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    Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark
    1.
    发明授权
    Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark 有权
    平版印刷设备和使用传感器和对准标记将图案施加到基板的装置制造方法

    公开(公告)号：US08773637B2

    公开(公告)日：2014-07-08

    申请号：US12908564

    申请日：2010-10-20

    申请人： Marcus Adrianus Van De Kerkhof ,  Willem Jurrianus Venema ,  Bearrach Moest ,  Vasco Miguel Matias Serrao ,  Cedran Bomhof

    发明人： Marcus Adrianus Van De Kerkhof ,  Willem Jurrianus Venema ,  Bearrach Moest ,  Vasco Miguel Matias Serrao ,  Cedran Bomhof

    IPC分类号： G03B27/52 ,  G03F9/00

    CPC分类号： G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

    摘要： A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.

    摘要翻译： 光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。 处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。 传感器的示例包括光电检测器的线阵列。 单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。 在保持基板支撑固定的同时执行建立基准位置的至少最后一步。 避免了现有技术传感器的机械扫描引起的错误和延迟。 或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。

    Level sensor, lithographic apparatus, and substrate surface positioning method
    2.
    发明授权
    Level sensor, lithographic apparatus, and substrate surface positioning method 有权
    液位传感器，光刻设备和基板表面定位方法

    公开(公告)号：US08675210B2

    公开(公告)日：2014-03-18

    申请号：US13603168

    申请日：2012-09-04

    申请人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    发明人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    IPC分类号： G01B11/14

    CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

    摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

    SUBSTRATE TABLE, SENSOR AND METHOD
    4.
    发明申请
    SUBSTRATE TABLE, SENSOR AND METHOD 审中-公开
    基板，传感器和方法

    公开(公告)号：US20090290139A1

    公开(公告)日：2009-11-26

    申请号：US12470099

    申请日：2009-05-21

    申请人： Arie Johan VAN DER SIJS ,  Willem Jurrianus Venema

    发明人： Arie Johan VAN DER SIJS ,  Willem Jurrianus Venema

    IPC分类号： G03B27/58 ,  G01J1/44

    CPC分类号： G03F7/70666

    摘要： A sensor for measuring a patterned beam of radiation in a lithographic exposure apparatus includes a receiving part for receiving the patterned beam of radiation and a processing part arranged to receive at least a part of the patterned radiation beam via the receiving part. The receiving part of the sensor is integrated in a substrate table for holding a substrate.

    摘要翻译： 用于在光刻曝光设备中测量图案化的辐射束的传感器包括用于接收图案化的辐射束的接收部分和布置成经由接收部分接收图案化的辐射束的至少一部分的处理部分。 传感器的接收部分集成在用于保持基板的基板台中。

    Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
    6.
    发明授权
    Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor 有权
    平版印刷设备和器件制造方法以及由此制造的器件用于校准具有传感器的成像系统

    公开(公告)号：US07233384B2

    公开(公告)日：2007-06-19

    申请号：US11150882

    申请日：2005-06-13

    申请人： Willem Jurrianus Venema ,  Anastasius Jacobus Anicetus Bruinsma ,  Joeri Lof ,  Eduardus Johannes Gerardus Boon

    发明人： Willem Jurrianus Venema ,  Anastasius Jacobus Anicetus Bruinsma ,  Joeri Lof ,  Eduardus Johannes Gerardus Boon

    IPC分类号： G03B27/42 ,  G03B27/74 ,  G03B27/32

    CPC分类号： G03F7/7085 ,  G03F7/70291 ,  G03F7/70516

    摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.

    摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，投影系统，衬底台和传感器系统。 照明系统提供一束辐射。 独立可控元件的阵列使光束成像。 投影系统将图案化的光束投射到目标平面上，图案化的光束包括辐射点阵列。 衬底台支撑衬底，使得衬底的目标表面基本上与靶平面重合。 传感器系统包括被布置成接收至少一个斑点的检测器元件的阵列。 传感器系统测量该接收点或每个接收点的能量，并提供指示该或每个接收点的能量的输出信号。

    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD
    7.
    发明申请
    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
    水平传感器，光刻设备和基板表面定位方法

    公开(公告)号：US20130077079A1

    公开(公告)日：2013-03-28

    申请号：US13603168

    申请日：2012-09-04

    申请人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    发明人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    IPC分类号： G03F9/00 ,  G01B11/06

    CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

    摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

    Ultrasonic distance sensors
    10.
    发明授权
    Ultrasonic distance sensors 有权
    超声波距离传感器

    公开(公告)号：US07391676B2

    公开(公告)日：2008-06-24

    申请号：US11018926

    申请日：2004-12-22

    申请人： Anastasius Jacobus Anicetus Bruinsma ,  Willem Jurrianus Venema

    发明人： Anastasius Jacobus Anicetus Bruinsma ,  Willem Jurrianus Venema

    IPC分类号： G01S15/02 ,  G01N29/00

    CPC分类号： G01S15/101 ,  G01S7/52004 ,  G01S7/52006 ,  G01S15/88 ,  G01S2007/52014

    摘要： A lithographic apparatus comprises an illumination system, a support constructed to support a patterning device, and a projection system. In pixel grid imaging, a large number of small optical spots are imaged onto the substrate surface using a micro-lens array (MLA). The z position of the MLA is adjustable in order to focus the spots on the substrate surface and/or to compensate for differences in height of the substrate surface. The focusing adjustment is based on an output of an ultrasonic distance sensor provided in the vicinity of the substrate surface.

    摘要翻译： 光刻设备包括照明系统，构造成支撑图案形成装置的支撑件和投影系统。 在像素网格成像中，使用微透镜阵列（MLA）将大量的小光斑成像到基板表面上。 MLA的z位置是可调节的，以便将斑点聚焦在衬底表面上和/或补偿衬底表面的高度差异。 聚焦调整基于设置在基板表面附近的超声波距离传感器的输出。