公开(公告)号：US08773637B2

公开(公告)日：2014-07-08

申请号：US12908564

申请日：2010-10-20

申请人： Marcus Adrianus Van De Kerkhof ,  Willem Jurrianus Venema ,  Bearrach Moest ,  Vasco Miguel Matias Serrao ,  Cedran Bomhof

发明人： Marcus Adrianus Van De Kerkhof ,  Willem Jurrianus Venema ,  Bearrach Moest ,  Vasco Miguel Matias Serrao ,  Cedran Bomhof

IPC分类号： G03B27/52 ,  G03F9/00

CPC分类号： G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

摘要： A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.

摘要翻译： 光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。 处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。 传感器的示例包括光电检测器的线阵列。 单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。 在保持基板支撑固定的同时执行建立基准位置的至少最后一步。 避免了现有技术传感器的机械扫描引起的错误和延迟。 或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。

公开(公告)号：US20110090476A1

公开(公告)日：2011-04-21

申请号：US12908564

申请日：2010-10-20

申请人： Marcus Adrianus VAN DE KERKHOF ,  Willem Jurrianus Venema ,  Bearrach Moest ,  Vasco Miguel Matias Serrao ,  Cedran Bomhof

发明人： Marcus Adrianus VAN DE KERKHOF ,  Willem Jurrianus Venema ,  Bearrach Moest ,  Vasco Miguel Matias Serrao ,  Cedran Bomhof

IPC分类号： G03B27/42

CPC分类号： G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

摘要： A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.

摘要翻译： 光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。 处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。 传感器的示例包括光电检测器的线阵列。 单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。 在保持基板支撑固定的同时执行建立基准位置的至少最后一步。 避免了现有技术传感器的机械扫描引起的错误和延迟。 或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。

公开(公告)号：US08675210B2

公开(公告)日：2014-03-18

申请号：US13603168

申请日：2012-09-04

申请人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

发明人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

IPC分类号： G01B11/14

CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

公开(公告)号：US07209216B2

公开(公告)日：2007-04-24

申请号：US11089539

申请日：2005-03-25

申请人： Pieter Willem Herman De Jager ,  Theodorus Leonardus Van Den Akker ,  Willem Jurrianus Venema ,  Wouter Frans Willem Mulckhuyse ,  Lambertus Gerardus Maria Kessels

发明人： Pieter Willem Herman De Jager ,  Theodorus Leonardus Van Den Akker ,  Willem Jurrianus Venema ,  Wouter Frans Willem Mulckhuyse ,  Lambertus Gerardus Maria Kessels

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.

摘要翻译： 其中通过调节图案特征边界处的辐射强度来调节形成在基底上的特征的尺寸和/或位置的光刻设备。

公开(公告)号：US20090290139A1

公开(公告)日：2009-11-26

申请号：US12470099

申请日：2009-05-21

申请人： Arie Johan VAN DER SIJS ,  Willem Jurrianus Venema

发明人： Arie Johan VAN DER SIJS ,  Willem Jurrianus Venema

IPC分类号： G03B27/58 ,  G01J1/44

CPC分类号： G03F7/70666

摘要： A sensor for measuring a patterned beam of radiation in a lithographic exposure apparatus includes a receiving part for receiving the patterned beam of radiation and a processing part arranged to receive at least a part of the patterned radiation beam via the receiving part. The receiving part of the sensor is integrated in a substrate table for holding a substrate.

摘要翻译： 用于在光刻曝光设备中测量图案化的辐射束的传感器包括用于接收图案化的辐射束的接收部分和布置成经由接收部分接收图案化的辐射束的至少一部分的处理部分。 传感器的接收部分集成在用于保持基板的基板台中。

公开(公告)号：US07250237B2

公开(公告)日：2007-07-31

申请号：US10743272

申请日：2003-12-23

申请人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

发明人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

IPC分类号： G03C5/00 ,  G03F9/00

CPC分类号： G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations.Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

公开(公告)号：US07233384B2

公开(公告)日：2007-06-19

申请号：US11150882

申请日：2005-06-13

申请人： Willem Jurrianus Venema ,  Anastasius Jacobus Anicetus Bruinsma ,  Joeri Lof ,  Eduardus Johannes Gerardus Boon

发明人： Willem Jurrianus Venema ,  Anastasius Jacobus Anicetus Bruinsma ,  Joeri Lof ,  Eduardus Johannes Gerardus Boon

IPC分类号： G03B27/42 ,  G03B27/74 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03F7/70291 ,  G03F7/70516

摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.

摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，投影系统，衬底台和传感器系统。 照明系统提供一束辐射。 独立可控元件的阵列使光束成像。 投影系统将图案化的光束投射到目标平面上，图案化的光束包括辐射点阵列。 衬底台支撑衬底，使得衬底的目标表面基本上与靶平面重合。 传感器系统包括被布置成接收至少一个斑点的检测器元件的阵列。 传感器系统测量该接收点或每个接收点的能量，并提供指示该或每个接收点的能量的输出信号。

公开(公告)号：US20130077079A1

公开(公告)日：2013-03-28

申请号：US13603168

申请日：2012-09-04

申请人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

发明人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

IPC分类号： G03F9/00 ,  G01B11/06

CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

公开(公告)号：US07595496B2

公开(公告)日：2009-09-29

申请号：US11812801

申请日：2007-06-21

申请人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

发明人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

IPC分类号： G21K5/00

CPC分类号： G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

公开(公告)号：US07528933B2

公开(公告)日：2009-05-05

申请号：US11398761

申请日：2006-04-06

申请人： Willem Jurrianus Venema

发明人： Willem Jurrianus Venema

IPC分类号： G03B27/54

CPC分类号： G03F7/70291 ,  G02B26/0841

摘要： An array of individually controllable elements for a lithographic apparatus comprise reflectors that can be actuated by an actuator and are biased to return to a given position by a force that varies non-linearly with the displacement of the reflector from that position.

摘要翻译： 用于光刻设备的独立可控元件的阵列包括可由致动器致动的反射器，并且通过与反射器从该位置的位移非线性地变化的力而被偏置回到给定位置。