摘要:
A module case having an air bag module accommodated therein is disposed in a side face of a seat back, so that a lid of the module case is opened by a pressure of an air bag expanded upon a side collision of a vehicle, and the air bag is deployed through the resulting opening, termed the “primary” opening into a vehicle compartment. As a result of a tear line provided in the module case, even if the lid is held down by the door which has been deformed by a shock resulting from the collision, so that the lid cannot be opened to provide the primary opening, the tear line in a case body of the module case is broken, whereby a front wall is pivoted forwardly to form an alternate or “secondary” opening from the module case. Therefore, the air bag can be deployed without hindrance through the alternate secondary opening defined in the front wall of the module case into the vehicle compartment.
摘要:
A holder for mounting an air bag module, the holder including a bottomed, substantially box-like body having a peripheral wall and an opening, the holder adapted to be fastened to a side plate of a seat back frame in a cavity of a back pad with the opening thereof facing a body of an automotive vehicle and with a bottom plate section thereof being applied to the side plate, and wrapped at the peripheral wall thereof by margin pieces which are provided around an opening portion in a side of a seat cover, rolled in the holder from the opening of the holder, and fastened to the holder, the air bag module having an air bag housed within an air bag case, the air bag module adapted to be incorporated in the holder and fastened to the side plate through the holder, whereby the air bag module is installed in the side of the seat back, the holder further including flanges, and at least first and second brittle sections serving as breaking portions, the peripheral wall including a front side wall section facing a front side of the seat back, a rear side wall section facing a rear side of the seat back, an upper side wall section, and a lower side wall section, the flanges projecting outwardly from edges of the front, rear, upper and lower side wall sections, at least a flange portion of the front side wall section having a thin metal plate embedded in an inner surface thereof, whereby the flange is reinforced by the metal plate, the first brittle section provided at a corner between the front side wall section and the upper wall section, and at a corner between the flange of the front side wall section and a flange of the upper wall section, and the second brittle section provided at a corner between the front side wall section and the lower wall section, and at a corner between the flange of the front side wall section and a flange of the lower wall section.
摘要:
An inspecting method is capable of efficiently inspecting a wafer. According to the inspecting method, the chip area of a wafer is inspected for defects, and based on the results, a defect density D0p of each of peripheral-zone chips in the chip area which are located closely to the peripheral area of the wafer is calculated. A peripheral-zone chip with a high defect density D0p is selected, and an area in the peripheral area which is outward of the selected peripheral-zone chip is inspected for defects. Since only the area in the peripheral area which is located outward of the peripheral-zone chip selected based on the defect density D0p is inspected for defects, the wafer is inspected efficiently.
摘要:
A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.
摘要:
A surface inspection method in a surface inspection system which comprises a photodetection unit and a photodetection polarizing angle changing means, comprising the step of receiving a scattered reflection light from a substrate surface where standard particles are coated by changing a photodetection polarizing angle by the photodetection polarizing angle changing means, and the step of performing surface inspection by setting the photodetection polarizing angle to a condition where an S/N ratio of photodetection output is at the highest.
摘要:
A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.
摘要:
Scattered light from the surface of a sample subjected to the same process as a process for an inspection object is observed, a defect is detected from an intensity of scattered light, and a position of the detected defect and an intensity of scattered light caused by the detected defect are acquired. Defects detected are classified into a group detectable by observing secondary electrons emitted when an electron beam is applied to the surface of the sample and a group not detectable. A decision threshold value of a scattered light intensity for extracting defects to be counted is determined, in accordance with a result of classification by the above steps and the intensity of scattered light caused by the detected defect.
摘要:
A method of inspecting defects on an object includes irradiating predetermined particles with a laser beam to measure first scattered light intensities, irradiating plural types of defects with the laser beam to measure second scattered light intensities, determining types of some defects selected out of the plural types of defects using the first scattered light intensities, setting a discrimination line indicating a boundary value of the second scattered light intensities based on the determination, and discriminating, using the discrimination line, defects on the object.
摘要:
(a) Scattered light from the surface of a sample subjected to the same process as a process for an inspection object is observed, a defect is detected from an intensity of scatted light, and a position of the detected defect and an intensity of scattered light caused by the detected defect are acquired.(b) Defects detected at the step (a) are classified into a group detectable by observing secondary electrons emitted when an electron beam is applied to the surface of the sample and a group not detectable. (c) A decision threshold value of a scattered light intensity for extracting defects to be counted is determined, in accordance with a result of classification by the step (b) and the intensity of scattered light caused by the detected defect.
摘要:
A process for producing an antimony-containing oxide catalyst with improved strength is described, by the steps of preparing a slurry containing an antimony compound, a polyvalent metal compound and a silica sol as the essential ingredients, adjusting the pH of the slurry to 7 or less, heat treating the slurry at a temperature of 40.degree. C. or higher, and thereafter drying the slurry and calcining the dried particles, wherein said slurry is irradiated with ultrasonic waves during the pH adjustment, or after the pH adjustment and before completion of the heat treatment.