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公开(公告)号：US20050155386A1
公开(公告)日：2005-07-21
申请号：US10505762
申请日：2003-02-20
申请人： Mariko Kataoka , Toshitaka Yagi , Yuichi Takamura , Naoyuki Goto
发明人： Mariko Kataoka , Toshitaka Yagi , Yuichi Takamura , Naoyuki Goto
CPC分类号： C03C10/0027
摘要： Obtaining previously a relation between a crystallization temperature and a physical property and a relation between a physical property parameter and the physical property of a glass ceramic, measuring the physical property parameter with respect to the glass ceramic sampled from a manufacturing line of the glass ceramic and controlling an actual crystallization temperature based on the relations so that the manufactured glass ceramic has the desired physical property value.
摘要翻译： 之前获得结晶温度和物理性质之间的关系以及物理性能参数与玻璃陶瓷的物理性质之间的关系，测量相对于从玻璃陶瓷的生产线获取的玻璃陶瓷的物理参数，以及 基于所述关系控制实际结晶温度，使得所制造的玻璃陶瓷具有期望的物理性质值。
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公开(公告)号：US07705964B2
公开(公告)日：2010-04-27
申请号：US11396795
申请日：2006-04-03
申请人： Kinya Yamaguchi , Yuichi Takamura
发明人： Kinya Yamaguchi , Yuichi Takamura
CPC分类号： G03F9/7096 , G03F7/70808 , G03F9/7046
摘要： An exposure system for exposing a substrate to radiation is disclosed. The system comprises an exposure unit configured to expose the substrate to radiation, an exposure chamber configured to accommodate the exposure unit, an alignment measurement unit arranged outside the exposure chamber and configured to measure a position of an alignment mark on the substrate, and a load-lock chamber arranged between the exposure chamber and the alignment measurement unit.
摘要翻译： 公开了一种用于将衬底暴露于辐射的曝光系统。 该系统包括被配置为将基板暴露于辐射的曝光单元，被配置为容纳曝光单元的曝光室，布置在曝光室外部并且被配置为测量基板上的对准标记的位置的对准测量单元， 锁定室布置在曝光室和对准测量单元之间。
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公开(公告)号：US07365828B2
公开(公告)日：2008-04-29
申请号：US11215021
申请日：2005-08-31
申请人： Yuichi Takamura
发明人： Yuichi Takamura
CPC分类号： G03F7/70341
摘要： An exposure apparatus which exposes a pattern of an original onto a substrate through a projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a liquid supply nozzle configured to supply the liquid to the space through a liquid supply opening, a liquid supply unit configured to supply the liquid into the liquid supply nozzle, a liquid recovery unit configured to recover the liquid in the liquid supply nozzle by using a vacuum source, and a gas supply unit configured to supply a gas into the liquid supply nozzle through a pipe connected to the liquid supply opening of the liquid supply nozzle. A gas supply by the gas supply unit is started and a liquid recovery by the liquid recovery unit is started while a liquid supply by the liquid supply unit is stopped.
摘要翻译： 一种曝光装置，其通过投影光学系统将原稿的图案曝光到基板上，在投影光学系统和填充有液体的基板之间具有空间。 该装置包括：液体供给喷嘴，其构造成通过液体供给口将液体供给到该空间;液体供给单元，其构造成将液体供给到液体供给喷嘴;液体回收单元，其构造成回收液体供给喷嘴 通过使用真空源，以及气体供给单元，被配置为通过与液体供给喷嘴的液体供给口连接的管道将气体供给到液体供给喷嘴。 开始由气体供给单元供给的气体，并且通过液体供给单元的液体供给停止而开始液体回收单元的液体回收。
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公开(公告)号：US20060221319A1
公开(公告)日：2006-10-05
申请号：US11396795
申请日：2006-04-03
申请人： Kinya Yamaguchi , Yuichi Takamura
发明人： Kinya Yamaguchi , Yuichi Takamura
CPC分类号： G03F9/7096 , G03F7/70808 , G03F9/7046
摘要： An exposure system for exposing a substrate to radiation is disclosed. The system comprises an exposure unit configured to expose the substrate to radiation, an exposure chamber configured to accommodate the exposure unit, an alignment measurement unit arranged outside the exposure chamber and configured to measure a position of an alignment mark on the substrate, and a load-lock chamber arranged between the exposure chamber and the alignment measurement unit.
