 3 SiO 3/2] w(1)表示的有机聚硅氧烷树脂之间进行交联反应获得的固化的有机聚硅氧烷树脂, )或[R1aR23-aSiO1 / 2] x [R3SiO3 / 2] y [SiO4 / 2] z(2)(其中R1表示一个或多于一种选自具有1至4个碳原子的烷基的一价烃基, 具有6至8个碳原子的单价芳族烃基; R 2表示具有2至6个碳原子的烯基; R 3表示具有1至4个碳原子的烷基或具有6至8个碳原子的单价芳族烃基;至少50摩尔% R3为苯基;“a”为0,1或2;0.8≤n1E; w <1.0且v + w = 1; 0
摘要:
A free-standing film comprising a cured organopolysiloxane resin obtained by conducting a cross-linking reaction between (A) an organopolysiloxane resin represented by the following average siloxane unit formula: [R1aR23-aSiO1/2]v[R3SiO3/2]w (1) or [R1aR23-aSiO1/2]x[R3SiO3/2]y[SiO4/2]z (2) (where R1 designates univalent hydrocarbon groups of one or more than one type selected from alkyl groups having 1 to 4 carbon atoms and univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; R2 designate alkenyl groups having 2 to 6 carbon atoms; R3 designates alkyl groups with 1 to 4 carbon atoms or univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; at least 50 mole % of R3 groups being phenyl groups; “a” is 0, 1, or 2; 0.8≦w
摘要翻译:通过在(A)由以下平均硅氧烷单元:[R1aR23-aSiO1 / 2] v [R3SiO3 / 2] w(1)表示的有机聚硅氧烷树脂之间进行交联反应获得的固化的有机聚硅氧烷树脂 )或[R1aR23-aSiO1 / 2] x [R3SiO3 / 2] y [SiO4 / 2] z(2)(其中R1表示一个或多于一种选自具有1至4个碳原子的烷基的一价烃基, 具有6至8个碳原子的一价芳族烃基; R 2表示具有2至6个碳原子的烯基; R 3表示具有1至4个碳原子的烷基或具有6至8个碳原子的单价芳族烃基;至少50摩尔% R3为苯基;“a”为0,1或2; 0.8 <= w <1.0且v + w = 1; 0
摘要:
The present invention relates to a film made from a cross-linked polysiloxane obtained by subjecting a polysiloxane that has a specific chemical structure and contains at least two unsaturated aliphatic hydrocarbon groups in one molecule and an organosilicon compound with at least two hydrogen atoms directly bonded to silicon atoms in one molecule to cross-linking reaction in the presence of a platinum-type catalyst.The film provided by the invention possesses superior heat-resistant properties, has excellent permeability for light in the visible wavelength range, is characterized by low birefringence, and demonstrates physical properties suitable for practical application. By forming an inorganic substance layer on the aforementioned polysiloxane, it is possible to use the laminated film of the invention, e.g., as a transparent electrode film.
摘要:
A method of forming a ceramic silicon oxide type coating and a method of producing an inorganic base material having this coating, by coating an organohydrogensiloxane/hydrogensiloxane copolymer on the surface of an inorganic base material and converting the coating into a ceramic silicon oxide type coating by heating to high temperatures in an inert gas or an oxygen-containing inert gas (oxygen gas less than 20 volume %). A coating-forming agent comprising an organohydrogensiloxane/hydrogensiloxane copolymer or its solution. A semiconductor device comprising at least a semiconductor layer formed on a silicon oxide type coating on an inorganic substrate.
摘要:
A cured organopolysiloxane resin film having gas barrier properties comprising a fiber-reinforced film made of a hydrosilylation-cured organopolysiloxane resin and having a transparent inorganic layer selected from silicon oxynitride layer, silicon nitride layer, and silicon oxide layer formed on the fiber-reinforced film wherein a layer of cured organopolysiloxane that contains an organic functional group, silanol group, hydrosilyl group, or an organic group produced by the polymerization of polymerizable organic functional groups is interposed between said fiber-reinforced film and inorganic layer. Also, a method of producing this cured organopolysiloxane resin film having gas barrier properties.
摘要:
A method of preparing a reinforced silicone resin film, the method comprising the steps of impregnating a fiber reinforcement in a hydrosilylation-curable silicone composition comprising a silicone resin, and heating the impregnated fiber reinforcement at a temperature sufficient to cure the silicone resin, wherein the reinforced silicone resin film comprises from 10 to 99% (w/w) of the cured silicone resin and the film has a thickness of from 15 to 500 μm; and a reinforced silicone resin film prepared according to the method.