摘要翻译： 公开了一种用于将衬底暴露于辐射的曝光系统。 该系统包括被配置为将基板暴露于辐射的曝光单元，被配置为容纳曝光单元的曝光室，布置在曝光室外部并且被配置为测量基板上的对准标记的位置的对准测量单元， 锁定室布置在曝光室和对准测量单元之间。
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公开(公告)号：US20060207680A1
公开(公告)日：2006-09-21
申请号：US11376240
申请日：2006-03-16
申请人： Yuichi Takamura
发明人： Yuichi Takamura
IPC分类号： B65B1/04
CPC分类号： H01L21/67201
摘要： An apparatus for processing an article in order to manufacture a device includes a process chamber in which the article is processed; a relay chamber; a first load-lock chamber disposed between an outside of the apparatus and the relay chamber; a second load-lock chamber disposed between the relay chamber and the process chamber; a first adjusting mechanism configured to adjust atmosphere in the process chamber to a first atmosphere; and a second adjusting mechanism configured to adjust atmosphere in the relay chamber to a second atmosphere that is an intermediate atmosphere between the first atmosphere and atmosphere of the outside.
摘要翻译： 一种用于处理制品以便制造装置的装置包括：处理室，其中处理物品; 中继室; 设置在所述装置的外部和所述中继室之间的第一装载锁定室; 设置在所述中继室和所述处理室之间的第二加载锁定室; 第一调节机构，被配置为将处理室中的气氛调节到第一气氛; 以及第二调节机构，被配置为将所述中继室中的气氛调节到作为所述第一大气和所述外部气氛之间的中间气氛的第二气氛。
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6.发明授权公开(公告)号：US09755207B2
公开(公告)日：2017-09-05
申请号：US13405661
申请日：2012-02-27
申请人： Shigeki Kawabe , Yuichi Takamura , Jun Iwata , Hiroomi Hanai
发明人： Shigeki Kawabe , Yuichi Takamura , Jun Iwata , Hiroomi Hanai
IPC分类号： H01M2/00 , C09J7/02 , H01M2/16 , H01M2/32 , H01M10/04 , H01M10/052 , H01M10/0587
CPC分类号： H01M2/1673 , C09J7/22 , C09J7/38 , C09J2201/622 , C09J2203/33 , C09J2423/00 , C09J2433/00 , C09J2451/00 , C09J2483/00 , H01M2/168 , H01M2/32 , H01M10/0431 , H01M10/052 , H01M10/0587 , Y10T428/28 , Y10T428/2878 , Y10T428/2891
摘要： The present invention relates to a pressure-sensitive adhesive tape for battery containing: a substrate; and a pressure-sensitive adhesive layer provided on at least one side of the substrate, in which the pressure-sensitive adhesive tape has a thickness change ratio of 20% or less after immersion in a mixed solvent of ethylene carbonate/diethyl carbonate [former/latter (volume ratio)=1/1] at 60° C. for 8 hours; and a 180° peeling adhesive strength (against aluminum foil, peel temperature: 25° C., peel rate: 300 mm/minute) of 0.5 N/10 mm or more after the above immersion.
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公开(公告)号：US09188214B2
公开(公告)日：2015-11-17
申请号：US13824249
申请日：2011-08-22
申请人： Masashi Suto , Yuichi Takamura , Masaki Mita , Hiroyuki Uchimura , Isao Abe , Makoto Ogiwara , Naruhito Ogino , Yukio Okada , Junichi Sekiguchi
发明人： Masashi Suto , Yuichi Takamura , Masaki Mita , Hiroyuki Uchimura , Isao Abe , Makoto Ogiwara , Naruhito Ogino , Yukio Okada , Junichi Sekiguchi
IPC分类号： F16H57/029 , F16H1/16 , F16H57/031 , F16H57/039 , H02K5/10 , H02K7/116 , B29C70/00 , F16H57/02
CPC分类号： F16H57/029 , B29C70/00 , F16H1/16 , F16H57/031 , F16H57/039 , F16H2057/02082 , H02K5/10 , H02K7/1166 , Y10T74/2186
摘要： A seal member is attached to a cover which occludes a gear case as a housing unit. The seal member is formed of elastomer and integrally formed with: a plate-shaped portion formed into a disc shape which covers the inner surface of the cover; an inner seal portion which is positioned on the inner peripheral edge of a through-hole, and comes into sliding contact with the outer peripheral surface of an output member; an outer seal portion which is positioned on the periphery of the cover, and comes into contact with the opening end of the housing unit; and anchor portions which latch onto the front surface of the cover via mounting holes provided to the cover. The boundary between the seal member and the cover extends only to the outside of the gear case, and does not extend to the inside of the gear case.
摘要翻译： 密封构件附接到封闭作为壳体单元的齿轮箱的盖。 密封部件由弹性体形成，一体地形成有：形成为覆盖盖的内表面的盘状的板状部分; 内密封部，其位于通孔的内周缘部，与输出部件的外周面滑动接触; 外密封部，其位于所述盖的周围，并与所述壳体单元的开口端接触; 以及通过设置在所述盖上的安装孔将所述固定部分锁定在所述盖的前表面上。 密封构件和盖之间的边界仅延伸到齿轮箱的外部，并且不延伸到齿轮箱的内部。
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公开(公告)号：US20130220073A1
公开(公告)日：2013-08-29
申请号：US13824249
申请日：2011-08-22
申请人： Masashi Suto , Yuichi Takamura , Masaki Mita , Hiroyuki Uchimura , Isao Abe , Makoto Ogiwara , Naruhito Ogino , Yukio Okada , Junichi Sekiguchi
发明人： Masashi Suto , Yuichi Takamura , Masaki Mita , Hiroyuki Uchimura , Isao Abe , Makoto Ogiwara , Naruhito Ogino , Yukio Okada , Junichi Sekiguchi
IPC分类号： F16H57/029 , B29C70/00
CPC分类号： F16H57/029 , B29C70/00 , F16H1/16 , F16H57/031 , F16H57/039 , F16H2057/02082 , H02K5/10 , H02K7/1166 , Y10T74/2186
摘要： A seal member is attached to a cover which occludes a gear case as a housing unit. The seal member is formed of elastomer and integrally formed with: a plate-shaped portion formed into a disc shape which covers the inner surface of the cover; an inner seal portion which is positioned on the inner peripheral edge of a through-hole, and comes into sliding contact with the outer peripheral surface of an output member; an outer seal portion which is positioned on the periphery of the cover, and comes into contact with the opening end of the housing unit; and anchor portions which latch onto the front surface of the cover via mounting holes provided to the cover. The boundary between the seal member and the cover extends only to the outside of the gear case, and does not extend to the inside of the gear case.
摘要翻译： 密封构件附接到封闭作为壳体单元的齿轮箱的盖。 密封部件由弹性体形成，一体地形成有：形成为覆盖盖的内表面的盘状的板状部分; 内密封部，其位于通孔的内周缘部，与输出部件的外周面滑动接触; 外密封部，其位于所述盖的周围，并与所述壳体单元的开口端接触; 以及通过设置在所述盖上的安装孔将所述固定部分锁定在所述盖的前表面上。 密封构件和盖之间的边界仅延伸到齿轮箱的外部，并且不延伸到齿轮箱的内部。
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公开(公告)号：US20060050256A1
公开(公告)日：2006-03-09
申请号：US11215021
申请日：2005-08-31
申请人： Yuichi Takamura
发明人： Yuichi Takamura
CPC分类号： G03F7/70341
摘要： An exposure apparatus is provided which has an optical system for projecting a pattern of an original onto a substrate and projects the pattern onto the substrate with a space between the optical system and the substrate filled with liquid. The apparatus includes a supply unit, having a nozzle, to supply liquid into the space through the nozzle, and a suppressing unit to suppress leakage of liquid from the nozzle.
摘要翻译： 提供了一种曝光装置，其具有用于将原稿的图案投影到基板上的光学系统，并且在光学系统和填充有液体的基板之间具有空间将图案投影到基板上。 该设备包括：具有喷嘴的供应单元，用于通过喷嘴将液体供应到空间;以及抑制单元，以抑制液体从喷嘴的泄漏。
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公开(公告)号：US20050029954A1
公开(公告)日：2005-02-10
申请号：US10910272
申请日：2004-08-04
IPC分类号： H05H1/46 , C23C16/511 , C23F4/00 , H01J7/24 , H01J27/16 , H01J37/08 , H01J37/32 , H01L21/00 , H01L21/3065 , H01L21/31 , H05H1/00
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32256
摘要： A plasma-processing apparatus includes a vacuum chamber for accommodating an object to be processed and for providing plasma processing to the object under a vacuum or reduced environment, an impedance matching unit configured for impedance matching, the impedance matching unit being provided between the vacuum chamber and a microwave oscillator for generating microwaves, and a controller for controlling actions of the impedance matching unit based on a relationship among a matching state of the impedance matching unit, a microwave strength distribution necessary to generate plasma for the matching state, and a matching state of the impedance matching unit which minimizes a reflected wave during the plasma processing.
摘要翻译： 等离子体处理装置包括用于容纳被处理物体的真空室，并且用于在真空或减小的环境下对物体提供等离子体处理，阻抗匹配单元被配置为用于阻抗匹配，所述阻抗匹配单元设置在真空室 以及微波振荡器，用于产生微波;以及控制器，用于根据阻抗匹配单元的匹配状态，匹配状态产生等离子体所需的微波强度分布与匹配状态之间的关系来控制阻抗匹配单元的动作 的阻抗匹配单元，其在等离子体处理期间使反射波最小化。
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